JP2000208396A5 - Field diaphragm projection optics, exposure equipment and methods - Google Patents
Field diaphragm projection optics, exposure equipment and methods Download PDFInfo
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- JP2000208396A5 JP2000208396A5 JP1999006344A JP634499A JP2000208396A5 JP 2000208396 A5 JP2000208396 A5 JP 2000208396A5 JP 1999006344 A JP1999006344 A JP 1999006344A JP 634499 A JP634499 A JP 634499A JP 2000208396 A5 JP2000208396 A5 JP 2000208396A5
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- field diaphragm
- projection
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- methods
- light
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- 230000003287 optical Effects 0.000 description 37
- 239000000758 substrate Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 1
Description
【特許請求の範囲】
【請求項１】
光源からの光に基づいて投影原版上のパターンを感光基板上の感光面に転写する露光装置に用いられ、前記光源と前記投影原版との間に配置される視野絞りの像を前記投影原版上ヘ投影する視野絞り投影光学系であって、
１枚の凹面鏡と１つ以上の屈折光学部材とを有することを特徴とする視野絞り投影光学系。
【請求項２】
前記凹面鏡と前記屈折光学部材とは共軸に配置されることを特徴とする請求項１記載の視野絞り投影光学系。
【請求項３】
前記視野絞り投影光学系はほぼ等倍の投影倍率を有し、
前記凹面鏡に入射する往路の光束と前記凹面鏡で反射される復路の光束とは、全ての前記屈折光学部材を通過することを特徴とする請求項１又は２記載の視野絞り投影光学系。
【請求項４】
前記１つ以上の屈折光学部材は、正屈折力のレンズ群と、該正屈折力のレンズ群と前記凹面鏡との間に配置された負屈折力のレンズ群とを有することを特徴とする請求項１乃至３の何れか一項記載の視野絞り投影光学系。
【請求項５】
前記１つ以上の屈折光学部材は、１枚の正レンズであることを特徴とする請求項１乃至３の何れか一項に記載の視野絞り投影光学系。
【請求項６】
前記視野絞りから前記凹面反射鏡までの光路と、前記凹面鏡から前記投影原版までの光路とのうちの、少なくとも何れか一方の光路には、該光路を折り曲げるための反射面が配置されることを特徴とする請求項１乃至５の何れか一項記載の視野絞り投影光学系。
【請求項７】
前記光路を折り曲げるための反射面は、前記１つ以上の屈折光学部材のうち前記凹面反射鏡から最も離れた位置に配置される屈折光学部材と前記視野絞りとの間の光路と、前記１つ以上の屈折光学部材のうち前記凹面反射鏡から最も離れた位置に配置される前記屈折光学部材と前記投影原板との間の光路とのうちの少なくとも一方であることを特徴とする請求項６に記載の視野絞り投影光学系。
【請求項８】
前記視野絞り投影光学系の光学面のうち、少なくとも１つの光学面は非球面であることを特徴とする請求項１乃至６の何れか一項に記載の視野絞り投影光学系。
【請求項９】
光源からの光に基づいて所定面上を均一に照明する照明光学系と、前記所定面上に配置される視野絞りの像を投影原版上へ投影する視野絞り投影光学系とを備え、前記視野絞り投影光学系からの光に基づいて前記投影原版上のパターンを感光基板上の感光面に転写する露光装置であって、
前記視野絞り投影光学系として、請求項１乃至８の何れか一項記載の視野絞り投影光学系を用いたことを特徴とする露光装置。
【請求項１０】
前記光源が供給する光の波長は１８０ｎｍ以下であることを特徴とする請求項９に記載の露光装置。
【請求項１１】
光源からの光を所定形状の開口を有する視野絞りへ導く第１ステップと、
視野絞りの開口を経た光を少なくとも１つの屈折光学部材と凹面鏡とを介して投影原版ヘ導く第２ステップと、
該投影原版ヘ導かれた光に基づいて前記投影原版上のパターンを感光基板上の感光面に転写する第３ステップとを含み、
前記第２ステップでは、前記視野絞りの開口の像を前記投影原版上に形成することを特徴とする露光方法。
【請求項１２】
前記第２ステップは、前記視野絞りの開口を経た光を、前記少なくとも１つの屈折光学部材を通過させる第１サブステップと前記屈折光学部材を通過した光を前記凹面鏡で反射させる第２サブステップと前記凹面鏡で反射された光を、前記屈折光学部材を再び通過させる第３サブステップとを含むことを特徴とする請求項１１に記載の露光方法。
【請求項１３】
前記第１ステップでは１８０ｎｍ以下の波長の光が前記光源から供給されることを特徴とする請求項１０または１１に記載の露光方法。
[Claims]
[Claim 1]
It is used in an exposure device that transfers a pattern on a projection master plate to a photosensitive surface on a photosensitive substrate based on light from a light source, and an image of a field diaphragm arranged between the light source and the projection master plate is displayed on the projection master plate. It is a field aperture projection optical system that projects
A field diaphragm projection optical system characterized by having one concave mirror and one or more refracting optical members.
2.
The field diaphragm projection optical system according to claim 1, wherein the concave mirror and the refraction optical member are arranged on the same axis.
3.
The field diaphragm projection optical system has a projection magnification of almost the same magnification.
The field diaphragm projection optical system according to claim 1 or 2, wherein the outward light flux incident on the concave mirror and the return light flux reflected by the concave mirror pass through all the refraction optical members.
4.
The one or more refractive optical members are characterized by having a lens group having a positive refractive power and a lens group having a negative refractive power arranged between the lens group having a positive refractive power and the concave mirror. Item 3. The field aperture projection optical system according to any one of Items 1 to 3.
5.
The field diaphragm projection optical system according to any one of claims 1 to 3, wherein the one or more refraction optical members are one positive lens.
6.
A reflecting surface for bending the optical path is arranged in at least one of the optical path from the field aperture to the concave reflecting mirror and the optical path from the concave mirror to the projection original plate. The visual field aperture projection optical system according to any one of claims 1 to 5, which is characterized.
7.
The reflecting surface for bending the optical path includes the optical path between the refracting optical member arranged at the position farthest from the concave reflecting mirror among the one or more refracting optical members and the field diaphragm, and the one. The sixth aspect of the above-mentioned refraction optical member is at least one of the optical path between the refraction optical member and the projection original plate arranged at the position farthest from the concave reflecting mirror. The field aperture projection optical system described.
8.
The visual field diaphragm projection optical system according to any one of claims 1 to 6, wherein at least one optical surface of the visual field diaphragm projection optical system is an aspherical surface.
9.
The field diaphragm projection optical system includes an illumination optical system that uniformly illuminates a predetermined surface based on light from a light source, and a field diaphragm projection optical system that projects an image of a field diaphragm arranged on the predetermined surface onto a projection original plate. An exposure apparatus that transfers a pattern on a projection original plate to a photosensitive surface on a photosensitive substrate based on light from an aperture projection optical system.
An exposure apparatus according to any one of claims 1 to 8 , wherein the field diaphragm projection optical system is used as the field diaphragm projection optical system.
10.
The exposure apparatus according to claim 9, wherein the wavelength of the light supplied by the light source is 180 nm or less.
11.
The first step of guiding the light from the light source to the field diaphragm having an aperture of a predetermined shape,
The second step of guiding the light that has passed through the aperture of the field diaphragm to the projection original plate through at least one refracting optical member and a concave mirror, and
The third step of transferring the pattern on the projection master plate to the photosensitive surface on the photosensitive substrate based on the light guided to the projection master plate is included.
The second step is an exposure method characterized in that an image of the opening of the field diaphragm is formed on the projection original plate.
12.
The second step includes a first sub-step in which the light passing through the opening of the field diaphragm is passed through the at least one refraction optical member and a second sub-step in which the light passing through the refraction optical member is reflected by the concave mirror. The exposure method according to claim 11, further comprising a third sub-step in which the light reflected by the concave mirror is passed through the refracting optical member again.
13.
The exposure method according to claim 10 or 11, wherein in the first step, light having a wavelength of 180 nm or less is supplied from the light source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11006344A JP2000208396A (en) | 1999-01-13 | 1999-01-13 | Visual field stop projection optical system and projection aligner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11006344A JP2000208396A (en) | 1999-01-13 | 1999-01-13 | Visual field stop projection optical system and projection aligner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000208396A JP2000208396A (en) | 2000-07-28 |
| JP2000208396A5 true JP2000208396A5 (en) | 2008-01-24 |
Family
ID=11635766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11006344A Pending JP2000208396A (en) | 1999-01-13 | 1999-01-13 | Visual field stop projection optical system and projection aligner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000208396A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI289210B (en) | 2004-10-21 | 2007-11-01 | Sony Corp | Projection optical system and projection type image display device |
| WO2013154557A1 (en) * | 2012-04-12 | 2013-10-17 | Hewlett-Packard Development Company, L.P. | Non-contact fingerprinting systems wth afocal optical systems |
| WO2018168993A1 (en) * | 2017-03-17 | 2018-09-20 | 株式会社ニコン | Illumination device and method, exposure device and method, and device manufacturing method |
-
1999
- 1999-01-13 JP JP11006344A patent/JP2000208396A/en active Pending
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