JP2000235963A5 - - Google Patents

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Publication number
JP2000235963A5
JP2000235963A5 JP1999038041A JP3804199A JP2000235963A5 JP 2000235963 A5 JP2000235963 A5 JP 2000235963A5 JP 1999038041 A JP1999038041 A JP 1999038041A JP 3804199 A JP3804199 A JP 3804199A JP 2000235963 A5 JP2000235963 A5 JP 2000235963A5
Authority
JP
Japan
Prior art keywords
less
forming
thin film
refractory metal
pressure range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999038041A
Other languages
English (en)
Other versions
JP4009034B2 (ja
JP2000235963A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP03804199A external-priority patent/JP4009034B2/ja
Priority to JP03804199A priority Critical patent/JP4009034B2/ja
Priority to KR1020000006214A priority patent/KR100773280B1/ko
Priority to EP00103073A priority patent/EP1029943B1/en
Priority to TW089102530A priority patent/TW451357B/zh
Priority to DE60019660T priority patent/DE60019660T2/de
Priority to US09/504,923 priority patent/US6743718B1/en
Publication of JP2000235963A publication Critical patent/JP2000235963A/ja
Priority to US10/133,432 priority patent/US20020123215A1/en
Publication of JP2000235963A5 publication Critical patent/JP2000235963A5/ja
Publication of JP4009034B2 publication Critical patent/JP4009034B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

高融点金属の窒化物薄膜を形成するときの圧力範囲については、１Ｐａ以上１００００Ｐａ以下が適当であり、より好ましくは１Ｐａ以上１００Ｐａ以下がよい。
JP03804199A 1999-02-17 1999-02-17 バリア膜製造方法 Expired - Fee Related JP4009034B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP03804199A JP4009034B2 (ja) 1999-02-17 1999-02-17 バリア膜製造方法
KR1020000006214A KR100773280B1 (ko) 1999-02-17 2000-02-10 배리어막제조방법및배리어막
DE60019660T DE60019660T2 (de) 1999-02-17 2000-02-15 Verfahren zum Aufbringen einer Sperrschicht
TW089102530A TW451357B (en) 1999-02-17 2000-02-15 Manufacturing method of barrier film and the barrier film
EP00103073A EP1029943B1 (en) 1999-02-17 2000-02-15 Process for producing barrier film
US09/504,923 US6743718B1 (en) 1999-02-17 2000-02-16 Process for producing barrier film and barrier film thus produced
US10/133,432 US20020123215A1 (en) 1999-02-17 2002-04-29 Process for producing barrier film and barrier film thus produced

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03804199A JP4009034B2 (ja) 1999-02-17 1999-02-17 バリア膜製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007163880A Division JP2007251211A (ja) 2007-06-21 2007-06-21 バリア膜製造方法、及びバリア膜

Publications (3)

Publication Number Publication Date
JP2000235963A JP2000235963A (ja) 2000-08-29
JP2000235963A5 true JP2000235963A5 (ja) 2005-11-04
JP4009034B2 JP4009034B2 (ja) 2007-11-14

Family

ID=12514462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03804199A Expired - Fee Related JP4009034B2 (ja) 1999-02-17 1999-02-17 バリア膜製造方法

Country Status (1)

Country Link
JP (1) JP4009034B2 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156024A (ja) * 1999-09-13 2001-06-08 Tokyo Electron Ltd ＴｉＮ系薄膜およびその成膜方法、成膜装置、ＴｉＮ系薄膜を含む膜構造体およびその製造方法、ならびに半導体装置
JP4674061B2 (ja) * 2004-07-14 2011-04-20 株式会社アルバック 薄膜形成方法
US10504741B2 (en) * 2017-02-28 2019-12-10 Tokyo Electron Limited Semiconductor manufacturing method and plasma processing apparatus

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