JP2000222960A - Material for insulating resin coating electrical contact and manufacture thereof - Google Patents
Material for insulating resin coating electrical contact and manufacture thereofInfo
- Publication number
- JP2000222960A JP2000222960A JP2312299A JP2312299A JP2000222960A JP 2000222960 A JP2000222960 A JP 2000222960A JP 2312299 A JP2312299 A JP 2312299A JP 2312299 A JP2312299 A JP 2312299A JP 2000222960 A JP2000222960 A JP 2000222960A
- Authority
- JP
- Japan
- Prior art keywords
- insulating resin
- electrical contact
- coated
- coating
- contact part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、耐環境性と加工性
に優れた電気接点用材料に関し、更に詳しくは電気接点
用材料の電気接点部の硫化クリープ(硫化腐食の表面成
長)による汚染を防止した、加工性に優れた絶縁樹脂コ
ーティングを施した電気接点用材料およびその製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material for electrical contacts excellent in environmental resistance and workability, and more particularly, to the prevention of contamination of electrical contacts of electrical contact materials by sulfide creep (surface growth of sulfide corrosion). BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material for an electrical contact, which is provided with an insulating resin coating excellent in processability, and a method for manufacturing the same.
【0002】[0002]
【従来の技術】銅合金条などの導電性帯条体上にAu、
Ag、Sn、Niなどの金属を層状に被覆した電気接点
用材料は、導電性帯条体の持つ高強度、高導電性に、S
nやAgなどの良好な耐食性、半田付性、電気接続性が
付加された高性能で低コストな導電材料であり、古くか
ら電気・電子機器の電気接点やリード部に広く用いられ
ている。2. Description of the Related Art Au, on a conductive strip such as a copper alloy strip,
The electrical contact material coated with a metal such as Ag, Sn, Ni or the like in a layered form has a high strength and a high conductivity that the conductive strip has,
It is a high-performance, low-cost conductive material to which good corrosion resistance such as n and Ag, solderability, and electrical connectivity are added, and has been widely used for electric contacts and leads of electric and electronic devices for a long time.
【0003】[0003]
【発明が解決しようとする課題】電気・電子機器は種々
の環境下で用いられるが、特に硫化環境下では電気接点
を構成する金属成分が接点部以外の箇所で硫化腐食し、
該硫化物が成長して電気接点部を汚染し、接点機能が低
下するという問題がある。この硫化クリープは特にAg
やCuの金属層に発生し易い。Electrical and electronic devices are used in various environments. Particularly in a sulfurized environment, metal components constituting electrical contacts are sulfided and corroded at locations other than the contact portions.
There is a problem that the sulfide grows and contaminates the electric contact portion, and the contact function is deteriorated. This sulfide creep is particularly Ag
Or a Cu metal layer.
【0004】即ち、電気接点部は、接点の開閉動作で清
浄化されるため、硫化クリープの発生源とはなり難い
が、接点部以外の箇所で硫化腐食が発生し、これが成長
して電気接点部が汚染されることがある。このような硫
化クリープに起因する汚染防止には、接点部を防錆処理
する方法、接点部を収容するスイッチケースの密閉度を
高める方法などが提案されているが、いずれも十分な効
果が得られていない。本発明は、硫化クリープに起因す
る接点部の汚染を防止した電気接点用材料およびその製
造方法の提供を目的とする。[0004] That is, since the electrical contact portion is cleaned by the opening and closing operation of the contact, it is unlikely to be a source of sulfide creep. However, sulfide corrosion occurs at portions other than the contact portion, and this grows and the electrical contact portion grows. Parts may be contaminated. In order to prevent contamination caused by such sulfide creep, a method of rust-proofing the contact portion and a method of increasing the degree of sealing of the switch case accommodating the contact portion have been proposed, but all have sufficient effects. Not been. SUMMARY OF THE INVENTION An object of the present invention is to provide a material for an electrical contact that prevents contamination of a contact portion caused by sulfide creep, and a method for manufacturing the same.
【0005】[0005]
【課題を解決するための手段】請求項1記載の発明は、
導電性帯条体上の少なくとも電気接点部とする箇所にA
u、Ag、Pd、Rh、Ru、Pt、Ni、Snの内の
1種、または前記金属の合金が層状に被覆された電気接
点用材料において、少なくとも前記電気接点部とする箇
所の周囲を含む非電気接点部に絶縁樹脂が5〜100μ
mの厚さに膜状にコーティングされていることを特徴と
する絶縁樹脂コーティング電気接点用材料である。According to the first aspect of the present invention,
At least a portion on the conductive strip that is to be an electrical contact portion is A
one of u, Ag, Pd, Rh, Ru, Pt, Ni, and Sn, or a material for an electric contact coated with a metal alloy in a layered form, including at least the periphery of a portion to be the electric contact portion Insulation resin is 5-100μ on non-electrical contact part
An insulating resin-coated electrical contact material characterized in that the material is coated in a film shape to a thickness of m.
【0006】請求項2記載の発明は、導電性帯条体上の
少なくとも電気接点部とする箇所にAu、Ag、Pd、
Rh、Ru、Pt、Ni、Snの内の1種、または前記
金属の合金を層状に被覆し、次いで少なくとも前記電気
接点部とする箇所の周囲を含む非電気接点部に絶縁樹脂
を5〜100μmの厚さに膜状にコーティングすること
を特徴とする絶縁樹脂コーティング電気接点用材料の製
造方法である。According to a second aspect of the present invention, Au, Ag, Pd,
One of Rh, Ru, Pt, Ni, and Sn or an alloy of the metal is coated in a layer, and then an insulating resin is applied to a non-electric contact portion including at least a portion around the electric contact portion in an amount of 5 to 100 μm. A method for producing a material for an electrical contact coated with an insulating resin, characterized in that the material is coated in the form of a film to a thickness.
【0007】請求項3記載の発明は、導電性帯条体上の
少なくとも電気接点部とする箇所の周囲を含む非電気接
点部に絶縁樹脂を5〜100μmの厚さに膜状にコーテ
ィングし、次いで前記電気接点部とする箇所にAu、A
g、Pd、Rh、Ru、Pt、Ni、Snの内の1種、
または前記金属の合金を層状に被覆することを特徴とす
る絶縁樹脂コーティング電気接点用材料の製造方法であ
る。According to a third aspect of the present invention, a non-electrical contact portion including at least a periphery of a portion to be an electric contact portion on the conductive strip is coated with an insulating resin to a film thickness of 5 to 100 μm, Then, Au, A
g, Pd, Rh, Ru, Pt, Ni, one of Sn,
Alternatively, there is provided a method for producing an insulating resin-coated electrical contact material, which comprises coating a metal alloy in a layered manner.
【0008】[0008]
【発明の実施の形態】本発明の電気接点用材料は、電気
接点部を汚染する、電気接点部近傍の硫化クリープの発
生を、導電性帯条体上の少なくとも電気接点部とする箇
所の周囲を含む非電気接点部に絶縁樹脂をコーティング
して防止したものである。ここでコーティング樹脂を絶
縁樹脂に限定する理由は、導電性樹脂を用いると導電性
帯条体との間で局部電池を形成して導電性帯条体が腐食
するためである。BEST MODE FOR CARRYING OUT THE INVENTION The electrical contact material according to the present invention reduces the occurrence of sulfide creep in the vicinity of the electrical contact portion, which contaminates the electrical contact portion, at least around the portion on the conductive strip which is to be the electrical contact portion. This is prevented by coating an insulating resin on the non-electric contact portions including the above. The reason why the coating resin is limited to the insulating resin is that when a conductive resin is used, a local battery is formed between the conductive resin and the conductive strip, and the conductive strip corrodes.
【0009】前記絶縁樹脂には、ポリイミド樹脂、エポ
キシ樹脂、フッ素樹脂、ウレタン樹脂、シリコン樹脂、
ビニル樹脂などが用いられる。本発明の電気接点用材料
は、皿ばねやブラシなどにプレス加工して使用すること
もある。このような用途では絶縁樹脂に硬質の皮膜を使
用すると皮膜が割れて導電性帯条体が露出することがあ
る。このため絶縁樹脂には軟質で加工性に富むエポキシ
樹脂やウレタン樹脂などが好ましい。The insulating resin includes a polyimide resin, an epoxy resin, a fluorine resin, a urethane resin, a silicon resin,
Vinyl resin or the like is used. The electric contact material of the present invention may be used after being pressed into a disc spring, a brush or the like. In such applications, when a hard film is used as the insulating resin, the film may be broken and the conductive strip may be exposed. For this reason, the insulating resin is preferably a soft and highly processable epoxy resin or urethane resin.
【0010】本発明において、絶縁樹脂のコーティング
厚さを5〜100μmに規定する理由は、5μm未満で
は絶縁樹脂皮膜にピンホールが生じて硫化クリープが十
分に防止されないため、100μmを超えると絶縁樹脂
皮膜の加工性が低下して皿ばねなどに加工する際に皮膜
に割れが発生し、耐食性向上効果が十分に得られなくな
り、また絶縁樹脂費用が嵩むためである。特に好ましい
絶縁樹脂皮膜の厚さは20〜50μmである。なお、耐
電圧が要求される用途には20μm以上の厚さが必要で
ある。In the present invention, the reason why the coating thickness of the insulating resin is specified to be 5 to 100 μm is that if the thickness is less than 5 μm, pinholes are formed in the insulating resin film and sulfide creep cannot be sufficiently prevented. This is because the workability of the film deteriorates and the film is cracked when processed into a disc spring or the like, whereby the effect of improving the corrosion resistance cannot be sufficiently obtained, and the cost of the insulating resin increases. A particularly preferred thickness of the insulating resin film is 20 to 50 μm. For applications requiring a withstand voltage, a thickness of 20 μm or more is required.
【0011】本発明において、絶縁樹脂のコーティング
には、絶縁樹脂フィルムを接着剤で貼付ける方法、溶剤
に溶かした絶縁樹脂をハケやスプレーで塗布し、これを
乾燥炉または紫外線照射により硬化させる方法などが用
いられる。特に後者の溶剤に溶かした絶縁樹脂を塗布す
る方法は、前者の絶縁樹脂フィルムを接着剤で貼付ける
方法に比べて、絶縁樹脂皮膜の接着強度が高い、曲面な
どへのコーティングが容易、接着剤を用いないため接着
剤が接点面に付着して電気接点特性に悪影響を及ぼした
りしないなどの利点を有する。In the present invention, the insulating resin is coated by a method of attaching an insulating resin film with an adhesive, a method of applying an insulating resin dissolved in a solvent with a brush or a spray, and curing the same by a drying oven or ultraviolet irradiation. Are used. In particular, the latter method of applying an insulating resin dissolved in a solvent, compared to the former method of applying an insulating resin film with an adhesive, has a higher adhesive strength of the insulating resin film, is easier to coat on a curved surface, and has an adhesive. Since the adhesive is not used, there is an advantage that the adhesive does not adhere to the contact surface and adversely affect the electrical contact characteristics.
【0012】本発明において、導電性帯条体には、C
u、Cu合金、Fe、Fe合金、Al、Al合金、Fe
合金やAl合金などにCuなどを被覆した複合材などが
適用できる。前記Cu合金にはリン青銅、黄銅、ベリリ
ウム銅、洋白など、Fe合金にはステンレス鋼、42ア
ロイなどが用いられる。In the present invention, the conductive strip has C
u, Cu alloy, Fe, Fe alloy, Al, Al alloy, Fe
A composite material in which an alloy or an Al alloy is coated with Cu or the like can be used. Phosphor bronze, brass, beryllium copper, nickel silver and the like are used for the Cu alloy, and stainless steel and 42 alloy are used for the Fe alloy.
【0013】本発明において、導電性帯条体上には、接
触抵抗の小さいAu、Ag、Pd、Rh、Ru、Pt、
Ni、Snの内の1種または前記金属の合金が層状に被
覆される。前記金属または合金は、電気めっき法、無電
解めっき法、溶融めっき法、クラッド法、PVD法など
の常法により被覆されるが、特に電気めっき法はコスト
的に有利である。In the present invention, Au, Ag, Pd, Rh, Ru, Pt, and the like having small contact resistance are formed on the conductive strip.
One of Ni and Sn or an alloy of the metal is coated in a layer. The metal or alloy is coated by a conventional method such as an electroplating method, an electroless plating method, a hot-dip plating method, a clad method, and a PVD method. The electroplating method is particularly advantageous in cost.
【0014】本発明の電気接点用材料は、例えば、広巾
の導電性帯条体の片面全体に、Au、Ag、Pd、R
h、Ru、Pt、Ni、Snの内の1種、または前記金
属の合金を電気めっきにより層状に被覆したのち、他面
に絶縁樹脂を5〜100μmの厚さにコーティングし、
その後、スリッターまたは裁断機により所望の寸法に切
断して効率良く生産することができる。The material for electrical contact of the present invention can be prepared, for example, by applying Au, Ag, Pd, R on one entire surface of a wide conductive strip.
one of h, Ru, Pt, Ni, Sn or an alloy of the metal is coated in a layer by electroplating, and the other surface is coated with an insulating resin to a thickness of 5 to 100 μm,
After that, it can be cut into desired dimensions by a slitter or a cutting machine to efficiently produce.
【0015】皿ばねやブラシなどの接点部品に加工して
から絶縁樹脂をコーティングする方法もあるが、絶縁樹
脂フィルムを接着剤で貼付ける方法では、平面でない部
分に貼付けるため作業性が悪くまた密着性に劣り、さら
に接点部が接着剤で汚染される恐れがある。一方、溶剤
に溶かした絶縁樹脂をハケやスプレーで塗布する方法で
は、樹脂が接点部に回り込んで接点部が汚染されるとい
う問題がある。従って、広巾の帯条体の段階で絶縁樹脂
をコーティングし、その後、所定寸法にスリット加工し
て所望の接点部品に加工する方が、接着剤による汚染や
樹脂の回り込みが回避され、作業性、密着性、生産性の
点で優れ、しかも低コストであり有利である。There is also a method of processing a contact part such as a disc spring or a brush and then coating the insulating resin, but the method of sticking the insulating resin film with an adhesive has poor workability because it is stuck to a non-planar part. Poor adhesion may result, and the contact portion may be contaminated with the adhesive. On the other hand, the method of applying an insulating resin dissolved in a solvent by brush or spray has a problem that the resin goes around the contact portion and contaminates the contact portion. Therefore, it is better to coat the insulating resin at the stage of the wide strip and then to slit it to a predetermined size and process it into a desired contact component, so that contamination by the adhesive and wraparound of the resin are avoided, workability, It is advantageous in terms of adhesion and productivity, and is low in cost and advantageous.
【0016】[0016]
【実施例】以下に本発明を実施例により詳細に説明す
る。 (実施例1)図1(イ)に示すように、厚さ0.5m
m、巾20mm、長さ200mmのリン青銅条1の片面
の電気接点部とする箇所(巾5mmの中央部分)3を残
す全面(図示しない他面も含む)に表1に示す絶縁樹脂
4を膜状にコーティングし、次に、図1(ロ)に示すよ
うに、電気接点部とする箇所3に表1に示す金属2を1
μm厚さに層状に電気めっきして電気接点用材料を製造
した。被覆金属と絶縁樹脂には種々の材料を用いた。絶
縁樹脂皮膜4の厚さは5〜100μmの範囲で種々に変
化させた。The present invention will be described below in detail with reference to examples. (Example 1) As shown in FIG.
The insulating resin 4 shown in Table 1 is applied to the entire surface (including the other surface (not shown)) of the phosphor bronze strip 1 having a width of 5 mm and a width of 200 mm and leaving a portion (central portion having a width of 5 mm) 3 on one surface thereof. Then, as shown in FIG. 1 (b), metal 2 shown in Table 1
The material for electrical contact was manufactured by electroplating in a layer to a thickness of μm. Various materials were used for the coating metal and the insulating resin. The thickness of the insulating resin film 4 was variously changed in the range of 5 to 100 μm.
【0017】(実施例2)図2(イ)に示すように、厚
さ0.5mm、巾20mm、長さ200mmのリン青銅
条1の片面全体に表1に示す金属(NiまたはSn)2
を1μm厚さに層状に電気めっきし、次に、図2(ロ)
に示すように、前記片面の電気接点部とする箇所(巾5
mmの中央部分)3を残す全面(図示しない他面も含
む)に絶縁樹脂(ポリイミド樹脂)4を5μmまたは2
0μmの厚さに膜状にコーティングして電気接点用材料
を製造した。(Example 2) As shown in FIG. 2A, a metal (Ni or Sn) 2 shown in Table 1 is applied to one entire surface of a phosphor bronze strip 1 having a thickness of 0.5 mm, a width of 20 mm and a length of 200 mm.
Is electroplated in a layer to a thickness of 1 μm, and then FIG.
As shown in the figure, a portion (width 5
(central part of mm) 3 is coated with an insulating resin (polyimide resin) 4 of 5 μm or 2 over the entire surface (including other surfaces not shown).
A material for electrical contact was manufactured by coating the film to a thickness of 0 μm.
【0018】(比較例1)表2に示す被覆金属層と絶縁
樹脂皮膜との組合わせ(絶縁樹脂皮膜をコーティングし
ない場合を含む)で、絶縁樹脂皮膜の厚さを3μmまた
は150μmとした他は、実施例1と同じ方法により電
気接点用材料を製造した。Comparative Example 1 A combination of the coated metal layer and the insulating resin film shown in Table 2 (including a case where the insulating resin film was not coated) was used, except that the thickness of the insulating resin film was 3 μm or 150 μm. An electrical contact material was manufactured in the same manner as in Example 1.
【0019】実施例1、2、および比較例1で得られた
各々の電気接点用材料を電気めっき面を外側にして内側
半径10mmの曲げ加工を行い、この曲げ加工材をサン
プルに用いて硫化腐食試験を行い、硫化腐食試験前後の
サンプルの電気接点面の接触抵抗を測定した。結果を表
1、2に示す。なお、硫化試験条件および接触抵抗の測
定方法は下記の通りである。 〔硫化試験条件〕雰囲気:H2 S3ppm、温度×時
間:40℃×48hr。 〔接触抵抗測定条件〕プローブ:頭部のRが5mmの純
Ag棒、荷重98mN〔10gf〕、電流:10mA。Each of the electrical contact materials obtained in Examples 1 and 2 and Comparative Example 1 was subjected to a bending process with an inner radius of 10 mm with the electroplated surface facing out, and this bent material was used as a sample for sulfidation. A corrosion test was performed, and the contact resistance of the electrical contact surface of the sample before and after the sulfide corrosion test was measured. The results are shown in Tables 1 and 2. The conditions for the sulfuration test and the method for measuring the contact resistance are as follows. [Sulfurization test conditions] Atmosphere: 3 ppm of H 2 S, temperature × time: 40 ° C. × 48 hours. [Contact resistance measurement conditions] Probe: Pure Ag rod with R of head 5 mm, load 98 mN [10 gf], current: 10 mA.
【0020】[0020]
【表1】 [Table 1]
【0021】[0021]
【表2】 [Table 2]
【0022】表1、2より明らかなように、本発明例の
No.1〜12はいずれも、硫化試験後における接触抵抗が低
かった。これは電気接点部以外の箇所に絶縁樹脂をコー
ティングしたために硫化クリープによる汚染が防止され
たためである。特にウレタン樹脂またはエポキシ樹脂を
コーティングしたもの(No.3,5)はコーティング樹脂が軟
質で曲げ加工性に優れるため、コーティング厚さが同じ
他の樹脂(No.7,8,10) と比較して硫化腐食試験後の接触
抵抗が著しく小さい。これに対し、比較例のNo.13 は絶
縁樹脂皮膜をコーティングしなかったため、No.14 は絶
縁樹脂皮膜が薄かったため、No.15 は絶縁樹脂皮膜が厚
過ぎて電気接点用材料を接点部品にプレス加工する際に
絶縁樹脂皮膜に割れが入り導電性帯条体が一部露出した
ため、いずれも、硫化試験で電気接点部の周囲に硫化ク
リープが発生し、これに電気接点部が汚染されて接触抵
抗が高くなった。As is clear from Tables 1 and 2,
No. 1 to 12 all had low contact resistance after the sulfurization test. This is because contamination by sulfide creep was prevented because insulating resin was coated on portions other than the electrical contact portions. Particularly, those coated with urethane resin or epoxy resin (No.3, 5) are softer and have superior bending workability, so compared with other resins with the same coating thickness (No.7,8,10). The contact resistance after the sulfide corrosion test is extremely low. In contrast, No. 13 of the comparative example did not have an insulating resin film coated, and No. 14 had a too thin insulating resin film. During the pressing process, the insulating resin film was cracked and the conductive strip was partially exposed, and in each case, the sulfuration test produced sulfide creep around the electrical contacts, contaminating the electrical contacts. Contact resistance increased.
【0023】前記実施例では、絶縁樹脂皮膜を他面にも
コーティングしたが、用途に応じて他面をマスクして片
面にのみコーティングしても差支えない。In the above embodiment, the other surface is coated with the insulating resin film. However, the other surface may be masked and coated on only one surface according to the application.
【0024】[0024]
【発明の効果】以上に述べたように、本発明の電気接点
用材料は、導電性帯条体上の少なくとも電気接点部とす
る箇所にSnなどが被覆された電気接点用材料におい
て、少なくとも前記電気接点部とする箇所の周囲を含む
非電気接点部に絶縁樹脂が所定厚さコーティングされて
いるので、電気接点部とする箇所の近傍に硫化クリープ
が発生せず、従って硫化クリープによる電気接点部の汚
染が防止されて良好な接点特性が安定して得られる。ま
た、前記電気接点用材料は導電性帯条体上に金属または
合金を被覆する工程と絶縁樹脂をコーティングする工程
を施すことにより容易に製造できる。依って、工業上顕
著な効果を奏する。As described above, the electrical contact material according to the present invention is characterized in that at least a portion of the conductive strip on which the electrical contact portion is formed is coated with Sn or the like. Since the insulating resin is coated to a predetermined thickness on the non-electric contact portions including the periphery of the electrical contact portion, no sulfide creep occurs near the electrical contact portion, and therefore, the electrical contact portion due to the sulfide creep is generated. , And good contact characteristics can be stably obtained. In addition, the electrical contact material can be easily manufactured by performing a step of coating a conductive strip with a metal or an alloy and a step of coating an insulating resin. Therefore, an industrially remarkable effect is achieved.
【図1】(イ)(ロ)は、本発明の電気接点用材料の製
造方法の第1の実施形態を示す工程説明図である。FIGS. 1A and 1B are process explanatory views showing a first embodiment of a method for producing an electrical contact material of the present invention.
【図2】(イ)(ロ)は、本発明の電気接点用材料の製
造方法の第2の実施形態を示す工程説明図である。FIGS. 2A and 2B are process explanatory views showing a second embodiment of the method for producing an electrical contact material of the present invention.
1 リン青銅条(導電性帯条体) 2 被覆金属 3 電気接点部とする箇所 4 絶縁樹脂 DESCRIPTION OF SYMBOLS 1 Phosphor bronze strip (conductive strip) 2 Coated metal 3 Location to be an electrical contact part 4 Insulating resin
Claims (3)
とする箇所にAu、Ag、Pd、Rh、Ru、Pt、N
i、Snの内の1種、または前記金属の合金が層状に被
覆された電気接点用材料において、少なくとも前記電気
接点部とする箇所の周囲を含む非電気接点部に絶縁樹脂
が5〜100μmの厚さに膜状にコーティングされてい
ることを特徴とする絶縁樹脂コーティング電気接点用材
料。At least a portion to be an electrical contact portion on a conductive strip is made of Au, Ag, Pd, Rh, Ru, Pt, and N.
One or more of i and Sn, or an electrical contact material coated with a layer of the metal alloy, wherein the insulating resin has a thickness of 5 to 100 μm at a non-electrical contact portion including at least a periphery of a portion to be the electrical contact portion. An insulating resin-coated electrical contact material characterized by being coated in a film-like thickness.
とする箇所にAu、Ag、Pd、Rh、Ru、Pt、N
i、Snの内の1種、または前記金属の合金を層状に被
覆し、次いで少なくとも前記電気接点部とする箇所の周
囲を含む非電気接点部に絶縁樹脂を5〜100μmの厚
さに膜状にコーティングすることを特徴とする絶縁樹脂
コーティング電気接点用材料の製造方法。2. A method according to claim 1, wherein at least a portion of the conductive strip which is to be an electrical contact portion is Au, Ag, Pd, Rh, Ru, Pt, or N.
i, Sn, or an alloy of the metal is coated in a layer, and then an insulating resin is formed into a film having a thickness of 5 to 100 μm on a non-electric contact part including at least a periphery of a part to be the electric contact part. A method for producing a material for an electrical contact coated with an insulating resin, characterized by coating the material.
とする箇所の周囲を含む非電気接点部に絶縁樹脂を5〜
100μmの厚さに膜状にコーティングし、次いで前記
電気接点部とする箇所にAu、Ag、Pd、Rh、R
u、Pt、Ni、Snの内の1種、または前記金属の合
金を層状に被覆することを特徴とする絶縁樹脂コーティ
ング電気接点用材料の製造方法。3. An insulating resin is applied to a non-electrical contact portion including at least a portion around an electric contact portion on the conductive strip.
A film having a thickness of 100 μm is coated in the form of a film, and then Au, Ag, Pd, Rh, R
A method for producing an insulating resin-coated electrical contact material, comprising coating one of u, Pt, Ni, and Sn or an alloy of the metal in a layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2312299A JP2000222960A (en) | 1999-01-29 | 1999-01-29 | Material for insulating resin coating electrical contact and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2312299A JP2000222960A (en) | 1999-01-29 | 1999-01-29 | Material for insulating resin coating electrical contact and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000222960A true JP2000222960A (en) | 2000-08-11 |
Family
ID=12101712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2312299A Pending JP2000222960A (en) | 1999-01-29 | 1999-01-29 | Material for insulating resin coating electrical contact and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000222960A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100758013B1 (en) | 2006-01-06 | 2007-09-11 | 한양대학교 산학협력단 | Electric contact and processing method of the same |
-
1999
- 1999-01-29 JP JP2312299A patent/JP2000222960A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100758013B1 (en) | 2006-01-06 | 2007-09-11 | 한양대학교 산학협력단 | Electric contact and processing method of the same |
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