JP2000151076A - Method of producing printed wiring board - Google Patents

Method of producing printed wiring board

Info

Publication number
JP2000151076A
JP2000151076A JP31616598A JP31616598A JP2000151076A JP 2000151076 A JP2000151076 A JP 2000151076A JP 31616598 A JP31616598 A JP 31616598A JP 31616598 A JP31616598 A JP 31616598A JP 2000151076 A JP2000151076 A JP 2000151076A
Authority
JP
Japan
Prior art keywords
substrate
metal plate
wiring board
plate
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31616598A
Other languages
Japanese (ja)
Inventor
Yasutaka Ina
靖高 伊奈
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Niterra Co Ltd
Original Assignee
NGK Spark Plug Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Spark Plug Co Ltd filed Critical NGK Spark Plug Co Ltd
Priority to JP31616598A priority Critical patent/JP2000151076A/en
Publication of JP2000151076A publication Critical patent/JP2000151076A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To ensure that processes such as etching and the like are property performed without dropping a metal plate used in a printed wiring board in carrying and variously processing the metal plate on a roller. SOLUTION: A method of producing a printed wiring board comprises the steps of connecting a guide plate 4 to the leading side of a substrate 1 in a carried direction, wherein the substrate 1 comprises a flexible metal plate 2 not thicker than 50 μm in the thickness direction and the guide plate 4 is more rigid than the substrate 1, and carrying the combination of the guide plate 4 and the substrate 1 on a plurality of rollers 8, 8. Since the guide plate 4 carries the substrate 1 in which dry films are stuck on both faces of the metal plate (foil) 2, in flexibility controlled state along the thickness direction, it is hard to flexibly deform when spraying etchant, developer or cleaning fluid in the thickness direction, and the substrate 1 fallen off between the rollers 8, 8 can be surely prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、エッチング工程等
において、撓み易い金属箔等からなる薄い基板を複数の
ローラ上で搬送しつつエッチング等を施す配線基板の製
造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a wiring board in which a thin substrate made of a flexible metal foil or the like is etched and conveyed on a plurality of rollers in an etching step or the like.

【0002】[0002]

【従来の技術】複数の絶縁層の間に導体層を形成する多
層配線基板は、絶縁基板の両表面に絶縁層と導体層とを
交互に積層して製造される。係る配線基板を小型化・高
密度化するため、上記絶縁基板にはその厚さ方向の中央
で且つ略全面に渉って薄い金属板(箔)が埋設される。係
る金属板を埋設することにより、薄肉の絶縁基板として
も所要の強度が得られる。また、絶縁基板の各表面に樹
脂絶縁層を形成する際の熱硬化時に生じる応力や、樹脂
絶縁層と導体層との熱膨張の差により生じる熱応力に対
抗して多層基板全体が反らないようにしている。
2. Description of the Related Art A multilayer wiring board in which a conductive layer is formed between a plurality of insulating layers is manufactured by alternately laminating insulating layers and conductive layers on both surfaces of the insulating substrate. In order to reduce the size and density of such a wiring board, a thin metal plate (foil) is embedded in the insulating substrate at the center in the thickness direction and over substantially the entire surface. By embedding such a metal plate, required strength can be obtained even as a thin insulating substrate. In addition, the entire multilayer substrate does not warp against the stress generated during thermal curing when forming the resin insulating layer on each surface of the insulating substrate or the thermal stress generated due to the difference in thermal expansion between the resin insulating layer and the conductor layer. Like that.

【0003】上記金属板は、銅、鉄、ニッケル、アルミニ
ウム、又は銀等からなり、数10μmの厚みを有する。
また、上記絶縁基板に埋設した際、その両表面に形成さ
れる導体層同士を導通させるスルーホール導体を非接触
で貫通させるため、予め所定の位置にスルーホール用の
貫通孔がエッチングにより形成される。係る貫通孔を形
成するため、金属板の両表面にエポキシ系樹脂からなる
厚さ数10μmで感光性のドライフィルムを貼り付け、
該フイルムに所定パターンの露光と現像を施す。この結
果、上記金属板における貫通孔を形成すべき位置が露出
したエッチングレジストが金属板の表面に形成される。
次いで、係る金属板をエッチングする。
The metal plate is made of copper, iron, nickel, aluminum, silver, or the like, and has a thickness of several tens μm.
Further, when embedded in the insulating substrate, through-hole conductors for conducting the conductive layers formed on both surfaces thereof are made to penetrate in a non-contact manner, so that through-holes for through-holes are formed in predetermined positions in advance by etching. You. In order to form such a through-hole, a photosensitive dry film having a thickness of several tens of μm made of an epoxy resin is attached to both surfaces of the metal plate,
The film is exposed and developed in a predetermined pattern. As a result, an etching resist is formed on the surface of the metal plate, exposing the position where the through hole is to be formed in the metal plate.
Next, the metal plate is etched.

【0004】図5(A)に示すように、上記エッチングレ
ジストを表面に形成した金属板40は、複数の搬送ロー
ラ42上を図示で左側から右側に搬送される。また、各
ローラ42の上下に垂直に配設された複数のノズル44
からはエッチング液eがシャワー状に噴射される。係る
搬送の間に、金属板40のうちエッチングレジストに被
覆されていない部分には、エッチングされスルーホール
用の貫通孔(図示せず)が穿設される。その後、剥離液に
より上記エッチングレジストを除去すると、所定の位置
に貫通孔を明けた金属板40が得られる。
As shown in FIG. 5A, a metal plate 40 having the etching resist formed on the surface thereof is transported on a plurality of transport rollers 42 from left to right in the figure. Also, a plurality of nozzles 44 vertically arranged above and below each roller 42 are provided.
From there, the etching liquid e is sprayed in a shower shape. During the transfer, a portion of the metal plate 40 not covered with the etching resist is etched and a through hole (not shown) for a through hole is formed. After that, when the etching resist is removed with a stripping solution, a metal plate 40 having a through hole at a predetermined position is obtained.

【0005】[0005]

【発明が解決すべき課題】ところで、上記金属板40に
エッチングを施す際、図5(B)及び(C)に示すように、
金属板40が数10μmの薄さであるため、撓み易くロ
ーラ42の回転に倣ってローラ42同士の間から下方に
脱落することもあった。係る金属板40の脱落により、
エッチング工程の効率が低下する。また、脱落した金属
板40が、折れ曲ったり変形したりしている場合には、
廃棄するしかなくその歩留まりの低下を招いていた。
尚、同様な金属板40の脱落は、水洗工程やその後の乾
燥工程など他の搬送工程においても生じていた。
When the metal plate 40 is etched, as shown in FIGS. 5B and 5C,
Since the metal plate 40 has a thickness of several tens of μm, the metal plate 40 is easily bent and may fall down from between the rollers 42 following the rotation of the rollers 42. Due to the falling off of the metal plate 40,
The efficiency of the etching process is reduced. Also, if the dropped metal plate 40 is bent or deformed,
It had to be discarded, resulting in a lower yield.
In addition, the similar falling off of the metal plate 40 occurred in other transporting steps such as a water washing step and a subsequent drying step.

【0006】本発明は、配線基板に用いる金属板等の基
板をローラ上を搬送しつつエッチング等を施す各種の工
程において、金属板等の基板が脱落することなく確実に
エッチング等の処理を適正に行うことを可能とする配線
基板の製造方法を提供することを課題とする。
According to the present invention, in various processes in which a substrate such as a metal plate used as a wiring substrate is etched while being conveyed on rollers, the processing such as etching can be properly performed without the substrate such as a metal plate falling off. It is an object of the present invention to provide a method of manufacturing a wiring board which can be performed in a short time.

【0007】[0007]

【課題を解決するための手段】本発明は、上記の課題を
解決するため、薄い金属板等の基板を撓みにくくした状
態にして、複数のローラ上を搬送することに着想して成
されたものである。即ち、本発明の配線基板の製造方法
は、厚さ方向に対して撓み易い基板における少なくとも
搬送される先側の辺に、該基板よりも剛性が高い先導板
を接続し、該先導板と上記基板とを一体にして複数のロ
ーラ上を搬送する工程を含む、ことを特徴とする。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention has been conceived in that a substrate such as a thin metal plate is transported over a plurality of rollers in a state where the substrate is hardly bent. Things. That is, the method for manufacturing a wiring board according to the present invention includes connecting a lead plate having a higher rigidity than the substrate to at least the transported front side of the substrate that is easily bent in the thickness direction. The method is characterized in that the method includes a step of transporting a plurality of rollers integrally with the substrate.

【0008】これによれば、上記先導板により、薄い金
属板(箔)等からなる基板は、撓みを抑制された状態で搬
送されるため、エッチング液、現像液、又は洗浄液を厚
さ方向から噴射されても変形しにくくなり、搬送ローラ
の間から基板が脱落するのを確実に防止できる。従っ
て、基板が単体の金属板又は表面が金属からなる基板で
ある場合には、所要のエッチングや水洗、乾燥等を適正
に施すことができる。また、基板の表面に感光性樹脂が
ある場合には、その現像や該樹脂表面の粗化等を行うこ
とができる。しかも、基板の生産性の低下を防止するこ
とができる。尚、上記の工程には、基板に対する現像、
エッチング、水洗、乾燥等の各工程が含まれる他、これ
らの工程間における搬送自体も含まれる。また、上記先
導板は、基板における搬送される少なくとも先側の辺で
接続され、且つ隣接するローラ同士間の距離よりも大き
いサイズを有するものであれば良い。
According to this, the substrate made of a thin metal plate (foil) or the like is conveyed in a state in which the bending is suppressed by the leading plate, so that the etching liquid, the developing liquid, or the cleaning liquid is supplied from the thickness direction. Even if it is ejected, it is difficult to be deformed, and it is possible to reliably prevent the substrate from falling off from between the transport rollers. Therefore, when the substrate is a single metal plate or a substrate whose surface is made of metal, necessary etching, washing, drying, etc. can be appropriately performed. When a photosensitive resin is present on the surface of the substrate, development and roughening of the resin surface can be performed. In addition, it is possible to prevent a decrease in the productivity of the substrate. Note that the above steps include developing the substrate,
In addition to the steps such as etching, washing, and drying, the transport itself between these steps is also included. Further, the leading plate may be any one that is connected at least on the front side of the substrate to be conveyed and that has a size larger than the distance between adjacent rollers.

【0009】また、前記基板は、厚さ50μm以下の金
属板又はこれを主体とする板である、配線基板の製造方
法も含まれる。これによれば、前記絶縁基板に埋設して
その強度を高め且つこれを用いる配線基板に反りを与え
ることなく、小型で薄肉の配線基板を提供することが可
能となる。尚、金属板(箔)の厚さを50μm以下とした
のは、これを超える厚さの金属板ではその厚さ方向に対
し生じる撓みが小さくなり、搬送ローラ間から脱落する
おそれが少ないためである。一方、金属板の厚さの下限
は実用的な範囲で適宜選定されるが、10μm以上とす
るのが望ましい。10μm未満になると、多層配線基板
全体に剛性を付与するという金属板本来の目的が達成さ
れにくくなるためである。また、上記金属板には、銅、
アルミニウム、ニッケル、鉄、クロム、モリブデン、又
はそれらの何れかをベースとする合金、或いは、熱膨張
率の低いアンバー(36wt%Ni−Fe合金)の他、アン
バーの両面に銅を被覆したり、モリブデンの両面に銅を
被覆したクラッド板等も用いられる。
Further, the present invention also includes a method of manufacturing a wiring board, wherein the board is a metal plate having a thickness of 50 μm or less or a plate mainly composed of the metal plate. According to this, it is possible to provide a small and thin wiring board, which is buried in the insulating substrate to increase its strength and does not warp a wiring board using the same. The reason why the thickness of the metal plate (foil) is set to 50 μm or less is that a metal plate having a thickness exceeding this thickness has a small bending in the thickness direction and is less likely to fall off between the transport rollers. is there. On the other hand, the lower limit of the thickness of the metal plate is appropriately selected within a practical range, but is preferably 10 μm or more. If the thickness is less than 10 μm, the original purpose of the metal plate, which imparts rigidity to the entire multilayer wiring board, is hardly achieved. In addition, copper,
Aluminum, nickel, iron, chromium, molybdenum, or an alloy based on any of them, or amber having a low coefficient of thermal expansion (36 wt% Ni-Fe alloy), and copper coated on both surfaces of the amber, A clad plate in which molybdenum is coated with copper on both surfaces is also used.

【0010】更に、前記基板は、その金属板の両面にエ
ッチングレジストが形成され、前記搬送時に上記金属板
の所定位置にエッチングを施す、配線基板の製造方法も
含まれる。これにより、搬送ローラに沿って金属板の搬
送方向と略直交して配置される複数のノズルからエッチ
ング液を両表面に噴射された際の噴射圧や搬送ローラの
巻き込みによって金属板(箔)が脱落せず、エッチングレ
ジストの間から露出した位置に所定の貫通孔又は凹部を
確実に穿設することができる。尚、上記エッチングレジ
ストは、例えば金属板の両面に予め被覆したドライフィ
ルム又は塗布した感光性樹脂層に対し、露光と現像を施
し、金属板の一部を露出した所定のパターンを有するも
のである。
[0010] The present invention also includes a method of manufacturing a wiring board, wherein an etching resist is formed on both surfaces of the metal plate of the substrate, and a predetermined position of the metal plate is etched during the transportation. As a result, the metal plate (foil) is formed by the injection pressure when the etching liquid is sprayed from the plurality of nozzles arranged on the both surfaces substantially orthogonally to the transfer direction of the metal plate along the transfer roller and by the roll of the transfer roller. A predetermined through hole or a concave portion can be reliably formed in a position exposed from between the etching resists without dropping. The etching resist has, for example, a predetermined pattern that exposes and develops a dry film or a coated photosensitive resin layer previously coated on both surfaces of a metal plate to expose a part of the metal plate. .

【0011】[0011]

【発明の実施の形態】以下において本発明の実施に好適
な形態を図面と共に説明する。図1(A)及び(B)は、本
発明による基板1の搬送状態を示す。該基板1は、図1
(C)に示すように、厚さ約35μmの薄い銅箔からなる
金属板2の両面に厚さ約10μmの感光性樹脂からなる
ドライフイルム3,3を貼り付けた板である。係る基板
1は、図1(A)及び(B)に示すように、複数の搬送ロー
ラ8,8,…上を図示で左側から右側に搬送される。基板
1はその搬送される先側、即ち図示で右側の辺におい
て、テープ7,7を介して先導板4と接続され、該先導
板4と一体にして搬送ローラ8,8,…上を搬送される。
Preferred embodiments of the present invention will be described below with reference to the drawings. FIGS. 1A and 1B show a state of transport of a substrate 1 according to the present invention. The substrate 1 is shown in FIG.
As shown in FIG. 3C, a metal plate 2 made of a thin copper foil having a thickness of about 35 μm is provided with a dry film 3 made of a photosensitive resin having a thickness of about 10 μm attached to both surfaces thereof. The substrate 1 is transported from left to right on the plurality of transport rollers 8, 8,... As shown in FIGS. The substrate 1 is connected to the leading plate 4 via tapes 7, 7 on the leading side to be transported, that is, on the right side in the figure, and is transported integrally with the leading plate 4 on the transport rollers 8, 8,. Is done.

【0012】上記先導板4は、基板1よりも剛性の高い
材質、例えばビスマレイミドトリアジン(BT)樹脂とガ
ラス繊維との複合材からなり、板厚が約0.8mmで且
つ基板1と略同じサイズを有する。但し、先導板4の搬
送方向に沿った長さは図示のように、少なくとも常に2
つのローラ8上に位置する寸法であることが必要であ
る。また、先導板4における搬送方向と反対側の左辺に
は、長さ約3cmの凸片6,6が突設され、各凸片6と
基板1の先側の辺との間に、耐酸性の例えばフッ素樹脂
(米国デュポン社の商品名:テフロン)等からなるテープ
7,7が貼り付けられている。このテープ7が耐酸性を
有するのは、追って説明するように基板1内の金属板2
をエッチングする際に、酸性のエッチング液に耐えるた
めである。
The leading plate 4 is made of a material having a higher rigidity than the substrate 1, for example, a composite material of bismaleimide triazine (BT) resin and glass fiber, has a plate thickness of about 0.8 mm and is substantially the same as the substrate 1. Have a size. However, the length of the leading plate 4 along the transport direction is at least always 2 as shown in the figure.
It is necessary that the size be located on one roller 8. Protrusions 6 and 6 having a length of about 3 cm protrude from the left side of the leading plate 4 on the side opposite to the transport direction, and an acid-resistant material is provided between each convex piece 6 and the front side of the substrate 1. For example, fluororesin
(Teflon, a product name of DuPont, USA) are attached. The reason why the tape 7 has acid resistance is that the metal plate 2 in the substrate 1 is formed as will be described later.
This is because when etching is performed, it is resistant to an acidic etchant.

【0013】上記金属板2は追って製造される配線基板
における絶縁基板の芯材として、該絶縁基板内に埋設さ
れるが、絶縁基板の両面に形成する導体層同士を導通す
るスルーホール導体を非接触で貫通するための貫通孔を
予め形成する必要がある。このため、図1(C)に示すよ
うに、金属板2の両面に前記フィルム3,3を貼り付け
た基板1とし、予め基板1の両面に紫外線等を照射して
所定パターンの露光を施しておく。
The metal plate 2 is buried in the insulating substrate as a core material of the insulating substrate in a wiring board to be manufactured later, but a through-hole conductor for conducting between conductive layers formed on both surfaces of the insulating substrate is used. It is necessary to previously form a through hole for penetrating by contact. For this reason, as shown in FIG. 1 (C), a substrate 1 having the films 3 and 3 adhered to both sides of a metal plate 2 is formed. Keep it.

【0014】次に、図2(A)に示すように、露光済みの
フィルム3を有する基板1を先導板4と共にローラ8,
8,…上を搬送しつつ、搬送方向と略直交する上下の各
ノズル9から基板1の両面の各フィルム3,3に対し、
現像液gをシャワー状に噴射する。その結果、図2(a)
に示すように、各フィルム3,3(ネガ型)における上記
露光によって感光した位置以外の位置に、凹部3a,3
aが形成されたエッチングレジスト3bとなり、且つ各
凹部3aの底部に金属板2の表面が露出する。係る現像
工程において、本来厚さ方向に撓み易い基板1は、それ
よりも剛性の高い先導板4と共に、ローラ8,8,…上を
一体に搬送されるため、ローラ8,8間から脱落するこ
となく、精度良く現像が施される。
Next, as shown in FIG. 2 (A), the substrate 1 having the exposed film 3
8,... While being transported above, the upper and lower nozzles 9 that are substantially perpendicular to the transport direction
The developer g is sprayed in a shower shape. As a result, FIG.
As shown in FIG. 3, concave portions 3a, 3 are located at positions other than the positions exposed by the above-described exposure on each of the films 3, 3 (negative type).
a becomes the formed etching resist 3b, and the surface of the metal plate 2 is exposed at the bottom of each recess 3a. In such a developing step, the substrate 1 which is originally easily bent in the thickness direction is transported together with the guide plate 4 having higher rigidity over the rollers 8, 8,. Developing is performed with high accuracy.

【0015】更に、図2(B)に示すように、現像済みの
基板1を先導板4と共にローラ8,8,…上を搬送しつ
つ、図示しないエッチングチャンバ内に搬送して、その
搬送方向と略直交する上下のノズル9から基板1の両面
の各エッチングレジスト3b,3bに対し、塩化第2鉄
等を含むエッチング液eをシャワー状に噴射する。その
結果、図2(b)に示すように、各凹部3a,3a間に挟
まれた金属板2の露出部分が腐食して除去され、上下両
面に貫通する貫通孔2aが形成される。係るエッチング
工程においても、本来厚さ方向に撓み易い基板1は、そ
れよりも剛性の高い先導板4と共に、ローラ8,8,…上
を一体に搬送されるため、撓んでローラ8,8間から脱
落することなく、適度のエッチングが施され精度良く貫
通孔2aを穿設することができる。
Further, as shown in FIG. 2B, the developed substrate 1 is transported together with the leading plate 4 on rollers 8, 8,. An etching solution e containing ferric chloride or the like is sprayed from each of the upper and lower nozzles 9 that are substantially perpendicular to the above, to each of the etching resists 3b, 3b on both surfaces of the substrate 1 in a shower shape. As a result, as shown in FIG. 2B, the exposed portions of the metal plate 2 sandwiched between the recesses 3a, 3a are corroded and removed, and the through holes 2a penetrating the upper and lower surfaces are formed. Also in such an etching step, the substrate 1 which is originally easily bent in the thickness direction is transported together with the leading plate 4 having higher rigidity over the rollers 8, 8,. Without being dropped from the substrate, appropriate etching is performed and the through-hole 2a can be accurately formed.

【0016】そして、エッチングされた基板1を先導板
4と共に、ローラ8,8,…上を搬送しつつ、図示しない
水洗部に挿入して純水により水洗し、表面に付着したエ
ッチング液を除去する。その後、基板1を先導板4と共
にローラ8,8,…上を搬送しながら加熱して乾燥する。
係る水洗や乾燥工程においても、基板1は搬送ローラ
8,8の間から脱落せずに搬送される。図2(C)は、上
記乾燥の後で、基板1にNaOH水溶液の剥離液を接触
することより前記フィルム3,3を除去した金属板(基
板)2の断面の一部を示す。
Then, while carrying the etched substrate 1 together with the leading plate 4 on the rollers 8, 8,..., The substrate 1 is inserted into a washing section (not shown) and washed with pure water to remove the etchant adhering to the surface. I do. Thereafter, the substrate 1 is heated and dried while being transported on the rollers 8, 8,... Together with the leading plate 4.
In such a washing or drying step, the substrate 1 is transported without falling off between the transport rollers 8. FIG. 2C shows a part of a cross section of the metal plate (substrate) 2 from which the films 3 and 3 have been removed by contacting the substrate 1 with a stripping solution of an aqueous NaOH solution after the drying.

【0017】図3は貫通孔2aを設けた金属板2を用い
る配線基板の製造方法に関する。先ず、図3(A)に示す
ように、金属板2の両面にプリプレグ10a,10bと
厚さ12μmの銅箔12a,12bを配置する。上記プ
リプレグ10a,10bは、連続多孔質PTFEにエポ
キシ樹脂を含浸させた複合材料からなる。次に、上記銅
箔12a,12bの外側に図示しないステンレス鋼(SUS
304)製の介挿板を介して図示しない上・下型の間に挟持
する。係る上・下型により真空加熱プレスを施すと、プ
リプレグ10a,10bの樹脂が硬化して、図3(B)に
示すように、それぞれ樹脂絶縁層11a,11bとな
り、両者間において金属板2を厚さ方向の中央で略全面
に渉って埋設する。また、銅箔12a,12bも樹脂絶
縁層11a,11bの表面に一体に接合されたコア基板
10となる。
FIG. 3 relates to a method of manufacturing a wiring board using a metal plate 2 provided with a through hole 2a. First, as shown in FIG. 3A, prepregs 10a and 10b and copper foils 12a and 12b having a thickness of 12 μm are arranged on both surfaces of the metal plate 2. The prepregs 10a and 10b are made of a composite material in which continuous porous PTFE is impregnated with an epoxy resin. Next, a stainless steel (not shown) is formed outside the copper foils 12a and 12b.
It is sandwiched between upper and lower dies (not shown) via an insert plate made of 304). When vacuum heating press is performed by the upper and lower dies, the resin of the prepregs 10a and 10b is hardened to form resin insulating layers 11a and 11b, respectively, as shown in FIG. 3 (B). It is buried almost entirely in the center in the thickness direction. Further, the copper foils 12a and 12b also become the core substrate 10 integrally joined to the surfaces of the resin insulating layers 11a and 11b.

【0018】次いで、係る金属板2、絶縁層11a,11
b、及び銅箔12a,12bからなるプレス成形によるコ
ア基板10に対し、図3(C)に示すように、金属板2の
貫通孔2a内を図示で垂直に貫通し、該貫通孔2aより
も細径のスルーホール11cをレーザ加工により形成す
る。且つスルーホール11c内に銅メッキによりスルー
ホール導体11dを形成する。尚、スルーホール導体1
1dの内側の中空部はエポキシ樹脂等が充填される。ま
た、表面の銅箔12a,12bに対し、エッチング等を
施すと、それぞれ所定パターンの第1の導体層14a,
14bが形成される。各導体層14a,14bは、上記
スルーホール導体11dを介して互いに導通している。
Next, the metal plate 2 and the insulating layers 11a, 11
As shown in FIG. 3 (C), the core substrate 10 formed by press-molding of the metal plate 2 and the copper foils 12a and 12b vertically penetrates the inside of the through hole 2a of the metal plate 2 as shown in FIG. Also, a small diameter through hole 11c is formed by laser processing. Further, a through-hole conductor 11d is formed in the through-hole 11c by copper plating. In addition, the through-hole conductor 1
The hollow portion inside 1d is filled with an epoxy resin or the like. Further, when etching or the like is performed on the copper foils 12a, 12b on the surface, the first conductor layers 14a, 14a,
14b is formed. The conductor layers 14a and 14b are electrically connected to each other via the through-hole conductor 11d.

【0019】更に、図3(D)に示すように、絶縁層11
a,11b及び導体層14a,14bの上に、上記と同様
にしてプリプレグ及び銅箔をそれぞれ積層し、且つ介挿
板を介して図示しない上・下型の間に挟持する。係る上
・下型により真空加熱プレスを施すと、上記プリプレグ
の樹脂が硬化して、図示のようにそれぞれ樹脂絶縁層1
5a,15bとなる。また、上記銅箔をエッチング等す
ることにより、第2の導体層17が形成される。
Further, as shown in FIG.
A prepreg and a copper foil are respectively laminated on the a, 11b and the conductor layers 14a, 14b in the same manner as described above, and are sandwiched between upper and lower dies (not shown) via interposition plates. When vacuum heating press is performed by the upper and lower dies, the resin of the prepreg is hardened, and the resin insulating layer 1 is formed as shown in the figure.
5a and 15b. The second conductor layer 17 is formed by etching the copper foil or the like.

【0020】尚、樹脂絶縁層15a,15bに対しレー
ザ加工によりビアホールを形成し、導体層14a,14
bの所定位置の表面を露出させる。このビアホール内に
銅メッキによりビア導体16を形成する。該ビア導体1
6により第1の導体層14aと第2の導体層17が互い
に導通する。図3(D)において、樹脂絶縁層15bの下
側にも同様なビア導体と第2の導体層(図示せず)が形成
される。
Incidentally, via holes are formed in the resin insulating layers 15a and 15b by laser processing, and the conductor layers 14a and 14b are formed.
The surface at the predetermined position b is exposed. Via conductors 16 are formed in the via holes by copper plating. The via conductor 1
6, the first conductor layer 14a and the second conductor layer 17 conduct with each other. In FIG. 3D, a similar via conductor and a second conductor layer (not shown) are formed below the resin insulating layer 15b.

【0021】そして、図3(D)に示すように、樹脂絶縁
層15aの上にソルダーレジスト層18が形成されると
共に、レーザ加工と銅メッキにより第2の導体層17の
表面からソルダーレジスト層18を貫通して立設する半
田バンプ(端子)19が形成される。また、下側の絶縁層
15bの下方にも同様のソルダーレジスト層が形成さ
れ、その間に設けた開口部から露出する図示しない第2
の導体層の表面をAu及びNiメッキして接続端子とし
て用いる多層配線基板20を得ることができる。
Then, as shown in FIG. 3D, a solder resist layer 18 is formed on the resin insulating layer 15a, and the solder resist layer 18 is formed on the surface of the second conductor layer 17 by laser processing and copper plating. Solder bumps (terminals) 19 are formed to penetrate through 18. Further, a similar solder resist layer is formed below the lower insulating layer 15b, and a second solder resist layer (not shown) exposed from an opening provided therebetween.
The surface of the conductive layer is plated with Au and Ni to obtain a multilayer wiring board 20 used as a connection terminal.

【0022】係る配線基板20を製造する過程におい
て、前記金属板2は、コア基板10の強度を高め、且つ
絶縁層11a,11b,15a,15bや導体層14a,1
4bを形成する際に、追って配線基板20に反りが生じ
ることを防止する。しかも、金属板2は、導体層14
a,14b等が形成する配線基板20内の回路のアース
や電源パターン等としても活用することも可能である。
係る金属板2をアース等に活用する場合、コア基板10
の適所にレーザ加工と銅メッキとにより、金属板2と導
体層14a等との間を導通する図示しないビア導体が形
成される。
In the process of manufacturing the wiring board 20, the metal plate 2 enhances the strength of the core substrate 10 and also forms the insulating layers 11a, 11b, 15a, 15b and the conductor layers 14a, 1b.
When the wiring board 4b is formed, the wiring board 20 is prevented from being warped later. Moreover, the metal plate 2 is
It can also be used as a ground or power supply pattern of a circuit in the wiring board 20 formed by a, 14b and the like.
When the metal plate 2 is used for grounding or the like, the core substrate 10
A via conductor (not shown) that conducts between the metal plate 2 and the conductor layer 14a or the like is formed at an appropriate position by laser processing and copper plating.

【0023】図4は異なる形態の先導板に関し、図4
(A)は複数のローラ8,8,…上を基板1又は金属板2と
共に搬送する先導板22を示す。この先導板22は、基
板1等と平面視で略同じサイズの矩形を呈し、且つその
搬送する先側の辺23の両端のコーナに面取りした傾斜
部24,24を設けたものである。係る傾斜部24を形
成することにより、先導板22自体の搬送ローラ8,8
上における円滑な摺動を確実にできる。また、先導板2
2の略中央に一点鎖線で示す中空部25を穿設しておく
と、エッチングや水洗工程におけるエッチング液等の液
切りを容易にすることができる。尚、この中空部25に
替えて、先導板22の上面の略中央付近をその周辺より
も僅かに高くした水勾配を付設しても上記液切りを容易
にできる。
FIG. 4 relates to a leader plate of a different form.
(A) shows a leading plate 22 which conveys a plurality of rollers 8, 8,... Together with the substrate 1 or the metal plate 2. The leading plate 22 has a rectangular shape of substantially the same size as the substrate 1 and the like in plan view, and is provided with inclined portions 24, 24 chamfered at corners at both ends of a front side 23 to be conveyed. By forming the inclined portion 24, the transport rollers 8, 8 of the leading plate 22 itself are formed.
Smooth sliding on the top can be ensured. In addition, the leading plate 2
If a hollow portion 25 indicated by a dashed line is formed substantially at the center of 2, the drainage of an etching solution or the like in the etching or washing step can be facilitated. It should be noted that, instead of the hollow portion 25, the drainage can be easily performed by providing a water gradient in which the vicinity of the center of the upper surface of the leading plate 22 is slightly higher than the periphery.

【0024】また、図4(B)に示すように、搬送される
先側の辺28を略半円形とした先導板26とし、且つそ
の内部に中空部29を形成することもできる。更に、図
4(C)に示すように、前記先導板4を矩形枠状としてそ
の内側の中空部に金属網のスクリーン5を張設した先導
板4′としても、前述したエッチング液等の液切りを容
易にすることができる。
Further, as shown in FIG. 4B, it is also possible to form a leading plate 26 having a substantially semicircular front side 28 to be conveyed, and to form a hollow portion 29 therein. Further, as shown in FIG. 4 (C), the leading plate 4 is formed in a rectangular frame shape, and a metal mesh screen 5 is stretched in a hollow portion inside thereof. Cutting can be facilitated.

【0025】一方、図4(D)に示すように、基板1又は
金属板2が搬送される先側の辺にテープ7を介して接続
する先導部32と共に、該先導部32の両側から搬送方
向と反対側に延在する一対の側片34,34を一体に設
けた先導板30を用いることもできる。上記先導部32
と一対の側片34に囲まれた矩形の凹み33中に基板1
等を挿入してテープ7により接続すると、前記搬送ロー
ラ8,8,…上を搬送しつつエッチング液等を噴射されて
も基板1等は一層撓みにくくなり、その脱落をより確実
に防止できる。
On the other hand, as shown in FIG. 4 (D), together with a leading portion 32 connected via a tape 7 to the front side to which the substrate 1 or the metal plate 2 is transported, and transported from both sides of the leading portion 32. It is also possible to use a leading plate 30 integrally provided with a pair of side pieces 34, 34 extending in the opposite direction. Leader 32
And the substrate 1 in a rectangular recess 33 surrounded by a pair of side pieces 34.
Is inserted and connected by the tape 7, even if the etching liquid or the like is jetted while being conveyed on the conveying rollers 8, 8,..., The substrate 1 and the like are more difficult to bend, and the falling off thereof can be prevented more reliably.

【0026】また、図4(E)に示すように、全体が平面
視で長方形を呈し、搬送される先側寄りに矩形の先導部
37を、後側寄りに矩形の中空部38をそれぞれ有する
先導板36を用いることも可能である。上記中空部38
内にこれと略相似形の基板1又は金属板2をテープ7を
介して接続して一体とし、前記搬送ローラ8,8,…上を
搬送する。係る搬送中にエッチング液等を噴射されて
も、基板1等はその四周辺の全てがテープ7を介して剛
性の高い先導板36に接続されているため、厚さ方向に
撓むことを阻止されるので、ローラ8,8間から脱落す
ることなく、適度のエッチング処理等が施される。
As shown in FIG. 4 (E), the whole has a rectangular shape in plan view, and has a rectangular leading portion 37 near the front side to be conveyed and a rectangular hollow portion 38 near the rear side. It is also possible to use the leading plate 36. The hollow part 38
The substrate 1 or the metal plate 2 having a substantially similar shape is connected thereto via a tape 7 to be integrated, and is conveyed on the conveying rollers 8, 8,. Even if an etching solution or the like is sprayed during the transfer, the substrate 1 and the like are prevented from bending in the thickness direction because all of the four surroundings are connected to the highly rigid leading plate 36 via the tape 7. Therefore, an appropriate etching process or the like is performed without falling off between the rollers 8.

【0027】本発明は以上において説明した各形態に限
定されるものではない。例えば、先導板の材質は、特に
限定されないが、エッチング液に耐えることを考慮する
と、耐酸性の樹脂であるフェノール、エポキシ、アクリ
ル、ポリエチレン、ポリプロピレン、ポリカーボネート等
や、これらの何れかとガラス繊維との複合材を用いても
良い。或いは、耐酸性を有するステンレス鋼やチタン合
金等の金属、更には強化ガラス等を適用することも可能
である。また、先導板と基板(金属板)とを接続するテー
プの材質も、特に限定されないが、エッチング液に耐え
る耐酸性を有する樹脂や金属箔を主体としたものが用い
られる。
The present invention is not limited to the embodiments described above. For example, the material of the leading plate is not particularly limited, but in consideration of resistance to an etchant, phenol, epoxy, acrylic, polyethylene, polypropylene, polycarbonate, or the like, which is an acid-resistant resin, or any of these and glass fiber. A composite material may be used. Alternatively, it is also possible to apply a metal such as stainless steel or a titanium alloy having acid resistance, and further, a tempered glass or the like. Further, the material of the tape for connecting the leading plate and the substrate (metal plate) is not particularly limited, but a material mainly composed of a resin or a metal foil having acid resistance to withstand an etching solution is used.

【0028】更に、本発明方法が適用される工程は、前
述した各工程の他に、樹脂絶縁層を現像により所定パタ
ーンにエッチングする工程と、その後でリンス液を塗布
する工程も含まれる。尚、本発明の対象となる配線基板
は、少なくとも前記所定パターンによる貫通孔2aを穿
設した金属板2を埋設した絶縁基板10と、この絶縁基
板10の表面に何らかの導体層を形成したものであれば
良く、内設する導体層の数や主表面上における端子や電
子部品等の搭載の有無等には影響されない。
Further, the steps to which the method of the present invention is applied include, in addition to the above-described steps, a step of etching the resin insulating layer into a predetermined pattern by development, and a step of subsequently applying a rinsing liquid. The wiring board to be used in the present invention is an insulating board 10 in which a metal plate 2 having at least a through hole 2a formed in the predetermined pattern is buried, and a conductive layer formed on the surface of the insulating board 10. It is not affected by the number of conductor layers provided therein, the presence or absence of terminals, electronic components, and the like on the main surface.

【0029】[0029]

【発明の効果】以上において説明した本発明の製造方法
によれば、薄く撓み易い金属板等からなる基板を先導板
に接続して一体として、複数のローラ上を搬送するた
め、係る搬送中にエッチング液や洗浄水等を噴射されて
も、撓んでローラ間から脱落することを確実に防止でき
る。従って、基板の処理効率を高く安定して維持でき
る。更に、係る基板に適正な現像やエッチングを施すこ
とができるため、この基板が用いられる配線基板の強度
を高め、且つその形状・形状の精度を良くして製造する
ことも可能となる。
According to the manufacturing method of the present invention described above, a substrate made of a thin and flexible metal plate or the like is connected to a leading plate and is integrally transported over a plurality of rollers. Even if an etching solution, cleaning water, or the like is sprayed, it can be reliably prevented from bending and dropping from between the rollers. Therefore, the processing efficiency of the substrate can be kept high and stably. Furthermore, since appropriate development and etching can be performed on the substrate, it is possible to increase the strength of the wiring substrate using the substrate and to manufacture the wiring substrate with improved shape and shape accuracy.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)及び(B)は本発明による基板の搬送状態を
示す斜視図又は側面図、(C)は(B)中の一点鎖線部分C
の拡大断面図。
1 (A) and 1 (B) are perspective views or side views showing a transport state of a substrate according to the present invention, and FIG. 1 (C) is a dashed-dotted line portion C in FIG. 1 (B).
FIG.

【図2】(A)と(B)は本発明による基板の各処理工程を
示す概略図、(a)と(b)は(A)と(B)中の一点鎖線部分
a,bの拡大断面図、(C)は得られた金属板の断面図。
2 (A) and 2 (B) are schematic diagrams showing each processing step of a substrate according to the present invention, and FIGS. 2 (a) and 2 (b) are enlargements of dashed lines a and b in FIGS. 2 (A) and 2 (B). Sectional drawing, (C) is a sectional view of the obtained metal plate.

【図3】(A)乃至(D)は本発明による配線基板の各製造
工程を示す概略断面図。
FIGS. 3A to 3D are schematic cross-sectional views illustrating respective manufacturing steps of a wiring board according to the present invention.

【図4】(A)乃至(E)は本発明に用いる異なる形態の先
導板を示す斜視図又は平面図。
4 (A) to 4 (E) are perspective views or plan views showing different forms of a lead plate used in the present invention.

【図5】(A)乃至(C)は従来の技術による基板のエッチ
ング工程を示す概略図。
FIGS. 5A to 5C are schematic views showing a substrate etching process according to a conventional technique.

【符号の説明】[Explanation of symbols]

1……………………………………基板 2……………………………………金属板 3……………………………………ドライフィルム 3b…………………………………エッチングレジスト 4,4′,22,26,30,36…先導板 8……………………………………ローラ 20…………………………………配線基板 1 ………………………………………………………………………………………… Metal plate 3 …………………… Dry film 3b ...... Etching resist 4,4 ', 22,26,30,36 Leading plate 8 ... Roller 20 ………………………… Wiring board

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E339 AA02 AB02 AD03 AD05 BE13 BE16 CC10 CD01 EE02 EE04 GG10 5E346 AA05 AA06 AA12 AA15 AA42 AA43 BB01 CC08 CC32 CC58 DD32 DD48 FF04 GG16 GG17 GG22 HH11 HH33  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E339 AA02 AB02 AD03 AD05 BE13 BE16 CC10 CD01 EE02 EE04 GG10 5E346 AA05 AA06 AA12 AA15 AA42 AA43 BB01 CC08 CC32 CC58 DD32 DD48 FF04 GG16 GG17 GG22 HH11 HH33

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】厚さ方向に対して撓み易い基板における少
なくとも搬送される先側の辺に、該基板よりも剛性が高
い先導板を接続し、該先導板と上記基板とを一体にして
複数のローラ上を搬送する工程を含む、ことを特徴とす
る配線基板の製造方法。
1. A lead plate having a higher rigidity than the substrate is connected to at least a side of the substrate to be conveyed which is easily bent in the thickness direction, and the lead plate and the substrate are integrally formed. A method for manufacturing a wiring board, comprising a step of transporting the wiring board on a roller.
【請求項2】前記基板は、厚さ50μm以下の金属板又
はこれを主体とする板である、ことを特徴とする請求項
1に記載の配線基板の製造方法。
2. The method according to claim 1, wherein the substrate is a metal plate having a thickness of 50 μm or less or a plate mainly composed of the metal plate.
【請求項3】前記基板は、その金属板の両面にエッチン
グレジストが形成され、前記搬送時に上記金属板の所定
位置にエッチングを施す、ことを特徴とする請求項2に
記載の配線基板の製造方法。
3. The method of manufacturing a wiring board according to claim 2, wherein an etching resist is formed on both surfaces of the metal plate, and a predetermined position of the metal plate is etched during the transportation. Method.
JP31616598A 1998-11-06 1998-11-06 Method of producing printed wiring board Pending JP2000151076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31616598A JP2000151076A (en) 1998-11-06 1998-11-06 Method of producing printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002368376A (en) * 2001-06-12 2002-12-20 Matsushita Electric Works Ltd Method of positioning connected board
JP2008177302A (en) * 2007-01-17 2008-07-31 Fujikura Ltd Manufacturing method for printed circuit board
JP2008235475A (en) * 2007-03-19 2008-10-02 Shinko Seisakusho:Kk Transfer jig for sheet base, and manufacturing method of printed wiring board
JP2009094394A (en) * 2007-10-11 2009-04-30 Mitsubishi Paper Mills Ltd Conveying tool plate
JP2010267986A (en) * 2010-07-12 2010-11-25 Nec Access Technica Ltd Board connecting member-attaching tool and detaching tool
TWI479970B (en) * 2010-11-10 2015-04-01 Kinpo Electronics China Co Ltd Surface mount technology (smt) method of picking and placing surface mount devices

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002368376A (en) * 2001-06-12 2002-12-20 Matsushita Electric Works Ltd Method of positioning connected board
JP2008177302A (en) * 2007-01-17 2008-07-31 Fujikura Ltd Manufacturing method for printed circuit board
JP2008235475A (en) * 2007-03-19 2008-10-02 Shinko Seisakusho:Kk Transfer jig for sheet base, and manufacturing method of printed wiring board
JP2009094394A (en) * 2007-10-11 2009-04-30 Mitsubishi Paper Mills Ltd Conveying tool plate
JP2010267986A (en) * 2010-07-12 2010-11-25 Nec Access Technica Ltd Board connecting member-attaching tool and detaching tool
TWI479970B (en) * 2010-11-10 2015-04-01 Kinpo Electronics China Co Ltd Surface mount technology (smt) method of picking and placing surface mount devices

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