JP2000169481A - Fluorine-containing compound and antifouling article - Google Patents
Fluorine-containing compound and antifouling articleInfo
- Publication number
- JP2000169481A JP2000169481A JP10351251A JP35125198A JP2000169481A JP 2000169481 A JP2000169481 A JP 2000169481A JP 10351251 A JP10351251 A JP 10351251A JP 35125198 A JP35125198 A JP 35125198A JP 2000169481 A JP2000169481 A JP 2000169481A
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- containing compound
- integer
- formula
- antifouling article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 51
- 239000011737 fluorine Substances 0.000 title claims abstract description 48
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 150000001875 compounds Chemical class 0.000 title claims abstract description 33
- 230000003373 anti-fouling effect Effects 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 125000000962 organic group Chemical group 0.000 claims abstract description 12
- 229910000077 silane Inorganic materials 0.000 claims abstract description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 5
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 5
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 5
- 239000001301 oxygen Substances 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 3
- -1 alcohol compound Chemical class 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 239000010410 layer Substances 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 238000001771 vacuum deposition Methods 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 229920000570 polyether Polymers 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- 239000003973 paint Substances 0.000 claims 1
- 238000006068 polycondensation reaction Methods 0.000 claims 1
- 150000004756 silanes Chemical class 0.000 abstract description 5
- 238000005299 abrasion Methods 0.000 abstract description 4
- 230000002194 synthesizing effect Effects 0.000 abstract description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 239000003344 environmental pollutant Substances 0.000 abstract 1
- 150000002221 fluorine Chemical class 0.000 abstract 1
- 231100000719 pollutant Toxicity 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 13
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002484 inorganic compounds Chemical class 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- WGJYIZQMPJVSFD-UHFFFAOYSA-N 1,2,3-trifluoro-4,5-dimethylbenzene Chemical group CC1=CC(F)=C(F)C(F)=C1C WGJYIZQMPJVSFD-UHFFFAOYSA-N 0.000 description 2
- HJIMAFKWSKZMBK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HJIMAFKWSKZMBK-UHFFFAOYSA-N 0.000 description 2
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 2
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000007735 ion beam assisted deposition Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229960004624 perflexane Drugs 0.000 description 2
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 2
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 210000002268 wool Anatomy 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- AHFXIFMCZUNFSI-UHFFFAOYSA-N 2,2-dimethoxyethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound COC(CO[SiH](C)CCCOCC1CO1)OC AHFXIFMCZUNFSI-UHFFFAOYSA-N 0.000 description 1
- ROYZOPPLNMOKCU-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl-tripropoxysilane Chemical compound C1C(CC[Si](OCCC)(OCCC)OCCC)CCC2OC21 ROYZOPPLNMOKCU-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- GJNHMDMCAAKXHV-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-(2,2,2-trimethoxyethoxy)silane Chemical compound COC(OC)(OC)CO[SiH2]CCCOCC1CO1 GJNHMDMCAAKXHV-UHFFFAOYSA-N 0.000 description 1
- GUXLAULAZDJOEK-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-triphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)CCCOCC1CO1 GUXLAULAZDJOEK-UHFFFAOYSA-N 0.000 description 1
- DAJFVZRDKCROQC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCCOCC1CO1 DAJFVZRDKCROQC-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- UDWIZRDPCQAYRF-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C=C UDWIZRDPCQAYRF-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- DGBFOBNYTYHFPN-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(C)CCCOC(=O)C=C DGBFOBNYTYHFPN-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- GBQYMXVQHATSCC-UHFFFAOYSA-N 3-triethoxysilylpropanenitrile Chemical compound CCO[Si](OCC)(OCC)CCC#N GBQYMXVQHATSCC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- 101100484948 Arabidopsis thaliana VQ11 gene Proteins 0.000 description 1
- 101100484952 Arabidopsis thaliana VQ19 gene Proteins 0.000 description 1
- 101100484954 Arabidopsis thaliana VQ20 gene Proteins 0.000 description 1
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
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- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- DFCLWRQWQBBXHP-UHFFFAOYSA-N [SiH4].C[Si](OCC)(OCC)C Chemical compound [SiH4].C[Si](OCC)(OCC)C DFCLWRQWQBBXHP-UHFFFAOYSA-N 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- YDVQLGHYJSJBKA-UHFFFAOYSA-N [diacetyloxy(3-chloropropyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)CCCCl YDVQLGHYJSJBKA-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 1
- VLFKGWCMFMCFRM-UHFFFAOYSA-N [diacetyloxy(phenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C1=CC=CC=C1 VLFKGWCMFMCFRM-UHFFFAOYSA-N 0.000 description 1
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- 230000002378 acidificating effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- SOKKGFZWZZLHEK-UHFFFAOYSA-N butoxy(dimethyl)silane Chemical compound CCCCO[SiH](C)C SOKKGFZWZZLHEK-UHFFFAOYSA-N 0.000 description 1
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- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 description 1
- FPOSCXQHGOVVPD-UHFFFAOYSA-N chloromethyl(trimethoxy)silane Chemical compound CO[Si](CCl)(OC)OC FPOSCXQHGOVVPD-UHFFFAOYSA-N 0.000 description 1
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- 238000007607 die coating method Methods 0.000 description 1
- OWHSEFXLFMRCOO-UHFFFAOYSA-N diethoxy-[5-(oxiran-2-ylmethoxy)pent-1-enyl]silane Chemical compound C(C1CO1)OCCCC=C[SiH](OCC)OCC OWHSEFXLFMRCOO-UHFFFAOYSA-N 0.000 description 1
- ODADONMDNZJQMW-UHFFFAOYSA-N diethoxy-ethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](CC)(OCC)CCCOCC1CO1 ODADONMDNZJQMW-UHFFFAOYSA-N 0.000 description 1
- UMWZTDBPOBTQIB-UHFFFAOYSA-N diethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](C)(OCC)COCC1CO1 UMWZTDBPOBTQIB-UHFFFAOYSA-N 0.000 description 1
- MRJXZRBBFSDWFR-UHFFFAOYSA-N diethoxy-methyl-[1-(7-oxabicyclo[4.1.0]heptan-4-yl)ethoxy]silane Chemical compound C1C(C(C)O[Si](C)(OCC)OCC)CCC2OC21 MRJXZRBBFSDWFR-UHFFFAOYSA-N 0.000 description 1
- NDXQFCXRDHAHNE-UHFFFAOYSA-N diethoxy-methyl-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](C)(OCC)C(C)OCC1CO1 NDXQFCXRDHAHNE-UHFFFAOYSA-N 0.000 description 1
- FTUJVDGSKMWKAN-UHFFFAOYSA-N diethoxy-methyl-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)C(CC)OCC1CO1 FTUJVDGSKMWKAN-UHFFFAOYSA-N 0.000 description 1
- FUXUUPOAQMPKOK-UHFFFAOYSA-N diethoxy-methyl-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](C)(OCC)CCOCC1CO1 FUXUUPOAQMPKOK-UHFFFAOYSA-N 0.000 description 1
- HUFWVNRUIVIGCH-UHFFFAOYSA-N diethoxy-methyl-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CC(C)OCC1CO1 HUFWVNRUIVIGCH-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- VDCSZEZNBODVRT-UHFFFAOYSA-N dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)CCCOCC1CO1 VDCSZEZNBODVRT-UHFFFAOYSA-N 0.000 description 1
- NFCHYERDRQUCGJ-UHFFFAOYSA-N dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[SiH](OC)CCCOCC1CO1 NFCHYERDRQUCGJ-UHFFFAOYSA-N 0.000 description 1
- FQPPMINVIMPSDP-UHFFFAOYSA-N dimethoxy-[5-(oxiran-2-ylmethoxy)pent-1-enyl]silane Chemical compound C(C1CO1)OCCCC=C[SiH](OC)OC FQPPMINVIMPSDP-UHFFFAOYSA-N 0.000 description 1
- PBDDFKGMGASJHE-UHFFFAOYSA-N dimethoxy-methyl-(7-oxabicyclo[4.1.0]heptan-4-ylmethoxy)silane Chemical compound C1C(CO[Si](C)(OC)OC)CCC2OC21 PBDDFKGMGASJHE-UHFFFAOYSA-N 0.000 description 1
- CAEPKDWOZATEMI-UHFFFAOYSA-N dimethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C)(OC)COCC1CO1 CAEPKDWOZATEMI-UHFFFAOYSA-N 0.000 description 1
- RLFWUGYBCZFNMQ-UHFFFAOYSA-N dimethoxy-methyl-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](C)(OC)C(C)OCC1CO1 RLFWUGYBCZFNMQ-UHFFFAOYSA-N 0.000 description 1
- KQODNYDIZIFQGO-UHFFFAOYSA-N dimethoxy-methyl-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)C(CC)OCC1CO1 KQODNYDIZIFQGO-UHFFFAOYSA-N 0.000 description 1
- PWPGWRIGYKWLEV-UHFFFAOYSA-N dimethoxy-methyl-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](C)(OC)CCOCC1CO1 PWPGWRIGYKWLEV-UHFFFAOYSA-N 0.000 description 1
- SYPWIQUCQXCZCF-UHFFFAOYSA-N dimethoxy-methyl-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CC(C)OCC1CO1 SYPWIQUCQXCZCF-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- BEHPKGIJAWBJMV-UHFFFAOYSA-N dimethyl(propoxy)silane Chemical compound CCCO[SiH](C)C BEHPKGIJAWBJMV-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- GYLXWHLPLTVIOP-UHFFFAOYSA-N ethenyl(2,2,2-trimethoxyethoxy)silane Chemical compound COC(OC)(OC)CO[SiH2]C=C GYLXWHLPLTVIOP-UHFFFAOYSA-N 0.000 description 1
- UREOZNJAZZUPGJ-UHFFFAOYSA-N ethenyl(triethoxy)silane silane Chemical compound [SiH4].CCO[Si](OCC)(OCC)C=C UREOZNJAZZUPGJ-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 1
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- HGWSCXYVBZYYDK-UHFFFAOYSA-N ethyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 HGWSCXYVBZYYDK-UHFFFAOYSA-N 0.000 description 1
- CFTUEADYSKHGCL-UHFFFAOYSA-N ethyl-[1,2,2-trimethoxy-2-(7-oxabicyclo[4.1.0]heptan-3-yl)ethoxy]silane Chemical compound O1C2CC(CCC21)C(C(O[SiH2]CC)OC)(OC)OC CFTUEADYSKHGCL-UHFFFAOYSA-N 0.000 description 1
- YCIAPTIZYCRWAU-UHFFFAOYSA-N ethyl-[3-(oxiran-2-ylmethoxy)propyl]-dipropoxysilane Chemical compound CCCO[Si](CC)(OCCC)CCCOCC1CO1 YCIAPTIZYCRWAU-UHFFFAOYSA-N 0.000 description 1
- YYDBOMXUCPLLSK-UHFFFAOYSA-N ethyl-dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC[Si](OC)(OC)CCCOCC1CO1 YYDBOMXUCPLLSK-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- CUIXFHFVVWQXSW-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)CCCOCC1CO1 CUIXFHFVVWQXSW-UHFFFAOYSA-N 0.000 description 1
- VOARQMXRPHXHID-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-dipropoxysilane Chemical compound CCCO[Si](C)(OCCC)CCCOCC1CO1 VOARQMXRPHXHID-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OQTSOKXAWXRIAC-UHFFFAOYSA-N tetrabutan-2-yl silicate Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)OC(C)CC OQTSOKXAWXRIAC-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- OAVPBWLGJVKEGZ-UHFFFAOYSA-N tributoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCCCC)(OCCCC)OCCCC)CCC2OC21 OAVPBWLGJVKEGZ-UHFFFAOYSA-N 0.000 description 1
- FQYWWLSIKWDAEC-UHFFFAOYSA-N tributoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCOCC1CO1 FQYWWLSIKWDAEC-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- OHKFEBYBHZXHMM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CCC)OCC1CO1 OHKFEBYBHZXHMM-UHFFFAOYSA-N 0.000 description 1
- SJQPASOTJGFOMU-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)C(C)OCC1CO1 SJQPASOTJGFOMU-UHFFFAOYSA-N 0.000 description 1
- NFRRMEMOPXUROM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CC)OCC1CO1 NFRRMEMOPXUROM-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- FVMMYGUCXRZVPJ-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(CC)OCC1CO1 FVMMYGUCXRZVPJ-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- CFUDQABJYSJIQY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)OCC1CO1 CFUDQABJYSJIQY-UHFFFAOYSA-N 0.000 description 1
- NLKPPXKQMJDBFO-UHFFFAOYSA-N triethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCC)(OCC)OCC)CCC2OC21 NLKPPXKQMJDBFO-UHFFFAOYSA-N 0.000 description 1
- KPNCYSTUWLXFOE-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCC(C)OCC1CO1 KPNCYSTUWLXFOE-UHFFFAOYSA-N 0.000 description 1
- PSUKBUSXHYKMLU-UHFFFAOYSA-N triethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OCC)(OCC)OCC)CCC2OC21 PSUKBUSXHYKMLU-UHFFFAOYSA-N 0.000 description 1
- GSUGNQKJVLXBHC-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCOCC1CO1 GSUGNQKJVLXBHC-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- FFJVMNHOSKMOSA-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCCC([Si](OC)(OC)OC)OCC1CO1 FFJVMNHOSKMOSA-UHFFFAOYSA-N 0.000 description 1
- DAVVOFDYOGMLNQ-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)C(C)OCC1CO1 DAVVOFDYOGMLNQ-UHFFFAOYSA-N 0.000 description 1
- FNBIAJGPJUOAPB-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)C(CC)OCC1CO1 FNBIAJGPJUOAPB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- KKFKPRKYSBTUDV-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CC(CC)OCC1CO1 KKFKPRKYSBTUDV-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- HTVULPNMIHOVRU-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)OCC1CO1 HTVULPNMIHOVRU-UHFFFAOYSA-N 0.000 description 1
- DBUFXGVMAMMWSD-UHFFFAOYSA-N trimethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OC)(OC)OC)CCC2OC21 DBUFXGVMAMMWSD-UHFFFAOYSA-N 0.000 description 1
- ZQPNGHDNBNMPON-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCC(C)OCC1CO1 ZQPNGHDNBNMPON-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- GUKYSRVOOIKHHB-UHFFFAOYSA-N trimethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCCCOCC1CO1 GUKYSRVOOIKHHB-UHFFFAOYSA-N 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Polyethers (AREA)
- Paints Or Removers (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】基材表面に汚れが付着しにく
く、かつ汚染物の除去が容易な性質を付与する高耐久性
の含フッ素化合物および透明基材表面にその防汚性組成
物を被覆した防汚性物品に関する。TECHNICAL FIELD The present invention relates to a highly durable fluorine-containing compound which imparts a property that dirt does not easily adhere to the surface of a substrate and easily removes contaminants, and a surface of a transparent substrate coated with the antifouling composition. The present invention relates to an antifouling article.
【0002】[0002]
【従来の技術】表示装置などに使用される反射防止処理
した表面などの透明基材は指紋などの汚れが付着しやす
く、透明性や反射性を損なうため、表面に撥水・撥油性
の塗膜を形成させる方法で防汚性を改善する試みがなさ
れている。このような防汚層を得る方法として含フッ素
化合物を使用して撥水撥油膜を得る試みが知られてお
り、近年、例えば特開平2−22372のようにパーフ
ルオロアルキル基を有するシラン化合物を溶媒に溶解し
た後、基板にコーティングして撥水撥油層を形成する方
法が知られるようになった。しかし、これらの含フッ素
被膜は撥水撥油性には優れるが、指紋の付着しやすさや
指紋の除去性に問題があり、また、膜自体の強度が弱く
被膜の耐久性、密着性にも問題があるため表示画面表面
に使用するには満足し得ない。2. Description of the Related Art A transparent substrate such as an antireflection-treated surface used for a display device or the like easily adheres to a stain such as a fingerprint and impairs transparency and reflectivity. Attempts have been made to improve antifouling properties by a method of forming a film. As a method for obtaining such an antifouling layer, an attempt to obtain a water- and oil-repellent film using a fluorine-containing compound has been known. In recent years, for example, a silane compound having a perfluoroalkyl group as disclosed in JP-A-2-22372 has been used. A method of forming a water- and oil-repellent layer by coating a substrate after dissolving in a solvent has become known. However, although these fluorine-containing coatings are excellent in water and oil repellency, they have problems in the ease with which fingerprints are attached and the ability to remove fingerprints. Therefore, it is not satisfactory for use on the display screen surface.
【0003】[0003]
【発明が解決しようとする課題】表示装置などに用いら
れる透明基材は人が使用するに際し、指紋、サインペ
ン、化粧、汗などの汚れが付着しやすく、一度付着する
とその汚れは除去しにくい。そのため本発明では、上記
従来技術の欠点を解消した非常に簡便な手法により合成
することができる含フッ素化合物および、それを透明基
材上に被覆した汚れが付着しにくく、かつ汚染物の除去
が容易で、被膜の密着性、膜強度、耐磨耗性に優れた防
汚性物品を提供するものである。A transparent substrate used for a display device or the like easily adheres to stains such as fingerprints, felt-tip pens, makeup, and sweat when used by humans, and once adhered, it is difficult to remove the stains. Therefore, in the present invention, a fluorine-containing compound that can be synthesized by a very simple method that has solved the above-mentioned disadvantages of the conventional technology, and the dirt coated on a transparent substrate is less likely to adhere, and the removal of contaminants is reduced. An object of the present invention is to provide an antifouling article which is easy and excellent in coating adhesion, film strength and abrasion resistance.
【0004】[0004]
【課題を解決するための手段】上記目的を達するために
本発明の防汚性組成物は、下記構成を有する。Means for Solving the Problems To achieve the above object, the antifouling composition of the present invention has the following constitution.
【0005】「下記一般式で示される含フッ素アルコー
ル化合物1種以上と R1−Af−R1 (Af:直鎖構造または分岐構造の二価含フッ素有機
基、R1:-(CH2)a-OR2(R2は水素原子または-(CH2CH(O
H)CH2O)bHまたは-(CH2CH2O)c-H ここで、aは1〜4の
整数、bは1〜3の整数、cは1〜15の整数を表
す。)、下記一般式で示されるシラン化合物1種以上を
反応することを特徴とする含フッ素化合物。"One or more fluorine-containing alcohol compounds represented by the following general formula and R 1 -A f -R 1 (A f : a divalent fluorine-containing organic group having a linear or branched structure, R 1 :-(CH 2 ) a -OR 2 (R 2 is a hydrogen atom or-(CH 2 CH (O
H) CH 2 O) b H, or - (wherein CH 2 CH 2 O) c -H , a is an integer from 1 to 4, b is an integer of 1 to 3, c is an integer of 1 to 15. ), A fluorine-containing compound characterized by reacting at least one silane compound represented by the following general formula.
【0006】Si(R3)i(R4)j(OR5)4-(i+j) (式中 R3、R4は炭素、水素、酸素又はフッ素原子
を含む有機基を、R5は脂肪族、脂環族、芳香族残基
を、iは0または1、jは0または1の整数をそれぞれ
表す。)」Si (R3) i (R4) j (OR5) 4- (i + j) (wherein R3 and R4 are organic groups containing a carbon, hydrogen, oxygen or fluorine atom, and R5 is an aliphatic or alicyclic And i represents an integer of 0 or 1, and j represents an integer of 0 or 1.)
【0007】[0007]
【発明の実施の形態】本発明においては、次の含フッ素
アルコール化合物の1種以上が用いられる。 R1−Af−R1 (Af:直鎖構造または分岐構造の二価含フッ素有機
基、R1:-(CH2)a-OR2(R2は水素原子または-(CH2CH(O
H)CH2O)bHまたは-(CH2CH2O)c-H ここで、aは1〜4の
整数、bは1〜3の整数、cは1〜15の整数を表
す。) 具体的には例えば以下のものが挙げられる。DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, one or more of the following fluorine-containing alcohol compounds are used. R 1 -A f -R 1 (A f : a linear or branched divalent fluorinated organic group, R 1 :-(CH 2 ) a -OR 2 (R 2 is a hydrogen atom or-(CH 2 CH (O
H) CH 2 O) b H, or - (wherein CH 2 CH 2 O) c -H , a is an integer from 1 to 4, b is an integer of 1 to 3, c is an integer of 1 to 15. Specific examples include the following.
【0008】HO-(CH2)k-Bf-(CH2)k-OH HO-(CH2CH2O)l-(CH2)k-Bf-(CH2)k-(OCH2CH2)m-OH HOCH2CH(OH)CH2-O-(CH2)k-Bf-(CH2)k-O-CH2CH(OH)CH2OH kは1〜4の整数 l,mは1〜15の整数であり、Bfと
しては(CF2)n(nは2以上12以下の整数)で表される
パーフルオロアルキレンあるいは(CF2CF(CF3)O)、(CF2C
F2O)、(CF2O)、(CF(CF3)O)から選ばれる含フッ素ポリエ
ーテル基を主成分として含む二価の有機基が挙げられる
が、より高い防汚性を得るためには、Bfとして主鎖が
屈曲性を有し、分子量が大きく、フッ素含率が高い後者
のパーフルオロポリエーテルを含む構造が好ましい。な
かでも、上記含フッ素ポリエーテル基をランダムに分布
した配列よりなるものが主鎖の屈曲性から高い防汚性が
得られる。分子量としては500以上20000以下が
好ましく、より好ましくは1000以上10000以下
である。分子量が500未満だと防汚性が低下し、20
000を越えると合成の際の反応性が低下する傾向があ
る。HO- (CH 2 ) k-Bf- (CH 2 ) k-OH HO- (CH 2 CH 2 O) l- (CH 2 ) k-Bf- (CH 2 ) k- (OCH 2 CH 2 ) m-OH HOCH 2 CH (OH) CH 2 -O- (CH 2 ) k-Bf- (CH 2 ) kO-CH 2 CH (OH) CH 2 OH k is an integer of 1 to 4, l and m are 1 Bf is a perfluoroalkylene represented by (CF 2 ) n (n is an integer of 2 or more and 12 or less) or (CF 2 CF (CF 3 ) O), (CF 2 C
(F 2 O), (CF 2 O), a divalent organic group containing as a main component a fluorinated polyether group selected from (CF (CF 3 ) O), to obtain a higher antifouling property Preferably, Bf has a structure in which the main chain has flexibility, has a large molecular weight, and contains the latter perfluoropolyether having a high fluorine content. Among them, those having an arrangement in which the above-mentioned fluorinated polyether groups are randomly distributed provide high antifouling properties due to the flexibility of the main chain. The molecular weight is preferably from 500 to 20,000, more preferably from 1,000 to 10,000. If the molecular weight is less than 500, the antifouling property is reduced, and
If it exceeds 000, the reactivity at the time of synthesis tends to decrease.
【0009】また、本発明において含フッ素化合物を合
成するために使用されるシラン化合物としては以下の構
造を持つものが用いられる。The silane compound used for synthesizing the fluorine-containing compound in the present invention has the following structure.
【0010】Si(R3)i(R4)j(OR5)4-(i+j) (式中 R3、R4は炭素、水素、酸素およびフッ素原
子から選ばれる少なくとも1つを含む有機基を、R5は
脂肪族、脂環族および芳香族残基から選ばれる少なくと
も1つを、iは0または1、jは0または1、kは0ま
たは1の整数をそれぞれ表す。) 具体的にはメチルシリケ―ト、エチルシリケ―ト、n−
プロピルシリケ―ト、i−プロピルシリケ―ト、n−ブ
チルシリケ―ト、sec−ブチルシリケ―トおよびt−
ブチルシリケ―トなどのテトラアルコキシシラン類、さ
らにはメチルトリメトキシシラン、メチルトリエトキシ
シラン、メチルトリアセトキシシラン、メチルトリブト
キシシラン、エチルトリメトキシシラン、エチルトリエ
トキシシラン、ビニルトリメトキシシラン、ビニルトリ
エトキシシラン、ビニルトリアセトキシシラン、ビニル
トリメトキシエトキシシラン、ビニルジメチルエトキシ
シラン、ビニルメチルジエトキシシラン、フェニルトリ
メトキシシラン、フェニルトリエトキシシラン、フェニ
ルトリアセトキシシラン、γ―クロロプロピルトリメト
キシシラン、γ―クロロプロピルトリエトキシシラン、
γ―クロロプロピルトリアセトキシシラン、γ―メタク
リルオキシプロピルトリメトキシシラン、γ―アミノプ
ロピルトリメトキシシラン、γ―アミノプロピルトリエ
トキシシラン、γ―メルカプトプロピルトリメトキシシ
ラン、γ―メルカプトプロピルトリエトキシシラン、N
−β−(アミノエチル)―γ―アミノプロピルトリメト
キシシラン、β―シアノエチルトリエトキシシラン、メ
チルトリフェノキシシラン、クロロメチルトリメトキシ
シラン、クロロメチルトリエトキシシラン、グリシドキ
シメチルトリメトキシシラン、グリシドキシメチルトリ
エトキシシラン、α―グリシドキシエチルトリメトキシ
シラン、α―グリシドキシエチルトリエトキシシラン、
β―グリシドキシエチルトリメトキシシラン、β―グリ
シドキシエチルトリエトキシシラン、α―グリシドキシ
プロピルトリメトキシシラン、α―グリシドキシプロピ
ルトリエトキシシラン、β―グリシドキシプロピルトリ
メトキシシラン、β―グリシドキシプロピルトリエトキ
シシラン、γ―グリシドキシプロピルトリメトキシシラ
ン、γ―グリシドキシプロピルトリエトキシシラン、ジ
エトキシ−3−グリシドキシプロピルメチルシラン、ジ
メトキシ−3−グリシドキシプロピルメチルシラン、3
−グリシドキシプロピルジメトキシシラン、γ−(メ
タ)アクリロイルオキシプロピルジメチルエトキシシラ
ン、γ−(メタ)アクリロイルオキシプロピルメチルジ
エトキシシラン、γ―グリシドキシプロピルトリプロポ
キシシラン、γ―グリシドキシプロピルトリブトキシシ
ラン、γ―グリシドキシプロピルトリメトキシエトキシ
シラン、γ―グリシドキシプロピルトリフェノキシシラ
ン、α―グリシドキシブチルトリメトキシシラン、α―
グリシドキシブチルトリエトキシシラン、β―グリシド
キシブチルトリメトキシシラン、β―グリシドキシブチ
ルトリエトキシシラン、γ―グリシドキシブチルトリメ
トキシシラン、γ―グリシドキシブチルトリエトキシシ
ラン、δ―グリシドキシブチルトリメトキシシラン、δ
―グリシドキシブチルトリエトキシシラン、(3,4−
エポキシシクロヘキシル)メチルトリメトキシシラン、
(3,4−エポキシシクロヘキシル)メチルトリエトキ
シシラン、β―(3,4−エポキシシクロヘキシル)エ
チルトリメトキシシラン、β―(3,4−エポキシシク
ロヘキシル)エチルトリエトキシシラン、β―(3,4
−エポキシシクロヘキシル)エチルトリプロポキシシラ
ン、β―(3,4−エポキシシクロヘキシル)エチルト
リブトキシシラン、β―(3,4−エポキシシクロヘキ
シル)エチルトリメトキシエトキシシラン、β―(3,
4−エポキシシクロヘキシル)エチルトリフェノキシシ
ラン、γ―(3,4−エポキシシクロヘキシル)プロピ
ルトリメトキシシラン、γ―(3,4−エポキシシクロ
ヘキシル)プロピルトリエトキシシラン、δ―(3,4
−エポキシシクロヘキシル)ブチルトリメトキシシラ
ン、δ―(3,4−エポキシシクロヘキシル)ブチルト
リエトキシシランなどのトリアルコキシシラン、トリア
シルオキシシランまたはトリフェノキシシラン類および
ジメチルジメトキシシラン、フェニルメチルジメトキシ
シラン、ジメチルジエトキシシラン、フェニルメチルジ
エトキシシラン、γ―クロロプロピルメチルジメトキシ
シラン、γ―クロロプロピルメチルジエトキシシラン、
ジメチルジアセトキシシラン、γ―メタクリルオキシプ
ロピルメチルジメトキシシラン、γ―メタクリルオキシ
プロピルメチルジエトキシシラン、γ―メルカプトプロ
ピルメチルジメトキシシラン、γ―メルカプトプロピル
メチルジエトキシシラン、γ―アミノプロピルメチルジ
メトキシシラン、γ―アミノプロピルメチルジエトキシ
シラン、メチルビニルジメトキシシラン、メチルビニル
ジエトキシシラン、グリシドキシメチルメチルジメトキ
シシラン、グリシドキシメチルメチルジエトキシシラ
ン、α―グリシドキシエチルメチルジメトキシシラン、
α―グリシドキシエチルメチルジエトキシシラン、β―
グリシドキシエチルメチルジメトキシシラン、β―グリ
シドキシエチルメチルジエトキシシラン、α―グリシド
キシプロピルメチルジメトキシシラン、α―グリシドキ
シプロピルメチルジエトキシシラン、β―グリシドキシ
プロピルメチルジメトキシシラン、β―グリシドキシプ
ロピルメチルジエトキシシラン、γ―グリシドキシプロ
ピルメチルジメトキシシラン、γ―グリシドキシプロピ
ルメチルジエトキシシラン、γ―グリシドキシプロピル
メチルジプロポキシシラン、γ―グリシドキシプロピル
メチルジブトキシシラン、γ―グリシドキシプロピルメ
チルジメトキシエトキシシラン、γ―グリシドキシプロ
ピルメチルジフェノキシシラン、γ―グリシドキシプロ
ピルエチルジメトキシシラン、γ―グリシドキシプロピ
ルエチルジエトキシシラン、γ―グリシドキシプロピル
エチルジプロポキシシラン、γ―グリシドキシプロピル
ビニルジメトキシシラン、γ―グリシドキシプロピルビ
ニルジエトキシシラン、γ―グリシドキシプロピルフェ
ニルジメトキシシラン、γ―グリシドキシプロピルフェ
ニルジエトキシシランなどジアルコキシシランまたはジ
アシルオキシシラン類、テトラメトキシシラン、テトラ
エトキシシラン、テトラ−iso−プロポキシシラン、
テトラ−n−プロポキシシラン、テトラ−n−ブトキシ
シラン、テトラ−sec−ブトキシシラン、テトラ−t
ert−ブトキシシラン、テトラペンタエトキシシラ
ン、テトラペンタ−iso−プロポキシシラン、テトラ
ペンタ−n−プロポキシシラン、テトラペンタ−n−ブ
トキシシラン、テトラペンタ−sec−ブトキシシラ
ン、テトラペンタ−tert−ブトキシシラン、メチル
トリプロポキシシラン、ジメチルエトキシシラン、ジメ
チルメトキシシラン、ジメチルプロポキシシラン、ジメ
チルブトキシシラン、メチルジメトキシシラン、ヘキシ
ルトリメトキシシラン、γ−(メタ)アクリロイルオキ
シプロピルトリメトキシシラン等のシラン化合物などが
挙げられる。Si (R 3) i (R 4) j (OR 5) 4- (i + j) (wherein R 3 and R 4 represent an organic group containing at least one selected from carbon, hydrogen, oxygen and a fluorine atom; Represents at least one selected from aliphatic, alicyclic and aromatic residues, i represents 0 or 1, j represents 0 or 1, and k represents an integer of 0 or 1.) Specifically, methyl silicate G, ethyl silicate, n-
Propyl silicate, i-propyl silicate, n-butyl silicate, sec-butyl silicate and t-butyl silicate
Tetraalkoxysilanes such as butyl silicate, furthermore, methyltrimethoxysilane, methyltriethoxysilane, methyltriacetoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane Silane, vinyltriacetoxysilane, vinyltrimethoxyethoxysilane, vinyldimethylethoxysilane, vinylmethyldiethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriacetoxysilane, γ-chloropropyltrimethoxysilane, γ-chloro Propyltriethoxysilane,
γ-chloropropyltriacetoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, N
-Β- (aminoethyl) -γ-aminopropyltrimethoxysilane, β-cyanoethyltriethoxysilane, methyltriphenoxysilane, chloromethyltrimethoxysilane, chloromethyltriethoxysilane, glycidoxymethyltrimethoxysilane, glycid Xymethyltriethoxysilane, α-glycidoxyethyltrimethoxysilane, α-glycidoxyethyltriethoxysilane,
β-glycidoxyethyltrimethoxysilane, β-glycidoxyethyltriethoxysilane, α-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltriethoxysilane, β-glycidoxypropyltrimethoxysilane, β-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, diethoxy-3-glycidoxypropylmethylsilane, dimethoxy-3-glycidoxypropylmethyl Silane, 3
-Glycidoxypropyldimethoxysilane, γ- (meth) acryloyloxypropyldimethylethoxysilane, γ- (meth) acryloyloxypropylmethyldiethoxysilane, γ-glycidoxypropyltripropoxysilane, γ-glycidoxypropyltri Butoxysilane, γ-glycidoxypropyltrimethoxyethoxysilane, γ-glycidoxypropyltriphenoxysilane, α-glycidoxybutyltrimethoxysilane, α-
Glycidoxybutyltriethoxysilane, β-glycidoxybutyltrimethoxysilane, β-glycidoxybutyltriethoxysilane, γ-glycidoxybutyltrimethoxysilane, γ-glycidoxybutyltriethoxysilane, δ- Glycidoxybutyltrimethoxysilane, δ
-Glycidoxybutyltriethoxysilane, (3,4-
Epoxycyclohexyl) methyltrimethoxysilane,
(3,4-epoxycyclohexyl) methyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4
-Epoxycyclohexyl) ethyltripropoxysilane, β- (3,4-epoxycyclohexyl) ethyltributoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxyethoxysilane, β- (3
4-epoxycyclohexyl) ethyltriphenoxysilane, γ- (3,4-epoxycyclohexyl) propyltrimethoxysilane, γ- (3,4-epoxycyclohexyl) propyltriethoxysilane, δ- (3,4
Trialkoxysilanes such as -epoxycyclohexyl) butyltrimethoxysilane, δ- (3,4-epoxycyclohexyl) butyltriethoxysilane, triacyloxysilanes or triphenoxysilanes and dimethyldimethoxysilane, phenylmethyldimethoxysilane, dimethyldiethoxysilane Silane, phenylmethyldiethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropylmethyldiethoxysilane,
Dimethyldiacetoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-aminopropylmethyldimethoxysilane, γ -Aminopropylmethyldiethoxysilane, methylvinyldimethoxysilane, methylvinyldiethoxysilane, glycidoxymethylmethyldimethoxysilane, glycidoxymethylmethyldiethoxysilane, α-glycidoxyethylmethyldimethoxysilane,
α-glycidoxyethylmethyldiethoxysilane, β-
Glycidoxyethylmethyldimethoxysilane, β-glycidoxyethylmethyldiethoxysilane, α-glycidoxypropylmethyldimethoxysilane, α-glycidoxypropylmethyldiethoxysilane, β-glycidoxypropylmethyldimethoxysilane, β-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropylmethyldipropoxysilane, γ-glycidoxypropylmethyl Dibutoxysilane, γ-glycidoxypropylmethyldimethoxyethoxysilane, γ-glycidoxypropylmethyldiphenoxysilane, γ-glycidoxypropylethyldimethoxysilane, γ-glycidoxypropylethyldiethoxysilane γ-glycidoxypropylethyldipropoxysilane, γ-glycidoxypropylvinyldimethoxysilane, γ-glycidoxypropylvinyldiethoxysilane, γ-glycidoxypropylphenyldimethoxysilane, γ-glycidoxypropylphenyldi Dialkoxysilane or diacyloxysilanes such as ethoxysilane, tetramethoxysilane, tetraethoxysilane, tetra-iso-propoxysilane,
Tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-t
ert-butoxysilane, tetrapentaethoxysilane, tetrapenta-iso-propoxysilane, tetrapenta-n-propoxysilane, tetrapenta-n-butoxysilane, tetrapenta-sec-butoxysilane, tetrapenta-tert-butoxysilane, methyltripropoxysilane, Examples thereof include silane compounds such as dimethylethoxysilane, dimethylmethoxysilane, dimethylpropoxysilane, dimethylbutoxysilane, methyldimethoxysilane, hexyltrimethoxysilane, and γ- (meth) acryloyloxypropyltrimethoxysilane.
【0011】シラン化合物の中でも特に好ましく使用さ
れるのは含フッ素シラン化合物であり以下のものが例示
される。Among the silane compounds, fluorine-containing silane compounds are particularly preferably used, and the following are exemplified.
【0012】CF3CH2Si(OCH3)3、CF3CH2Si(OC2H5)3、C4F
9CH2Si(OCH3)3、C4F9CH2Si(OC2H5)3、C6F13CH2Si(OCH3)
3、C6F13CH2Si(OC2H5)3、C8F17CH2Si(OCH3)3、C8F17CH2
Si(OC2H5)3、CF3C2H4Si(OCH3)3、CF3C2H4Si(OC2H5)3、C
4F9C2H4Si(OCH3)3、C4F9C2H4Si(OC2H5)3、C6F13C2H4Si
(OCH3)3、C6F13C2H4Si(OC2H5)3、C8F17C2H4Si(OCH3)3、
C8F17C2H4Si(OC2H5)3、C6F13C2H4SiCH3(OCH3)2、C6F13C
3H6Si(OC2H5)3、C8F17C2H4SiCH3(OCH3)2、C16F33C2H4Si
(OCH3)3、C18F37C2H4Si(OCH3)3、C20F41C2H4Si(OC
H3)3。CF 3 CH 2 Si (OCH 3 ) 3 , CF 3 CH 2 Si (OC 2 H 5 ) 3 , C 4 F
9 CH 2 Si (OCH 3 ) 3 , C 4 F 9 CH 2 Si (OC 2 H 5 ) 3 , C 6 F 13 CH 2 Si (OCH 3 )
3, C 6 F 13 CH 2 Si (OC 2 H 5) 3, C 8 F 17 CH 2 Si (OCH 3) 3, C 8 F 17 CH 2
Si (OC 2 H 5) 3 , CF 3 C 2 H 4 Si (OCH 3) 3, CF 3 C 2 H 4 Si (OC 2 H 5) 3, C
4 F 9 C 2 H 4 Si (OCH 3 ) 3 , C 4 F 9 C 2 H 4 Si (OC 2 H 5 ) 3 , C 6 F 13 C 2 H 4 Si
(OCH 3) 3, C 6 F 13 C 2 H 4 Si (OC 2 H 5) 3, C 8 F 17 C 2 H 4 Si (OCH 3) 3,
C 8 F 17 C 2 H 4 Si (OC 2 H 5 ) 3 , C 6 F 13 C 2 H 4 SiCH 3 (OCH 3 ) 2 , C 6 F 13 C
3 H 6 Si (OC 2 H 5 ) 3 , C 8 F 17 C 2 H 4 SiCH 3 (OCH 3 ) 2 , C 16 F 33 C 2 H 4 Si
(OCH 3) 3, C 18 F 37 C 2 H 4 Si (OCH 3) 3, C 20 F 41 C 2 H 4 Si (OC
H 3 ) 3 .
【0013】一般に官能基含有含フッ素化合物は各種の
方法により製造することが可能であるが、本発明におい
て以上に挙げた含フッ素多価アルコール1種以上とシラ
ン化合物1種以上を下記の脱アルコール縮合を行うこと
により簡便に含フッ素化合物を得ることができる。ま
た、この化合物は一般には重縮合体であり、分子内に未
反応のアルコキシシラン基を含む場合は基材に対して高
い密着性を有する特徴がある。In general, the functional group-containing fluorine-containing compound can be produced by various methods. In the present invention, one or more of the above-mentioned fluorine-containing polyhydric alcohol and one or more of the silane compounds are subjected to the following alcohol removal. By performing the condensation, a fluorine-containing compound can be easily obtained. In addition, this compound is generally a polycondensate, and has a feature of having high adhesion to a substrate when containing an unreacted alkoxysilane group in the molecule.
【0014】脱アルコール反応 −Rx−OH + RyO−Si− → −Rx−O−
Si− + RyOH↑ 反応は無溶媒下あるいは溶媒下で行うことができ、溶媒
としてはDMF,DMSO等の極性溶媒あるいはパーフ
ルオロヘキサン、パーフルオロオクタン、トリフルオロ
キシレン等のフッ素系の溶媒等を使用できる。反応温度
は室温から200度ぐらいが好ましいが、生成したアル
コールが蒸発する温度以上で行うことが望ましい。ま
た、生成アルコールを完全に留去するために、5〜20
0torrに減圧して反応を完結させても良い。The dealcoholation reaction -Rx-OH + RyO-Si- → -Rx-O-
The Si- + RyOH reaction can be carried out without solvent or in a solvent. As the solvent, a polar solvent such as DMF or DMSO or a fluorine-based solvent such as perfluorohexane, perfluorooctane or trifluoroxylene is used. it can. The reaction temperature is preferably from room temperature to about 200 ° C., but it is preferable to carry out the reaction at a temperature at which the produced alcohol evaporates. Further, in order to completely remove the formed alcohol, 5 to 20
The reaction may be completed by reducing the pressure to 0 torr.
【0015】また、この脱アルコール反応による縮合を
行う際に、反応速度を早くするなどの目的でナトリウム
あるいは水酸化ナトリウム、水酸化リチウムなどの塩基
性触媒、ナトリウムメトキシド、ナトリウムエトキシド
などの金属アルコキシドを触媒として使用することもで
きる。In the condensation by the dealcoholation reaction, sodium or a basic catalyst such as sodium hydroxide or lithium hydroxide, or a metal such as sodium methoxide or sodium ethoxide for the purpose of increasing the reaction rate. Alkoxides can also be used as catalysts.
【0016】含フッ素アルコール100モルに対してシ
ラン化合物を50モル〜400モル添加して脱アルコー
ル反応により縮重合することが好ましく、50モル未満
では基材に対する密着性、強度が低下し、400モルを
越えると防汚性が低下する傾向がある。It is preferable to add 50 to 400 moles of a silane compound to 100 moles of the fluorinated alcohol and to conduct condensation polymerization by a dealcoholization reaction. If it exceeds 300, the antifouling property tends to decrease.
【0017】また、分子量を調整する目的で、分子量調
整剤を使用することもできる。分子量調整剤としては特
に限定されないが、下式5あるいは下式6で表される化
合物が望ましい。For the purpose of adjusting the molecular weight, a molecular weight modifier may be used. The molecular weight regulator is not particularly limited, but a compound represented by the following formula 5 or 6 is desirable.
【0018】X1X2X3Si(OR6) ・・・式5 (X1、X2、X3は炭素、水素、酸素、窒素、硫黄ま
たはフッ素原子を含む有機基を、R6は脂肪族、脂環
族、芳香族残基をそれぞれ示す。) R7-OH ・・・式6 (R7は1価の有機基) 式5で表される化合物の具体例としては(CH3)3Si(OC
H3)、(CH3)3Si(OC2H5)などが挙げられる。また、式6で
表される化合物の具体例としてはF(CF2)pCH2OH、F(CF2)
pCH2CH2OH、H(CF2)pCH2OH、F(CF2)p(CH2)6OH、CF3(CF3)
CF(CF2)rCH2CH2OH、CF3(CF3)CF(CF2)r(CH2)6OH(pは1
〜10の整数、rは1〜8の整数)などが挙げられる。X1X2X3Si (OR6) Formula 5 (X1, X2, X3 represent an organic group containing a carbon, hydrogen, oxygen, nitrogen, sulfur or fluorine atom, and R6 represents an aliphatic, alicyclic or aromatic residue. indicating each.) R7-OH ··· equation 6 (R7 are specific examples of compounds represented by a monovalent organic group) formula 5 (CH 3) 3 Si ( OC
H 3 ), (CH 3 ) 3 Si (OC 2 H 5 ) and the like. Specific examples of the compound represented by the formula 6 include F (CF 2 ) pCH 2 OH and F (CF 2 )
pCH 2 CH 2 OH, H (CF 2 ) pCH 2 OH, F (CF 2 ) p (CH 2 ) 6 OH, CF 3 (CF 3 )
CF (CF 2) rCH 2 CH 2 OH, CF 3 (CF 3) CF (CF 2) r (CH 2) 6 OH (p is 1
An integer of 10 to 10, and r is an integer of 1 to 8).
【0019】このようにして合成した含フッ素化合物の
数平均分子量は1×103 〜1×106が好ましい。The number average molecular weight of the fluorine-containing compound thus synthesized is preferably from 1 × 10 3 to 1 × 10 6 .
【0020】以上のようにして得られた含フッ素化合物
を透明基材上に被覆すれば防汚性の透明基材が得られ
る。被覆方法としてはウエットプロセスとドライプロセ
スが挙げられる。ウエットプロセスとしては特に限定す
るものではないが、スピンコート、ディップコート、ダ
イコート、スプレーコート、バーコート、ロールコー
ト、カーテンフローコート、グラビアコートなどの溶液
コート法により含フッ素化合物を含む塗料を塗布し、溶
媒を除去し、必要に応じて室温あるいは加熱して硬化す
る。使用する溶媒としては一般の極性溶媒あるいはパー
フルオロヘキサン、パーフルオロオクタン、トリフルオ
ロキシレン等のフッ素系の溶媒が好ましい。また、分子
内の未反応のアルコキシシラン基を加水分解し、シロキ
サン結合による縮合を促進するために、純水または塩
酸、酢酸、リン酸、硝酸あるいは硫酸などの酸性水溶液
あるいは硬化促進のためアルミニウムアセチルアセトナ
ートなどの金属アルコキシドを添加していても構わな
い。その他に、防汚性能、光学性能、表面性能の改質剤
としてフッ素系界面活性剤あるいはシリコン系界面活性
剤などの界面活性剤、Si、Al、Sn、Sb、Zn、
Tiの酸化物やフッ化マグネシウム、フッ化カルシウム
などの微粒子、ポリテトラフルオロエチレン等のフッ素
樹脂、エチルシリケート、パーフルオロオクチルエチル
トリメトキシシラン等の有機珪素化合物あるいはその加
水分解物を添加しても良い。When the thus obtained fluorine-containing compound is coated on a transparent substrate, an antifouling transparent substrate can be obtained. Examples of the coating method include a wet process and a dry process. The wet process is not particularly limited, but a coating containing a fluorine-containing compound is applied by a solution coating method such as spin coating, dip coating, die coating, spray coating, bar coating, roll coating, curtain flow coating, or gravure coating. Then, the solvent is removed, and if necessary, the mixture is cured at room temperature or by heating. As a solvent to be used, a general polar solvent or a fluorine-based solvent such as perfluorohexane, perfluorooctane, trifluoroxylene and the like is preferable. In addition, pure water or an acidic aqueous solution such as hydrochloric acid, acetic acid, phosphoric acid, nitric acid or sulfuric acid, or aluminum acetyl for accelerating hardening is used to hydrolyze unreacted alkoxysilane groups in the molecule and promote condensation by siloxane bonds. A metal alkoxide such as acetonate may be added. In addition, surfactants such as a fluorine-based surfactant or a silicon-based surfactant as modifiers for antifouling performance, optical performance, and surface performance, Si, Al, Sn, Sb, Zn,
Oxidation of Ti, fine particles such as magnesium fluoride and calcium fluoride, fluororesins such as polytetrafluoroethylene, and organic silicon compounds such as ethyl silicate and perfluorooctylethyltrimethoxysilane or a hydrolyzate thereof are also added. good.
【0021】一方、ドライプロセスとしては特に限定す
るものではないが真空蒸着法、イオンビームアシスト蒸
着法、イオンプレーティング法、スパッタリング法、C
VD法などの気相成長法により透明基材上に含フッ素化
合物を被覆する方法が挙げられる。On the other hand, the dry process is not particularly limited, but includes a vacuum deposition method, an ion beam assisted deposition method, an ion plating method, a sputtering method,
A method in which a fluorine-containing compound is coated on a transparent substrate by a vapor phase growth method such as a VD method is exemplified.
【0022】含フッ素化合物の被膜の好ましい膜厚とし
ては1nmから100nm、より好ましくは10nmか
ら50nmである。膜厚が1nmより薄いと防汚性の効
果が乏しくなり、100nmより厚いと膜強度が弱くな
る傾向がある。The preferred film thickness of the fluorine-containing compound film is 1 nm to 100 nm, more preferably 10 nm to 50 nm. If the thickness is less than 1 nm, the antifouling effect is poor, and if it is more than 100 nm, the film strength tends to be weak.
【0023】本発明における好ましい実施形態として上
記含フッ素化合物を有機または無機成分の、単層または
多層の反射防止膜上に設ける様態が挙げられる。通常、
有機成分をバインダーとして使用する反射防止膜はウエ
ットプロセスにより、無機成分の反射防止膜はドライプ
ロセスにより形成される。なかでも反射防止膜の最表層
が二酸化珪素を主体としてなる層からなり、本発明の含
フッ素化合物と化学的に結合できる反射防止膜が膜強
度、密着性から考えて好ましい。本発明を限定するもの
ではないが、反射防止膜としては無機酸化物、無機窒化
物、フッ素含有無機化合物などを単層または多層コーテ
ィングして得られるものが好ましい。用いられる無機化
合物としては、一酸化珪素、二酸化珪素、酸化ジルコニ
ウム、酸化アルミニウム、酸化イットリウム、酸化イッ
テルビウム、酸化セリウム、酸化ハフニウム、酸化ス
ズ、ITO等の酸化物、窒化珪素などの無機窒化物、フ
ッ化マグネシム、フッ化カルシウム、フッ化ナトリウ
ム、フッ化セシウム、フッ化リチウム等のフッ素含有無
機化合物等が挙げられる。In a preferred embodiment of the present invention, the above-mentioned fluorine-containing compound is provided on a single-layer or multilayer antireflection film of an organic or inorganic component. Normal,
The antireflection film using an organic component as a binder is formed by a wet process, and the antireflection film of an inorganic component is formed by a dry process. Above all, the outermost layer of the antireflection film is composed of a layer mainly composed of silicon dioxide, and an antireflection film capable of chemically bonding to the fluorine-containing compound of the present invention is preferable in view of film strength and adhesion. Although the present invention is not limited thereto, it is preferable that the antireflection film is obtained by coating an inorganic oxide, an inorganic nitride, a fluorine-containing inorganic compound, or the like with a single layer or a multilayer. Examples of the inorganic compound used include oxides such as silicon monoxide, silicon dioxide, zirconium oxide, aluminum oxide, yttrium oxide, ytterbium oxide, cerium oxide, hafnium oxide, tin oxide, ITO, inorganic nitrides such as silicon nitride, and fluorine. And fluorine-containing inorganic compounds such as magnesium fluoride, calcium fluoride, sodium fluoride, cesium fluoride, and lithium fluoride.
【0024】無機系反射防止膜の形成方法としては、特
に限定されるものではないが真空蒸着法、イオンビーム
アシスト蒸着法、イオンプレーティング法、スパッタリ
ング法などにより形成される。The method of forming the inorganic antireflection film is not particularly limited, but is formed by a vacuum deposition method, an ion beam assisted deposition method, an ion plating method, a sputtering method, or the like.
【0025】また、透明基材がポリメチルメタクリレー
トのような樹脂である場合、表面硬度を高める目的で基
材と反射防止膜の間にハードコート層を設けることが好
ましい。When the transparent substrate is a resin such as polymethyl methacrylate, a hard coat layer is preferably provided between the substrate and the antireflection film for the purpose of increasing the surface hardness.
【0026】以上のような方法で透明基材上に、本発明
の優れた防汚性、耐磨耗性、膜強度を有する含フッ素化
合物を被覆することにより、目的とする防汚性物品を得
る事ができる。By coating a fluorine-containing compound having excellent antifouling properties, abrasion resistance and film strength of the present invention on a transparent substrate by the above method, the desired antifouling article can be obtained. You can get it.
【0027】[0027]
【実施例】次に実施例を挙げて、本発明を具体的に説明
するが、これに限定されるものではない。Next, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples.
【0028】(合成例1)パーフルオロポリエチレング
リコール系化合物HO-CH2CF2(CF2CF2O)n-CF2CH2-OH(数
平均分子量1500)15mmolとエチルシリケート
8mmolとナトリウムメトキシド(触媒)0.005
gを混合し100度で1時間攪拌し、徐々に昇温しなが
ら150度で4時間反応した後、さらに20torrの
減圧下で150度で1時間反応させたところ無色の粘性
の液体が得られた。(Synthesis Example 1) 15 mmol of perfluoropolyethylene glycol compound HO-CH 2 CF 2 (CF 2 CF 2 O) n-CF 2 CH 2 -OH (number average molecular weight 1500), 8 mmol of ethyl silicate and sodium methoxide (Catalyst) 0.005
g, stirred at 100 ° C for 1 hour, reacted at 150 ° C for 4 hours while gradually increasing the temperature, and further reacted at 150 ° C under reduced pressure of 20 torr for 1 hour to obtain a colorless viscous liquid. Was.
【0029】(合成例2)HO-CH2-CF2(OC2F4)p(OCF2)qO
CF2-CH2-OH (アウシモント社 FOMBLIN Z DOL 数平均
分子量2000;p/q=1 )15mmol とエチルシリケー
ト8mmolとナトリウムメトキシド(触媒)0.00
5gを混合し100度で1時間攪拌し、徐々に昇温しな
がら150度で4時間反応した後、さらに20torr
の減圧下で150度で1時間反応させたところ黄色の粘
性の液体が得られた。(Synthesis Example 2) HO-CH 2 -CF 2 (OC 2 F 4 ) p (OCF 2 ) qO
CF 2 -CH 2 -OH (Ausimont FOMBLIN Z DOL number average molecular weight 2000; p / q = 1) 15 mmol, ethyl silicate 8 mmol and sodium methoxide (catalyst) 0.00
5 g were mixed and stirred at 100 ° C. for 1 hour, and reacted at 150 ° C. for 4 hours while gradually increasing the temperature, and then further at 20 torr.
When the reaction was carried out at 150 ° C. for 1 hour under reduced pressure, a yellow viscous liquid was obtained.
【0030】(合成例3)HO-CH2-CF2(OC2F4)p(OCF2)qO
CF2-CH2-OH (アウシモント社 FOMBLIN Z DOL 数平均
分子量2000;p/q=1 )15mmol とCF3(CF2)7CH2CH2
Si(OCH3)3 11mmolとナトリウムメトキシド(触
媒)0.005gを混合し100度で1時間攪拌し、徐
々に昇温しながら150度で4時間反応した後、さらに
20torrの減圧下で150度で1時間反応させたと
ころ黄色の粘性の液体が得られた。(Synthesis Example 3) HO-CH 2 -CF 2 (OC 2 F 4 ) p (OCF 2 ) qO
15 mmol of CF 2 -CH 2 -OH (FOMBLIN Z DOL number-average molecular weight 2000; p / q = 1) of Asimont and CF 3 (CF 2 ) 7 CH 2 CH 2
11 mmol of Si (OCH 3 ) 3 and 0.005 g of sodium methoxide (catalyst) were mixed, stirred at 100 ° C. for 1 hour, reacted at 150 ° C. for 4 hours while gradually increasing the temperature, and then further reduced under reduced pressure of 20 torr. When the reaction was performed at a temperature of 1 hour, a yellow viscous liquid was obtained.
【0031】(合成例4)HO-CH2CH2(OH)CH2O-CF2(OC2F
4)p(OCF2)qOCF2-CH2-OCH2CH(OH)CH2-OH(アウシモント
社 FOMBLIN Z TETRAOL 数平均分子量2000;p/q=1 )と
15mmolエチルシリケート8mmolとナトリウム
メトキシド(触媒)0.005gをDMF20g中で混
合し100度で1時間攪拌し、徐々に昇温しながら15
0度で4時間反応した後、さらに20torrの減圧下
で150度で1時間反応させ、溶媒を留去したところ黄
色の粘性の液体が得られた。(Synthesis Example 4) HO-CH 2 CH 2 (OH) CH 2 O-CF 2 (OC 2 F
4) p (OCF 2) qOCF 2 -CH 2 -OCH 2 CH (OH) CH 2 -OH ( Ausimont FOMBLIN Z TETRAOL number average molecular weight 2000; p / q = 1) and 15mmol of ethyl silicate 8mmol and sodium methoxide ( (Catalyst) 0.005 g was mixed in 20 g of DMF, stirred at 100 ° C. for 1 hour, and gradually heated to 15
After reacting at 0 degree for 4 hours, the mixture was further reacted at 150 degree under reduced pressure of 20 torr for 1 hour, and the solvent was distilled off to obtain a yellow viscous liquid.
【0032】それぞれの反応においてIRにより反応の
進行を追跡し、3000cm-1〜3600cm-1付近に
現れるOH基に基づく特性吸収の減少により反応を確認
した。[0032] By IR in each of the reaction to track the progress of the reaction, the reaction was confirmed by a decrease in characteristic absorption based on OH groups appearing in the vicinity of 3000cm -1 ~3600cm -1.
【0033】(反射防止膜の作成)無機系反射防止膜を
以下の方法により作成した。(Preparation of Antireflection Film) An inorganic antireflection film was prepared by the following method.
【0034】シリカゾル(135重量部)、γーグリシ
ドキシプロピルトリエトキシシラン(129重量部)の
加水分解物、γークロロプロピルトリメトキシシラン
(70部)の加水分解物を主としてなるエタノール溶液
をポリカーボネート板の両面に塗布硬化して、ハードコ
ート膜を形成したものに無機物質のZrO2/SiO2/TiO2/SiO
2を真空蒸着法でこの順に、最外層がSiO2になるように
それぞれλ/4(λ=540nm)の膜厚に設定し、多
層被覆した。An ethanol solution mainly containing silica sol (135 parts by weight), a hydrolyzate of γ-glycidoxypropyltriethoxysilane (129 parts by weight), and a hydrolyzate of γ-chloropropyltrimethoxysilane (70 parts) was used. An inorganic substance, ZrO 2 / SiO 2 / TiO 2 / SiO, was applied to both sides of a polycarbonate plate and cured to form a hard coat film.
2 were coated in this order by a vacuum deposition method so that the outermost layer would be SiO 2 with a film thickness of λ / 4 (λ = 540 nm).
【0035】(実施例1〜4)上記無機系反射防止膜上
に、合成例1〜4で合成した物質を真空蒸着によりそれ
ぞれを被覆して防汚性反射防止物品を得た。(Examples 1 to 4) The substances synthesized in Synthesis Examples 1 to 4 were respectively coated on the above-mentioned inorganic antireflection films by vacuum evaporation to obtain antifouling antireflection articles.
【0036】(比較例1)無機系反射防止膜上にHO-CH2
-CF2(OC2F4)p(OCF2)qOCF2-CH2-OH (アウシモント社FOM
BLIN Z DOL 数平均分子量2000;p/q=1 )の被膜を真空
蒸着法により形成させた防汚性反射防止物品を得た。Comparative Example 1 HO-CH 2 was coated on an inorganic anti-reflection film.
-CF 2 (OC 2 F 4 ) p (OCF 2 ) qOCF 2 -CH 2 -OH (Ausimont FOM
BLIN Z DOL An antifouling antireflective article having a coating having a number average molecular weight of 2000; p / q = 1) was formed by vacuum evaporation.
【0037】(比較例2)無機系反射防止膜上にパーフ
ルオロオクチルエチルトリメトキシシランの被膜を真空
蒸着法により形成させた防汚性反射防止物品を得た。(Comparative Example 2) An antifouling antireflection article was obtained in which a film of perfluorooctylethyltrimethoxysilane was formed on the inorganic antireflection film by a vacuum evaporation method.
【0038】なお、以上の実施例及び参考例で得た防汚
性反射防止物品を以下の評価手段で評価した。The antifouling antireflection articles obtained in the above Examples and Reference Examples were evaluated by the following evaluation means.
【0039】a.指紋の拭き取り性:表面に指を3秒間
押しつけて、指紋を付着させ、ティッシュペーパーを往
復させて指紋を拭き取り、指紋の拭き取り易さを判定し
た。判定基準は以下の通り。A. Fingerprint wiping property: A finger was pressed against the surface for 3 seconds to attach a fingerprint, a tissue paper was reciprocated to wipe the fingerprint, and the ease of wiping the fingerprint was determined. The criteria are as follows.
【0040】 ◎:10往復程度で指紋が完全に拭き取れる ○:20往復程度で指紋が完全に拭き取れる △:30往復程度で拭き取れる ×:30往復以上で拭き残しあり ××:全くとれない b.スチールウール(SW)硬度:スチールウール#0
000番を使用し、250g/cm2荷重で往復する。判
定基準は以下の通り。 ◎:20往復して傷全く無し ○:10往復して傷無し △:10往復して傷が数本ある ×:10往復して傷あり ××:10往復して表面がはがれる c.耐擦傷性:クリーニングクロス(ベンコットM3:
旭化成製)を2Kg/cm2荷重で100往復する。判定
基準は以下の通り。 ◎:変化無し ○:接触角に多少変化あり △:反射率に多少変化あり ×:反射色が変化する ××:剥離 評価結果を以下の表に示す。A: A fingerprint can be completely wiped off in about 10 round trips. A: A fingerprint can be completely wiped out in about 20 round trips. Δ: Can be wiped out in about 30 round trips. b. Steel wool (SW) hardness: Steel wool # 0
Use No. 000 and reciprocate at a load of 250 g / cm 2 . The criteria are as follows. :: No scratches after 20 reciprocations ○: No scratches after 10 reciprocations △: Several scratches after 10 reciprocations ×: Scratches after 10 reciprocations XX: Surface peeled after 10 reciprocations c. Scratch resistance: Cleaning cloth (Bencott M3:
(Made by Asahi Kasei) 100 reciprocations with a load of 2 kg / cm 2 . The criteria are as follows. ◎: no change :: slight change in contact angle △: slight change in reflectance ×: change in reflected color XX: peeling The evaluation results are shown in the following table.
【0041】[0041]
【表1】 [Table 1]
【0042】[0042]
【本発明の効果】本発明により汚れが付着しにくく、か
つ汚染物の除去が容易で、被膜の密着性、膜強度、耐磨
耗性に優れた防汚性物品およびそれに適した含フッ素化
合物を提供することができた。According to the present invention, an antifouling article which does not easily adhere dirt, easily removes contaminants, and has excellent coating adhesion, film strength and abrasion resistance, and a fluorine-containing compound suitable therefor. Could be provided.
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08G 65/22 C08G 65/22 65/336 65/32 Q C09D 5/16 C09D 5/16 183/08 183/08 C09K 3/00 112 C09K 3/00 112D 112E 112F // C09K 3/18 102 3/18 102 104 104 Fターム(参考) 4H020 BA11 BA12 BA32 BA36 4H049 VN01 VP01 VQ02 VQ11 VQ19 VQ20 VR11 VR12 VR21 VR22 VR42 VR43 VR44 VS02 VS21 VU17 VU21 VW02 4J005 AA09 BD08 4J038 DL071 NA05 PB11 PC03 PC08 Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat II (Reference) C08G 65/22 C08G 65/22 65/336 65/32 Q C09D 5/16 C09D 5/16 183/08 183/08 C09K 3/00 112 C09K 3/00 112D 112E 112F // C09K 3/18 102 3/18 102 104 104 F F-term (reference) 4H020 BA11 BA12 BA32 BA36 4H049 VN01 VP01 VQ02 VQ11 VQ19 VQ20 VR11 VR12 VR21 VR22 VR42 VR43 VR44 VS02 VS02 VU17 VU21 VW02 4J005 AA09 BD08 4J038 DL071 NA05 PB11 PC03 PC08
Claims (11)
化合物1種以上と R1−Af−R1 (Af:直鎖構造または分岐構造の二価含フッ素有機
基、R1:-(CH2)a-OR2(R2は水素原子または-(CH2CH(O
H)CH2O)bHまたは-(CH2CH2O)c-H ここで、aは1〜4の
整数、bは1〜3の整数、cは1〜15の整数を表
す。)、下記一般式で示されるシラン化合物1種以上を
反応してなることを特徴とする含フッ素化合物。 Si(R3)i(R4)j(OR5)4-(i+j) (式中 R3、R4は炭素、水素、酸素およびフッ素原
子から選ばれる少なくとも一つを含む有機基を、R5は
脂肪族、脂環族および芳香族残基から選ばれる少なくと
も一つを、iは0または1、jは0または1の整数をそ
れぞれ表す。)1. A method according to claim 1, wherein at least one fluorine-containing alcohol compound represented by the following general formula and R 1 -A f -R 1 (A f : a linear or branched divalent fluorine-containing organic group, R 1 :-( CH 2 ) a -OR 2 (R 2 is a hydrogen atom or-(CH 2 CH (O
H) CH 2 O) b H, or - (wherein CH 2 CH 2 O) c -H , a is an integer from 1 to 4, b is an integer of 1 to 3, c is an integer of 1 to 15. ), A fluorine-containing compound obtained by reacting at least one silane compound represented by the following general formula. Si (R3) i (R4) j (OR5) 4- (i + j) (wherein R3 and R4 are organic groups containing at least one selected from carbon, hydrogen, oxygen and fluorine atoms, and R5 is aliphatic , At least one selected from alicyclic and aromatic residues, i represents 0 or 1, and j represents an integer of 0 or 1.)
C3F6)から選ばれる含フッ素ポリエーテル基を主成分
にすることを特徴とする請求項1記載の含フッ素化合
物。2. Af is (OCF 2 ), (OC 2 F 4 ), (O
C 3 F 6) fluorine-containing compound according to claim 1, characterized in that the main component a fluorine-containing polyether group selected from.
ることを特徴とする請求項1または2記載の含フッ素化
合物。3. The fluorine-containing compound according to claim 1, wherein the silane compound is a fluorine-containing silane compound.
モルに対して式2で表されるシラン化合物を50モル〜
400モル添加して脱アルコール反応により縮重合して
なることを特徴とする請求項1〜3のいずれかに記載の
含フッ素化合物。4. A fluorine-containing alcohol 100 represented by the formula 1.
The silane compound represented by the formula 2 is used in an amount of 50 mol to
The fluorine-containing compound according to any one of claims 1 to 3, which is obtained by polycondensation by a dealcoholization reaction after adding 400 moles.
化合物を主剤とする硬化性組成物。5. A curable composition comprising the fluorine-containing compound according to claim 1 as a main component.
化合物を含む塗料。6. A paint containing the fluorine-containing compound according to claim 1.
載の含フッ素化合物が被覆されてなることを特徴とする
防汚性物品。7. An antifouling article comprising a transparent substrate coated with the fluorine-containing compound according to any one of claims 1 to 4.
たは多層の反射防止膜を有し、さらにその上に請求項1
〜4のいずれかに記載の含フッ素化合物が被覆されてな
ることを特徴とする請求項7記載の防汚性物品。8. A transparent substrate having a monolayer or multilayer antireflection film of an organic or inorganic component, and further thereon.
The antifouling article according to claim 7, which is coated with the fluorine-containing compound according to any one of (1) to (4).
した層であることを特徴とする請求項8記載の防汚性物
品。9. The antifouling article according to claim 8, wherein the outermost layer of the antireflection film is a layer mainly composed of silicon dioxide.
ト層を設けたことを特徴とする請求項8〜9のいずれか
に記載の防汚性物品。10. The antifouling article according to claim 8, wherein a hard coat layer is provided between the transparent substrate and the antireflection film.
覆したことを特徴とする請求項7〜10のいずれかに記
載の防汚性物品。11. The antifouling article according to claim 7, wherein the fluorine-containing compound is coated by a vacuum deposition method.
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JP10351251A JP2000169481A (en) | 1998-12-10 | 1998-12-10 | Fluorine-containing compound and antifouling article |
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JP10351251A JP2000169481A (en) | 1998-12-10 | 1998-12-10 | Fluorine-containing compound and antifouling article |
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Family
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