JP2000290533A - Titanyl oxalate coating solution and preparation of photocatalytic element using this - Google Patents

Titanyl oxalate coating solution and preparation of photocatalytic element using this

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Publication number
JP2000290533A
JP2000290533A JP11102541A JP10254199A JP2000290533A JP 2000290533 A JP2000290533 A JP 2000290533A JP 11102541 A JP11102541 A JP 11102541A JP 10254199 A JP10254199 A JP 10254199A JP 2000290533 A JP2000290533 A JP 2000290533A
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JP
Japan
Prior art keywords
coating solution
substrate
solution
titanyl oxalate
titanium oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11102541A
Other languages
Japanese (ja)
Other versions
JP3978635B2 (en
Inventor
Masahiro Kurose
雅弘 黒瀬
Masahiro Kawamoto
正比呂 河本
Ryoji Masuno
良二 増野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tayca Corp
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Tayca Corp
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Priority to JP10254199A priority Critical patent/JP3978635B2/en
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Abstract

PROBLEM TO BE SOLVED: To provide a shelf-stable coating solution which contains titanyl oxalate which forms an unsupported film of anatase-type titanium oxide and does not limit target substrates to acid-resistant materials, and a process for forming in anatase-type titanium oxide photocatalytic film having an excellent hardness, substrate adhesion and photocatalytic activity from this coating solution. SOLUTION: A coating solution has from 1 to 13 wt.% titanyl oxalate, calculated as TiO2, and has a pH adjusted within a range of from 3.8 to 5.0 using aqueous ammonia. A substrate is coated or impregnated with this coating solution and calcined at from 400 to 800 deg.C to form a photocatalytic layer on the surface of the substrate. Preferably, the substrate is made of glass or ceramins.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、基材へ塗布または
含浸し、焼成することによって支持体表面に酸化チタン
光触媒層を形成するためのシュウ酸チタニルコーティン
グ液に関する。
The present invention relates to a titanyl oxalate coating solution for forming a titanium oxide photocatalyst layer on the surface of a support by coating or impregnating on a substrate and firing.

【0002】[0002]

【従来技術とその問題点】酸化チタンは、酸素と水の存
在下そのバンドギャップ以上のエネルギーを持つ波長3
80nm以下の光で照射する時物質を酸化分解する光触
媒反応を行うことは良く知られている。近年この現象を
利用して環境浄化を行う研究が盛んに行われている。
2. Description of the Related Art Titanium oxide has a wavelength of 3 or more in the presence of oxygen and water having an energy greater than its band gap.
It is well known to perform a photocatalytic reaction that oxidizes and decomposes substances when irradiated with light of 80 nm or less. In recent years, studies for purifying the environment utilizing this phenomenon have been actively conducted.

【0003】具体的には、自動車や工場の排気ガス中の
NOx ,SOx ,アンモニア、アルデヒド類、アミン
類、メルカプタン類の有害または悪臭物質の光分解、
油、タール、タバコのヤニなどの生活汚染物質の光分
解、工業排水に含まれる染料、糊剤などの光分解、細
菌、カビ、藻類等の有害微生物の殺滅等である。
Specifically, photodecomposition of harmful or odorous substances such as NO x , SO x , ammonia, aldehydes, amines and mercaptans in exhaust gas of automobiles and factories,
Photodecomposition of living pollutants such as oil, tar and tobacco tar, photodecomposition of dyes and pastes contained in industrial wastewater, killing of harmful microorganisms such as bacteria, mold and algae.

【0004】酸化チタン自体は固体の粉末または結晶で
あるから前記のような用途に用いるために支持体もしく
は基材へ固定化し、支持しなければならない。この固定
化のための一方法として、光触媒または加熱により光触
媒となる成分を含んでいるコーティング液を使用する方
法があり、そのための種々のコーティング液も知られて
いる。
[0004] Since titanium oxide itself is a solid powder or a crystal, it must be immobilized and supported on a support or substrate in order to be used in the above-mentioned applications. As one method for this immobilization, there is a method using a coating solution containing a photocatalyst or a component which becomes a photocatalyst by heating, and various coating solutions for that purpose are also known.

【0005】これらのうち四塩化ケイ素および硫酸チタ
ニルの水溶液や、塩酸または硝酸で解膠したチタニアゾ
ルは液自体が強酸性であるため取扱い上不便であり、支
持体も耐酸性材料に制限される。その上これらのコーテ
ィング液を塗布した後加熱して塗膜を形成する際に有害
ガスを発生する。
Of these, aqueous solutions of silicon tetrachloride and titanyl sulfate and titania sol peptized with hydrochloric acid or nitric acid are inconvenient to handle because the liquid itself is strongly acidic, and the support is also limited to acid-resistant materials. In addition, when these coating liquids are applied and heated to form a coating film, harmful gases are generated.

【0006】アルコキシチタンの加水分解物のゾルを酸
化チタン単独膜の形成に利用する提案もなされている
(特開平7−100378)。しかしながらこのゾルは
原料のアルコキシチタンが高価である上、貯蔵に不安定
である。またこのゾルから比較的厚い酸化チタン膜を一
時に形成しようとすると焼成時にクラックを生じ、膜が
支持体から容易に剥離するので、低チタン濃度のコーテ
ィング液を用いて所望の膜厚へ達するまで塗布および焼
成をくり返す必要がある。
It has been proposed to use a sol of a hydrolyzate of alkoxytitanium for forming a titanium oxide single film (Japanese Patent Application Laid-Open No. 7-100378). However, this sol is expensive in its raw material, and is unstable in storage. In addition, if a relatively thick titanium oxide film is formed from this sol at one time, cracks occur during firing, and the film easily peels off from the support. Application and baking must be repeated.

【0007】水酸化チタンにシュウ酸をモル比1:2以
上で反応させて得られるシュウ酸チタン錯体は水溶性で
あり、熱分解によって酸化チタンを生成するので、この
錯体の水溶液を酸化チタン膜を形成するためのコーティ
ング液に使用することが提案された(特開昭54−98
716)。この液は例えばガラス板基材に塗布し、30
0℃以上に加熱すると基材に密着性のある酸化チタン膜
を形成する。しかしながらこのコーティング液はその強
酸性のため支持体の材質が耐酸性のものに制限される。
例えばアルミナは使用できない。
A titanium oxalate complex obtained by reacting oxalic acid with titanium hydroxide at a molar ratio of 1: 2 or more is water-soluble and generates titanium oxide by thermal decomposition. For use as a coating liquid for forming a polymer (JP-A-54-98).
716). This liquid is applied to, for example, a glass plate
When heated to 0 ° C. or higher, a titanium oxide film having adhesion to the substrate is formed. However, since the coating solution is strongly acidic, the material of the support is limited to an acid-resistant material.
For example, alumina cannot be used.

【0008】そこで本発明の課題の一つは、熱分解によ
り酸化チタンへ変化するチタン化合物としてシュウ酸チ
タニルを含み、対象となる基材が耐酸性材料に限定され
ず、貯蔵に安定であり、かつ硬度および基材密着性の高
い光触媒膜を形成するコーティング液を提供することで
ある。本発明の他の課題および利益は説明が進むにつれ
明らかになるであろう。
Therefore, one of the objects of the present invention is to include titanyl oxalate as a titanium compound which changes to titanium oxide by thermal decomposition, the target substrate is not limited to acid-resistant materials, and is stable in storage. Another object of the present invention is to provide a coating liquid that forms a photocatalytic film having high hardness and high substrate adhesion. Other problems and benefits of the present invention will become apparent as the description proceeds.

【0009】[0009]

【課題を解決するための方法】上記および他の課題は、
本発明により、シュウ酸チタニル濃度1〜13重量%を
有し、アンモニア水でpH3.8〜5.0範囲に調節さ
れていることを特徴とする光触媒層形成用コーティング
液を提供することによって解決される。
SUMMARY OF THE INVENTION The above and other problems include:
According to the present invention, a solution is provided by providing a coating solution for forming a photocatalyst layer, which has a titanyl oxalate concentration of 1 to 13% by weight and is adjusted to pH 3.8 to 5.0 with aqueous ammonia. Is done.

【0010】本発明はまた、上のコーティング液を用い
て光触媒エレメントを製造する方法を提供する。この方
法は、このコーティング液を支持体に塗布または含浸
し、400〜800℃の温度で焼成することによってシ
ュウ酸チタニルを熱分解し、基材表面に酸化チタン光触
媒層を形成することを特徴としている。
The present invention also provides a method for producing a photocatalytic element using the above coating liquid. This method is characterized in that the coating liquid is applied or impregnated on a support, and the titanium oxide oxalate is thermally decomposed by baking at a temperature of 400 to 800 ° C. to form a titanium oxide photocatalyst layer on the surface of the substrate. I have.

【0011】[0011]

【具体的実施方法】シュウ酸チタニルは公知物質であ
り、その水溶液は例えば以下のようにして得ることがで
きる。すなわち硫酸チタニルまたは四塩化チタン水溶液
をアンモニア水で中和し、析出物を濾過、水洗して無定
形のオルトチタン酸含水ケーキを製造する。このケーキ
へそのTiO2 含量に対しモル比で少なくとも2倍のシ
ュウ酸(二水和物)を添加し、攪拌すると、ケーキは淡
黄色透明なシュウ酸チタニル溶液となる。過剰なシュウ
酸は静置して沈澱させ、濾過または傾斜して除去するこ
とができる。
DETAILED DESCRIPTION Titanyl oxalate is a known substance, and its aqueous solution can be obtained, for example, as follows. That is, an aqueous solution of titanyl sulfate or titanium tetrachloride is neutralized with aqueous ammonia, and the precipitate is filtered and washed with water to produce an amorphous water cake of orthotitanic acid. Oxalic acid (dihydrate) at a molar ratio of at least twice the TiO 2 content is added to the cake and, when stirred, the cake becomes a pale yellow transparent titanyl oxalate solution. Excess oxalic acid can be allowed to settle on standing, filtered or decanted off.

【0012】得られたシュウ酸水溶液はpHメーターに
より測定できない程酸性が強く、そのままでは例えばア
ルミナ等の非耐酸性基材へ塗布できない。本発明によれ
ば、この水溶液をアンモニア水を用いてpH3.8〜
5.0,好ましくはpH4.0〜4.5の範囲へ中和す
る。この際中和にアンモニア水を用いること、および中
和後のpHが上の範囲にあることが本発明にとって重要
である。例えば水酸化ナトリウム等の他の中和剤は焼成
後も塗膜中に残存し、場合によりTiO2 と化合して触
媒活性の低下等の光触媒に対する悪影響を及ぼすのに対
し、アンモニアは焼成により全量が揮散し、塗膜中に残
存しないからである。またpHが上の範囲内であれば基
材およびコーティング液の取扱い器具が実質上耐酸性で
あることを要しない。しかしながらpHが高くなるにつ
れチタンイオンに配位しているシュウ酸が解離し、pH
6.0以上では水酸化チタンの生成により溶液の安定性
と塗膜の性能に悪影響するのでそのようなpH域は避け
るべきである。
The obtained oxalic acid aqueous solution is so acidic that it cannot be measured by a pH meter, and cannot be applied to a non-acid-resistant substrate such as alumina as it is. According to the present invention, the pH of the aqueous solution is adjusted to 3.8 to 3.8 using aqueous ammonia.
Neutralize to 5.0, preferably pH 4.0-4.5. At this time, it is important for the present invention that ammonia water is used for neutralization and that the pH after neutralization is in the above range. For example, other neutralizing agents such as sodium hydroxide remain in the coating film after calcination and, in some cases, combine with TiO 2 to adversely affect the photocatalyst such as a decrease in catalytic activity. Is volatilized and does not remain in the coating film. If the pH is within the above range, the handling equipment for the substrate and the coating liquid does not need to be substantially acid-resistant. However, as the pH increases, oxalic acid coordinated to the titanium ion dissociates, and the pH increases.
Above 6.0, such pH range should be avoided because the formation of titanium hydroxide adversely affects the stability of the solution and the performance of the coating film.

【0013】このようにアンモニア水でpH調節したシ
ュウ酸チタニル水溶液はTiO2 換算固形分濃度1〜1
3重量%へ調節することができる。1回の塗布でできる
だけ厚い膜を形成するためにはコーティング液のこの濃
度は高い方が好ましいが、常温での溶解度から13重量
%が限度であろう。濃度の調節はコーティング液を水で
希釈するか、または反対にコーティング液を水の蒸発に
より濃縮することによって行うことができる。
The aqueous solution of titanyl oxalate pH-adjusted with ammonia water in this manner has a solid content concentration of 1 to 1 in terms of TiO 2.
It can be adjusted to 3% by weight. In order to form a film as thick as possible in one application, this concentration of the coating liquid is preferably higher, but the solubility at room temperature may be limited to 13% by weight. The concentration can be adjusted by diluting the coating solution with water or, conversely, concentrating the coating solution by evaporation of water.

【0014】基材は、ガラス、アルミナを含むセラミッ
クス、セメント、スレート、石膏、石材、活性炭等の後
記の焼成温度に耐えることができる材質のものでなけれ
ばならないが、形状は板状、球状、繊維状、ハニカム状
などの光触媒の用途に適した任意の形状から選ばれる。
The substrate must be made of a material that can withstand the calcination temperature described below, such as glass, ceramics containing alumina, cement, slate, gypsum, stone, activated carbon, etc. The shape is selected from arbitrary shapes suitable for the use of the photocatalyst, such as a fibrous shape and a honeycomb shape.

【0015】コーティング液の基材への塗布または含浸
方法も基材の形状と寸法に適した任意の方法を採用し得
る。例えばハケ塗り、スプレー法、バーコーター法、ア
プリケーター法、スピンコーティング、ディップ法など
である。スピンコーティングやスプレー法の場合は他の
場合よりも濃度をやや低めに設定するのが好ましい。
The method of applying or impregnating the substrate with the coating liquid may be any method suitable for the shape and dimensions of the substrate. For example, a brush coating, a spray method, a bar coater method, an applicator method, a spin coating, a dip method, and the like. In the case of spin coating or spraying, it is preferable to set the concentration slightly lower than in other cases.

【0016】コーティング液を塗布または含浸した後、
基材を100℃以上の温度で乾燥し、400〜800
℃,好ましくは500〜600℃の温度で焼成する。こ
の焼成によりシュウ酸およびアンモニアが揮散し、基材
表面または内部空胴に光触媒能を有するアナタース形酸
化チタンの層が形成される。上の範囲内の焼成温度にお
いてシュウ酸およびアンモニアを完全に揮散させるのに
要する時間は温度の関数であるが、一般に2〜5時間を
要する。しかしながら上の範囲をこえる高温域では酸化
チタンの形が触媒活性の低いルチル形へ転移するリスク
があるのでそのような高温域における焼成は避けるべき
である。
After applying or impregnating the coating liquid,
The substrate is dried at a temperature of 100 ° C. or more, and 400 to 800
C., preferably at a temperature of 500 to 600.degree. By this baking, oxalic acid and ammonia volatilize, and a layer of anatase-type titanium oxide having photocatalytic ability is formed on the surface of the substrate or the internal cavity. The time required to completely volatilize oxalic acid and ammonia at firing temperatures in the above range is a function of temperature, but generally requires 2-5 hours. However, in a high temperature range exceeding the above range, there is a risk that the form of titanium oxide is transformed into a rutile form having low catalytic activity, so that calcination in such a high temperature range should be avoided.

【0017】本発明のコーティング液を用いれば、1回
の塗布または含浸によって約1〜6μmの膜厚のアナタ
ース形酸化チタン光触媒層を形成することが可能であ
る。この膜は透明であり、硬度が高く、かく基材への密
着性もすぐれている。
By using the coating solution of the present invention, it is possible to form an anatase-type titanium oxide photocatalytic layer having a thickness of about 1 to 6 μm by one coating or impregnation. This film is transparent, has high hardness, and thus has excellent adhesion to a substrate.

【0018】このような膜もしくは層の形でアナタース
形酸化チタン光触媒を固定化させた基材は、酸化チタン
の光触媒反応を利用して有害物質を分解して浄化する光
触媒エレメントとして有用である。例えばNOX 分解ま
たはセルフクリーニング機能を有する窓ガラスまたは屋
外建材、空気清浄機に組込まれる悪臭物質分解用フィル
ター、病院や浴室に使用される抗菌性タイルなどの製造
に使用することができる。またガラスビーズ、アルミナ
ビーズ、活性炭などを基材とするエレメントは、生活排
水または工業排水中に含まれる界面活性剤、染料、糊料
などの光浄化に使用することができる。
The substrate on which the anatase-type titanium oxide photocatalyst is immobilized in the form of such a film or layer is useful as a photocatalytic element for decomposing and purifying harmful substances by utilizing the photocatalytic reaction of titanium oxide. For example it is possible to use NO X decomposition or glazing or outdoor building material having a self-cleaning function, malodorous material decomposition filter to be incorporated into the air purifier, the production of such antimicrobial tiles used in hospitals or bathroom. Elements based on glass beads, alumina beads, activated carbon and the like can be used for light purification of surfactants, dyes, pastes and the like contained in domestic wastewater or industrial wastewater.

【0019】[0019]

【実施例】以下に限定を意図しない実施例をもって本発
明をさらに詳しく説明する。
The present invention will be described in more detail with reference to the following non-limiting examples.

【0020】実施例1 硫酸チタニル水溶液(テイカ(株)製TM結晶(商品
名)を純水中TiO2 換算濃度5重量%に溶解した水溶
液)を、試薬級アンモニア水(片山化学工業(株)製、
NH3 濃度25重量%)によりpH7.5へ中和し、析
出物を濾過し、2倍量の純水で洗浄して無定形のオルト
チタン酸を得た。このケーキ中のTiO2換算チタン含
量は14重量%であった。
Example 1 An aqueous solution of titanyl sulfate (an aqueous solution obtained by dissolving a TM crystal (trade name) manufactured by Teika Co., Ltd. in pure water at a concentration of 5% by weight as TiO 2 ) was mixed with reagent grade ammonia water (Katayama Chemical Industry Co., Ltd.) Made,
(NH 3 concentration 25% by weight) to neutralize to pH 7.5, and precipitate was filtered and washed with twice the amount of pure water to obtain amorphous orthotitanic acid. The content of titanium in terms of TiO 2 in this cake was 14% by weight.

【0021】このケーキ57.1g(TiO2 換算して
8g)を100mlガラスビーカーに取り、シュウ酸二
水和物(試薬級、片山化学工業(株)製)27.9g
(TiO2 換算量に対して2.2倍のモル比)を添加
し、攪拌しながら70℃へ昇温し、ケーキを完全に溶解
させた。この溶液を室温へ冷却後静置し、沈澱した過剰
のシュウ酸を濾過により除去した。この濾液82.4g
へアンモニア水(上に同じ)14gと純水3.6gの混
液を攪拌しながら徐々に添加し、溶液のpHを4.0へ
調節し、TiO2 換算濃度8重量%のコーティング液を
得た。
57.1 g of this cake (8 g in terms of TiO 2 ) was placed in a 100 ml glass beaker, and 27.9 g of oxalic acid dihydrate (reagent grade, manufactured by Katayama Chemical Industry Co., Ltd.) was used.
(A molar ratio of 2.2 times the amount of TiO 2 ) was added, and the temperature was raised to 70 ° C. while stirring to completely dissolve the cake. The solution was cooled to room temperature and allowed to stand, and the precipitated excess oxalic acid was removed by filtration. 82.4 g of this filtrate
A mixture of 14 g of aqueous ammonia (same as above) and 3.6 g of pure water was gradually added with stirring, and the pH of the solution was adjusted to 4.0 to obtain a coating solution having a concentration of 8% by weight in terms of TiO 2 . .

【0022】このコーティング液をスライドガラス板
(松波ガラス社製、サイズ8×2.5cm,厚さ1.3
mm)にバーコーター#22(大佑機械社製)を用いて
塗布し、110℃において30分間乾燥し、その後60
0℃で2時間焼成し、塗板を作成した。
This coating solution was applied to a slide glass plate (Matsunami Glass Co., Ltd., size 8 × 2.5 cm, thickness 1.3).
mm) using a bar coater # 22 (manufactured by Daisuke Kikai Co., Ltd.), dried at 110 ° C. for 30 minutes, and then dried for 60 minutes.
It was baked at 0 ° C. for 2 hours to prepare a coated plate.

【0023】実施例2 シュウ酸チタニル水溶液をアンモニア水14.5gと純
水3.1gの混液でpHを5.0へ調節したことを除
き、実施例1と同様にしてTiO2 換算濃度8重量%の
透明なコーティング液を得た。
Example 2 Except that the pH of an aqueous solution of titanyl oxalate was adjusted to 5.0 with a mixture of 14.5 g of aqueous ammonia and 3.1 g of pure water, the concentration in terms of TiO 2 was 8 wt. % Of the coating liquid was obtained.

【0024】実施例3 実施例1のシュウ酸チタニル溶液41.2gへ、アンモ
ニア水7gと純水51.8gの混液を添加してpH4.
0へ調節し、TiO2 換算濃度4重量%の透明なコーテ
ィング液を得た。
Example 3 A mixture of 7 g of ammonia water and 51.8 g of pure water was added to 41.2 g of the titanyl oxalate solution of Example 1 to obtain a pH 4.0 solution.
It was adjusted to 0 to obtain a transparent coating solution having a concentration of 4% by weight in terms of TiO 2 .

【0025】実施例4 実施例1においてオルトチタン酸ケーキを85.7g
(TiO2 換算12g)、シュウ酸二水和物を41.8
g(TiO2 に対するモル比2.2)に変更し、過剰の
シュウ酸を除去してシュウ酸チタニル水溶液123.7
gを得た。この溶液にアンモニア水21gを添加し(T
iO2 換算濃度8.3重量%)、110℃の乾燥機中で
水を蒸発させて濃縮し、pH4.0、TiO2 換算濃度
12重量%のコーティング液を得た。
Example 4 85.7 g of the orthotitanate cake in Example 1
(Equivalent to 12 g of TiO 2 ) and 41.8 of oxalic acid dihydrate
g (molar ratio to TiO 2 of 2.2), and removing excess oxalic acid to obtain an aqueous solution of titanyl oxalate 123.7.
g was obtained. 21 g of aqueous ammonia was added to this solution (T
iO 2 concentration in terms 8.3 wt%), evaporating the water in a 110 ° C. oven and concentrated, pH 4.0, to give the terms of TiO 2 concentration of 12% by weight of the coating solution.

【0026】実施例5 コーティング液を塗布したガラス板の焼成温度を450
℃に変更した以外は実施例1に同じ。
Example 5 The firing temperature of a glass plate coated with a coating liquid was 450
Same as Example 1 except that the temperature was changed to ° C.

【0027】実施例6 コーティング液を塗布したガラス板の焼成温度を750
℃に変更した以外は実施例1に同じ。
Example 6 The firing temperature of a glass plate coated with a coating liquid was 750.
Same as Example 1 except that the temperature was changed to ° C.

【0028】比較例1 実施例1においてシュウ酸チタニル水溶液へ添加するア
ンモニア水の量を15.0g,純水の量を2.6gに変
更し、TiO2 換算濃度8重量%のコーティング液を得
た。この液のpHは6.0であり、酸化チタンが析出
し、白濁していた。
Comparative Example 1 In Example 1, the amount of aqueous ammonia added to the aqueous solution of titanyl oxalate was changed to 15.0 g and the amount of pure water to 2.6 g to obtain a coating liquid having a concentration of 8% by weight in terms of TiO 2. Was. The pH of this solution was 6.0, and titanium oxide was precipitated and became cloudy.

【0029】比較例2 実施例1においてシュウ酸チタニル水溶液へ添加するア
ンモニア水の量を13.6g、純水の量を4.0gに変
更し、TiO2 換算濃度8重量%のコーティング液を得
た。この液のpHは3.5であり、透明であった。
Comparative Example 2 In Example 1, the amount of ammonia water added to the aqueous solution of titanyl oxalate was changed to 13.6 g and the amount of pure water was changed to 4.0 g to obtain a coating solution having a concentration of 8% by weight in terms of TiO 2. Was. This solution had a pH of 3.5 and was transparent.

【0030】比較例3 実施例4において、アンモニア水を添加後のTiO2
算濃度8.3重量%のシュウ酸チタニル水溶液をTiO
2 換算濃度14重量%まで濃縮した。このコーティング
液のpHは4.0であったがシュウ酸塩の結晶の析出が
多く見られた。
COMPARATIVE EXAMPLE 3 In Example 4, an aqueous solution of titanyl oxalate having a concentration of 8.3% by weight in terms of TiO 2 after addition of aqueous ammonia was replaced with TiO 2.
It was concentrated to a concentration of 2 % by weight of 14% by weight. Although the pH of this coating solution was 4.0, many oxalate crystals were precipitated.

【0031】比較例4 コーティング液を塗布したガラス板の焼成温度を900
℃に変更した以外は実施例1に同じ。
Comparative Example 4 The firing temperature of the glass plate to which the coating liquid was applied was 900
Same as Example 1 except that the temperature was changed to ° C.

【0032】比較例5 試薬級シュウ酸チタニルアンモニウム(片山化学工業社
製、TiO2 換算含量25.4重量%)31.5gを純
水68.5gに攪拌溶解し、TiO2 換算濃度8重量%
のシュウ酸チタニルアンモニウム水溶液100gを得
た。この溶液のpHは2.0で、透明であった。
Comparative Example 5 31.5 g of reagent grade titanyl ammonium oxalate (manufactured by Katayama Chemical Co., Ltd., 25.4% by weight in terms of TiO 2 ) was stirred and dissolved in 68.5 g of pure water, and the concentration in terms of TiO 2 was 8% by weight.
Thus, 100 g of an aqueous solution of titanyl ammonium oxalate was obtained. This solution had a pH of 2.0 and was transparent.

【0033】コーティング液の貯蔵安定性および基材腐
食性 1.貯蔵安定性 コーティング液100gを蓋付きのガラス容器に入れ、
25℃で2ケ月間静置し、沈降物の有無について目視で
評価した。 2.基材腐食性 コーティング液100gと、粒状酸化アルミニウム(片
山化学工業社製)1gを混合し、蓋付きのガラス容器に
入れ、50℃で12時間静置した。その後粒状酸化アル
ミニウムを濾過して回収し、水洗、乾燥して重量を測定
した。当初重量の減少率をもって基材腐食性を評価し
た。
Storage stability of coating solution and substrate decay
Food habits 1. Storage stability 100 g of the coating liquid is placed in a glass container with a lid,
It was allowed to stand at 25 ° C. for 2 months, and the presence or absence of sediment was visually evaluated. 2. Substrate Corrosion 100 g of the coating solution and 1 g of granular aluminum oxide (manufactured by Katayama Chemical Industry Co., Ltd.) were mixed, placed in a glass container with a lid, and allowed to stand at 50 ° C. for 12 hours. Thereafter, the particulate aluminum oxide was recovered by filtration, washed with water, dried and weighed. The substrate corrosion was evaluated based on the weight loss rate at the beginning.

【0034】光触媒膜の性能評価 1.塗膜の作成方法 実施例1のようにコーティング液をスライドガラス板に
塗布し、乾燥したものを実施例5において450℃、実
施例6においては750℃、比較例4においては900
℃とし、他の実施例および比較例においては600℃と
した。 2.塗膜の密着性 JIS K5400に従ったゴバン目テープ法によって
評価した。テープを剥がした後の塗膜剥離部分が総ゴバ
ン目の10%未満を良好とし、10%以上のものを不良
とした。 3.塗膜硬度 JIS K5400に従った鉛筆硬度によって評価し
た。 4.光触媒活性 塗板を内容積400mlのガラス容器に入れ、その中に
10ppmのNOガスを封入した。この容器を高圧水銀
灯(和光電気社製理化学用水銀灯起動装置H−400−
A/B、ランプ東芝H−400F、ランプ消費電力40
0W)の直下25cmに設置し、水銀灯の照射強度が
3.7mW/cm2 になるように微調整した。その後上
記ガラス容器を回転させながら高圧水銀灯で10分間塗
板を照射した。照射後の残留NOガス濃度をガス検知機
(GASTEC社製GV−100S検知管No.11
L)により測定し、以下の式により光分解率を求めた。 光分解率(%)=(初期ガス濃度−残留ガス濃度)/初
期ガス濃度×100 結果を表1および表2に示す。
Performance Evaluation of Photocatalytic Film Method of forming coating film A coating solution was applied to a slide glass plate as in Example 1, dried, and dried at 450 ° C. in Example 5, 750 ° C. in Example 6, and 900 ° C. in Comparative Example 4.
° C, and 600 ° C in other Examples and Comparative Examples. 2. Adhesion of Coating Film The adhesiveness of the coating film was evaluated according to the Gobang tape method according to JIS K5400. When the peeled portion of the coating film after peeling off the tape was less than 10% of the total gross pattern, it was regarded as good, and when it was 10% or more, it was regarded as bad. 3. Film hardness was evaluated by pencil hardness according to JIS K5400. 4. Photocatalytic activity The coated plate was placed in a glass container having an inner volume of 400 ml, and 10 ppm of NO gas was sealed therein. This container is placed in a high-pressure mercury lamp (H-400- mercury lamp activator for physics and chemistry manufactured by Wako Electric Co., Ltd.).
A / B, Lamp Toshiba H-400F, Lamp power consumption 40
0 W), and finely adjusted so that the irradiation intensity of the mercury lamp was 3.7 mW / cm 2 . Thereafter, the coated plate was irradiated with a high-pressure mercury lamp for 10 minutes while rotating the glass container. The residual NO gas concentration after the irradiation was measured using a gas detector (GV-100S detector tube No. 11 manufactured by GASTEC).
L), and the photodegradation rate was determined by the following equation. Photolysis rate (%) = (initial gas concentration−residual gas concentration) / initial gas concentration × 100 The results are shown in Tables 1 and 2.

【0035】[0035]

【表1】 [Table 1]

【0036】[0036]

【表2】 [Table 2]

───────────────────────────────────────────────────── フロントページの続き (72)発明者 増野 良二 大阪府大阪市大正区船町1丁目3番47号 テイカ株式会社内 Fターム(参考) 4J038 AA012 EA011 HA212 HA216 JA43 KA04 PA19 PC03  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Ryoji Masuno 1-47, Funamachi, Taisho-ku, Osaka City, Osaka Prefecture F-term (in reference) 4J038 AA012 EA011 HA212 HA216 JA43 KA04 PA19 PC03 PC03

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】TiO2 に換算したシュウ酸チタニル濃度
1〜13重量%を有し、アンモニア水でpH3.8〜
5.0の範囲に調節されていることを特徴とする光触媒
層形成用コーティング液。
1. It has a titanyl oxalate concentration of 1 to 13% by weight in terms of TiO 2 and a pH of 3.8 to 3.8 with ammonia water.
A coating solution for forming a photocatalyst layer, which is adjusted to a range of 5.0.
【請求項2】請求項1のコーティング液を基材に塗布ま
たは含浸し、400〜800℃の温度で焼成することに
より基材表面に酸化チタン光触媒層を形成することを特
徴とする光触媒エレメントの製造方法。
2. A photocatalytic element, wherein a titanium oxide photocatalyst layer is formed on a surface of a substrate by applying or impregnating the coating solution of claim 1 on a substrate and firing at a temperature of 400 to 800 ° C. Production method.
【請求項3】基材がガラスまたはセラミックス製である
請求項2の方法。
3. The method according to claim 2, wherein the substrate is made of glass or ceramic.
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* Cited by examiner, † Cited by third party
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KR20010099352A (en) * 2001-09-21 2001-11-09 최명식 A glass coeaed photocatalyst
JP2006312730A (en) * 2005-04-08 2006-11-16 Toho Titanium Co Ltd Composition for forming photocatalyst coating film of titanium oxide, its manufacturing method, coating film for photocatalyst and coated article for photocatalyst
WO2008007453A1 (en) 2006-07-13 2008-01-17 Central Japan Railway Company Coating liquid, titanium oxide thin-film formed using coating liquid, and method of forming the same
US7435765B2 (en) 2002-12-06 2008-10-14 Eastman Kodak Company Additive for ink jet ink

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010099352A (en) * 2001-09-21 2001-11-09 최명식 A glass coeaed photocatalyst
US7435765B2 (en) 2002-12-06 2008-10-14 Eastman Kodak Company Additive for ink jet ink
JP2006312730A (en) * 2005-04-08 2006-11-16 Toho Titanium Co Ltd Composition for forming photocatalyst coating film of titanium oxide, its manufacturing method, coating film for photocatalyst and coated article for photocatalyst
JP4540069B2 (en) * 2005-04-08 2010-09-08 東邦チタニウム株式会社 Composition for forming titanium oxide photocatalyst coating film, method for producing the same, coating film for photocatalyst, and coated product for photocatalyst
WO2008007453A1 (en) 2006-07-13 2008-01-17 Central Japan Railway Company Coating liquid, titanium oxide thin-film formed using coating liquid, and method of forming the same
WO2008007451A1 (en) 2006-07-13 2008-01-17 Central Japan Railway Company Coating solution, titanium oxide thin film formed using the coating solution, and method for formation of thin film
US7993753B2 (en) 2006-07-13 2011-08-09 Central Japan Railway Company Coating liquid, titanium oxide film formed by coating liquid, and forming method thereof

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