JP2000233963A - Production of clay tile - Google Patents

Production of clay tile

Info

Publication number
JP2000233963A
JP2000233963A JP11033838A JP3383899A JP2000233963A JP 2000233963 A JP2000233963 A JP 2000233963A JP 11033838 A JP11033838 A JP 11033838A JP 3383899 A JP3383899 A JP 3383899A JP 2000233963 A JP2000233963 A JP 2000233963A
Authority
JP
Japan
Prior art keywords
tile
self
tile body
clay
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11033838A
Other languages
Japanese (ja)
Inventor
Mikio Nakazono
中園幹男
Takenobu Kudo
工藤武信
Yuji Mawatari
馬渡裕ニ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TAKAHAMA KOGYO KK
Takahama Industry Co Ltd
Original Assignee
TAKAHAMA KOGYO KK
Takahama Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TAKAHAMA KOGYO KK, Takahama Industry Co Ltd filed Critical TAKAHAMA KOGYO KK
Priority to JP11033838A priority Critical patent/JP2000233963A/en
Publication of JP2000233963A publication Critical patent/JP2000233963A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To stably keep tile body in a self-supporting state and to prevent the fall of the tile body in firing by flat grinding the contact part of the tile body prior to firing even if the tile body is distorted by shrinkage due to drying in the production of a clay tile. SOLUTION: When molded tile body 10 is dried and fired in a self-supporting state to produce a clay tile, the contact part 22 of the dried clay body 10 on the bottom 14 side is flat ground so that the clay body 10 can self-support and the clay body 10 is allowed to self-support through the ground contact part 22 and fired in the self-supporting state.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、粘土瓦の製造方
法に関するもので、とくに乾燥された瓦素地を自立状態
で焼成させる粘土瓦の製造方法に関するものある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a clay tile, and more particularly to a method for manufacturing a clay tile in which a dried tile body is fired in an independent state.

【0002】[0002]

【従来の技術】一般的に粘土瓦の製造において、プレス
成形機などで成形された瓦素地は未乾燥状態にあるため
乾燥され、乾燥された瓦素地はその後焼成される。ま
た、瓦素地の焼成は焼成炉により行われるが、焼成時に
おける瓦素地の姿勢は頭を上方とし尻を下方とする、い
わゆる自立状態とすることが比較的多い。
2. Description of the Related Art Generally, in the production of clay roof tiles, tile bodies formed by a press molding machine or the like are dried since they are in an undried state, and the dried tile bodies are thereafter fired. The firing of the tiles is performed by a firing furnace, and the firing is often performed in a so-called self-standing state in which the tiles have a head upward and a butt downward.

【0003】ところで、瓦素地の乾燥の際、乾燥に伴う
収縮が瓦素地に発生することは避けられない。例えば、
図9に示されるように、自立状態で瓦素地Wを焼成する
場合、瓦素地Wの尻側の当接部位S(尻側の端面)が乾
燥の収縮により歪み、歪んだ瓦素地Wでは自立状態にお
ける瓦素地Wの重心Gが移動する。自立状態における瓦
素地Wの重心Gが瓦素地Wの歪みにより移動すると、瓦
素地Wは不安定な自立状態となり、焼成炉内において瓦
素地Wが転倒するなどのおそれがあった。
[0003] By the way, when drying the tile, it is inevitable that shrinkage accompanying the drying occurs in the tile. For example,
As shown in FIG. 9, in the case of firing the tile body W in a self-supporting state, the abutting portion S (an end surface on the tail side) of the tile body W is distorted due to drying shrinkage, and the warped tile body W is self-supporting. The center of gravity G of the tile body W in the state moves. When the center of gravity G of the tile body W in the self-standing state moves due to the distortion of the tile body W, the tile body W becomes an unstable self-standing state, and there is a possibility that the tile body W may fall over in the firing furnace.

【0004】とくに、F形粘土瓦(いわゆる平板瓦)の
瓦素地は、瓦素地の肉厚も薄いので乾燥の収縮による歪
みが顕在化しやすく、F形粘土瓦の瓦素地に対しては一
層安定した自立状態で瓦素地を焼成させることが強く要
請されていた。
[0004] In particular, in the case of F-type clay tiles (so-called flat tiles), since the thickness of the tiles is small, distortion due to drying shrinkage is apt to be evident, and the F-type clay tiles are more stable. There has been a strong demand for firing tiles in a self-sustaining state.

【0005】[0005]

【発明が解決しようとする課題】この発明が解決しよう
とする課題は、従来の自立状態の瓦素地を焼成する粘土
瓦の製造にあっては、瓦素地の乾燥の収縮による歪みが
尻側の当接部位に発生した場合、不安定な自立状態とな
り焼成炉内で瓦素地が転倒するおそれがある点である。
この発明の目的は、安定させた自立状態の瓦素地を焼成
し、焼成炉内で瓦素地が転倒することのない粘土瓦の製
造方法を提供することにある。
An object to be solved by the present invention is to produce clay tiles for firing a tile material in a self-standing state, in which distortion due to drying shrinkage of the tile material is reduced due to shrinkage of the tile side. If it occurs at the contact portion, it becomes an unstable self-supporting state, and the tile body may fall down in the firing furnace.
An object of the present invention is to provide a method of manufacturing a clay tile in which a stabilized free standing tile body is fired and the tile body does not fall in a firing furnace.

【0006】[0006]

【課題を解決するための手段および作用効果】上記の目
的を達成するため、請求項1記載の粘土瓦の製造方法
は、成形された瓦素地を乾燥させた後、瓦素地を自立状
態で焼成する粘土瓦の製造方法において、瓦素地が安定
して自立するように、乾燥された瓦素地における尻側の
当接部位を平坦に研削し、研削された当接部位を介して
瓦素地を自立させ、自立状態の瓦素地を焼成することを
特徴とするものである。
In order to achieve the above object, a method of manufacturing a clay tile according to the first aspect of the present invention comprises drying a formed tile and then firing the tile in an independent state. In the method of manufacturing clay tiles, the abutting portion of the dried tile material is ground flat so that the tile material becomes stable and self-supporting, and the tile material becomes independent through the ground contact portion. And firing the self-supporting tile body.

【0007】したがって、請求項1記載の粘土瓦の製造
方法においては、瓦素地が安定した自立状態を保つよう
に、乾燥された瓦素地の尻側の当接部位が焼成に先立っ
て平坦に研削され、研削された当接部位を介して瓦素地
を自立させ、自立状態の瓦素地が焼成される。このと
き、瓦素地に乾燥の収縮による歪みが生じていても尻側
の当接部位が平坦に研削されているので、安定した瓦素
地の自立状態が保たれる。
Therefore, in the method for manufacturing a clay tile according to the first aspect, the abutting portion of the dried tile body is ground flat prior to firing so that the tile body maintains a stable self-standing state. Then, the tile body is made to stand by itself through the ground contact portion, and the tile body in a self-standing state is fired. At this time, even if the tile body is distorted due to drying shrinkage, the abutting portion on the buttocks side is ground flat, so that the tile body can maintain a stable self-standing state.

【0008】請求項1記載の粘土瓦の製造方法は、上記
のように構成されているので以下の利点を有する。瓦素
地に乾燥の収縮による歪みが生じていても尻側の当接部
位が平坦に研削されているので、安定した瓦素地の自立
状態が保たれ、焼成時に瓦素地が転倒するおそれがな
い。また、尻側の当接部位を研削することにより、瓦素
地の尻の仕上がりがより美しくなる。
[0008] The method for manufacturing a clay tile according to the first aspect has the following advantages since it is configured as described above. Even if the tile is deformed due to drying shrinkage, the abutting portion on the buttocks side is ground flat, so that the tile is kept in a self-supporting stable state and there is no possibility that the tile will fall over during firing. In addition, by grinding the contact portion on the tail side, the finish of the tail of the tile body becomes more beautiful.

【0009】また、請求項2記載の粘土瓦の製造方法
は、請求項1記載の粘土瓦の製造方法において、瓦素地
の尻側の当接部位を突状体とするものである。
In the method for manufacturing a clay tile according to a second aspect of the present invention, in the method for manufacturing a clay tile according to the first aspect, the contact portion on the tail side of the tile body is formed as a projection.

【0010】したがって、請求項2記載の粘土瓦の製造
方法は、請求項1記載の粘土瓦の製造方法おいて、瓦素
地の尻側の当接部位を突状体とするので、突状体のみ研
削すればよく、焼成前の当接部位の研削に必要な時間が
より短縮化される。
Therefore, in the method for manufacturing a clay tile according to the second aspect of the present invention, in the method for manufacturing a clay tile according to the first aspect, the abutting portion on the tail side of the tile body is formed as a projecting body. Only the grinding is required, and the time required for grinding the contact portion before firing is further reduced.

【0011】請求項2記載の粘土瓦の製造方法は、上記
のように構成されているので以下の利点を有する。請求
項1記載の粘土瓦の製造方法の発明の効果を奏するほ
か、焼成前の当接部位の研削に必要な時間がより短縮化
されるほか、粘土瓦の生産性を低下させることがない。
The method for manufacturing a clay tile according to the second aspect has the following advantages because it is configured as described above. In addition to the effect of the invention of the method for manufacturing a clay tile described in claim 1, the time required for grinding the contact portion before firing is further reduced, and the productivity of the clay tile is not reduced.

【0012】[0012]

【発明の実施の形態】この発明の実施の形態について図
面を参照して説明する。図1はこの実施の形態に係る瓦
素地の自立状態を示す側面図、図2は実施の形態に係る
瓦素地の斜視図、図3は実施の形態に係る瓦素地の研削
部分を示す拡大図、図4は当接部位を突状体とした瓦素
地の自立状態を示す側面図、図5は当接部位を突状体と
した瓦素地の斜視図、図6は当接部位を突状体とした瓦
素地の研削部分を示す拡大図、図7および図8は別の形
態にかかる突状体を備えた瓦素地の斜視図、図9は従来
例における自立状態の瓦素地を示す側面図である。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a side view showing the self-standing state of the tile according to the embodiment, FIG. 2 is a perspective view of the tile according to the embodiment, and FIG. 3 is an enlarged view showing a ground portion of the tile according to the embodiment. FIG. 4 is a side view showing a self-standing state of a tile body having a protruding body as a contact portion, FIG. 5 is a perspective view of a tile body having a protruding body as a contact section, and FIG. 7 and 8 are perspective views of a tile body provided with a projection according to another embodiment, and FIG. 9 is a side view showing a self-standing tile body in a conventional example. FIG.

【0013】まず、水分を含んだ粘土を主体とする原料
をプレス成形機(図示せず)により加圧成形し、図2に
示されるような瓦素地10を得る。本例の瓦素地10は
F形粘土瓦の桟瓦であり、いわゆる平板瓦と称されてい
る。
First, a raw material mainly composed of clay containing water is press-formed by a press-forming machine (not shown) to obtain a tile body 10 as shown in FIG. The tile body 10 of this example is an F-type clay tile, and is called a so-called flat tile.

【0014】この明細書においては、瓦素地10を屋根
に葺いたとき軒側に位置する瓦素地10の端を頭12と
し、棟側に位置する端を尻14とする。また、瓦素地1
0の一側にはアンダーラップ部16が備えられ、他側に
はオーバーラップ部18が備えられ、また、尻14寄り
の裏面Mには2個の引っ掛け部20が一定の間隔を保っ
て設けられている。この実施の形態における瓦素地10
の尻14側の端面は、後述する焼成時の自立状態の瓦素
地10において、焼成用台車(図示せず)に設けられた
棚板24などと当接するため当接部位22とする(図1
および図2を参照)。
In this specification, when the tile substrate 10 is laid on a roof, the end of the tile substrate 10 located on the eave side is referred to as a head 12 and the end located on the ridge side is referred to as a tail 14. In addition, tile foundation 1
On one side, an underlap portion 16 is provided, on the other side, an overlap portion 18 is provided, and two hooks 20 are provided on the back surface M near the buttocks 14 at a constant interval. Have been. The tile substrate 10 in this embodiment
An end surface on the side of the tail 14 is an abutting portion 22 for abutting with a shelf plate 24 provided on a baking cart (not shown) in the self-standing tile body 10 at the time of baking described later (FIG. 1).
And FIG. 2).

【0015】成形された瓦素地10は、水分を含んでい
るため乾燥炉(図示せず)により乾燥されるが、乾燥時
の歪みをできるだけ抑制するため、乾燥用パレット上に
水平で載置された状態で乾燥される。なお、未乾燥の瓦
素地10は連続的に成形され、これらの瓦素地10はト
ンネル式またはバッチ式の乾燥炉が利用される。
The formed tile body 10 is dried by a drying furnace (not shown) because it contains moisture, but is placed horizontally on a drying pallet to minimize distortion during drying. It is dried in the state. The undried tiles 10 are formed continuously, and a tunnel-type or batch-type drying furnace is used for these tiles 10.

【0016】乾燥された瓦素地10は乾燥の収縮による
歪みが生じている可能性があり、歪みによる凹凸等が瓦
素地10の尻側の当接部位22に生じている場合があ
る。この場合の瓦素地10は、自立させることが不能で
あるか、あるいは不安定な自立状態となり、自立状態が
不安定な瓦素地を焼成すると、焼成炉内で転倒するおそ
れがある。
There is a possibility that the dried tile body 10 may be distorted due to drying shrinkage, and irregularities or the like due to the distortion may be generated in the abutting portion 22 of the tail side of the tile body 10. In this case, the tile body 10 cannot be made independent or is in an unstable self-supporting state. If the tile body 10 in which the self-supporting state is unstable is fired, the tile body 10 may fall over in the firing furnace.

【0017】つまり、尻側の当接部位22に歪みによる
凹凸等が生じていると、自立状態における瓦素地10の
重心G(この実施の形態では瓦素地10のほぼ中心に位
置する)が移動し、移動した重心Gの鉛直方向に当接部
位が位置しないと瓦素地10が自立状態を保つことがで
きない。
That is, if unevenness or the like due to distortion occurs in the abutting portion 22 on the buttocks side, the center of gravity G of the tile body 10 in the self-standing state (in this embodiment, located substantially at the center of the tile body 10) moves. However, if the contact portion is not located in the vertical direction of the moved center of gravity G, the tile body 10 cannot maintain its self-standing state.

【0018】一方、瓦素地10の重心Gの鉛直方向に当
接部位22が位置する場合でも、僅かに留まっているよ
うな状態であれば、少しの振動や衝撃によって瓦素地1
0が容易に転倒することになる。他方、焼成時における
瓦素地10の転倒は、乾燥の歪みによる凹凸等が原因と
なるほか、瓦素地10の成形時に生じがちなバリにより
誘発することもある(図3を参照)。
On the other hand, even if the contact portion 22 is located in the vertical direction of the center of gravity G of the tile substrate 10, if the contact portion 22 slightly stays, the tile substrate 1 is slightly affected by a slight vibration or impact.
0 will easily fall over. On the other hand, the falling of the tile body 10 at the time of firing is caused not only by unevenness due to drying distortion, but also by burrs which tend to occur at the time of forming the tile body 10 (see FIG. 3).

【0019】そこで、この実施の形態においては、乾燥
済みの瓦素地10の尻14側の端面、すなわち当接部位
22を平坦に研削するが、瓦素地10の当接部位22の
研削は、瓦素地10を自立状態にさせたときに安定する
ように研削する必要がある。
Therefore, in this embodiment, the end face of the dried tile material 10 on the side of the tail 14, that is, the contact portion 22 is ground flat. It is necessary to grind the substrate 10 so that it is stable when the substrate 10 is made self-supporting.

【0020】そのため、瓦素地10の重心Gが瓦素地1
0のほぼ中心部に位置するとした場合、瓦素地10の自
立状態において重心Gの鉛直方向に当接部位22の中心
付近が位置することが必要であり、当接部位22の研削
面が瓦素地10の表面Mまたは裏面Nに対して直角とな
ればよい(図3を参照)。
Therefore, the center of gravity G of the tile substrate 10 is
0, it is necessary that the center of the contact portion 22 be located in the vertical direction of the center of gravity G in the self-standing state of the tile body 10, and the ground surface of the contact portion 22 is It may be perpendicular to the front surface M or the back surface N of 10 (see FIG. 3).

【0021】この実施の形態では、当接部位22に対す
る研削の具体的手段として、コンベアに設けられたベル
ト式の研削機(図示せず)が採用されており、研削機に
は無端状の研削ベルトが循環駆動できるように設けられ
ている。乾燥済みの瓦素地10がコンベア上を搬送さ
れ、研削機が搬送中の瓦素地10に対して接近し、瓦素
地10の当接部位22へ研削ベルトを押し付けて研削す
るものである。勿論、研削機は砥石が回転する研削機や
切削刃が移動する研削機など種類を問うものではない。
In this embodiment, a belt-type grinding machine (not shown) provided on a conveyor is used as a specific means for grinding the contact portion 22. The grinding machine has an endless grinding machine. The belt is provided so that it can be driven to circulate. The dried tile substrate 10 is conveyed on the conveyor, the grinding machine approaches the tile substrate 10 being transported, and the grinding belt is pressed against the contact portion 22 of the tile substrate 10 to perform grinding. Of course, the type of the grinder does not matter, such as a grinder in which a grindstone rotates and a grinder in which a cutting blade moves.

【0022】研削機により研削された瓦素地10は、焼
成用台車に搭載されるが、焼成用台車に設けられた棚板
24上に当接部位22を接地させ、瓦素地10の頭12
が上方に向かうように載置される。このとき、棚板24
と当接する瓦素地10の当接部位22は、瓦素地10の
表面Mあるいは裏面Nと直角に形成されているので、瓦
素地Wの重心Gが移動することがなく、重心Gの鉛直方
向に当接部位22の中心付近が位置することになり、瓦
素地10は安定した自立状態を保つことになる(図1お
よび図3を参照)。
The tile body 10 ground by the grinding machine is mounted on a firing cart. The contact portion 22 is grounded on a shelf 24 provided on the firing cart, and the head 12 of the tile base 10 is grounded.
Are placed upward. At this time, the shelf 24
The contact portion 22 of the tile body 10 that is in contact with the tile body 10 is formed at right angles to the front surface M or the back surface N of the tile body 10, so that the center of gravity G of the tile body W does not move, and The vicinity of the center of the contact portion 22 is located, and the tile body 10 maintains a stable self-standing state (see FIGS. 1 and 3).

【0023】そして、瓦素地10を搭載した焼成用台車
がトンネル式の焼成炉(図示せず)を通過することによ
り瓦素地10の焼成が行われるが、瓦素地10は安定し
た自立状態を保っているので、焼成用台車の移動の際の
振動や衝撃を受けて転倒するおそれがない。また、焼成
時の熱により瓦素地10に歪みが生じても、瓦素地10
は焼成に先立って安定した自立状態を保っているので、
焼成中に瓦素地10が転倒するおそれは少ない。
Then, the firing cart carrying the tile substrate 10 passes through a tunnel-type firing furnace (not shown), whereby the tile substrate 10 is fired. The tile substrate 10 maintains a stable self-standing state. As a result, there is no possibility of falling over due to vibrations and impacts during the movement of the firing cart. Further, even if the tile 10 is distorted due to heat during firing, the tile 10
Maintains a stable self-supporting state prior to firing,
The possibility that the tile body 10 falls over during firing is small.

【0024】なお、この実施の形態における瓦素地10
をF形粘土瓦の桟瓦としたが、J形粘土瓦、S形粘土瓦
およびこれらの役物瓦など、自立状態で焼成可能な瓦素
地であれば種類は限定されない
Note that the tile substrate 10 in this embodiment is
Is an F-type clay tile, but the type is not limited as long as it is a tile body that can be fired in a self-supporting state, such as a J-type clay tile, an S-type clay tile, and these accessory tiles.

【0025】次に瓦素地の当接部位を突状体とした実施
の形態について説明する。この実施の形態の瓦素地30
は、先の実施の形態と同様に、頭32、尻34、アンダ
ーラップ部36、オーバーラップ部38、引っ掛け部4
0を備えるF形粘土瓦の桟瓦である。この実施の形態で
は瓦素地30の尻34側の端面に突状体42が4個設け
られている(図5を参照)。この実施の形態において
は、先の実施の形態と異なり、突状体42が当接部位に
相当する。
Next, a description will be given of an embodiment in which the contact portion of the tile body is a projection. The tile substrate 30 of this embodiment
The head 32, buttocks 34, underlap portion 36, overlap portion 38, hook portion 4
It is an F-type clay tile with 0. In this embodiment, four protrusions 42 are provided on the end face of the tile base 30 on the side of the tail 34 (see FIG. 5). In this embodiment, unlike the previous embodiment, the projection 42 corresponds to the contact portion.

【0026】突状体42は瓦素地30に尻34側の端面
において、引っ掛け部40、40の先端付近にそれぞれ
設けられているほか、アンダーラップ部36の表面M寄
りに1個、オーバーラップ部38の表面M寄りに1個設
けられている。これらの突状体42は尻34側の端面よ
り1〜2mm程度突出するように設けられ、その形態は
略4角柱状である(図5を参照)。
The protrusions 42 are provided on the tile base 30 near the ends of the hooks 40 on the end face on the side of the tail 34, respectively. One of them is provided near the surface M of 38. These protrusions 42 are provided so as to protrude from the end face on the side of the tail 34 by about 1 to 2 mm, and have a substantially quadrangular prism shape (see FIG. 5).

【0027】そして、先の実施の形態と同様に、この瓦
素地30を成形した後乾燥させる。次に乾燥された瓦素
地30の当接部位である突状体42が研削される。この
とき、焼成時において安定した瓦素地30の自立状態を
保つため、研削された各突状体42が同一平面に当接す
るように、各突状体42の表面が平坦に研削される。研
削された瓦素地30は、先の実施の形態と同様に焼成用
台車に自立状態で搭載されて焼成される(図4および図
6を参照)。
Then, as in the previous embodiment, the tile body 30 is formed and dried. Next, the protruding body 42 which is the contact portion of the dried tile body 30 is ground. At this time, the surface of each protrusion 42 is ground flat so that the ground protrusions 42 abut on the same plane in order to maintain a stable self-standing state of the tile body 30 during firing. The ground tile body 30 that has been ground is mounted on a firing cart in a self-standing manner and fired as in the previous embodiment (see FIGS. 4 and 6).

【0028】このとき、瓦素地30の重心Gは、鉛直方
向へ向けて突状体42間のほぼ中心付近を通過する位置
にあるので、4個の突状体42により支持される瓦素地
30は安定した自立状態を保つことができる。
At this time, since the center of gravity G of the tile body 30 is located at a position passing substantially near the center between the projections 42 in the vertical direction, the tile foundation 30 supported by the four projections 42 is provided. Can maintain a stable independence state.

【0029】このように、この実施の形態では、瓦素地
30に設けられた4個の突状体42のみ研削すればよ
く、研削に必要な時間が短縮化できるので粘土瓦の製造
の生産性を低下させることがなく、また、研削による瓦
素地30の損傷が発生しない。さらに、研削機の装置の
小型化や研削機への負荷が軽減されるほか、研削による
粉塵を最小限に抑制することができ、作業環境への影響
は少ない。また、棚板24との接触面が極めて抑制され
るので、焼成の熱が瓦素地に対して均等に作用しやす
く、焼成時における瓦素地30の変形をより低減でき
る。
As described above, in this embodiment, only the four protrusions 42 provided on the tile body 30 need to be ground, and the time required for grinding can be shortened. And the tile substrate 30 is not damaged by grinding. Further, the size of the grinding machine can be reduced, the load on the grinding machine can be reduced, and the dust caused by grinding can be suppressed to a minimum. Further, since the contact surface with the shelf board 24 is extremely suppressed, the heat of firing easily acts evenly on the tile substrate, and the deformation of the tile substrate 30 during firing can be further reduced.

【0030】なお、この実施の形態において瓦素地30
に4個の突状体42を設けたが、瓦素地30の自立状態
を可能にするためには、突状体42の数について制限を
受けることはなく、また、突状体42の形態は尻34側
の端面から突出する形態であればよい。
In this embodiment, the tile substrate 30
Are provided with four protrusions 42, but in order to enable the tile foundation 30 to be self-supporting, the number of the protrusions 42 is not limited, and the form of the protrusions 42 is Any shape that protrudes from the end face on the side of the buttocks 34 may be used.

【0031】次に、別の形態の突状体54とした瓦素地
50を図7に示す。図7における瓦素地50の突状体5
4は、引っ掛け部52、52付近にそれぞれ設けられ、
その形態は略六角柱となっており、瓦素地50の焼成前
に突状体54、54が平坦に研削される。2個の突状体
54は倒立「ハ」字状に形成されているほか、先の実施
の形態に係る瓦素地30の突状体42よりも接触面が広
いので、より瓦素地50をより安定させて自立させるこ
とができる。
Next, FIG. 7 shows a tile body 50 in the form of a projection 54 of another form. Projection 5 of tile body 50 in FIG.
4 are provided near the hooks 52, 52, respectively.
The form is a substantially hexagonal column, and the protrusions 54 are ground flat before firing the tile body 50. The two protrusions 54 are formed in an inverted “C” shape and have a wider contact surface than the protrusions 42 of the tile body 30 according to the above embodiment, so that the tile body 50 can be It can stabilize and become independent.

【0032】次に、さらに別の形態の突状体64とした
瓦素地60を図8に示す。図8における瓦素地60の突
状体64は、瓦素地60の尻側の端面にほぼ倣った形態
であり、瓦素地60の焼成前に突状体64が平坦に研削
される。瓦素地60の尻側に端面に倣った突状体64と
することにより、突状体64を1個にすることができ
る。
Next, FIG. 8 shows a tile body 60 in the form of a projection 64 of still another form. The protrusion 64 of the tile body 60 in FIG. 8 has a form substantially following the end surface of the tile body 60 on the tail side, and the protrusion 64 is ground flat before firing the tile body 60. By forming the protruding body 64 following the end face on the tail side of the tile body 60, the number of the protruding bodies 64 can be reduced to one.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施の形態に係る瓦素地の自立状態を示す側面
図である。
FIG. 1 is a side view showing a self-supporting state of a tile body according to an embodiment.

【図2】実施の形態に係る瓦素地の斜視図である。FIG. 2 is a perspective view of the tile body according to the embodiment.

【図3】実施の形態に係る瓦素地の研削部分を示す拡大
図である。
FIG. 3 is an enlarged view showing a ground portion of the tile body according to the embodiment.

【図4】当接部位を突状体とする瓦素地の自立状態を示
す側面図である。
FIG. 4 is a side view showing a self-standing state of the tile body having a contact portion as a projection.

【図5】当接部位を突状体とする瓦素地の斜視図であ
る。
FIG. 5 is a perspective view of a tile body having a contact portion as a projecting body.

【図6】当接部位を突状体とする瓦素地の研削部分を示
す拡大図である。
FIG. 6 is an enlarged view showing a ground portion of a tile body having a contact portion as a projection.

【図7】別の形態にかかる突状体を示す瓦素地の斜視図
である。
FIG. 7 is a perspective view of a tile body showing a projection according to another embodiment.

【図8】さらに別の形態にかかる突状体を示す瓦素地の
斜視図である。
FIG. 8 is a perspective view of a tile body showing a projecting body according to still another embodiment.

【図9】従来例における自立状態の瓦素地を示す側面図
である。
FIG. 9 is a side view showing a self-standing tile body in a conventional example.

【符号の説明】[Explanation of symbols]

10 瓦素地 12 頭 14 尻 16 アンダーラップ部 18 オーバーラップ部 20 引っ掛け部 22 当接部位 24 棚板 30 瓦素地 32 頭 34 尻 36 アンダーラップ部 38 オーバーラップ部 40 引っ掛け部 42 突状体 50 瓦素地 52 引っ掛け部 54 突状体 60 瓦素地 62 引っ掛け部 64 突状体 G 重心 M 表面 N 裏面 S 当接部位 DESCRIPTION OF SYMBOLS 10 tile base 12 head 14 buttocks 16 underlap part 18 overlap part 20 hook part 22 contact part 24 shelf board 30 tile base 32 head 34 tail 36 underlap part 38 overlap part 40 hook part 42 projecting body 50 tile base 52 Hooked part 54 Projected body 60 tile body 62 Hooked part 64 Projected body G Center of gravity M Front surface N Back surface S Contact part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 成形された瓦素地を乾燥させた後、瓦素
地を自立状態で焼成する粘土瓦の製造方法において、 瓦素地が安定して自立するように、乾燥された瓦素地に
おける尻側の当接部位を平坦に研削し、 研削された当接部位を介して瓦素地を自立させ、自立状
態の瓦素地を焼成することを特徴とする粘土瓦の製造方
法。
1. A method for manufacturing a clay tile in which a formed tile body is dried and then fired in a self-supporting state, wherein the tile side of the dried tile body is stably and self-supporting. A method for producing a clay tile, characterized in that the contact portion is ground flat, the tile body is self-supported via the ground contact portion, and the self-standing tile body is fired.
【請求項2】 瓦素地の尻側の当接部位を突状体とする
請求項1記載の粘土瓦の製造方法。
2. The method for producing a clay tile according to claim 1, wherein the abutting portion on the tail side of the tile body is a projection.
JP11033838A 1999-02-12 1999-02-12 Production of clay tile Pending JP2000233963A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11033838A JP2000233963A (en) 1999-02-12 1999-02-12 Production of clay tile

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11033838A JP2000233963A (en) 1999-02-12 1999-02-12 Production of clay tile

Publications (1)

Publication Number Publication Date
JP2000233963A true JP2000233963A (en) 2000-08-29

Family

ID=12397641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11033838A Pending JP2000233963A (en) 1999-02-12 1999-02-12 Production of clay tile

Country Status (1)

Country Link
JP (1) JP2000233963A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002011713A (en) * 2000-06-27 2002-01-15 Takasago Ind Co Ltd Method for manufacturing flat plate tile and apparatus for adjusting end face of bottom part therefor
JP2002086436A (en) * 2000-09-14 2002-03-26 Tsuruya:Kk Equipment for grinding end face of base part for making plain plate tile stand by itself
JP2002254418A (en) * 2001-03-02 2002-09-11 Miyazono Seisakusho:Kk Method for manufacturing tile
JP2006044095A (en) * 2004-08-05 2006-02-16 Kato Kikai:Kk Grinding device of tail end face of tile basis material
DE102005045392A1 (en) * 2005-08-17 2007-02-22 Röben Tonbaustoffe GmbH Clay roof tiles suffer reduced damage during kiln firing by being stood upright on edge, unsecured, on carrying trays, with the tile planes parallel to the direction of movement through or into the kiln

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002011713A (en) * 2000-06-27 2002-01-15 Takasago Ind Co Ltd Method for manufacturing flat plate tile and apparatus for adjusting end face of bottom part therefor
JP2002086436A (en) * 2000-09-14 2002-03-26 Tsuruya:Kk Equipment for grinding end face of base part for making plain plate tile stand by itself
JP4576034B2 (en) * 2000-09-14 2010-11-04 株式会社鶴弥 Flat end tile grinding device for self-supporting flat roof tiles
JP2002254418A (en) * 2001-03-02 2002-09-11 Miyazono Seisakusho:Kk Method for manufacturing tile
JP2006044095A (en) * 2004-08-05 2006-02-16 Kato Kikai:Kk Grinding device of tail end face of tile basis material
JP4550517B2 (en) * 2004-08-05 2010-09-22 株式会社 加藤機械 Edge end grinding device for tile base
DE102005045392A1 (en) * 2005-08-17 2007-02-22 Röben Tonbaustoffe GmbH Clay roof tiles suffer reduced damage during kiln firing by being stood upright on edge, unsecured, on carrying trays, with the tile planes parallel to the direction of movement through or into the kiln

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