JP2000216536A - Manufacture of laminate board with inner layer circuits - Google Patents

Manufacture of laminate board with inner layer circuits

Info

Publication number
JP2000216536A
JP2000216536A JP11016090A JP1609099A JP2000216536A JP 2000216536 A JP2000216536 A JP 2000216536A JP 11016090 A JP11016090 A JP 11016090A JP 1609099 A JP1609099 A JP 1609099A JP 2000216536 A JP2000216536 A JP 2000216536A
Authority
JP
Japan
Prior art keywords
circuit
substrate
copper
thermosetting resin
inner layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11016090A
Other languages
Japanese (ja)
Inventor
Shuji Kitagawa
修次 北川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP11016090A priority Critical patent/JP2000216536A/en
Publication of JP2000216536A publication Critical patent/JP2000216536A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the CCD recognition by heating and holding a substrate over a specified substrate surface temp. for several seconds or more and adhering a Cu circuit with a thermosetting resin. SOLUTION: A Cu circuit on the surface of a substrate is treated with an acid water soln. contg. carboxylic acid, Cu ions and a Cu ion chelating agent to rough the Cu circuit surface, the rough-surfaced Cu circuit is washed with water, the substrate is heated and the substrate surface temp. held at 110 deg.C or higher for 5 sec or more, the Cu circuit is adhered with a thermosetting resin such as epoxy resins, phenol resins, polyimide resins, unsat. polyester resins and polyphenylene ether resins to produce. Thus it is possible to obtain an inner-circuit-contg. laminate board superior in acid resistance and solder heat resistance.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、多層プリント配線
板の製造に使用される内層回路入り積層板の、製造方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a laminated board containing an inner circuit used for manufacturing a multilayer printed wiring board.

【0002】[0002]

【従来の技術】電気・電子機器等に使用される多層のプ
リント配線板は、内層用基板の表面の銅箔をエッチング
して銅回路を形成した後、その銅回路に接着強度を高め
るために表面処理を行い、次いでその内層用基板と、熱
硬化性樹脂をガラスクロスに含浸して製造したプリプレ
グを積層し、更にその積層物の外側に銅箔を積層した
後、加熱・加圧成形して内層回路入り積層板を作製す
る。次いで、この内層回路入り積層板に穴あけをした
後、メッキ処理を行ってこの穴に内層の銅回路及び外層
の銅箔を導通するスルホールメッキ皮膜を形成し、次い
で、外層の銅箔をエッチングして外層回路を形成した
後、電子部品と接続を予定する外層回路以外の部分の積
層板表面に、ハンダが付着しないようにソルダーレジス
ト皮膜を形成することにより製造されている。
2. Description of the Related Art A multilayer printed wiring board used for electric and electronic equipment is used to form a copper circuit by etching a copper foil on the surface of an inner layer substrate and then increase the adhesive strength to the copper circuit. Perform surface treatment, then laminate the substrate for the inner layer and the prepreg manufactured by impregnating the glass cloth with the thermosetting resin, further laminate copper foil on the outside of the laminate, heat and pressure mold To produce a laminated board with an inner circuit. Next, after drilling a hole in the inner layer circuit-containing laminate, a plating process is performed to form a through-hole plating film for conducting the inner layer copper circuit and the outer layer copper foil in the hole, and then the outer layer copper foil is etched. After forming an outer layer circuit by soldering, a solder resist film is formed on the surface of the laminated board other than the outer layer circuit to be connected to the electronic component so that solder does not adhere.

【0003】内層用基板の表面の銅回路に施す表面処理
は、黒化処理と呼ばれる化学的酸化処理が一般に行われ
ている。しかし、この黒化処理を行った内層回路入り積
層板を用いた場合、メッキ工程で用いられているメッキ
液等の酸が、穴の周囲の処理皮膜を溶かし、黒色がピン
ク色に変色し、得られるプリント配線板に、ハローイン
グと呼ばれる現象が発生する場合があるという問題があ
った。
As a surface treatment applied to a copper circuit on the surface of the inner layer substrate, a chemical oxidation treatment called a blackening treatment is generally performed. However, when using the laminated board with the inner layer circuit that has been subjected to this blackening treatment, the acid such as the plating solution used in the plating process dissolves the treatment film around the hole, and the black color changes to pink, There is a problem that a phenomenon called haloing may occur in the obtained printed wiring board.

【0004】そのため、酸化処理を行わずに、酸、過酸
化水素及び銅イオンを含有する液で銅箔を粗化する方法
や、酸化処理を行わずに、酸、銅イオン及び銅イオンの
キレート剤を含有する液で銅箔を粗化する方法等によ
り、ハローイングの発生を抑えながら、適度な接着強度
を呈させる表面処理方法が検討されている(例えば、特
開平10−335815号)。
[0004] Therefore, a method of roughening a copper foil with a solution containing an acid, hydrogen peroxide and copper ions without performing an oxidation treatment, or a method of chelating acid, copper ions and copper ions without performing an oxidation treatment. A surface treatment method for giving a proper adhesive strength while suppressing the occurrence of haloing by a method of roughening a copper foil with a solution containing an agent or the like has been studied (for example, Japanese Patent Application Laid-Open No. 10-335815).

【0005】しかし、このような銅イオンを含有する液
で粗化処理した場合、得られた内層回路入り積層板のハ
ンダ耐熱性が低下する場合があるという問題があり、改
良の余地があった。そのため、酸化処理を行わなくて
も、耐酸性が優れると共に、ハンダ耐熱性が優れた内層
回路入り積層板が得られる製造方法が求められている。
[0005] However, when roughening treatment is performed with such a solution containing copper ions, there is a problem that the solder heat resistance of the obtained laminated board with an inner layer circuit may be reduced, and there is room for improvement. . Therefore, there is a demand for a manufacturing method that can provide a laminated board with an inner layer circuit having excellent acid resistance and excellent solder heat resistance without performing an oxidation treatment.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するために成されたもので、その目的とするとこ
ろは、基板の表面に形成された銅回路を、銅イオンを含
有する酸性水溶液で処理して銅回路の表面を粗化した
後、その粗化した銅回路と熱硬化性樹脂を接着して製造
する内層回路入り積層板の製造方法であって、耐酸性が
優れると共に、ハンダ耐熱性が優れた内層回路入り積層
板が得られる製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to make a copper circuit formed on the surface of a substrate contain copper ions. After the surface of the copper circuit is roughened by treating with an acidic aqueous solution, a method of manufacturing a laminated board containing an inner layer circuit manufactured by bonding the roughened copper circuit and a thermosetting resin, and having excellent acid resistance. Another object of the present invention is to provide a manufacturing method capable of obtaining a laminate having an inner circuit having excellent solder heat resistance.

【0007】[0007]

【課題を解決するための手段】本発明に係る内層回路入
り積層板の製造方法は、基板の表面に形成された銅回路
を、銅イオンを含有する酸性水溶液で処理して銅回路の
表面を粗化した後、その粗化した銅回路と熱硬化性樹脂
を接着して製造する内層回路入り積層板の製造方法にお
いて、粗化した銅回路と熱硬化性樹脂を接着する方法
が、酸性水溶液で処理して銅回路の表面を粗化した後、
その粗化した銅回路の表面を水洗し、次いで、基板を加
熱して、基板の表面温度が110℃以上の状態を5秒以
上保持した後、銅回路と熱硬化性樹脂を接着する方法で
あることを特徴とする。
According to the present invention, there is provided a method of manufacturing a laminated board having an inner layer circuit, wherein a copper circuit formed on a surface of a substrate is treated with an acidic aqueous solution containing copper ions to form a surface of the copper circuit. After the roughening, the method of bonding the roughened copper circuit and the thermosetting resin is performed by bonding the roughened copper circuit and the thermosetting resin. After roughening the surface of the copper circuit by
The surface of the roughened copper circuit is rinsed with water, and then the substrate is heated. After maintaining the surface temperature of the substrate at 110 ° C. or higher for 5 seconds or longer, the copper circuit is bonded to the thermosetting resin. There is a feature.

【0008】上記基板を加熱する方法は、基板の表面に
赤外線を照射する方法であると好ましく、上記銅回路と
接着する熱硬化性樹脂は、ガラスクロスに含浸された熱
硬化性樹脂であると好ましい。
[0008] The method of heating the substrate is preferably a method of irradiating the surface of the substrate with infrared rays, and the thermosetting resin adhered to the copper circuit is a thermosetting resin impregnated in glass cloth. preferable.

【0009】[0009]

【発明の実施の形態】本発明に係る内層回路入り積層板
の製造方法は、内層用基板の表面に形成された銅回路
を、銅イオンを含有する酸性水溶液で処理して銅回路の
表面を粗化した後、その粗化した銅回路と熱硬化性樹脂
を接着して製造する内層回路入り積層板の製造方法であ
る。
BEST MODE FOR CARRYING OUT THE INVENTION In the method for manufacturing a laminated board with an inner layer circuit according to the present invention, a copper circuit formed on the surface of an inner layer substrate is treated with an acidic aqueous solution containing copper ions to form a surface of the copper circuit. This is a method for manufacturing a laminated board with an inner circuit, which is manufactured by bonding a roughened copper circuit and a thermosetting resin after roughening.

【0010】本発明で用いる酸性水溶液は、酸と、銅イ
オンを少なくとも含有する酸性水溶液であり、例えば、
カルボン酸及び銅イオンを含有する液や、カルボン酸、
銅イオン及び銅イオンのキレート剤を含有する液や、硫
酸、過酸化水素及び銅イオンを含有する液等の、銅をエ
ッチングして銅回路の表面を粗化可能な酸性の水溶液で
ある。この酸性の水溶液に銅イオンを含有していると、
エッチング量が安定するため、基板の面内位置による粗
化の程度の差が小さくなる。
The acidic aqueous solution used in the present invention is an acidic aqueous solution containing at least an acid and copper ions.
Liquid containing carboxylic acid and copper ions, carboxylic acid,
An acidic aqueous solution such as a solution containing copper ions and a chelating agent for copper ions and a solution containing sulfuric acid, hydrogen peroxide and copper ions, which can etch copper to roughen the surface of a copper circuit. If this acidic aqueous solution contains copper ions,
Since the etching amount is stable, the difference in the degree of roughening depending on the in-plane position of the substrate is reduced.

【0011】なお、この酸性水溶液に、ギ酸や酢酸等の
炭素数1〜5のカルボン酸を含有すると、粗化する反応
性が優れるため、処理時間を短くすることができ好まし
い。また、この酸性水溶液に、銅イオンのキレート剤を
含有すると、基板の面内位置による粗化の程度の差が小
さくなり好ましい。これは、キレート剤が介在すること
により、銅回路の表面の銅が溶解しやすくなり、粗化が
均一に進むと考えられる。このキレート剤としては、例
えばエチレンジアミン四酢酸、シクロヘキサンジアミン
四酢酸、1,10−フェナントロリン、8−ヒドロキシ
キノリン等が挙げられる。
It is preferable that the acidic aqueous solution contains a carboxylic acid having 1 to 5 carbon atoms, such as formic acid or acetic acid, because the reactivity for roughening is excellent and the processing time can be shortened. Further, it is preferable that the acidic aqueous solution contains a chelating agent for copper ions, because the difference in the degree of roughening depending on the in-plane position of the substrate becomes small. This is thought to be because the presence of the chelating agent facilitates the dissolution of copper on the surface of the copper circuit, and the roughening proceeds uniformly. Examples of the chelating agent include ethylenediaminetetraacetic acid, cyclohexanediaminetetraacetic acid, 1,10-phenanthroline, 8-hydroxyquinoline and the like.

【0012】カルボン酸及び銅イオンを含有する酸性水
溶液を用いて銅回路の表面を粗化する場合、カルボン酸
の濃度は、一般には10〜100グラム/リットル(以
下、g/Lと記す)であることが望ましく、銅イオンの
濃度は15〜25g/Lであることが望ましい。また、
pHは、4以下であることが望ましく、処理時の液温
は、30〜45℃程度が望ましい。
When the surface of a copper circuit is roughened using an acidic aqueous solution containing a carboxylic acid and copper ions, the concentration of the carboxylic acid is generally from 10 to 100 g / L (hereinafter referred to as g / L). Desirably, the concentration of copper ions is desirably 15 to 25 g / L. Also,
The pH is desirably 4 or less, and the liquid temperature during the treatment is desirably about 30 to 45 ° C.

【0013】また、カルボン酸、銅イオン及び銅イオン
のキレート剤を含有する酸性水溶液を用いて銅回路の表
面を粗化する場合、カルボン酸の濃度は、一般には10
〜100g/Lであることが望ましく、銅イオンの濃度
は15〜25g/Lであることが望ましく、銅イオンの
キレート剤の濃度は、0.1〜10g/Lであることが
望ましい。また、pHは、4以下であることが望まし
く、処理時の液温は、30〜45℃が望ましい。
When the surface of a copper circuit is roughened using an acidic aqueous solution containing carboxylic acid, copper ions and a chelating agent for copper ions, the concentration of the carboxylic acid is generally 10%.
The concentration of copper ions is preferably 15 to 25 g / L, and the concentration of the chelating agent for copper ions is desirably 0.1 to 10 g / L. Further, the pH is desirably 4 or less, and the liquid temperature during the treatment is desirably 30 to 45 ° C.

【0014】また、硫酸、過酸化水素及び銅イオンを含
有する酸性水溶液を用いて銅回路の表面を粗化する場
合、硫酸の濃度は、一般には30〜150g/Lである
ことが望ましく、過酸化水素の濃度は、一般には5〜5
0g/Lであることが望ましく、銅イオンの濃度は、5
〜30g/Lであることが望ましく、処理時の液温は、
25〜45℃が望ましい。
When the surface of a copper circuit is roughened using an acidic aqueous solution containing sulfuric acid, hydrogen peroxide and copper ions, the concentration of sulfuric acid is generally desirably 30 to 150 g / L. The concentration of hydrogen oxide is generally 5 to 5
0 g / L, and the concentration of copper ions is 5 g / L.
3030 g / L, and the liquid temperature during the treatment is
25-45 ° C is desirable.

【0015】酸性水溶液を用いて処理する時間は、酸性
水溶液の組成、温度等に応じて適宜決められるが、銅回
路の表面の粗度が、2〜6μmとなる条件で処理を行う
と好ましい。2μm以下の場合は、得られる積層板の接
着性が低下する場合があり、6μmを越えると、銅回路
の厚みが薄くなって電気信頼性が低下する場合がある。
この銅回路を酸性水溶液で処理する方法としては、銅回
路に酸性水溶液をスプレーする方法や、銅回路を酸性水
溶液に浸漬する方法等が挙げられる。
The treatment time using the acidic aqueous solution is appropriately determined according to the composition and temperature of the acidic aqueous solution, but it is preferable to perform the treatment under the condition that the surface roughness of the copper circuit is 2 to 6 μm. When the thickness is less than 2 μm, the adhesiveness of the obtained laminate may decrease. When the thickness exceeds 6 μm, the thickness of the copper circuit may be reduced and the electrical reliability may decrease.
Examples of the method of treating the copper circuit with an acidic aqueous solution include a method of spraying the copper circuit with an acidic aqueous solution and a method of immersing the copper circuit in an acidic aqueous solution.

【0016】なお、酸性水溶液には、湿潤剤や防錆剤等
を含有していてもよい。また、酸性水溶液で処理する前
に必要に応じて、銅回路の表面を機械的な研磨又は過硫
酸アンモニウムのような化学的な研磨を行い洗浄した
後、酸性水溶液で処理を行ってもよい。
The acidic aqueous solution may contain a humectant, a rust inhibitor and the like. Before the treatment with the acidic aqueous solution, if necessary, the surface of the copper circuit may be washed by mechanical polishing or chemical polishing such as ammonium persulfate, and then the treatment may be performed with the acidic aqueous solution.

【0017】次いで、酸性水溶液で処理して粗化した銅
回路を、水洗して表面に付着している酸性水溶液を除去
した後、基板を加熱して水分を乾燥させ、次いで、銅回
路と熱硬化性樹脂を接着して、内層回路入り積層板を製
造する。
Next, the copper circuit roughened by the treatment with the acidic aqueous solution is washed with water to remove the acidic aqueous solution adhering to the surface, and then the substrate is heated to dry the moisture. A laminated board with an inner layer circuit is manufactured by bonding a curable resin.

【0018】なお、基板を加熱する方法が、基板の表面
温度が110℃以上の温度となる状態を5秒以上保持す
るように加熱することが重要である。この加熱によっ
て、酸性水溶液で処理したときに基板に吸収した水分が
乾燥され、得られる内層回路入り積層板は、ハンダ耐熱
性が優れた内層回路入り積層板となる。なお、110℃
以上の温度となる状態が5秒未満の場合や、基板の表面
温度が110℃に到達しない場合には、除湿が不足し
て、得られる内層回路入り積層板のハンダ耐熱性が低く
なる。
It is important that the substrate is heated so that the surface temperature of the substrate is kept at 110 ° C. or more for 5 seconds or more. By this heating, the moisture absorbed by the substrate when treated with the acidic aqueous solution is dried, and the resulting laminated board with an inner layer circuit becomes a laminated board with an inner layer circuit having excellent solder heat resistance. In addition, 110 ° C
If the above temperature is less than 5 seconds or if the surface temperature of the substrate does not reach 110 ° C., the dehumidification is insufficient, and the solder heat resistance of the obtained laminated board with an inner layer circuit is reduced.

【0019】なお、この基板の表面温度は、銅回路の表
面部分で測定した温度であり、また、基板の面内位置に
より110℃以上の温度の保持時間が異なる場合は、最
も短い位置においても5秒以上保持するように加熱す
る。また、この基板の表面温度が110℃以上の温度と
なる状態の上限時間は、特に限定するものではないが、
10分以下が経済的である。
The surface temperature of the substrate is a temperature measured at the surface of the copper circuit. If the holding time at a temperature of 110 ° C. or more differs depending on the in-plane position of the substrate, even at the shortest position. Heat to hold for more than 5 seconds. Further, the upper limit time of the state in which the surface temperature of the substrate becomes 110 ° C. or more is not particularly limited,
Less than 10 minutes is economical.

【0020】この加熱処理する方法としては、基板の表
面温度が110℃以上に到達可能な方法であれば特に限
定するものではなく、基板の表面に温風を吹き付ける方
法や、基板の表面に赤外線を照射する方法等が挙げられ
る。なお、基板の表面に赤外線を照射する方法の場合、
基板の表面温度を、容易に110℃以上に到達可能であ
り好ましい。
The method of the heat treatment is not particularly limited as long as the surface temperature of the substrate can reach 110 ° C. or higher, and a method of blowing hot air onto the surface of the substrate, an infrared ray on the surface of the substrate, And the like. In the case of the method of irradiating the surface of the substrate with infrared rays,
It is preferable because the surface temperature of the substrate can easily reach 110 ° C. or higher.

【0021】なお、本発明に用いる熱硬化性樹脂として
は、エポキシ樹脂系、フェノール樹脂系、ポリイミド樹
脂系、不飽和ポリエステル樹脂系、ポリフェニレンエー
テル樹脂系等の単独、変性物、混合物のように、熱硬化
性樹脂全般を用いることができる。
The thermosetting resin used in the present invention may be an epoxy resin, a phenol resin, a polyimide resin, an unsaturated polyester resin, a polyphenylene ether resin, etc., alone, modified, or a mixture. All thermosetting resins can be used.

【0022】なお熱硬化性樹脂が、ガラスクロス等の基
材に熱硬化性樹脂を含浸して製造した、一般にプリプレ
グと呼ばれる樹脂含浸基材に含浸された熱硬化性樹脂の
場合、接着性及び耐酸性の向上する効果が大きく好まし
いが、プリプレグに用いられた熱硬化性樹脂のみに限定
するものではなく、内層用基板の表面に基材なしの熱硬
化性樹脂層を介して金属箔を接着して製造する、一般に
ビルドアップ法と呼ばれる方法に用いる樹脂層形成用の
熱硬化性樹脂や、ソルダーレジスト皮膜形成用の熱硬化
性樹脂でもよい。
In the case where the thermosetting resin is a thermosetting resin impregnated into a resin-impregnated base material generally called a prepreg, which is produced by impregnating a base material such as glass cloth with the thermosetting resin, the adhesive property and the The effect of improving the acid resistance is large and preferable, but it is not limited to the thermosetting resin used for the prepreg, and the metal foil is bonded to the surface of the inner layer substrate via the thermosetting resin layer without the base material. A thermosetting resin for forming a resin layer or a thermosetting resin for forming a solder resist film used in a method generally called a build-up method may be used.

【0023】本発明に用いる内層用の基板としては、上
記熱硬化性樹脂の硬化のための加熱処理等に耐える材料
を用いて、片面又は両面に銅回路が形成されている板で
あればよく、例えば、上記熱硬化性樹脂のシートの片面
又は両面に銅箔が張られている板や、ガラス等の無機質
繊維やポリイミド等の有機質繊維のクロス、ペーパー等
の基材を、上記熱硬化性樹脂で接着し、片面又は両面に
銅箔が張られている板等を用いて、銅箔をエッチングし
て回路を形成したものや、銅箔が張られていない板の表
面に銅メッキを行い、銅の回路を形成したもの等が挙げ
られる。
The substrate for the inner layer used in the present invention may be a plate having a copper circuit formed on one or both sides using a material that can withstand heat treatment for curing the thermosetting resin. For example, the above-mentioned thermosetting resin sheet is a plate in which copper foil is stretched on one or both sides, a cloth of inorganic fibers such as glass or an organic fiber such as polyimide, a substrate such as paper, and the above-mentioned thermosetting resin. Adhering with resin, using a board or the like with copper foil on one or both sides, etching the copper foil to form a circuit, or performing copper plating on the surface of the board without copper foil And those formed with a copper circuit.

【0024】[0024]

【実施例】(実施例1)大きさ50×50cm、銅箔を
除く厚み0.8mmのガラス基材エポキシ樹脂両面銅張
り積層板[松下電工株式会社製、商品名 R−176
6]の銅箔(厚み35μm)をエッチングして、直径
1.5mmのランドパターン複数と、大きさ30×10
0mmの銅箔が残るパターンを形成した内層用基板を得
た。
(Example 1) A glass-based epoxy resin double-sided copper-clad laminate having a size of 50 × 50 cm and a thickness of 0.8 mm excluding copper foil [trade name: R-176, manufactured by Matsushita Electric Works, Ltd.]
6] is etched to form a plurality of land patterns having a diameter of 1.5 mm and a size of 30 × 10
An inner layer substrate having a pattern in which 0 mm copper foil remains was obtained.

【0025】また、炭素数1〜5のカルボン酸と銅イオ
ンのキレート剤を含有する酸性水溶液として、メック株
式会社製処理液[商品名 CZ8100]を用いて、水
酸化銅を溶解させることにより銅イオンを15g/L含
有する、pH3.5の酸性水溶液を建浴した。なお、銅
イオン濃度は、酸性水溶液をサンプリングして、EDT
A(エチレンジアミン四酢酸)規定液を用いて滴定する
ことにより測定した。
Also, as an acidic aqueous solution containing a carboxylic acid having 1 to 5 carbon atoms and a chelating agent for copper ions, a copper hydroxide is dissolved by using a treatment liquid [trade name: CZ8100] manufactured by Mec Co., Ltd. An acidic aqueous solution having a pH of 3.5 and containing 15 g / L of the ions was bathed. The copper ion concentration was determined by sampling an acidic aqueous solution,
It measured by titrating using A (ethylenediaminetetraacetic acid) normal liquid.

【0026】そして、38℃に温度制御した酸性水溶液
を銅回路にスプレーすることにより、銅回路と酸性水溶
液を165秒間接触させて、銅回路の表面を粗化した。
次いで、水洗して表面に付着している酸性水溶液を除去
した後、基板の表面に熱風を吹き付けて、基板の表面温
度が110℃以上の状態を5秒保持するように加熱し
た。
Then, the copper circuit was contacted with the acidic aqueous solution for 165 seconds by spraying an acidic aqueous solution whose temperature was controlled at 38 ° C. onto the copper circuit, thereby roughening the surface of the copper circuit.
Next, after washing with water to remove the acidic aqueous solution adhering to the surface, hot air was blown onto the surface of the substrate to heat the substrate so that the surface temperature of the substrate was kept at 110 ° C. or higher for 5 seconds.

【0027】次いで、その内層用基板に、厚み0.15
mm、樹脂量50%のガラス基材エポキシ樹脂プリプレ
グ[松下電工株式会社製、商品名 R−1661]を内
層用基板の両方の面に2枚づつ重ねて積層し、さらにそ
の積層物の両外層に厚み18μmの銅箔を積層し、この
積層物を温度170℃、圧力3.9MPa、時間60分
の条件で加熱加圧成形して内層回路入り積層板を得た。
Next, a thickness of 0.15
mm, a glass-based epoxy resin prepreg having a resin amount of 50% [trade name: R-1661, manufactured by Matsushita Electric Works, Ltd.] is laminated on both sides of the inner layer substrate by two sheets, and further, both outer layers of the laminate are laminated. Then, a copper foil having a thickness of 18 μm was laminated thereon, and this laminate was heated and pressed under the conditions of a temperature of 170 ° C., a pressure of 3.9 MPa, and a time of 60 minutes to obtain a laminate having an inner layer circuit.

【0028】(実施例2)水洗して表面に付着している
酸性水溶液を除去した後、基板の表面に赤外線を照射し
て、基板の表面温度が110℃以上の状態を5秒保持す
るように加熱したこと以外は実施例1と同様にして内層
回路入り積層板の製造方法を得た。
Example 2 After washing with water to remove the acidic aqueous solution adhering to the surface, the surface of the substrate is irradiated with infrared rays so that the surface temperature of the substrate is kept at 110 ° C. or higher for 5 seconds. Except that heating was performed in the same manner as in Example 1, a method for producing a laminated board with an inner layer circuit was obtained.

【0029】(実施例3)水洗して表面に付着している
酸性水溶液を除去した後、基板の表面に赤外線を照射し
て、基板の表面温度が110℃以上の状態を15秒保持
するように加熱したこと以外は実施例1と同様にして内
層回路入り積層板の製造方法を得た。
Example 3 After washing with water to remove the acidic aqueous solution adhering to the surface, the surface of the substrate is irradiated with infrared rays so that the surface temperature of the substrate is kept at 110 ° C. or higher for 15 seconds. Except that heating was performed in the same manner as in Example 1, a method for producing a laminated board with an inner layer circuit was obtained.

【0030】(比較例1)水洗して表面に付着している
酸性水溶液を除去した後、基板の表面に赤外線を照射し
て、基板の表面温度が110℃以上の状態を1秒保持す
るように加熱したこと以外は実施例1と同様にして内層
回路入り積層板の製造方法を得た。
(Comparative Example 1) After washing with water to remove the acidic aqueous solution adhering to the surface, the surface of the substrate is irradiated with infrared rays so that the surface temperature of the substrate is kept at 110 ° C or higher for 1 second. Except that heating was performed in the same manner as in Example 1, a method for producing a laminated board with an inner layer circuit was obtained.

【0031】(比較例2)基板の表面温度が110℃以
上の状態を4秒保持するように加熱したこと以外は実施
例1と同様にして内層回路入り積層板の製造方法を得
た。
Comparative Example 2 A method for producing a laminated board with an inner circuit was obtained in the same manner as in Example 1 except that the substrate was heated so that the surface temperature of the substrate was kept at 110 ° C. or higher for 4 seconds.

【0032】(比較例3)水洗して表面に付着している
酸性水溶液を除去した後、基板の表面に赤外線を照射し
て、基板の表面温度が110℃以上の状態を4秒保持す
るように加熱したこと以外は実施例1と同様にして内層
回路入り積層板の製造方法を得た。
(Comparative Example 3) After washing with water to remove the acidic aqueous solution adhering to the surface, the surface of the substrate is irradiated with infrared rays so that the surface temperature of the substrate is kept at 110 ° C or higher for 4 seconds. Except that heating was performed in the same manner as in Example 1, a method for producing a laminated board with an inner layer circuit was obtained.

【0033】(評価、結果)各実施例及び各比較例で得
られた内層回路入り積層板のハンダ耐熱性及び耐酸性を
測定した。
(Evaluation and Results) The heat resistance and the acid resistance of the laminates with the inner layer circuits obtained in each of the examples and comparative examples were measured.

【0034】ハンダ耐熱性は、内層回路入り積層板の外
層の銅箔を全面エッチングした後、50mm角に切断
し、次いで、その端面を研磨して評価試料を作成した。
次いで、その評価試料をイオン交換水中で1時間又は2
時間又は3時間煮沸処理した後、260℃のハンダに3
0秒浸漬し、ミーズリング等の異常の有無を目視で観察
した。そして、ミーズリングやデラミネーション等の異
常の発生が無い場合○とし、ミーズリングやデラミネー
ション等の異常が発生した場合×とした。
The solder heat resistance was evaluated by preparing an evaluation sample by etching the entire surface of the copper foil of the outer layer of the laminated board with the inner layer circuit, cutting it into a square of 50 mm, and then polishing the end face.
Next, the evaluation sample was placed in ion-exchanged water for 1 hour or 2 hours.
After boiling for 3 hours or 3 hours.
It was immersed for 0 seconds and visually observed for abnormalities such as measling. Then, when no abnormality such as measling or delamination occurred, it was evaluated as ○, and when an abnormality such as measling or delamination occurred, it was evaluated as x.

【0035】耐酸性は、内層回路入り積層板のうち、内
層用基板の直径1.5mmのランドパターンがある位置
に、直径0.4mmのドリル[ユニオンツール株式会社
製、商品名 UC30]を用いて、72000回転/分
の回転数、19μm/回転の送り速度で50個穴あけを
行い、次いで20℃1.2規定の塩酸水溶液に10分浸
漬して処理した後、直ちに水洗し、次いで、外層の銅箔
とプリプレグが硬化した絶縁層を削って内層用基板の銅
回路を露出させ、処理皮膜がピンク色に変色した部分
の、穴の壁面からの最大の長さを50倍の拡大鏡で測定
した。
The acid resistance is measured by using a 0.4 mm diameter drill [manufactured by Union Tool Co., Ltd., product name: UC30] at a position where a land pattern with a diameter of 1.5 mm of the inner layer substrate is located in the laminated board containing the inner layer circuit. 50 holes were drilled at a rotation speed of 72,000 rpm and a feed rate of 19 μm / rotation, then immersed in a 1.2 N hydrochloric acid aqueous solution at 20 ° C. for 10 minutes, washed immediately, and then washed with an outer layer. The copper circuit of the inner layer substrate is exposed by shaving the insulating layer where the copper foil and prepreg have hardened, and the maximum length from the wall surface of the hole of the part where the treated film has turned pink is magnified by 50 times. It was measured.

【0036】その結果は表1に示したとおり、各実施例
で得られた内層回路入り積層板は、各比較例で得られた
内層回路入り積層板と比べてハンダ耐熱性が優れ、且
つ、各比較例で得られた内層回路入り積層板と同様に耐
酸性が優れていることが確認された。
The results are shown in Table 1. As shown in Table 1, the laminated board with the inner layer circuit obtained in each of the examples has better solder heat resistance than the laminated board with the inner layer circuit obtained in each of the comparative examples, and It was confirmed that the laminate had excellent acid resistance, similarly to the laminate with the inner layer circuit obtained in each comparative example.

【0037】[0037]

【表1】 [Table 1]

【0038】[0038]

【発明の効果】本発明に係る内層回路入り積層板の製造
方法は、銅回路の表面を粗化した後、その粗化した銅回
路の表面を水洗し、次いで、基板を加熱して、基板の表
面温度が110℃以上の状態を5秒以上保持した後、銅
回路と熱硬化性樹脂を接着して製造するため、耐酸性が
優れると共に、ハンダ耐熱性が優れた内層回路入り積層
板を得ることが可能になる。
According to the method of manufacturing a laminated board with an inner layer circuit according to the present invention, after roughening the surface of a copper circuit, the surface of the roughened copper circuit is washed with water, and then the substrate is heated. After maintaining the surface temperature of 110 ° C. or more for 5 seconds or more, the copper circuit and the thermosetting resin are bonded together to produce, so that the laminated board with the inner layer circuit having excellent acid resistance and solder heat resistance is excellent. It is possible to obtain.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E343 AA15 AA17 BB24 BB67 CC22 CC33 CC34 CC45 DD54 DD76 EE02 ER39 ER44 GG16 GG20 5E346 AA06 AA12 AA15 BB01 CC08 CC58 EE06 EE09 EE14 EE19 GG01 GG16 GG27 GG28 HH11 HH18  ──────────────────────────────────────────────────続 き Continued from the front page F term (reference)

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板の表面に形成された銅回路を、銅イ
オンを含有する酸性水溶液で処理して銅回路の表面を粗
化した後、その粗化した銅回路と熱硬化性樹脂を接着し
て製造する内層回路入り積層板の製造方法において、粗
化した銅回路と熱硬化性樹脂を接着する方法が、酸性水
溶液で処理して銅回路の表面を粗化した後、その粗化し
た銅回路の表面を水洗し、次いで、基板を加熱して、基
板の表面温度が110℃以上の状態を5秒以上保持した
後、銅回路と熱硬化性樹脂を接着する方法であることを
特徴とする内層回路入り積層板の製造方法。
1. A copper circuit formed on a surface of a substrate is treated with an acidic aqueous solution containing copper ions to roughen the surface of the copper circuit, and then the roughened copper circuit is bonded to a thermosetting resin. In the method for manufacturing a laminated board with an inner layer circuit to be manufactured, the method of bonding the roughened copper circuit and the thermosetting resin is performed after the surface of the copper circuit is roughened by treating with an acidic aqueous solution. The method is characterized in that the surface of the copper circuit is washed with water, then the substrate is heated, and the surface temperature of the substrate is kept at 110 ° C. or more for 5 seconds or more, and then the copper circuit and the thermosetting resin are bonded. A method for producing a laminated board containing an inner circuit.
【請求項2】 基板を加熱する方法が、基板の表面に赤
外線を照射する方法であることを特徴とする請求項1記
載の内層回路入り積層板の製造方法。
2. The method according to claim 1, wherein the method of heating the substrate is a method of irradiating infrared rays to the surface of the substrate.
【請求項3】 銅回路と接着する熱硬化性樹脂が、ガラ
スクロスに含浸された熱硬化性樹脂であることを特徴と
する請求項1又は請求項2記載の内層回路入り積層板の
製造方法。
3. The method according to claim 1, wherein the thermosetting resin that adheres to the copper circuit is a thermosetting resin impregnated in a glass cloth. .
JP11016090A 1999-01-25 1999-01-25 Manufacture of laminate board with inner layer circuits Pending JP2000216536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11016090A JP2000216536A (en) 1999-01-25 1999-01-25 Manufacture of laminate board with inner layer circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11016090A JP2000216536A (en) 1999-01-25 1999-01-25 Manufacture of laminate board with inner layer circuits

Publications (1)

Publication Number Publication Date
JP2000216536A true JP2000216536A (en) 2000-08-04

Family

ID=11906837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11016090A Pending JP2000216536A (en) 1999-01-25 1999-01-25 Manufacture of laminate board with inner layer circuits

Country Status (1)

Country Link
JP (1) JP2000216536A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006324620A (en) * 2005-04-19 2006-11-30 Hitachi Chem Co Ltd Multilayer printed-wiring board, manufacturing method therefor, processing method for inner layer substrate, and inner layer substrate
JP2008103532A (en) * 2006-10-19 2008-05-01 Hitachi Chem Co Ltd Inner layer treatment method for multilayer printed wiring board and circuit board obtained thereby
US8625279B2 (en) 2011-03-08 2014-01-07 Kabushiki Kaisha Toshiba Display device and electronic device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006324620A (en) * 2005-04-19 2006-11-30 Hitachi Chem Co Ltd Multilayer printed-wiring board, manufacturing method therefor, processing method for inner layer substrate, and inner layer substrate
JP2008103532A (en) * 2006-10-19 2008-05-01 Hitachi Chem Co Ltd Inner layer treatment method for multilayer printed wiring board and circuit board obtained thereby
US8625279B2 (en) 2011-03-08 2014-01-07 Kabushiki Kaisha Toshiba Display device and electronic device

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