JP2000254402A - Tray type gas-liquid contact device - Google Patents
Tray type gas-liquid contact deviceInfo
- Publication number
- JP2000254402A JP2000254402A JP11058667A JP5866799A JP2000254402A JP 2000254402 A JP2000254402 A JP 2000254402A JP 11058667 A JP11058667 A JP 11058667A JP 5866799 A JP5866799 A JP 5866799A JP 2000254402 A JP2000254402 A JP 2000254402A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- tray
- gas
- shelf
- trays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、棚段式気液接触装
置における棚段と棚段との間隔をはるかに小さくするこ
とのできる新規な棚段式気液接触装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel plate-type gas-liquid contacting device in a plate-type gas-liquid contacting device, in which the distance between the plates can be made much smaller.
【０００２】[0002]
【従来の技術】従来、蒸留塔、ガス吸収塔、ガス放散塔
などの気液接触装置の分離能力を上げるためには、棚段
式の場合は塔を高くしてその段数を増やすことにより、
充填式の場合には充填部分の高さを高くすることによ
り、それぞれ対応してきた。2. Description of the Related Art Conventionally, in order to increase the separation capacity of a gas-liquid contacting device such as a distillation column, a gas absorption column, a gas diffusion column, etc., in the case of a tray type, the height of the column is increased and the number of stages is increased.
In the case of the filling type, the height of the filling portion has been increased to cope with each case.
【０００３】しかしながら、この装置を室内に設置しな
ければならないときには、その高さは当然に制約を受
け、棚段の数を増やしたり、充填部分の高さを目的とす
る高さとすることができなくなる。そこで、塔を分割す
るなどの手段により高さを抑えることはできるが、付帯
設備の増加、配管の複雑化などの問題を生じていた。However, when this apparatus must be installed indoors, its height is naturally limited, and the number of shelves can be increased, and the height of the filling portion can be set to a desired height. Disappears. Therefore, the height can be suppressed by means such as dividing the tower, but there have been problems such as an increase in incidental facilities and complicated piping.
【０００４】直交流気液接触をもつ従来の棚段式の場
合、ある制限高さ内で棚段数を増やそうとして、単純に
段間隔を小さくして、段間隔を小さくする前と同一の処
理能力を保とうとすると気体の流速が高くなってしま
い、フラッディング（流下液が上昇蒸気の圧力により降
下できなくなる現象）をおこしたり、飛沫同伴率（上昇
蒸気に液滴が同伴され、分離能力が低下する現象）が増
加してしまうので、このような手段は採用できない。[0004] In the case of the conventional shelf type having cross-flow gas-liquid contact, in order to increase the number of shelf levels within a certain limit height, the gap between the shelf levels is simply reduced and the same processing as before reducing the gap between the levels is performed. When trying to maintain the capacity, the gas flow velocity increases, causing flooding (a phenomenon in which the falling liquid cannot drop due to the pressure of the rising steam) or a droplet entrainment rate (droplets are entrained by the rising steam, and the separation capacity decreases. This phenomenon cannot be adopted, since the number of phenomena increases.
【０００５】そこで本発明者らは、孔を有しないで端部
に切り欠き部を設けた棚段を、切り欠き部の位置が左右
交互に、かつ段間隔が１０〜１５０ｍｍ、好ましくは１
０〜１００ｍｍになるよう塔内に多数設置し、溢流管を
用いることなく液体を切り欠き部より下方の棚段に流下
させ、一方気体は液体と本質的に向流方向に流すことに
より、棚段と棚段との間隔をはるかに小さくした棚段式
気液接触装置を提案した。これにより棚段数が多くても
気液接触装置の高さをある程度の範囲内に抑えることに
成功し、特願平１０−１９２４０１号として出願した。[0005] The inventors of the present invention have developed a shelf having no notch at the end without a hole, in which the position of the notch is alternately left and right and the step interval is 10 to 150 mm, preferably 1 to 150 mm.
By installing a large number in the tower so as to be 0 to 100 mm, the liquid flows down to the shelf below the notch without using an overflow pipe, while the gas flows essentially countercurrently with the liquid, A tray-type gas-liquid contactor with a much smaller gap between trays was proposed. As a result, the height of the gas-liquid contact device was successfully kept within a certain range even when the number of shelves was large, and was filed as Japanese Patent Application No. 10-192401.
【０００６】しかし、前記出願発明では棚段の間隔が狭
いので気体（または蒸気）の流速が相対的に高くなり、
かつ液体とガス体の流れ方向が向流であるため、飛沫同
伴による逆混合やフラッディングを発生しない気体流速
はそれほど大きくすることができず、処理能力の点で充
分満足できない面があった。However, in the above-mentioned invention, the flow rate of gas (or steam) becomes relatively high because the interval between the trays is narrow,
In addition, since the flow directions of the liquid and the gas body are countercurrent, the gas flow rate that does not cause back mixing or flooding due to entrainment cannot be so large, and there is a problem that the processing capacity is not sufficiently satisfactory.
【０００７】[0007]
【発明が解決しようとする課題】本発明の目的は、棚段
式気液接触装置における棚段と棚段との間隔を従来不可
能とされていた狭い間隔に詰め、かつ、気体の流速を相
当早くして処理能力を高めても、かなりの段階まで、飛
沫同伴による逆混合やフラッディングを回避できる新規
な棚段式気液接触装置を提供する点にある。SUMMARY OF THE INVENTION It is an object of the present invention to reduce the gap between trays in a tray-type gas-liquid contacting device to a narrow gap which has been impossible so far, and to reduce the gas flow rate. An object of the present invention is to provide a novel plate-type gas-liquid contacting device which can avoid back mixing and flooding due to entrainment to a considerable extent even if the processing capacity is increased considerably.
【０００８】[0008]
【課題を解決するための手段】本発明は、（Ａ）棚段
に孔を有しないで、一方の端部に切り欠き部を、他方の
端部に液シール部を有する棚段を、その切り欠き部の
位置が左右交互になるように、かつ棚段間隔が１０〜
３００ｍｍになるように多数段設置し、（Ｂ）液体と気
体が並流方向に流れる手段を設けた、ことを特徴とする
棚段式気液接触装置に関する。According to the present invention, there is provided (A) a shelf having a cutout at one end and a liquid seal at the other end without a hole in the shelf. The positions of the notches are alternately left and right, and the shelf spacing is 10 to 10.
The present invention relates to a shelf-type gas-liquid contact device, wherein a plurality of stages are provided so as to have a thickness of 300 mm, and (B) means for flowing a liquid and a gas in a co-current direction is provided.
【０００９】本発明においては、液シールの態様におい
て、（１）図１、図２で示されるように棚段の端部で液
シールをするタイプと、（２）図４〜７で示されるよう
に溢流管を設けて１つ下の棚段上部で液シールするタイ
プに大別される。In the present invention, in the form of the liquid seal, (1) a type in which the liquid seal is performed at the end of the shelf as shown in FIGS. 1 and 2, and (2) FIGS. As described above, an overflow pipe is provided, and the liquid is sealed at the upper part of the lower shelf.
【００１０】前記（１）のタイプは、図１および図２の
ものである。塔１内の棚段２−１上を流れる液体は、図
１の実線で示すように棚段２−１の一方の端に設置され
た液シール部３、３、……を通過し、オーバーフローす
る形で下の棚段２−２へと流れる。一方、棚段２−３と
棚段２−２の間にある気体は図１の点線で示すように、
棚段２−２の切り欠き部４−２から棚段２−２と棚段２
−１との間にはいりこみ、そこを液体と同一方向に流
れ、反対側の切り欠き部４−１からさらに上の棚段間に
流れこむ。このようにして、液体と気体は、棚段上の一
方の端から、液体は上段より、気体は下段より、それぞ
れ流れこみ、棚段上を並流で流れ、この間に気液接触
し、棚段上の反対側で気液分離し、気体は上の棚段側
に、液は下の棚段側にそれぞれ流れてゆく。気体が上の
方の棚段側に抜けてゆく側と反対側には液シール部が存
在する。The type (1) is shown in FIGS. 1 and 2. The liquid flowing on the shelf 2-1 in the tower 1 passes through the liquid seals 3, 3,... Provided at one end of the shelf 2-1 as shown by a solid line in FIG. And flows to the lower shelf 2-2. On the other hand, as shown by a dotted line in FIG.
From the cutout portion 4-2 of the shelf 2-2, the shelf 2-2 and the shelf 2
-1 and flows in the same direction as the liquid, and flows from the cutout 4-1 on the opposite side to the upper shelf. In this way, the liquid and the gas flow from one end on the shelf, the liquid flows from the upper stage, and the gas flows from the lower stage, respectively, and flows in parallel on the shelf. Gas and liquid are separated on the opposite side of the stage, and the gas flows to the upper shelf and the liquid flows to the lower shelf. There is a liquid seal portion on the side opposite to the side where gas escapes to the upper shelf side.
【００１１】前記（１）のタイプにおいて、飛沫同伴や
フラッティングを避けるためには、液体が流下する棚段
端部に （１）凹凸をつける[図３の（ａ）] （２）切り込みを入れる[図３の（ｂ）] （３）垂直方向の突起物をつける[図３の（ｃ）] などにより液膜を強制的に破断させ、気液がスムースに
流れるようにすることが好ましい。In the above type (1), in order to avoid entrainment and flooding, the edge of the shelf where the liquid flows down is provided with (1) unevenness (FIG. 3 (a)). (FIG. 3 (b)) (3) It is preferable to forcibly break the liquid film by attaching a vertical projection [FIG. 3 (c)] so that gas-liquid flows smoothly. .
【００１２】前記（２）のタイプは、棚板の切り欠き部
と反対側の端部近傍に溢流管を設けるケースである。図
４にみられるように、棚段の切り欠き部と反対側の端部
近傍個所に任意数の円形、楕円形、方形などの断面形状
をもつ溢流管をつける方法がある。溢流管は棚段に開け
た穴につば７付きの溢流管５を落し込むなどの取りつけ
方もある（図５参照）。さらには、図６に示すように気
体が溢流管内を上昇するのを防止するため、溢流管下部
にシール部６を設ける方法や、図７に示すように溢流管
の下部に切り欠き８を設け、気体の流れは切り欠き８と
は反対側の図７における左側から右側に流れるようにす
る。これが反対に切り欠き８が気体の流れてくる方向に
向いていると、気体が切り欠き８より溢流管５中に潜り
込んでしまうので不都合である。切り欠き８を図７のよ
うに気体が流れていく方向に向けておけば、溢流管内を
上から流れてくる液体に気体が潜り込むことがなく、溢
流管内の液体が気体のシール材として機能し、気体も液
体も所定どおりスムースに流れることになる。この
（２）のタイプの場合には実質上、１つ下の棚段上で液
シールが行われていることになる。なお、溢流管の断面
積は、それを含む処理塔の断面積の１０％前後であるの
が普通であり、処理塔の直径が５００〜６００ｍｍ程度
の小さいものである場合は、溢流管は直径５０〜６０ｍ
ｍのもの１本でもよいが、処理塔の直径が大きい場合に
は溢流管の数を複数本とすることができる。The type (2) is a case in which an overflow pipe is provided near an end of the shelf plate opposite to the cutout portion. As shown in FIG. 4, there is a method in which an arbitrary number of overflow pipes having a cross-sectional shape such as a circle, an ellipse, or a square is provided at a position near an end opposite to the cutout of the shelf. The overflow pipe may be attached by dropping an overflow pipe 5 with a flange 7 into a hole formed in the shelf (see FIG. 5). Further, in order to prevent gas from rising inside the overflow pipe as shown in FIG. 6, a method of providing a seal portion 6 below the overflow pipe, or as shown in FIG. 8 is provided so that the gas flows from the left side to the right side in FIG. Conversely, if the notch 8 is oriented in the direction in which the gas flows, it is inconvenient because the gas enters the overflow pipe 5 from the notch 8. If the notch 8 is oriented in the direction in which the gas flows as shown in FIG. 7, the gas does not enter the liquid flowing from above in the overflow pipe, and the liquid in the overflow pipe serves as a gas sealing material. It works, and both gas and liquid flow smoothly as predetermined. In the case of the type (2), the liquid seal is substantially performed on the next lower shelf. The cross-sectional area of the overflow pipe is generally about 10% of the cross-sectional area of the processing tower including the overflow pipe. When the diameter of the processing tower is as small as about 500 to 600 mm, the overflow pipe is Is 50-60m in diameter
m, but when the diameter of the treatment tower is large, the number of overflow pipes can be plural.
【００１３】いずれにしても本発明は、液シール部があ
ることにより、気体が逆流することを防止し、飛沫同伴
を極力抑えることができた。In any case, according to the present invention, the presence of the liquid seal prevents the gas from flowing backward, thereby minimizing the entrainment of the droplets.
【００１４】本発明は、前記（１）のケースの場合も
（２）のケースの場合も、棚段の液シール部を有する端
部（または端部近傍）とは反対の端部にある切り欠き部
は、平坦な状態でもよいが、図２や図４にみられるよう
に堰９を設けることもできる。堰９を設けることにより
棚段上の液が気体の流れとは逆の方向に流れることを防
止することができる。According to the present invention, in both the case (1) and the case (2), the cut at the end opposite to the end (or near the end) having the liquid seal portion of the shelf is provided. The notch may be flat, but a weir 9 may be provided as shown in FIGS. By providing the weir 9, the liquid on the shelf can be prevented from flowing in the direction opposite to the gas flow.
【００１５】本発明においては、棚段に孔がないので、
気体が液中を通過することがないので、飛沫同伴が本質
的に低いが、液体は、棚段上を膜状で流れるようにする
ことが好ましい。しかし、本発明においては、ほとんど
傾斜のない棚段を設けているので液体の流速が小さいた
め、Ｒｅ（レイノルズ数）も小さく、物質移動係数も小
さいので、必要に応じて棚段上に金網１０などを張り付
ける（図８参照）あるいは棚段の棚板に液の流れに対し
て直角方向あるいはやや斜め方向に凹凸あるいは突起を
つけるなどして液膜面が擬似乱流状態、すなわち液膜に
破断部分が生じないで、気液の接触面積が大きくなるよ
うにして棚段上での物質移動を促進することが望まし
い。In the present invention, since there is no hole in the shelf,
Since the gas does not pass through the liquid, the entrainment is essentially low, but it is preferred that the liquid flows in a film on the platen. However, in the present invention, since the shelf having almost no inclination is provided, the flow velocity of the liquid is small, the Re (Reynolds number) is small, and the mass transfer coefficient is small. The liquid film surface is in a quasi-turbulent state, that is, the liquid film is formed by attaching irregularities or projections on the shelf plate in a direction perpendicular or slightly oblique to the flow of the liquid. It is desirable that the gas-liquid contact area be increased without breakage to promote mass transfer on the platen.
【００１６】本発明においては、気体と液体は水平並流
が主体であり、気体は原則液体中を通過しないので、一
段あたりの圧力損失は非常に小さく、処理能力が大き
い。そして棚段上を液体と平行に流れた気体は棚段の他
方の端部で気液分離され、気体は上段に、液体は下段に
流れる。液体の線速度は０．０１〜０．５ｍ／ｓ、好ま
しくは０．０５〜０．１ｍ／ｓ程度であるが、とくに限
定されるものではない。In the present invention, the gas and the liquid mainly flow in parallel, and the gas does not pass through the liquid in principle, so that the pressure loss per stage is very small and the processing capacity is large. The gas flowing in parallel with the liquid on the shelf is separated into gas and liquid at the other end of the shelf, and the gas flows to the upper stage and the liquid flows to the lower stage. The linear velocity of the liquid is 0.01 to 0.5 m / s, preferably about 0.05 to 0.1 m / s, but is not particularly limited.
【００１７】また、棚板は、基本的には水平であるが、
若干の傾斜をもうけてもよい。その傾斜方向は流れ方向
と同一方向であることが好ましい。そうしないと偏流が
発生するからである。Although the shelf is basically horizontal,
Some inclination may be provided. The inclination direction is preferably the same as the flow direction. Otherwise, drift will occur.
【００１８】気液接触は、液表面のみであるため、物質
移動係数が小さい。また液体と気体は並流であるため、
従来の棚段式気液接触装置で言われている段効率は１を
超えることはできない。 （１）塔断面積を大きくすることより、これにより気液
接触面積を大きくして段効率を１に近づけることができ
る。 （２）棚段間隙に充填物を充填したり、棚段上に邪魔板
を設置するなど、種々の気液接触改善手段を併用するこ
とにより、効率を上げることができる。 （３）棚段間隔を小さくして、ある制限高さ内での全段
数を増やすことにより塔全体としての効率を上げること
ができる。Since gas-liquid contact is only on the liquid surface, the mass transfer coefficient is small. Also, since liquid and gas are co-current,
The stage efficiency referred to in the conventional shelf-stage gas-liquid contact device cannot exceed 1. (1) By increasing the column cross-sectional area, the gas-liquid contact area can be increased, and the stage efficiency can be made closer to 1. (2) Efficiency can be increased by using various means for improving gas-liquid contact, such as filling the gap between the trays with a filler or installing a baffle plate on the shelf. (3) The efficiency of the tower as a whole can be increased by reducing the spacing between the trays and increasing the total number of trays within a certain limit height.
【００１９】[0019]
【実施例】以下に、実施例、比較例を挙げて本発明を説
明するが、本発明はこれらにより何ら限定されるもので
はない。The present invention will be described below with reference to examples and comparative examples, but the present invention is not limited to these examples.
【００２０】実施例１および比較例１〜３ 本発明の実施例１に相当する蒸留塔の装置仕様を表１に
示す。なお、比較のため従来の棚段式蒸留塔であるシー
ブレイト蒸留塔（比較例１）の装置仕様、金属規則充填
塔（比較例２）の装置仕様および本発明者の先願発明
（特願平１０−１９２４０１号）の装置仕様（比較例
３）も表１に示す。また、処理原液の組成、操作条件は
下記のとおりである。 Example 1 and Comparative Examples 1 to 3 Table 1 shows the specifications of a distillation column corresponding to Example 1 of the present invention. For comparison, the specifications of a conventional plate-type distillation column, a sea-blade distillation column (Comparative Example 1), the specifications of a metal packed packed column (Comparative Example 2), and the invention of the inventor of the present invention (Japanese Patent Application No. Hei 10-214,861). Table 1 also shows the device specifications (Comparative Example 3) of No. 10-192401). The composition of the stock solution and the operating conditions are as follows.
【００２１】[0021]
【表１】 ＊ 金属規則充填塔は、塔頂部に液分散器が設置されて
いる。また、充填物は、三菱エンジニアリング製ＭＣ−
２５０Ｔ（ＳＵＳ３０４製）である。 ＊＊ 特願平１０−１９２４０１号発明[Table 1] * The metal packing tower has a liquid disperser at the top. The filling is made by Mitsubishi Engineering MC-
250T (made of SUS304). ** Invention of Japanese Patent Application No. Hei 10-192401
【００２２】前述の実施例１および比較例１〜３に記載
した条件により、分離能力の試験を行ない、その結果を
下記表２に示す。A separation capacity test was conducted under the conditions described in Example 1 and Comparative Examples 1 to 3, and the results are shown in Table 2 below.
【表２】 １ ＮＴＵＯＧ：蒸気側境膜基準総括移動単位数（Ｎｕ
ｍｂｅｒ ｏｆＴｒａｎｓｆｅｒ Ｕｎｉｔ） ２ ＨＴＵＯＧ：蒸気側境膜基準総括単位移動高さ（Ｈ
ｅｉｇｈｔ ｏｆＴｒａｎｓｆｅｒ Ｕｎｉｔ）：これ
が小さいほど高さあたりの分離能力が高い。 塔高さ＝ＮＴＵＯＧ×ＨＴＵＯＧ ＊３：実施例１のＨＴＵで、各比較例のＨＴＵを割った
数字。[Table 2]1 NTUOG: Total number of moving units based on steam side film (Nu
mber ofTransfer Unit) 2 HTUOG： Steam side film standard total unit movement height (H
right ofTransfer Unit):
The smaller the is, the higher the separation capacity per height. Tower height = NTUOG× HTUOG * 3: HTU of Example 1 was divided by HTU of Example 1.
Numbers.
【００２３】以上の結果より、本発明の棚段式気液接触
装置では、先願発明の棚段式気液接触装置に比べ、やや
分離効率では劣るものの、従来の棚段式気液接触装置、
金属規則充填物を用いた場合よりも分離効率が優れてお
り、かつ先願発明に較べて飛沫同伴を最小限に抑えるこ
とができる。From the above results, the plate-type gas-liquid contact device of the present invention has a slightly lower separation efficiency than the plate-type gas-liquid contact device of the prior application, but the conventional plate-type gas-liquid contact device of the prior application. ,
The separation efficiency is superior to the case where the metal structured packing is used, and splash entrainment can be minimized as compared with the prior invention.
【００２４】実施例２と比較例４ 表３に示す装置を用いて、下記の条件で全還流下におけ
るＦファクターと圧力損失の関係を調べた。 Ｆファクター＝〔蒸気線速度（ｍ／ｓ）〕×〔蒸気密度
（ｋｇ／ｍ３）〕０．５ たゞし、蒸気線速度は棚段上の蒸気通過部分のなかで最
も通過面積の小さい部位の値を基準とした。 液の種類：トルエン１００％ 操作圧力：７６０ｍｍＨｇExample 2 and Comparative Example 4 The apparatus shown in Table 3 was used under the following conditions under total reflux.
The relationship between the F factor and the pressure loss was examined. F factor = [steam linear velocity (m / s)] x [steam density
(Kg / m3)]0.5 However, the steam line velocity is the highest in the steam passage on the platen.
Also, the value of a portion having a small passing area was used as a reference. Liquid type: toluene 100% Operating pressure: 760 mmHg
【００２５】[0025]
【表３】 [Table 3]
【００２６】両者のＦファクターと圧力損失の関係は図
９に示すとおりである。図９より明らかなように、圧力
損失が同程度で運転した場合、比較例４と比べ実施例２
では、約２〜３倍程度の蒸発量で運転可能なこと、つま
り処理能力として２〜３倍程度であるといえる。The relationship between the F factor and the pressure loss is as shown in FIG. As is clear from FIG. 9, when the operation was performed with the same pressure loss, Example 2 was
Thus, it can be said that the operation can be performed with about 2 to 3 times the evaporation amount, that is, the processing capacity is about 2 to 3 times.
【００２７】[0027]
【効果】（１）本発明により、従来の棚段式蒸留塔にお
ける棚段と棚段との間隔を大幅に小さくすることができ
た。 （２）これにより、高さ制限を伴う室内設置においても
塔を分割して並列する必要がなくなり、その分高い経済
性を達成することができ、かつ室内面積の利用率も高め
ることができた。 （３）本発明により、飛沫同伴による逆混合やフラッデ
ィングを発生する気体流速の臨界点を大幅に高めること
ができ、装置の処理能力を大きく向上することができ
た。(1) According to the present invention, the interval between trays in a conventional tray-type distillation column can be greatly reduced. (2) This eliminates the necessity of dividing and arranging the towers even in an indoor installation with height restrictions, thereby achieving high economic efficiency and increasing the utilization rate of the indoor area. . (3) According to the present invention, the critical point of the gas flow velocity at which backmixing and flooding due to entrainment can be significantly increased, and the processing capacity of the apparatus can be greatly improved.
【図１】本発明の棚段２−１、２−２、２−３、……の
一方の端部に設けられた切り欠き部４−１、４−２、４
−３、……を有するとともに、その反対の端部に設けら
れた液シール部３、３、３、……を有する本発明の棚段
式気液接触装置の１部を示す断面図である。FIG. 1 shows cutouts 4-1, 4-2, and 4 provided at one end of shelf stages 2-1, 2-2, 2-3,... Of the present invention.
-3,... And a cross-sectional view showing a part of the shelf type gas-liquid contact device of the present invention having liquid seal portions 3, 3, 3,. .
【図２】図１に対応する斜視図である。FIG. 2 is a perspective view corresponding to FIG.
【図３】本発明の棚段の一方の端部である切り欠き部の
いろいろの態様を示す斜視図であり、（ａ）は棚段の切
り欠き部に凸部を設けた場合であり、（ｂ）は切り込み
を入れた場合であり、（ｃ）は垂直方向に突起物を設け
た場合を示す。FIG. 3 is a perspective view showing various aspects of a cutout portion which is one end of a shelf of the present invention, wherein (a) shows a case where a protrusion is provided in the cutout of the shelf; (B) shows a case where a cut is made, and (c) shows a case where a protrusion is provided in the vertical direction.
【図４】切り欠き部の他の態様として溢流管を用いた場
合の本発明の棚段式気液接触装置の１部を示す断面図で
ある。FIG. 4 is a cross-sectional view showing a part of the plate-type gas-liquid contact device of the present invention when an overflow pipe is used as another mode of the cutout portion.
【図５】溢流管として、つば付きのものを用いた場合の
部分断面図（ａ）と、溢流管の斜視図（ｂ）を示す。FIGS. 5A and 5B are a partial cross-sectional view when a spill tube with a flange is used, and a perspective view of the spill tube.
【図６】溢流管と液シールの一方法を示す断面図であ
る。FIG. 6 is a sectional view showing one method of an overflow pipe and a liquid seal.
【図７】溢流管の下端部変形例を示す断面図である。FIG. 7 is a sectional view showing a modified example of the lower end portion of the overflow pipe.
【図８】棚段上に金網を張った態様を示す斜視図であ
る。FIG. 8 is a perspective view showing a mode in which a wire net is provided on a shelf.
【図９】実施例２と比較例４における圧力損失による能
力比較を示すグラフである。FIG. 9 is a graph showing a comparison of performance due to pressure loss in Example 2 and Comparative Example 4.
１ 塔 ２ 棚段 ２−１ 棚段 ２−２ 棚段 ２−３ 棚段 ３ 液シール部 ４ 切り欠き部 ４−１ 切り欠き部 ４−２ 切り欠き部 ４−３ 切り欠き部 ５ 溢流管 ６ シール部 ７ つば ８ 切り欠き ９ 堰 １０ 金網 1 Tower 2 Shelf 2-1 Shelf 2-2 Shelf 2-3 Shelf 3 Liquid seal 4 Notch 4-1 Notch 4-2 Notch 4-3 Notch 5 Overflow pipe 6 Seal part 7 Collar 8 Notch 9 Weir 10 Wire mesh
───────────────────────────────────────────────────── フロントページの続き (72)発明者 劉 芳芝 千葉県市原市八幡海岸通り74−18 日本リ ファイン株式会社千葉工場内 (72)発明者 小田 昭昌 千葉県市原市八幡海岸通り74−18 日本リ ファイン株式会社千葉工場内 Ｆターム(参考） 4D020 AA08 BA15 BB04 BC01 CB19 CB35 CC08 DA01 DA03 DB12 4D076 BB05 CC01 EA08Z EA11Z 4G075 AA02 BB03 BB04 BD03 BD04 BD05 BD07 BD13 BD23 DA02 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Liu Yoshiba 74-18 Yawata Kaigan-dori, Ichihara-shi, Chiba Prefecture Nippon Refine Co., Ltd. Chiba Plant (72) Inventor Akimasa Oda 74-18 Yawata-kaigan-dori, Ichihara-shi, Chiba F-term in Nihon Refine Co., Ltd. Chiba factory (reference) 4D020 AA08 BA15 BB04 BC01 CB19 CB35 CC08 DA01 DA03 DB12 4D076 BB05 CC01 EA08Z EA11Z 4G075 AA02 BB03 BB04 BD03 BD04 BD05 BD07 BD13 BD23 DA02
Claims (1)
端部に切り欠き部を、他方の端部または端部近傍に液シ
ール部を有する棚段を、その切り欠き部の位置が左右
交互になるように、かつ棚段間隔が１０〜３００ｍｍ
になるように多数段設置し、（Ｂ）液体と気体が並流方
向に流れる手段を設けた、ことを特徴とする棚段式気液
接触装置。(A) A shelf having a notch at one end and a shelf having a liquid seal portion at or near the other end without having a hole in the shelf is provided with a notch. The positions are alternately left and right, and the shelf interval is 10 to 300 mm
And (B) a means for flowing a liquid and a gas in a co-current direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05866799A JP4183331B2 (en) | 1999-03-05 | 1999-03-05 | Shelf type gas-liquid contact device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05866799A JP4183331B2 (en) | 1999-03-05 | 1999-03-05 | Shelf type gas-liquid contact device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000254402A true JP2000254402A (en) | 2000-09-19 |
| JP4183331B2 JP4183331B2 (en) | 2008-11-19 |
Family
ID=13090949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05866799A Expired - Lifetime JP4183331B2 (en) | 1999-03-05 | 1999-03-05 | Shelf type gas-liquid contact device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4183331B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009022753A1 (en) | 2007-08-16 | 2009-02-19 | Jgc Corporation | Contact column |
| JP2009136862A (en) * | 2007-11-14 | 2009-06-25 | Hokkaido Univ | Treatment method of high alkaline water and treatment apparatus thereof |
| CN100563788C (en) * | 2003-01-29 | 2009-12-02 | 日本瑞环株式会社 | Concentrate the method and apparatus of material higher in the exhaust than water boiling point |
| CN115041106A (en) * | 2022-06-21 | 2022-09-13 | 湖北新轩宏新材料有限公司 | Reactor for preparing trichlorobenzene and preparation method |
-
1999
- 1999-03-05 JP JP05866799A patent/JP4183331B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100563788C (en) * | 2003-01-29 | 2009-12-02 | 日本瑞环株式会社 | Concentrate the method and apparatus of material higher in the exhaust than water boiling point |
| WO2009022753A1 (en) | 2007-08-16 | 2009-02-19 | Jgc Corporation | Contact column |
| US8240640B2 (en) | 2007-08-16 | 2012-08-14 | Jgc Corporation | Contactor |
| JP2009136862A (en) * | 2007-11-14 | 2009-06-25 | Hokkaido Univ | Treatment method of high alkaline water and treatment apparatus thereof |
| CN115041106A (en) * | 2022-06-21 | 2022-09-13 | 湖北新轩宏新材料有限公司 | Reactor for preparing trichlorobenzene and preparation method |
| CN115041106B (en) * | 2022-06-21 | 2023-11-07 | 湖北新轩宏新材料有限公司 | Reactor for preparing trichlorotoluene and preparation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4183331B2 (en) | 2008-11-19 |
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