JP2000192226A - Formation of titanium oxide film - Google Patents
Formation of titanium oxide filmInfo
- Publication number
- JP2000192226A JP2000192226A JP10365140A JP36514098A JP2000192226A JP 2000192226 A JP2000192226 A JP 2000192226A JP 10365140 A JP10365140 A JP 10365140A JP 36514098 A JP36514098 A JP 36514098A JP 2000192226 A JP2000192226 A JP 2000192226A
- Authority
- JP
- Japan
- Prior art keywords
- film
- titanium oxide
- oxide film
- oxygen
- helium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 32
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 230000015572 biosynthetic process Effects 0.000 title abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000001301 oxygen Substances 0.000 claims abstract description 15
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 15
- 239000001307 helium Substances 0.000 claims abstract description 12
- 229910052734 helium Inorganic materials 0.000 claims abstract description 12
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000007789 gas Substances 0.000 claims abstract description 11
- 238000004544 sputter deposition Methods 0.000 claims abstract description 11
- 239000010936 titanium Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 14
- 239000011521 glass Substances 0.000 abstract description 13
- 230000001699 photocatalysis Effects 0.000 abstract description 12
- 238000010438 heat treatment Methods 0.000 abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000005299 abrasion Methods 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 2
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 2
- 150000004767 nitrides Chemical class 0.000 abstract description 2
- 229910052708 sodium Inorganic materials 0.000 abstract description 2
- 239000011734 sodium Substances 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 230000010718 Oxidation Activity Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- -1 titanium alkoxide Chemical class 0.000 description 1
Landscapes
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は酸化チタン膜の成膜
方法に関する。The present invention relates to a method for forming a titanium oxide film.
【０００２】[0002]
【従来の技術】近年、酸化チタン（酸化チタン）によ
る、親水、抗菌、防汚コーティングの研究が注目を集め
ている。これらは、酸化チタンの光触媒効果を利用して
いる。報告例としては、酸化チタン膜がコートされた親
水防汚コート（特開平８−２６７６４６）、貴金属等と
の混合による光触媒活性向上方法（特開平６−１９８１
９６）などがある。2. Description of the Related Art In recent years, research on hydrophilic, antibacterial, and antifouling coatings using titanium oxide (titanium oxide) has attracted attention. These utilize the photocatalytic effect of titanium oxide. Examples of the report include a hydrophilic antifouling coat coated with a titanium oxide film (JP-A-8-267646), and a method for improving photocatalytic activity by mixing with a noble metal (JP-A-6-1981).
96).
【０００３】従来、光触媒活性を示す酸化チタン膜の形
成方法として、酸化チタンの微粒子を有機または無機の
バインダにより固定する方法や、チタンアルコキシドか
らゾルゲル法で形成するなどの湿式法が検討されてき
た。これらの方法は熱平衡プロセスであり、これらの方
法で得られた酸化チタン膜の光触媒活性は高い。Hitherto, as a method for forming a titanium oxide film exhibiting photocatalytic activity, a method of fixing fine particles of titanium oxide with an organic or inorganic binder, and a wet method of forming a titanium alkoxide by a sol-gel method have been studied. . These methods are thermal equilibrium processes, and the photocatalytic activity of the titanium oxide film obtained by these methods is high.
【０００４】しかし、湿式法では、窓ガラスのような大
面積へのコートに成膜した際の膜厚均一性の点、また
は、膜の耐擦傷性の点で不十分である。さらに、塗布液
を一定の状態に保管するのに細心の注意を必要とする。[0004] However, the wet method is insufficient in terms of uniformity of film thickness when a film is formed on a large-area coat such as a window glass or scratch resistance of the film. Furthermore, it is necessary to take great care to keep the coating liquid in a constant state.
【０００５】一方、建築用、自動車用熱線反射ガラスな
どの製造に用いられている直流（ＤＣ）スパッタリング
法は、大面積への均一なコーティングが容易で、かつ膜
の基板への密着性にも優れる。また、スパッタリングタ
ーゲットの保管には特別な注意を必要としない。しか
し、従来スパッタリング法では充分な光触媒活性を示す
酸化チタン膜は得られなかった。On the other hand, direct current (DC) sputtering, which is used in the production of heat-reflective glass for architectural and automobile use, allows uniform coating on a large area and also facilitates adhesion of the film to a substrate. Excellent. Further, no special care is required for storing the sputtering target. However, a titanium oxide film exhibiting a sufficient photocatalytic activity has not been obtained by the conventional sputtering method.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、光触媒活性
が高く、耐擦傷性に優れる酸化チタン膜の成膜方法の提
供を目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for forming a titanium oxide film having high photocatalytic activity and excellent scratch resistance.
【０００７】[0007]
【課題を解決するための手段】本発明は、Ｔｉを含有す
る金属ターゲットを用いスパッタリング法により酸化チ
タン膜を成膜する方法において、雰囲気ガスとして、酸
素とヘリウムとの混合ガスを用い、ヘリウムを酸素とヘ
リウムとの総量に対して２０〜９０体積％とする酸化チ
タン膜の成膜方法を提供する。According to the present invention, there is provided a method of forming a titanium oxide film by a sputtering method using a metal target containing Ti, wherein a mixed gas of oxygen and helium is used as an atmosphere gas, and Provided is a method for forming a titanium oxide film in which the content is 20 to 90% by volume based on the total amount of oxygen and helium.
【０００８】スパッタリング法でＴｉターゲットを用い
酸化度雰囲気で得られる酸化チタン膜が高い光触媒活性
を示さない原因としては、スパッタリング法は非平衡プ
ロセスであり、スパッタリング法では、電子と正孔の再
結合中心となる格子欠陥が、湿式法による場合と比べて
膜中に多く存在するためと考えられている。[0008] The reason that the titanium oxide film obtained in a oxidizing atmosphere using a Ti target by the sputtering method does not show high photocatalytic activity is that the sputtering method is a non-equilibrium process, and the sputtering method recombines electrons and holes. It is considered that the lattice defects serving as the center exist in the film more than in the case of the wet method.
【０００９】膜中の欠陥は主として酸素欠陥である。す
なわち、スパッタリング法では、酸化チタンの酸化度が
完全ではなく、酸素が化学量論量よりも不足しているも
のと考えられている。高い光触媒活性を発現させるため
には、酸化チタンの酸化度を完全なものとする必要があ
る。The defects in the film are mainly oxygen defects. That is, in the sputtering method, it is considered that the degree of oxidation of titanium oxide is not perfect, and oxygen is less than the stoichiometric amount. In order to exhibit high photocatalytic activity, it is necessary to complete the oxidation degree of titanium oxide.
【００１０】本発明者らは、酸化チタンの酸化度を向上
させるための方策として、１）成膜中の酸素分圧の増
加、２）基板加熱、が有効であることことを見出した
（特開平１０−２７８１６５）。しかし、窓ガラスのよ
うな大面積基板に対し、均一に基板加熱することは困難
である。そこで、低温で酸化チタンの酸化度を上げるた
めには、酸化性雰囲気の酸化活性を上げることが必要で
ある。The present inventors have found that 1) increasing the oxygen partial pressure during film formation and 2) substrate heating are effective as measures for improving the degree of oxidation of titanium oxide. Kaihei 10-278165). However, it is difficult to uniformly heat a large area substrate such as a window glass. Therefore, in order to increase the degree of oxidation of titanium oxide at a low temperature, it is necessary to increase the oxidation activity in an oxidizing atmosphere.
【００１１】本発明者らは、雰囲気ガスとして酸素とヘ
リウムの混合ガスを用いることが有効であることを見出
した。ヘリウムはプラズマ中でエネルギー準位の高い準
安定粒子になる。酸素ガスが前記準安定粒子と衝突し、
酸素原子のイオン化率が上がり、高励起状態となり、酸
素の酸化力が著しく増加する。The present inventors have found that it is effective to use a mixed gas of oxygen and helium as an atmosphere gas. Helium becomes a metastable particle with a high energy level in the plasma. Oxygen gas collides with the metastable particles,
The ionization rate of oxygen atoms increases, the state becomes highly excited, and the oxidizing power of oxygen increases significantly.
【００１２】本発明においては、ヘリウムを酸素とヘリ
ウムとの総量に対して２０〜９０体積％とすることが重
要である。２０体積％未満では、酸素の酸化活性が増加
せず、また、９０体積％超では、再び酸化活性が減少す
る。In the present invention, it is important to make helium 20 to 90% by volume based on the total amount of oxygen and helium. If it is less than 20% by volume, the oxidizing activity of oxygen does not increase, and if it exceeds 90% by volume, the oxidizing activity decreases again.
【００１３】ターゲットへの投入電力は、例えば、０．
１〜５．０Ｗ／ｃｍ2とする。また、雰囲気ガスの圧力
は、放電安定性の観点から、１ｍＴｏｒｒ以上が好まし
い。The power supplied to the target is, for example, 0.
1 to 5.0 W / cm 2 . The pressure of the atmospheric gas is preferably 1 mTorr or more from the viewpoint of discharge stability.
【００１４】酸化チタン膜の幾何学的膜厚は５〜１００
０ｎｍであることが好ましい。５ｎｍ未満では充分な光
触媒活性を示さず、また１０００ｎｍ超では、膜表面の
平滑性が損なわれ、摩擦係数が増大して、膜強度が低下
する。The geometric thickness of the titanium oxide film is 5 to 100.
It is preferably 0 nm. If it is less than 5 nm, sufficient photocatalytic activity is not exhibited, and if it exceeds 1000 nm, the smoothness of the film surface is impaired, the friction coefficient increases, and the film strength decreases.
【００１５】本発明においては、成膜中に基板加熱を行
うか、成膜後に酸化チタン膜を空気中または酸素を含む
雰囲気中で後加熱することが好ましい。加熱温度は１０
０〜６５０℃が好ましい。１００℃未満では、酸化チタ
ンの酸化度は加熱をしない場合と変わらず、また、６５
０℃超ではガラス基板の場合、基板が軟化する。また、
本発明においては、ガラス基板と酸化チタン膜の間に機
能性膜を設けることができる。機能性膜としては、金属
酸化物膜、金属窒化物膜、金属炭化物膜が挙げられる。
機能性膜の製造方法は特に限定されない。In the present invention, it is preferable to heat the substrate during the film formation or to post-heat the titanium oxide film after the film formation in air or in an atmosphere containing oxygen. Heating temperature is 10
0-650 ° C is preferred. If the temperature is lower than 100 ° C., the degree of oxidation of titanium oxide is the same as that without heating, and
If the temperature exceeds 0 ° C., the glass substrate is softened. Also,
In the present invention, a functional film can be provided between the glass substrate and the titanium oxide film. Examples of the functional film include a metal oxide film, a metal nitride film, and a metal carbide film.
The method for producing the functional film is not particularly limited.
【００１６】前記の基板加熱または成膜後の後加熱をす
る場合には、ガラス中のナトリウムが酸化チタン膜への
拡散することを防ぐため、機能性膜として、シリカ膜を
設けることが好ましい。機能性膜は２層以上設けること
もでき、例えば、基板側から、シリカ膜、その他の機能
性膜を順次形成することもできる。In the case of heating the substrate or post-heating after film formation, it is preferable to provide a silica film as a functional film in order to prevent sodium in the glass from diffusing into the titanium oxide film. Two or more functional films can be provided. For example, a silica film and other functional films can be sequentially formed from the substrate side.
【００１７】[0017]
【実施例】以下の例で例１〜５は実施例、例６〜１１は
比較例に相当する。EXAMPLES In the following examples, Examples 1 to 5 correspond to Examples, and Examples 6 to 11 correspond to Comparative Examples.
【００１８】［例１］洗浄した厚さ２ｍｍのフロートガ
ラス基板をスパッタリング装置内にセットし、１０-6Ｔ
ｏｒｒ台まで排気した。次に表１の条件で、ＴｉＯ2−
１（２００ｎｍ）を成膜した。 ＴｉＯ2−１の成膜条件
は表１に示すとおりである。Example 1 A washed float glass substrate having a thickness of 2 mm was set in a sputtering apparatus, and 10 -6 T was used.
The air was exhausted to the orr level. Next, under the conditions shown in Table 1, TiO 2 −
1 (200 nm) was formed. Conditions for forming the TiO 2 -1 are shown in Table 1.
【００１９】得られた膜付きガラスの光触媒活性は次の
ようにして評価した。大きさ４．５ｃｍ×５．０ｃｍ×
２ｍｍのサンプルを膜面を上にしてパイレックス（岩城
硝子（株）製）製容器（容量３リットル）に入れ、アセ
トアルデヒド蒸気を数百ｐｐｍ入れた。次に容器の外側
からサンプルの膜面に６Ｗのブラックライト蛍光燈４本
で紫外光を当てた。一定時間おきに容器の中のアセトア
ルデヒド濃度をガス検知管により測定し、アセトアルデ
ヒド濃度の減少速度を測定し、アセトアルデヒド（ＣＨ
3ＣＨＯ）分解速度を求めた。結果を表２に示す。The photocatalytic activity of the obtained glass with a film was evaluated as follows. 4.5cm × 5.0cm ×
A sample of 2 mm was placed in a Pyrex (Iwaki Glass Co., Ltd.) container (capacity: 3 liters) with the membrane surface facing up, and several hundred ppm of acetaldehyde vapor was charged. Next, ultraviolet light was applied to the film surface of the sample from the outside of the container with four 6 W black light fluorescent lamps. The acetaldehyde concentration in the container was measured at regular intervals using a gas detector tube, and the rate of decrease in the acetaldehyde concentration was measured.
3 CHO) decomposition rate was determined. Table 2 shows the results.
【００２０】［例２〜１１］例１と同様にして、表２に
示す各種の膜を形成した。例２〜１１で用いた６種類の
酸化チタン膜（ＴｉＯ2−１〜ＴｉＯ2−６）およびその
他の各膜の成膜条件は表１に示すとおりである。なお、
例３については、成膜後に空気中で、６００℃、１時間
の熱処理をした。例１と同様にアセトアルデヒド（ＣＨ
3ＣＨＯ）分解速度を求めた結果を表２に示す。Examples 2 to 11 In the same manner as in Example 1, various films shown in Table 2 were formed. Deposition conditions for six titanium oxide film (TiO 2 -1~TiO 2 -6) and each additional film used in Example 2 to 11 are shown in Table 1. In addition,
In Example 3, a heat treatment was performed at 600 ° C. for one hour in air after the film formation. Acetaldehyde (CH
Table 2 shows the results obtained for the 3 CHO) decomposition rate.
【００２１】また、例１〜５で得られた膜付きガラスの
耐擦傷性をテーバー試験（試験荷重５００ｇ、摩耗輪Ｃ
Ｓ−１０Ｆ）で評価した。比較のために、湿式法により
ガラス基板上に酸化チタン膜を成膜した膜付きガラスに
ついても同様に評価した。その結果、湿式法により得ら
れた膜付きガラスでは、テーバー回転１００回で膜がと
れてしまうのに対し、例１〜５で得られた膜付きガラス
では３００回でも膜がとれず、高い耐擦傷性を示した。The abrasion resistance of the glass with a film obtained in each of Examples 1 to 5 was evaluated by a Taber test (test load: 500 g, wear wheel C:
S-10F). For comparison, a film-coated glass in which a titanium oxide film was formed on a glass substrate by a wet method was similarly evaluated. As a result, in the case of the glass with the film obtained by the wet method, the film could be removed in 100 times of Taber rotation, whereas in the case of the glass with the film obtained in Examples 1 to 5, the film could not be removed even in 300 times, and the high glass resistance was high. It showed abrasion.
【００２２】[0022]
【表１】 [Table 1]
【００２３】[0023]
【表２】 [Table 2]
【００２４】[0024]
【発明の効果】本発明によれば、光触媒活性の高い酸化
チタン膜が得られる。また、スパッタリング法により成
膜するため、大面積に均一な膜厚分布で、基板への膜の
密着性が強く、膜の耐擦傷性に優れる。したがって耐擦
傷性向上のための対策を特に講ずることなく、ビル用の
窓ガラスとして使用できる。According to the present invention, a titanium oxide film having high photocatalytic activity can be obtained. Further, since the film is formed by the sputtering method, the film has a uniform film thickness distribution over a large area, has strong adhesion to the substrate, and has excellent scratch resistance. Therefore, it can be used as a window glass for a building without taking special measures for improving the scratch resistance.
Claims (3)
ッタリング法により酸化チタン膜を成膜する方法におい
て、雰囲気ガスとして、酸素とヘリウムとの混合ガスを
用い、ヘリウムを酸素とヘリウムとの総量に対して２０
〜９０体積％とする酸化チタン膜の成膜方法。In a method of forming a titanium oxide film by a sputtering method using a metal target containing Ti, a mixed gas of oxygen and helium is used as an atmosphere gas, and helium is added to the total amount of oxygen and helium. 20
A method for forming a titanium oxide film having a volume ratio of about 90% by volume.
る請求項１に記載の成膜方法。2. The film forming method according to claim 1, wherein the pressure of the atmosphere gas is 1 mTorr or more.
的膜厚で形成する請求項１または２に記載の成膜方法。3. The film forming method according to claim 1, wherein the titanium oxide film is formed with a geometric thickness of 5 to 1000 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10365140A JP2000192226A (en) | 1998-12-22 | 1998-12-22 | Formation of titanium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10365140A JP2000192226A (en) | 1998-12-22 | 1998-12-22 | Formation of titanium oxide film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000192226A true JP2000192226A (en) | 2000-07-11 |
Family
ID=18483529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10365140A Pending JP2000192226A (en) | 1998-12-22 | 1998-12-22 | Formation of titanium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000192226A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004510051A (en) * | 2000-09-20 | 2004-04-02 | サン−ゴバン グラス フランス | Substrate with photocatalytic coating |
| US7483226B2 (en) | 2004-09-27 | 2009-01-27 | Nidec Copal Corporation | ND filter, manufacturing method thereof, and aperture device |
| JP2013505820A (en) * | 2009-09-25 | 2013-02-21 | エクス−マルセイユ ユニヴェルシテ | Superporous photocatalytic material, method for producing the same, and use thereof |
-
1998
- 1998-12-22 JP JP10365140A patent/JP2000192226A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004510051A (en) * | 2000-09-20 | 2004-04-02 | サン−ゴバン グラス フランス | Substrate with photocatalytic coating |
| US7483226B2 (en) | 2004-09-27 | 2009-01-27 | Nidec Copal Corporation | ND filter, manufacturing method thereof, and aperture device |
| JP2013505820A (en) * | 2009-09-25 | 2013-02-21 | エクス−マルセイユ ユニヴェルシテ | Superporous photocatalytic material, method for producing the same, and use thereof |
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