JP2000271550A - Cleaning device - Google Patents
Cleaning deviceInfo
- Publication number
- JP2000271550A JP2000271550A JP11082548A JP8254899A JP2000271550A JP 2000271550 A JP2000271550 A JP 2000271550A JP 11082548 A JP11082548 A JP 11082548A JP 8254899 A JP8254899 A JP 8254899A JP 2000271550 A JP2000271550 A JP 2000271550A
- Authority
- JP
- Japan
- Prior art keywords
- water
- gas
- cleaning
- electrolyte
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は洗浄装置に係り、特
に、洗剤等を使用せず、水を電気分解して得た酸性水や
アルカリ性水を用いて物品を洗浄する洗浄装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus, and more particularly to a cleaning apparatus for cleaning articles using acidic water or alkaline water obtained by electrolyzing water without using a detergent or the like.
【0002】[0002]
【従来の技術】例えば、機械部品、あるいは半導体や表
示装置等の製造工程中における被加工品等の物品を洗浄
する洗浄装置では、一般に、界面活性剤や酸、アルカ
リ、あるいは過酸化物等の薬剤を添加した水を用いて洗
浄を行っていた。また、近年では、上記方法に加え、電
気分解によりpHや酸化還元電位を改質して得た酸性水
やアルカリ性水が洗浄水として用いられるようになっ
た。2. Description of the Related Art For example, in a cleaning apparatus for cleaning an article such as a machine part or a workpiece during a manufacturing process of a semiconductor or a display device, a surfactant, an acid, an alkali, a peroxide or the like is generally used. Cleaning was performed using water to which the chemical was added. In recent years, in addition to the above method, acidic water or alkaline water obtained by modifying pH or oxidation-reduction potential by electrolysis has been used as washing water.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記方
法のうち、薬剤の添加による方法では、洗浄後の物品に
薬剤が残留するという問題や、環境保全への対応にコス
トを要するという問題があった。However, of the above methods, the method involving the addition of a chemical has a problem that the chemical remains on the washed article and a problem that costs are required for environmental protection. .
【0004】一方、電気分解による方法では、水道水等
を直接電気分解すると、所望の酸性水やアルカリ性水を
得るために多大な電力を要するという問題があった。ま
た、また、電気分解に要する電圧を低下させる目的で、
食塩等の電解質を添加すると、洗浄後の物品に電解質が
残留し、物品が腐食するという新たな問題が生じてい
た。特に、半導体製造工程中における被加工品の洗浄に
使用すると、電解質中のナトリウム及びカリウムイオン
の残留が素子の歩留まりに直接影響し、製品の品質が低
下するという問題があった。On the other hand, in the electrolysis method, if tap water or the like is directly electrolyzed, there is a problem that a large amount of electric power is required to obtain desired acidic water or alkaline water. Also, in order to reduce the voltage required for electrolysis,
When an electrolyte such as salt is added, the electrolyte remains on the washed article, which causes a new problem that the article is corroded. In particular, when used for cleaning a workpiece during a semiconductor manufacturing process, there is a problem that the residual sodium and potassium ions in the electrolyte directly affect the yield of the device, and the quality of the product is reduced.
【0005】[0005]
【課題を解決するための手段】本発明は上記事情に鑑み
てなされたもので、原料水に電解質を添加し、更に電気
分解することにより前記原料水を改質するようにした洗
浄装置において、前記原料水への前記電解質の添加が、
前記原料水に水溶性の気体を溶解させることにより行わ
れることを特徴としている。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and is directed to a cleaning apparatus in which an electrolyte is added to raw water and the raw water is reformed by electrolysis. The addition of the electrolyte to the raw water,
It is performed by dissolving a water-soluble gas in the raw water.
【0006】前記気体には例えば二酸化炭素が用いられ
る。また、前記気体が微細孔を有する膜状分離手段を介
して前記原料水に添加されることが望ましい。For example, carbon dioxide is used as the gas. Further, it is desirable that the gas be added to the raw water through a membrane-like separation means having fine pores.
【0007】[0007]
【発明の実施の形態】以下、図面に基づき、本発明の実
施形態について説明する。本発明に係る洗浄装置の構成
の例を図1に示す。この洗浄装置は、ガス溶解容器1
と、電解槽2と、洗浄手段3とから構成されている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an example of the configuration of the cleaning apparatus according to the present invention. This cleaning device includes a gas dissolving vessel 1
, An electrolytic cell 2 and a cleaning means 3.
【0008】ガス溶解容器1は、多数の微細孔を有する
膜状の分離材(膜状分離手段)11により、上方に位置
する水容器12と、下方に位置するガス容器13とに分
割されている。ここで、分離材11には、水は通過せ
ず、ガスのみを上記微細孔を介して選択的に通過させる
ものが使用される。また、水容器12の上端部には給水
路14が、下端部には排水路15がそれぞれ形成され、
ガス容器13の下端中央部には、ガス供給路16が形成
されている。The gas dissolving vessel 1 is divided into an upper water vessel 12 and a lower gas vessel 13 by a membrane-like separating material (membrane separating means) 11 having a large number of micropores. I have. Here, a material that selectively allows gas to pass through the micropores without passing water is used as the separation material 11. Further, a water supply channel 14 is formed at an upper end portion of the water container 12, and a drainage channel 15 is formed at a lower end portion, respectively.
A gas supply path 16 is formed at the center of the lower end of the gas container 13.
【0009】電解槽2は、イオン交換性を有しイオンを
透過させる隔膜21により、陽極室22と陰極室23と
に分割され、陽極室22及び陰極室23は、給水路24
を介して、排水路15に連結されている。陽極室22及
び陰極室23にはそれぞれ電極22a,23aが設置さ
れ、電極22aは、導線22bを介して、図示しない電
源装置の陽極に接続され、電極23aは、導線23bを
介して、上記電源装置の陰極、または装置の筐体あるい
は接地端子に接続されている。また、符号22c,23
cは、陽極室22で得られた酸性水(後述)及び陰極室
23で得られたアルカリ性水(後述)を洗浄手段3にそ
れぞれ供給する洗浄水供給路である。The electrolytic cell 2 is divided into an anode chamber 22 and a cathode chamber 23 by an ion-exchangeable and ion-permeable diaphragm 21. The anode chamber 22 and the cathode chamber 23 are connected to a water supply passage 24.
Is connected to the drainage channel 15. Electrodes 22a and 23a are installed in the anode chamber 22 and the cathode chamber 23, respectively. The electrode 22a is connected to an anode of a power supply (not shown) via a conductor 22b, and the electrode 23a is connected to the power supply via a conductor 23b. It is connected to the cathode of the device, the housing of the device or the ground terminal. Reference numerals 22c, 23
“c” denotes a cleaning water supply path for supplying the cleaning means 3 with the acidic water (described later) obtained in the anode chamber 22 and the alkaline water (described below) obtained in the cathode chamber 23, respectively.
【0010】洗浄に用いられる水(原料水)は給水路1
4から水容器12に供給され、水容器12内に貯留され
る。一方、ガス容器13には、ガス供給路16から、水
に溶解して電解質イオンを形成するガスが供給される。
このガスは、ガス容器13内で加圧され、分離材11を
通過して水容器12側に押し出され、微細な気泡となっ
て水容器12内を上昇するとともに、水容器12内の水
に溶解する。その結果、水容器12内の水に電解質が添
加され、水の導電率が増大する。Water (raw water) used for washing is supplied to the water supply channel 1.
4 to the water container 12 and stored in the water container 12. On the other hand, a gas that is dissolved in water to form electrolyte ions is supplied to the gas container 13 from the gas supply path 16.
This gas is pressurized in the gas container 13, passes through the separating material 11, and is extruded toward the water container 12, forms fine bubbles, rises in the water container 12, and is mixed with water in the water container 12. Dissolve. As a result, the electrolyte is added to the water in the water container 12, and the conductivity of the water increases.
【0011】ここで、ガス供給路16から供給されるガ
スには、例えば二酸化炭素、アンモニア、塩化水素等が
好適であるが、他のガスを用いてもよい。上記ガスとし
て二酸化炭素を用いた場合の、ガスの曝気時間と、水
(純水)の導電率との関係を図2に例示する。図2から
明らかな通り、水の導電率は、ガスの曝気時間に応じて
増大する。また、ガスの曝気時間を長くするためには、
図1に示すような、水容器12の下方に分離材11を設
け、分離材11を通過したガスが、微細な気泡となって
水容器12内を上昇する形態とすることが望ましい。The gas supplied from the gas supply passage 16 is preferably, for example, carbon dioxide, ammonia, hydrogen chloride or the like, but other gases may be used. FIG. 2 illustrates the relationship between the gas aeration time and the conductivity of water (pure water) when carbon dioxide is used as the gas. As is clear from FIG. 2, the conductivity of the water increases with the gas aeration time. Also, in order to extend the gas aeration time,
As shown in FIG. 1, it is preferable that the separating material 11 is provided below the water container 12, and the gas that has passed through the separating material 11 becomes fine bubbles and rises inside the water container 12.
【0012】ガスが溶解した水は、排水口15及び給水
路24を経て、電解槽2の陽極室22及び陰極室23に
供給される。そして、導線22b,23bを介して電極
22a,23a間に電流を通じると、電解槽2内の水が
電気分解され、電極22a,23a側に電気泳動され
る。電極22a,23a間に通電される電流には、直流
電流またはパルス電流を用いることが望ましい。The water in which the gas is dissolved is supplied to the anode chamber 22 and the cathode chamber 23 of the electrolytic cell 2 through the drain 15 and the water supply channel 24. Then, when an electric current is passed between the electrodes 22a and 23a through the conductive wires 22b and 23b, water in the electrolytic cell 2 is electrolyzed and electrophoresed on the electrodes 22a and 23a side. It is desirable to use a DC current or a pulse current as a current passed between the electrodes 22a and 23a.
【0013】電気分解及び電気泳動の結果、陽極室22
側には、pHが酸性側に傾き、酸化還元電位が上昇した
水(酸性水)が移動し、陰極室23側には、pHがアル
カリ性側に傾き、酸化還元電位が低下した水(アルカリ
性水)が移動する。これらの改質された水は、必要に応
じ、個別に、または時系列的に、または同時に、洗浄水
供給路22c,23cを介して洗浄手段3に供給され、
物品の洗浄に使用される。As a result of the electrolysis and electrophoresis, the anode compartment 22
To the side, water (acidic water) whose pH is tilted to the acidic side and the oxidation-reduction potential is increased moves, and water (acidic water) whose pH is tilted to the alkaline side and the oxidation-reduction potential is lowered is moved to the cathode chamber 23 side. Move). These reformed waters are supplied to the cleaning means 3 individually or in a time series manner or simultaneously through the cleaning water supply passages 22c and 23c as necessary.
Used for cleaning articles.
【0014】洗浄手段3では、上記酸性水またはアルカ
リ性水に物品を浸積して超音波振動を印加する等の方法
で物品の洗浄を行う。例えば、シリコンウエハの洗浄に
際しては、ウエハを回転させつつウエハ表面に向け上記
酸性水またはアルカリ性水を噴射することにより、ウエ
ハ表面への付着物が溶解除去される。この場合、酸性水
は金属イオンの溶解除去に有効で、アルカリ性水は有機
物の溶解除去に有効である。The cleaning means 3 cleans the articles by immersing the articles in the above-mentioned acidic water or alkaline water and applying ultrasonic vibration. For example, when cleaning a silicon wafer, the acidic water or alkaline water is sprayed toward the wafer surface while rotating the wafer to dissolve and remove the deposits on the wafer surface. In this case, acidic water is effective for dissolving and removing metal ions, and alkaline water is effective for dissolving and removing organic substances.
【0015】しかも、本発明の場合、添加する電解質が
気体であるため、洗浄後は物品の乾燥に伴い揮発し、物
品の表面に残留することがない。従って、本発明によれ
ば、洗浄後の物品の表面における電解質の残留と、それ
に伴う物品の品質低下が防止される。Moreover, in the case of the present invention, since the electrolyte to be added is a gas, it is volatilized with the drying of the article after washing and does not remain on the surface of the article. Therefore, according to the present invention, it is possible to prevent the electrolyte from remaining on the surface of the article after cleaning, and to prevent the quality of the article from being reduced.
【0016】[0016]
【発明の効果】本発明の洗浄装置によれば、水を電気分
解して得た酸性水やアルカリ性水を洗浄水に使用するた
め、以下の効果を得ることができる。 (1)pHの調整に加え、酸化還元電位をも改変させる
ことができるため、単なる薬剤の添加により調製された
洗浄水に比べ洗浄効果が高い。 (2)電解質の添加により水の導電率を増大させてから
通電を行っているため、電気分解に要する電圧が、原水
を直接電気分解する場合に比べ低下する。更に、本発明
の洗浄装置によれば、添加する電解質が気体であるた
め、以下の効果を得ることができる。 (3)洗浄後の電解質が物品の乾燥に伴い揮発し、物品
の表面に残留することがないため、電解質の残留に伴う
物品の品質低下が防止される。According to the cleaning apparatus of the present invention, the following effects can be obtained because the acidic water or the alkaline water obtained by electrolyzing water is used for the cleaning water. (1) Since the oxidation-reduction potential can be modified in addition to the adjustment of the pH, the washing effect is higher than that of washing water prepared by simply adding a chemical. (2) Since electricity is supplied after the conductivity of water is increased by the addition of an electrolyte, the voltage required for electrolysis is lower than in the case where raw water is directly electrolyzed. Further, according to the cleaning device of the present invention, since the electrolyte to be added is a gas, the following effects can be obtained. (3) Since the electrolyte after washing volatilizes with drying of the article and does not remain on the surface of the article, deterioration of the quality of the article due to the remaining electrolyte is prevented.
【図1】 本発明に係る洗浄装置の構成の例を示す図で
ある。FIG. 1 is a diagram showing an example of a configuration of a cleaning device according to the present invention.
【図2】 水への二酸化炭素の曝気時間と、水の導電率
との関係を示す図である。FIG. 2 is a diagram showing the relationship between the aeration time of carbon dioxide to water and the conductivity of water.
11 分離材(膜状分離手段) 11 Separation material (membrane separation means)
Claims (2)
することにより前記原料水を改質するようにした洗浄装
置において、 前記原料水への前記電解質の添加が、前記原料水に水溶
性の気体を溶解させることにより行われることを特徴と
する洗浄装置。1. A washing apparatus in which an electrolyte is added to raw water and the raw water is reformed by electrolysis, wherein the addition of the electrolyte to the raw water is water-soluble in the raw water. A cleaning device, wherein the cleaning is performed by dissolving a gas.
もに、前記気体が微細孔を有する膜状分離手段を介して
前記原料水に添加されることを特徴とする請求項1に記
載の洗浄装置。2. The cleaning apparatus according to claim 1, wherein carbon dioxide is used as the gas, and the gas is added to the raw water through a membrane-like separation means having fine pores.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11082548A JP2000271550A (en) | 1999-03-25 | 1999-03-25 | Cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11082548A JP2000271550A (en) | 1999-03-25 | 1999-03-25 | Cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000271550A true JP2000271550A (en) | 2000-10-03 |
Family
ID=13777568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11082548A Withdrawn JP2000271550A (en) | 1999-03-25 | 1999-03-25 | Cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000271550A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005290336A (en) * | 2004-03-31 | 2005-10-20 | Takahashi Kinzoku Kk | Cleaning method of non-chromium film-coated steel plate product |
JP2012122383A (en) * | 2010-12-07 | 2012-06-28 | Kazusumi Tomiyoshi | Internal combustion engine system |
-
1999
- 1999-03-25 JP JP11082548A patent/JP2000271550A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005290336A (en) * | 2004-03-31 | 2005-10-20 | Takahashi Kinzoku Kk | Cleaning method of non-chromium film-coated steel plate product |
JP2012122383A (en) * | 2010-12-07 | 2012-06-28 | Kazusumi Tomiyoshi | Internal combustion engine system |
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Legal Events
Date | Code | Title | Description |
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A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20041126 |
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A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20060606 |