JP2000277047A - Visual field movement correcting device for scanning electron microscope - Google Patents
Visual field movement correcting device for scanning electron microscopeInfo
- Publication number
- JP2000277047A JP2000277047A JP11079146A JP7914699A JP2000277047A JP 2000277047 A JP2000277047 A JP 2000277047A JP 11079146 A JP11079146 A JP 11079146A JP 7914699 A JP7914699 A JP 7914699A JP 2000277047 A JP2000277047 A JP 2000277047A
- Authority
- JP
- Japan
- Prior art keywords
- detecting unit
- ray
- magnetic field
- correcting
- generated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000007 visual effect Effects 0.000 title claims abstract description 7
- 238000006073 displacement reaction Methods 0.000 abstract description 12
- 238000010894 electron beam technology Methods 0.000 abstract description 8
- 238000010893 electron trap Methods 0.000 abstract description 4
- 230000037431 insertion Effects 0.000 abstract 2
- 238000003780 insertion Methods 0.000 abstract 2
- 238000004458 analytical method Methods 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、走査形電子顕微鏡
などに用いる非分散形X線分析装置などの検出器の出し
入れによって発生する分析位置の移動や、観察視野の移
動の低減を図る視野移動補正装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a visual field movement for reducing a movement of an analysis position and a movement of an observation visual field caused by inserting and removing a detector such as a non-dispersive X-ray analyzer used for a scanning electron microscope. The present invention relates to a correction device.
【0002】[0002]
【従来の技術】走査形電子顕微鏡等は試料中の成分分析
などを行う目的で、非分散形X線分析装置などの分析装
置が広く用いられる。非分散形X線分析装置は分析感度
を向上させるためX線の発生源近傍に検出器を設定する
事が重要であるが、試料より発生する反射電子の影響に
よって、検出器破損などの問題が起こってくる。2. Description of the Related Art In a scanning electron microscope or the like, an analyzer such as a non-dispersive X-ray analyzer is widely used for analyzing components in a sample. In a non-dispersive X-ray analyzer, it is important to set a detector near the source of X-rays in order to improve the analysis sensitivity. However, problems such as damage to the detector due to reflected electrons generated from the sample may occur. Will happen.
【0003】この問題を回避する手段として、一般的な
X線検出器では検出器先端にマグネットを装着し反射電
子を偏向し検出器面に突入しないような対策を図ってい
る。しかし検出器先端にマグネットが取り付けられた状
態で、試料近傍まで検出器を近づけると、走査形電子顕
微鏡側では、電子線がマグネットの磁界の影響を受け偏
向され結果として分析場所の変化や、視野の移動といっ
た問題が発生してくる。As a means for avoiding this problem, a general X-ray detector is provided with a magnet at the tip of the detector so as to deflect reflected electrons so as not to enter the detector surface. However, if the detector is brought close to the sample with the magnet attached to the tip of the detector, the scanning electron microscope will deflect the electron beam under the influence of the magnetic field of the magnet, resulting in a change in the analysis location and the field of view. The problem of the movement of an object arises.
【0004】具体的には、日立SEM,S−4700形
SEMに装着した非分散形X線分析装置のように、X線
分析を行う場合には、X線分析用検出器をあらかじめ分
析位置に設定した後、分析位置を再設定しなければなら
なかった。Specifically, when performing X-ray analysis such as a non-dispersive X-ray analyzer mounted on a Hitachi SEM, S-4700 type SEM, a detector for X-ray analysis is set in advance at an analysis position. After setting, the analysis position had to be reset.
【0005】[0005]
【発明が解決しようとする課題】つまり、従来の構造に
於いては、X線分析用検出器の出し入れのたびに分析位
置の再設定や電子光学系の軸調整を行う必要が有った。That is, in the conventional structure, it is necessary to reset the analysis position and adjust the axis of the electron optical system every time the detector for X-ray analysis is moved in and out.
【0006】本発明の目的は、上記問題を解決する手段
として、検出器の位置検出を行うと共に電子線の位置ず
れの発生を補正する為の機能を設け、X線検出器のいか
なる位置においても、軸ずれを起こさない機能を提供す
る事にある。It is an object of the present invention to provide a function for detecting the position of the detector and correcting the occurrence of the displacement of the electron beam at any position of the X-ray detector as means for solving the above-mentioned problems. Another object of the present invention is to provide a function that does not cause axis misalignment.
【0007】[0007]
【課題を解決するための手段】上記課題を達成する為
に、本発明では電子線偏向系にX線検出器の出し入れに
よって発生する電子線の位置ずれを、X線検出器部に位
置センサ−を設ける事により補正し分析位置や観察位置
のずれの補正を行う事に有る。In order to attain the above object, according to the present invention, a displacement of an electron beam caused by taking an X-ray detector in and out of an electron beam deflection system is detected by a position sensor in an X-ray detector section. Is provided to correct the shift of the analysis position and the observation position.
【0008】[0008]
【発明の実施の形態】本発明の実施形態の例とするSE
M概略図を図1を用い説明する。図1はSEMにX線分析
装置を装着し、SEM像の観察と観察領域での試料中の
成分分析を行うためのX線分析装置を装着した構成を示
す。DESCRIPTION OF THE PREFERRED EMBODIMENTS SE as an example of an embodiment of the present invention
The M schematic diagram will be described with reference to FIG. FIG. 1 shows a configuration in which an X-ray analyzer is mounted on an SEM, and an X-ray analyzer for observing an SEM image and analyzing components in a sample in an observation region is mounted.
【0009】X線分析用検出器1の出し入れによって、
試料9と対物レンズ5間に発生している漏洩磁場や、X
線検出器2の先端に組み込んであるエレクトロントラッ
プの磁場の影響を受け試料上を走査している電子線は位
置ずれ8を起こす為結果として観察領域や、X線分析位
置に位置ずれが発生する。この位置ずれはX線検出器2
の挿入量や対物レンズ5の漏洩磁場量によって変化する
事になる。By taking the detector 1 for X-ray analysis in and out,
Leakage magnetic field generated between the sample 9 and the objective lens 5 and X
The electron beam scanning on the sample under the influence of the magnetic field of the electron trap incorporated in the tip of the X-ray detector 2 causes a position shift 8, resulting in a position shift in the observation region and the X-ray analysis position. . This displacement is caused by the X-ray detector 2
And the amount of leakage magnetic field of the objective lens 5.
【0010】この位置ずれを補正するために、X線検出
器部の挿入によって発生する位置補正のための位置検出
器12、および対物レンズと試料間に発生する漏洩磁場
による影響を補正するための対物電流検出13を設け補
正機能14にフィ−ドバックさせ位置ずれ8の位置を補
正するための補正信号15とし位置ずれを補正する事に
有る。In order to correct the positional deviation, a position detector 12 for correcting the position generated by inserting the X-ray detector unit, and a position detector 12 for correcting the influence of the leakage magnetic field generated between the objective lens and the sample. An objective current detection 13 is provided and a correction signal 15 for correcting the position of the position shift 8 by feeding back the correction function 14 is used to correct the position shift.
【0011】以上のよう、本実施例によれば、X線検出
器のいかなる位置においても、X線検出器のエレクトロ
ントラップによる偏向を受ける事無く、試料面上では位
置ずれの発生を防ぐ事が可能となり問題の回避が可能と
なる。As described above, according to this embodiment, at any position of the X-ray detector, the occurrence of displacement on the sample surface can be prevented without being deflected by the electron trap of the X-ray detector. It becomes possible and the problem can be avoided.
【0012】[0012]
【発明の効果】本発明によれば、SEMに用いられるX
線分析装置を装着したシステムにおいて、X線分析装置
に組み込んであるエレクトロントラップからの発生磁場
による電子線の位置ずれの補正が可能であり、効果は顕
著である。According to the present invention, X used in SEM
In the system equipped with the X-ray analyzer, the displacement of the electron beam due to the magnetic field generated from the electron trap incorporated in the X-ray analyzer can be corrected, and the effect is remarkable.
【図1】本発明の一実施例の構成図を示す。FIG. 1 shows a configuration diagram of an embodiment of the present invention.
1…X線分析用検出器、2…X線検出器、3…電子線、
4…偏向コイル、5…対物レンズ、6…対物電流信号、
7…偏向信号、8…位置ずれ、9…試料、10…対物レ
ンズ電源、11…偏向電源、12…位置検出器、13…
対物電流検出、14…補正機能、15…補正信号。DESCRIPTION OF SYMBOLS 1 ... Detector for X-ray analysis, 2 ... X-ray detector, 3 ... Electron beam,
4: Deflection coil, 5: Objective lens, 6: Objective current signal,
7 Deflection signal, 8 Position shift, 9 Sample, 10 Objective power supply, 11 Deflection power supply, 12 Position detector, 13
Object current detection, 14 correction function, 15 correction signal.
Claims (1)
対して、補正する手段として、打ち消し用磁界発生源を
設け視野移動を低減することを特徴とする、走査形電子
顕微鏡等の視野移動補正装置。1. A scanning electron microscope or the like, characterized in that a means for detecting a position of a detector and correcting the occurrence of a visual field movement is provided with a canceling magnetic field source to reduce the visual field movement. View movement correction device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11079146A JP2000277047A (en) | 1999-03-24 | 1999-03-24 | Visual field movement correcting device for scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11079146A JP2000277047A (en) | 1999-03-24 | 1999-03-24 | Visual field movement correcting device for scanning electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000277047A true JP2000277047A (en) | 2000-10-06 |
Family
ID=13681831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11079146A Pending JP2000277047A (en) | 1999-03-24 | 1999-03-24 | Visual field movement correcting device for scanning electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000277047A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109342983A (en) * | 2018-11-09 | 2019-02-15 | 安徽工程大学 | A kind of Hall sensor calibrating installation and its calibration scaling method |
CN110068267A (en) * | 2019-05-06 | 2019-07-30 | 广东工业大学 | Evaluate the space nanometer positioning and detection device and method of micro-vision measurement performance |
-
1999
- 1999-03-24 JP JP11079146A patent/JP2000277047A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109342983A (en) * | 2018-11-09 | 2019-02-15 | 安徽工程大学 | A kind of Hall sensor calibrating installation and its calibration scaling method |
CN109342983B (en) * | 2018-11-09 | 2024-03-29 | 安徽工程大学 | Hall sensor calibration device and calibration method thereof |
CN110068267A (en) * | 2019-05-06 | 2019-07-30 | 广东工业大学 | Evaluate the space nanometer positioning and detection device and method of micro-vision measurement performance |
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