JP2000266704A - X-ray analyzer - Google Patents

X-ray analyzer

Info

Publication number
JP2000266704A
JP2000266704A JP11075993A JP7599399A JP2000266704A JP 2000266704 A JP2000266704 A JP 2000266704A JP 11075993 A JP11075993 A JP 11075993A JP 7599399 A JP7599399 A JP 7599399A JP 2000266704 A JP2000266704 A JP 2000266704A
Authority
JP
Japan
Prior art keywords
ray
sample
ccd
collimator
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11075993A
Other languages
Japanese (ja)
Inventor
Masao Sato
正雄 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP11075993A priority Critical patent/JP2000266704A/en
Publication of JP2000266704A publication Critical patent/JP2000266704A/en
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PROBLEM TO BE SOLVED: To perform element analysis and structure analysis in a single measurement operation by arranging a collimator restraining a primary X-ray, an energy-dispersion type X-ray detector and a measurement circuit serving as an element analyzing means, a CCD camera serving as a structure analyzing means, and a sample observing optical system and analyzing respective results in a controlling and computing unit. SOLUTION: A sample 4 is placed on a sample stage 14, while an X-ray analyzer is constructed of a sample observation mirror 15 and a sample observation optical system block 17 consisting of an optical microscope and a CCD camera 16. An X-ray emitted from an X-ray bulb 2 is restrained by a collimator 3, and a switch to a CCD Laue camera 6 is carried out for performing measurement after the X-ray irradiation position is checked. A diffraction ray 5 emitted from the sample 5 is reflected by a reflection mirror 7 so as to be incident on a cooling type CCD 9 via a lens 8. Surface information from the CCD camera 9 is processed in a measurement circuit 10 so as to be processed in an operation controlling and computing unit 14 as information for a Laue spot. A standard pattern for each substance is stored previously so as to be compared with a pattern of an unknown sample for identifying the unknown substance.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【発明の属する技術分野】本発明は蛍光X線分析装置と
X線回折装置の機能を合わせたX線分析装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray analyzer having the functions of an X-ray fluorescence analyzer and an X-ray diffractometer.

【従来の技術】従来、元素分析は蛍光X線分析装置で、
構造解析はX線回折装置で、別々に実行していた。
2. Description of the Related Art Conventionally, elemental analysis is performed by a fluorescent X-ray analyzer.
Structural analysis was performed separately on an X-ray diffractometer.

【発明が解決しようとする課題】従来、元素分析を行う
場合は蛍光X線分析装置を利用していたが、各元素の組
成は解るものの、それが酸化物か窒化物か、ハロゲン化
物かが分析できなかった。このような目的の場合はX線
回折装置で回折パターンを測定して同定する必要があっ
た。このように蛍光X線分析装置とX線回折装置の2機
種を設置すると設置スペースを必要とする、測定時間が
2倍必要である、設置の届け出が2種類必要であるなど
の問題を抱えていた。
Conventionally, when performing elemental analysis, an X-ray fluorescence spectrometer has been used. However, although the composition of each element is known, whether it is an oxide, a nitride, or a halide is known. Could not be analyzed. For such a purpose, it is necessary to measure and identify a diffraction pattern with an X-ray diffractometer. When two types of X-ray fluorescence spectrometer and X-ray diffractometer are installed in this way, there are problems such as requiring an installation space, doubling the measurement time, and requiring two types of notification of installation. Was.

【課題を解決するための手段】共通のX線発生源と、一
次X線を絞るためのコリメーターと、元素分析手段とし
ての蛍光X線分析のためのエネルギー分散型X線検出器
と計測回路、構造解析手段としてのX線回折のためのラ
ウエ像取得用CCDカメラと、微小部分の測定位置確認
のための試料観察光学系、および、それぞれの結果を解
析するための制御・演算部から構成する。X線高圧電
源、X線管球、シャッター、コリメータ、試料ステー
ジ、試料観察光学系および操作制御演算部を共有し、蛍
光X線を検出するための半導体検出器と構造解析のため
のCCDラウエカメラを配置することによって、1回の
X線照射で蛍光X線スペクトルとラウエ像を同時に得る
ことが可能となる。
A common X-ray source, a collimator for narrowing down primary X-rays, an energy dispersive X-ray detector and a measuring circuit for X-ray fluorescence analysis as elemental analysis means It consists of a CCD camera for Laue image acquisition for X-ray diffraction as a structural analysis means, a sample observation optical system for confirming the measurement position of a minute part, and a control / calculation unit for analyzing each result. I do. X-ray high-voltage power supply, X-ray tube, shutter, collimator, sample stage, sample observation optical system and operation control operation unit are shared, and a semiconductor detector for detecting fluorescent X-rays and a CCD Laue camera for structural analysis Is arranged, it is possible to obtain a fluorescent X-ray spectrum and a Laue image simultaneously by one X-ray irradiation.

【発明の実施の形態】図1に蛍光X線分析とX線回折を
可能とする実施例を示す。試料ステージ・14に試料・
4を載せ、試料観察ミラー・15と光学顕微鏡、CCD
カメラ・16からなる試料観察光学系ブロック・17
で、X線管球・2から発生するX線をコリメータ・3で
絞って照射し、照射位置を確認した後、CCDラウエカ
メラ・6と切り換えて測定を行う。試料・4から発生す
る回折線・5は反射ミラー・7で反射して、レンズ・8
を通して冷却型CCD・9に入射する。CCDからの面
情報は計測回路・10で処理し、ラウエ斑点の情報とし
て操作制御演算部・14で処理する。同定の方法として
は格子間隔等で理論的にパターンを解析する方法を採ら
ず、物質毎の標準物質パターンをあらかじめ記憶してお
き、未知試料のパターンと比較して、物質を同定する。
ラウエパターンの測定と同時に発生する蛍光X線・11
は角度位置固定のエネルギー分散型のX線検出器・12
で検出し、計測回路・13で計測してX線スペクトルを
得て、定性、定量計算を操作制御演算部・14で実行す
る。測定個所の設定は試料ステージ・14を動かして実
行する。
FIG. 1 shows an embodiment capable of X-ray fluorescence analysis and X-ray diffraction. The sample stage 14
4 on which sample observation mirror 15 and optical microscope, CCD
Sample observation optical system block consisting of camera and 16.
Then, the X-ray generated from the X-ray tube 2 is irradiated with the collimator 3 while being narrowed down, and the irradiation position is confirmed. Diffraction lines 5 generated from the sample 4 are reflected by a reflecting mirror 7 to form a lens 8.
Through the cooling CCD 9. The surface information from the CCD is processed by the measurement circuit 10 and is processed by the operation control operation unit 14 as information on Laue spots. As a method of identification, a method of theoretically analyzing a pattern based on a lattice interval or the like is not used, and a standard substance pattern for each substance is stored in advance, and the substance is identified by comparing with a pattern of an unknown sample.
X-ray fluorescence 11 generated simultaneously with Laue pattern measurement
Is an energy dispersive X-ray detector having a fixed angular position.
And an X-ray spectrum is obtained by measurement by the measurement circuit 13 and qualitative and quantitative calculations are executed by the operation control operation unit 14. The setting of the measurement point is performed by moving the sample stage 14.

【発明の効果】元素分析と構造解析が1度の測定で可能
となり、時間短縮と、設置スペースの縮小が実現でき
る。
According to the present invention, elementary analysis and structural analysis can be performed in one measurement, so that the time can be reduced and the installation space can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本実施例を示す。FIG. 1 shows this embodiment.

【符号の説明】[Explanation of symbols]

1:X線高圧電源 2:X線管球 3:コリメータ 4:試料 5:回折X線 6:CCDラウエカメラ 7:反射ミラー 8:レンズ 9:冷却型CCD 10:計測回路 11:蛍光X線 12:エネルギー分散型X線検出器 13:計測回路 14:操作制御演算部 15:試料観察ミラー 16:試料観察用CCDカメラ 17:試料観察光学系ブロック 1: X-ray high voltage power supply 2: X-ray tube 3: Collimator 4: Sample 5: Diffracted X-ray 6: CCD Laue camera 7: Reflection mirror 8: Lens 9: Cooled CCD 10: Measurement circuit 11: Fluorescent X-ray 12 : Energy dispersive X-ray detector 13: Measurement circuit 14: Operation control operation unit 15: Specimen observation mirror 16: Specimen observation CCD camera 17: Specimen observation optical system block

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 共通のX線発生源と、一次X線を絞るた
めのコリメーターと、元素分析手段としての蛍光X線分
析のためのエネルギー分散型X線検出器と計測回路、構
造解析手段としてのX線回折のためのラウエ像取得用C
CDカメラと、微小部分の測定位置確認のための試料観
察光学系、および、それぞれの結果を解析するための制
御・演算部から構成されたことを特徴とするX線分析装
置。
1. A common X-ray source, a collimator for focusing primary X-rays, an energy dispersive X-ray detector and a measurement circuit for X-ray fluorescence analysis as elemental analysis means, and a structure analysis means For Laue image acquisition for X-ray diffraction as an image
An X-ray analysis apparatus comprising: a CD camera; a sample observation optical system for confirming a measurement position of a minute portion; and a control / calculation unit for analyzing each result.
JP11075993A 1999-03-19 1999-03-19 X-ray analyzer Pending JP2000266704A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11075993A JP2000266704A (en) 1999-03-19 1999-03-19 X-ray analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11075993A JP2000266704A (en) 1999-03-19 1999-03-19 X-ray analyzer

Publications (1)

Publication Number Publication Date
JP2000266704A true JP2000266704A (en) 2000-09-29

Family

ID=13592325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11075993A Pending JP2000266704A (en) 1999-03-19 1999-03-19 X-ray analyzer

Country Status (1)

Country Link
JP (1) JP2000266704A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002350373A (en) * 2001-05-29 2002-12-04 Seiko Instruments Inc Complex x-ray analyzing apparatus
JP2003004671A (en) * 2001-06-18 2003-01-08 Rigaku Corp Substance identifying method and system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002350373A (en) * 2001-05-29 2002-12-04 Seiko Instruments Inc Complex x-ray analyzing apparatus
JP2003004671A (en) * 2001-06-18 2003-01-08 Rigaku Corp Substance identifying method and system
JP4565774B2 (en) * 2001-06-18 2010-10-20 株式会社リガク Substance identification method and substance identification system

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