JP2000260716A - Exhaust gas treatment equipment of cvd system - Google Patents
Exhaust gas treatment equipment of cvd systemInfo
- Publication number
- JP2000260716A JP2000260716A JP11060528A JP6052899A JP2000260716A JP 2000260716 A JP2000260716 A JP 2000260716A JP 11060528 A JP11060528 A JP 11060528A JP 6052899 A JP6052899 A JP 6052899A JP 2000260716 A JP2000260716 A JP 2000260716A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- gas treatment
- electric heater
- deterioration
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、シリコンウエハ
の成膜その他に広く用いられているＣＶＤ装置の排出ガ
スを電熱ヒータによって加熱分解するための排ガス処理
装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust gas treatment apparatus for thermally decomposing an exhaust gas of a CVD apparatus widely used for film formation of a silicon wafer or the like by an electric heater.
【０００２】[0002]
【従来の技術】従来、加熱分解するための排ガス処理装
置は円筒状の反応炉の周辺にセラミックヒータを配置
し、円筒状の反応炉をその周辺に設けたセラミックヒー
タの電熱で加熱し、円筒状の反応炉内を通るＣＶＤ装置
から排出されるガスを加熱して分解している。2. Description of the Related Art Conventionally, an exhaust gas treatment apparatus for thermal decomposition has a ceramic heater disposed around a cylindrical reactor, and the cylindrical reactor is heated by electric heat of a ceramic heater provided around the cylindrical reactor. The gas discharged from the CVD apparatus passing through the inside of the reactor is heated and decomposed.
【０００３】上記従来のセラミックヒータはニクロム系
の発熱体が使用されており、長時間使用による劣化破断
の予測検知が困難である。従って稼働中に突然ヒータが
切れ、ＣＶＤ装置内のウエハを不良にしてしまうという
問題がある。[0003] The above-mentioned conventional ceramic heater uses a nichrome heating element, and it is difficult to predict and detect deterioration and rupture due to long-term use. Therefore, there is a problem that the heater is suddenly turned off during the operation and the wafer in the CVD apparatus becomes defective.
【０００４】また前記問題を回避するために、反応筒を
並列に２本有し、一方のヒータが切れてももう一方で処
理する方法もあるが、２本の反応筒を有するため装置が
大型化する問題がある。またその構造上、ヒータ交換が
面倒で時間が掛かるという欠点を有している。In order to avoid the above-mentioned problem, there is a method in which two reaction tubes are provided in parallel, and if one of the heaters is turned off, the other is processed. However, since the two reaction tubes are provided, the apparatus is large. Problem. Further, due to its structure, there is a disadvantage that the replacement of the heater is troublesome and time-consuming.
【０００５】[0005]
【発明が解決しようとする課題】この発明は前記電熱ヒ
ータの劣化や破断の状態をオペレータに知らせることが
可能でかつ電熱ヒータ交換の時期を知らせることが容易
な加熱分解式の排ガス処理装置を提供することを目的と
するものである。SUMMARY OF THE INVENTION The present invention provides a pyrolysis type exhaust gas treatment apparatus which can inform an operator of the state of deterioration or breakage of the electric heater and which can easily inform the operator when to replace the electric heater. It is intended to do so.
【０００６】他の目的は上記ヒータが不用意に断線して
排ガス処理装置ならびにＣＶＤ装置の運転を停止するこ
とがないようにすることである。Another object is to prevent the heater from being inadvertently disconnected to stop the operation of the exhaust gas treatment device and the CVD device.
【０００７】また他の目的は、従来装置のように上記二
本の反応筒を設ける場合と比較して、ヒータの交換の時
間がかからないようにすることである。Another object of the present invention is to reduce the time required for replacing the heater as compared with the case where the two reaction tubes are provided as in the conventional apparatus.
【０００８】[0008]
【課題を解決するための手段】この発明のＣＶＤ装置の
排ガス処理装置は反応炉の周辺に電熱ヒータを配置して
なるＣＶＤ装置の排ガス処理装置において、該電熱ヒー
タの抵抗値を検出する手段と、その抵抗値が予め定めら
れた抵抗値を超過した際の劣化表示手段とを具備するも
のである。An exhaust gas treatment apparatus for a CVD apparatus according to the present invention is an exhaust gas treatment apparatus for a CVD apparatus in which an electric heater is arranged around a reaction furnace, wherein means for detecting a resistance value of the electric heater is provided. And a deterioration display means when the resistance value exceeds a predetermined resistance value.
【０００９】また、この発明のＣＶＤ装置の排ガス処理
装置は前記電熱ヒータを炭化珪素の材料で棒状に形成
し、予め定められる抵抗値と、予め定められる抵抗値を
超過した際の劣化表示手段を複数とし、また劣化表示手
段として警報ブザー、警報ランプ、劣化目盛及び断線警
報ランプの中の少なくとも何れかを具備するものであ
る。In the exhaust gas treatment apparatus for a CVD apparatus according to the present invention, the electric heater is formed in a rod shape from a material of silicon carbide, and a predetermined resistance value and a deterioration indicating means when the predetermined resistance value is exceeded are provided. It is provided with at least one of a warning buzzer, a warning lamp, a deterioration scale and a disconnection warning lamp as deterioration display means.
【００１０】[0010]
【発明の実施の形態】この発明のＣＶＤ装置の排ガス処
理装置はＣＶＤ装置１からの排ガス２と、反応用エアー
３とからなる混合ガス４ａの反応炉５の周辺に炭化珪素
（ＳｉＣ）系の材料からなる棒状の電熱ヒータ６を配置
してなるＣＶＤ装置の排ガス処理装置であって、その電
熱ヒータ６に電源７から電流を流すときの抵抗値を検出
するための検出手段８と、その抵抗値が予め定められた
抵抗値を超過した際に作動するための劣化表示手段９を
具備するものである。BEST MODE FOR CARRYING OUT THE INVENTION An exhaust gas treatment apparatus for a CVD apparatus according to the present invention comprises a silicon carbide (SiC) system around a reaction furnace 5 of a mixed gas 4a comprising an exhaust gas 2 from a CVD apparatus 1 and a reaction air 3. An exhaust gas treatment apparatus for a CVD apparatus in which a rod-shaped electric heater 6 made of a material is disposed, comprising: a detecting means 8 for detecting a resistance value when a current is supplied from a power supply 7 to the electric heater 6; It is provided with deterioration indicator 9 for operating when the value exceeds a predetermined resistance value.
【００１１】上記反応炉５の入口側５ａから供給された
混合ガス４ａはその反応炉５の内部を出口側５ｂに向か
ってスパイラル状に流れ、その間に電熱ヒータ６で加熱
され、 ＳｉＨ4＋Ｏ2 →ＳｉＯ2＋２Ｈ2 ＳｉＨ4＋２Ｏ2→ＳｉＯ2＋２Ｈ2Ｏ の反応が行われて、二酸化珪素ＳｉＯ2の粉末を含んだ
処理済ガス４ｂになって、次の図示してない該粉末の分
離装置等に排出される。The mixed gas 4a supplied from the inlet side 5a of the reaction furnace 5 spirally flows through the inside of the reaction furnace 5 toward the outlet side 5b, and is heated by the electric heater 6 during the heating, thereby producing SiH 4 + O 2. The reaction of → SiO 2 + 2H 2 SiH 4 + 2O 2 → SiO 2 + 2H 2 O is carried out to become the treated gas 4b containing the powder of silicon dioxide SiO 2 , and the following separation device for the powder not shown And so on.
【００１２】前述の反応炉５の周辺に配置する複数の電
熱ヒータ６は炭化珪素ＳｉＣで形成され、使用時間の増
加によって空気中の酸素Ｏ2との反応によって電熱ヒー
タ６の表面から順次酸化され、絶縁物である二酸化珪素
ＳｉＯ2を生成し、その量の増加によって電気抵抗が増
大する。The plurality of electric heaters 6 disposed around the reactor 5 are made of silicon carbide SiC, and are oxidized sequentially from the surface of the electric heater 6 by reaction with oxygen O 2 in the air as the use time increases. In addition, silicon dioxide SiO 2 which is an insulator is generated, and an increase in the amount increases electric resistance.
【００１３】前記複数の電熱ヒータ６の一端は図１に示
す如く、ヒータ制御回路１０の出力トランス１１の二次
側コイル１２の一端に電圧切換器具１３を介して電線１
５ａで接続されている。前記複数の電熱ヒータ６の他端
は同二次側コイル１２の他端に電線１５ｂで接続されて
いる。As shown in FIG. 1, one end of each of the plurality of electric heaters 6 is connected to one end of a secondary coil 12 of an output transformer 11 of a heater control circuit 10 through a voltage switching device 13.
5a. The other ends of the plurality of electric heaters 6 are connected to the other ends of the secondary coils 12 by electric wires 15b.
【００１４】該電線１５ｂにその抵抗値の検出手段８の
一例として変流器を接続し、その検出手段８の出力側に
劣化表示手段９を接続する。A current transformer is connected to the electric wire 15b as an example of the resistance detecting means 8, and a deterioration display means 9 is connected to an output side of the detecting means 8.
【００１５】さらに前記出力トランス１１の一次側コイ
ル１４の一方の端子１４ａを順次電力調節器２７とスイ
ッチ３０ａを介して前記電源７に電線２８で接続し、他
方の端子１４ｂを過電流遮断器３１とスイッチ３０ｂを
介して電源７に電線２９で接続する。Further, one terminal 14a of the primary coil 14 of the output transformer 11 is sequentially connected to the power source 7 via a power controller 27 and a switch 30a by an electric wire 28, and the other terminal 14b is connected to an overcurrent breaker 31. And the power supply 7 via a switch 30b.
【００１６】前記検出手段８と劣化表示手段９との間に
図２に示すような劣化検知回路１７を構成し、その中の
検出手段８で前記各電熱ヒータ６の抵抗値を計測するた
め、その電熱ヒータ６を流れる電流値を計測し、その電
流値が予め設定した電流値を下回っていないか、どうか
をアナログデジタル変換器１９を経て演算装置２０で演
算する。電熱ヒータ６が酸化して電気抵抗値が増加し、
その電流値が予め設定された電流値より低下して交換時
期になれば、そのときの電流値を検出手段８で検出し、
その出力側に接続されている劣化表示手段９の警報ブザ
ー２１を鳴らし、警報ランプ２２を点滅してオペレータ
に知らせる。A deterioration detecting circuit 17 as shown in FIG. 2 is formed between the detecting means 8 and the deterioration displaying means 9 and the resistance value of each of the electric heaters 6 is measured by the detecting means 8 therein. The value of the current flowing through the electric heater 6 is measured, and the arithmetic unit 20 calculates via the analog-to-digital converter 19 whether the current value is below a preset current value. The electric heater 6 is oxidized and the electric resistance increases,
If the current value falls below a preset current value and it is time to replace the battery, the current value at that time is detected by the detecting means 8,
The alarm buzzer 21 of the deterioration display means 9 connected to the output side is sounded, and the alarm lamp 22 flashes to notify the operator.
【００１７】これと同様にして電熱ヒータ６が断線した
場合、検出手段８でその際の電流値を検出し、警報ブザ
ー２１及び断線警報ランプ２３を起動すると共に外部出
力装置２４に出力してオペレータに知らせる。In the same manner, when the electric heater 6 is disconnected, the detecting means 8 detects the current value at that time, activates the alarm buzzer 21 and the disconnection alarm lamp 23, and outputs it to the external output device 24 to output it to the operator. Inform
【００１８】電熱ヒータ６の使用時間に対する劣化程度
は図４に示す劣化程度％と使用時間Ｈの線図において、
劣化表示曲線４０に示す如く変化し、その劣化程度％を
検出手段８の検出値によって検出し、その値を図２の回
路図及び図３の表示盤３３のヒータ寿命表示器２５に表
示する。なお図４中の４２は電熱ヒータ６の寿命限界ラ
インを示している。The degree of deterioration of the electric heater 6 with respect to the use time is shown in the graph of the degree of deterioration% and the use time H shown in FIG.
It changes as shown by the deterioration display curve 40, and the degree of deterioration% is detected by the detection value of the detecting means 8, and the value is displayed on the circuit diagram of FIG. 2 and the heater life indicator 25 of the display panel 33 of FIG. Reference numeral 42 in FIG. 4 indicates a life limit line of the electric heater 6.
【００１９】さらに、図１に示す如く前記電熱ヒータ６
に対して熱電対等の温度計１６を配設し、この温度計１
６と前記電力調節器２７の間を温度調節器３２を介して
電気的に接続し、電熱ヒータ６の温度変化に応じて電力
調節器２７を作動し、電熱ヒータ６の温度を所定の温度
にするものである。Further, as shown in FIG.
A thermometer 16 such as a thermocouple is arranged for
6 and the power controller 27 are electrically connected via a temperature controller 32, and the power controller 27 is operated in accordance with a temperature change of the electric heater 6 to bring the temperature of the electric heater 6 to a predetermined temperature. Is what you do.
【００２０】[0020]
【発明の効果】この発明は上述のとおりであり、電熱ヒ
ータの抵抗値の検出手段と、その抵抗値が予め定められ
た抵抗値を超過した際に作動する劣化表示手段とを具備
するので、前記電熱ヒータの劣化の程度や破断の状態を
常時オペレータに知らせることができるため、電熱ヒー
タの交換時期を容易に知ることができる。As described above, the present invention comprises means for detecting the resistance value of the electric heater and deterioration indication means which operates when the resistance value exceeds a predetermined resistance value. Since the operator can be constantly informed of the degree of deterioration and the state of breakage of the electric heater, the replacement time of the electric heater can be easily known.
【００２１】またＣＶＤ装置の排ガスの処理を長時間使
用した際、その使用中に突然前記電熱ヒータが断線し
て、その排ガス処理が使用不能になり、そのことによる
ＣＶＤ装置で処理中の高価なウエハに損傷を与えること
がない。Further, when the exhaust gas processing of the CVD apparatus is used for a long time, the electric heater is suddenly disconnected during the use, and the exhaust gas processing becomes unusable. No damage to the wafer.
【図１】本発明の実施形態を示す電気回路図である。FIG. 1 is an electric circuit diagram showing an embodiment of the present invention.
【図２】図１の一部分の詳細図である。FIG. 2 is a detailed view of a part of FIG.
【図３】図２の正面図である。FIG. 3 is a front view of FIG. 2;
【図４】使用時間に対する劣化程度の劣化曲線を示す線
図である。FIG. 4 is a diagram showing a deterioration curve of a degree of deterioration with respect to use time.
１ ＣＶＤ装置 ２ 排ガス ３ 反応用エアー ４ａ 混合ガス ４ｂ 処理済ガス ５ 反応炉 ６ 電熱ヒータ ７ 電源 ８ 検出手段 ９ 劣化表示手段 １０ ヒータ制御回路 １１ 出力トランス １２ 二次側コイル １３ 電圧切換器具 ２１ 警報ブザー ２２ 警報ランプ ２３ 断線警報ランプ ２５ ヒータ寿命表示器 DESCRIPTION OF SYMBOLS 1 CVD apparatus 2 Exhaust gas 3 Reaction air 4a Mixed gas 4b Treated gas 5 Reactor 6 Electric heater 7 Power supply 8 Detection means 9 Deterioration display means 10 Heater control circuit 11 Output transformer 12 Secondary coil 13 Voltage switching equipment 21 Alarm buzzer 22 alarm lamp 23 disconnection alarm lamp 25 heater life indicator
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 4D002 AA26 BA05 BA12 CA20 DA70 GA02 GA03 GB20 HA03 4K030 CA04 CA12 EA12 JA16 KA22 KA39 KA41 KA49 5F045 BB10 BB20 EG01 EG07 EK08 GB15 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4D002 AA26 BA05 BA12 CA20 DA70 GA02 GA03 GB20 HA03 4K030 CA04 CA12 EA12 JA16 KA22 KA39 KA41 KA49 5F045 BB10 BB20 EG01 EG07 EK08 GB15
Claims (4)
るＣＶＤ装置の排ガス処理装置において、該電熱ヒータ
の抵抗値の検出手段と、その抵抗値が予め定められた抵
抗値を超過した際に作動するための劣化表示手段とを具
備することを特徴とするＣＶＤ装置の排ガス処理装置。1. An exhaust gas treatment apparatus for a CVD apparatus having an electric heater arranged around a reaction furnace, wherein a means for detecting a resistance value of the electric heater is provided when the resistance value exceeds a predetermined resistance value. An exhaust gas treatment apparatus for a CVD apparatus, comprising: a deterioration display means for operating the apparatus.
料で棒状に形成されていることを特徴とする請求項１記
載のＣＶＤ装置の排ガス処理装置。2. An exhaust gas treatment apparatus for a CVD apparatus according to claim 1, wherein the electric heater is formed of a silicon carbide (SiC) -based material in a rod shape.
た予め定められた抵抗値を超過した際の劣化表示手段が
複数であることを特徴とする請求項１記載のＣＶＤ装置
の排ガス処理装置。3. The exhaust gas treatment of a CVD apparatus according to claim 1, wherein there are a plurality of predetermined resistance values, and a plurality of deterioration display means when the resistance value exceeds the predetermined resistance value. apparatus.
プ、ヒータ寿命表示装置及び断線警報ランプの中の少な
くとも何れかを具備していることを特徴とする請求項１
記載のＣＶＤ装置の排ガス処理装置。4. The deterioration indicating means comprises at least one of an alarm buzzer, an alarm lamp, a heater life indicator and a disconnection alarm lamp.
An exhaust gas treatment apparatus for a CVD apparatus as described in the above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11060528A JP2000260716A (en) | 1999-03-08 | 1999-03-08 | Exhaust gas treatment equipment of cvd system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11060528A JP2000260716A (en) | 1999-03-08 | 1999-03-08 | Exhaust gas treatment equipment of cvd system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000260716A true JP2000260716A (en) | 2000-09-22 |
Family
ID=13144912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11060528A Pending JP2000260716A (en) | 1999-03-08 | 1999-03-08 | Exhaust gas treatment equipment of cvd system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000260716A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7002113B2 (en) * | 2003-03-31 | 2006-02-21 | Kokusai Electric Semiconductor Service Inc. | Heater inspection apparatus and semiconductor manufacturing apparatus having heater inspection apparatus mounted thereon |
-
1999
- 1999-03-08 JP JP11060528A patent/JP2000260716A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7002113B2 (en) * | 2003-03-31 | 2006-02-21 | Kokusai Electric Semiconductor Service Inc. | Heater inspection apparatus and semiconductor manufacturing apparatus having heater inspection apparatus mounted thereon |
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