JP2000235963A5 - - Google Patents
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- Publication number
- JP2000235963A5 JP2000235963A5 JP1999038041A JP3804199A JP2000235963A5 JP 2000235963 A5 JP2000235963 A5 JP 2000235963A5 JP 1999038041 A JP1999038041 A JP 1999038041A JP 3804199 A JP3804199 A JP 3804199A JP 2000235963 A5 JP2000235963 A5 JP 2000235963A5
- Authority
- JP
- Japan
- Prior art keywords
- less
- forming
- thin film
- refractory metal
- pressure range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03804199A JP4009034B2 (ja) | 1999-02-17 | 1999-02-17 | バリア膜製造方法 |
| KR1020000006214A KR100773280B1 (ko) | 1999-02-17 | 2000-02-10 | 배리어막제조방법및배리어막 |
| DE60019660T DE60019660T2 (de) | 1999-02-17 | 2000-02-15 | Verfahren zum Aufbringen einer Sperrschicht |
| EP00103073A EP1029943B1 (en) | 1999-02-17 | 2000-02-15 | Process for producing barrier film |
| TW089102530A TW451357B (en) | 1999-02-17 | 2000-02-15 | Manufacturing method of barrier film and the barrier film |
| US09/504,923 US6743718B1 (en) | 1999-02-17 | 2000-02-16 | Process for producing barrier film and barrier film thus produced |
| US10/133,432 US20020123215A1 (en) | 1999-02-17 | 2002-04-29 | Process for producing barrier film and barrier film thus produced |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03804199A JP4009034B2 (ja) | 1999-02-17 | 1999-02-17 | バリア膜製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007163880A Division JP2007251211A (ja) | 2007-06-21 | 2007-06-21 | バリア膜製造方法、及びバリア膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000235963A JP2000235963A (ja) | 2000-08-29 |
| JP2000235963A5 true JP2000235963A5 (https=) | 2005-11-04 |
| JP4009034B2 JP4009034B2 (ja) | 2007-11-14 |
Family
ID=12514462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03804199A Expired - Fee Related JP4009034B2 (ja) | 1999-02-17 | 1999-02-17 | バリア膜製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4009034B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001156024A (ja) * | 1999-09-13 | 2001-06-08 | Tokyo Electron Ltd | TiN系薄膜およびその成膜方法、成膜装置、TiN系薄膜を含む膜構造体およびその製造方法、ならびに半導体装置 |
| JP4674061B2 (ja) * | 2004-07-14 | 2011-04-20 | 株式会社アルバック | 薄膜形成方法 |
| US10504741B2 (en) * | 2017-02-28 | 2019-12-10 | Tokyo Electron Limited | Semiconductor manufacturing method and plasma processing apparatus |
-
1999
- 1999-02-17 JP JP03804199A patent/JP4009034B2/ja not_active Expired - Fee Related
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