JP2000144450A - Method and equipment for simultaneous treatment of immersion and liquid draining - Google Patents

Method and equipment for simultaneous treatment of immersion and liquid draining

Info

Publication number
JP2000144450A
JP2000144450A JP10314539A JP31453998A JP2000144450A JP 2000144450 A JP2000144450 A JP 2000144450A JP 10314539 A JP10314539 A JP 10314539A JP 31453998 A JP31453998 A JP 31453998A JP 2000144450 A JP2000144450 A JP 2000144450A
Authority
JP
Japan
Prior art keywords
bottom plate
liquid
liquid tank
immersion
processed material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10314539A
Other languages
Japanese (ja)
Inventor
Kingo Yamada
錦吾 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Riko Co Ltd
Original Assignee
Sumitomo Riko Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Riko Co Ltd filed Critical Sumitomo Riko Co Ltd
Priority to JP10314539A priority Critical patent/JP2000144450A/en
Publication of JP2000144450A publication Critical patent/JP2000144450A/en
Pending legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for simultaneously carrying out, in high efficiency, both immersion treatment and liquid draining treatment parallel to each other in one liquid tank and for preventing the scattering of treating liquid and flying-out of a material to be treated and also to provide simultaneous treatment equipment therefor. SOLUTION: While vertically moving a first bottom plate 13 simultaneously with a second bottom plate 14 provided at a position higher than that of the first bottom plate 13 in one liquid tank 10, when the bottom plates 13, 14 are in the lowest position, a material A to be treated on the first bottom plate 13 is subjected to immersion treatment in a treating solution 2 and simultaneously, parallel to this immersion treatment, a material A to be treated on the second bottom plate 14 above the treating liquid 2 is subjected to liquid draining. According to the vertical motion of the bottom plates 13, 14 which are inclined so that their respective ends on the inlet-port side become located in higher positions, respectively, the material A to be treated is successively moved from the first bottom plate 13 to the second bottom plate 14 and further to a discharge port 12.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、処理物の浸漬処理
と浸漬処理後の処理物の液切り処理とを、1つの液槽内
で同時に平行して行う方法、及びそのための装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for simultaneously immersing a processed object and draining the processed object after the immersion process in a single liquid tank, and an apparatus therefor.

【0002】[0002]

【従来の技術】従来から、金属製品の防錆処理や洗浄処
理のように、処理液による各種の表面処理は、一般的に
処理物を処理液に浸漬して行う浸漬処理、即ちディッピ
ングによって行われている。そして、処理液から取り出
した処理済みの処理物は、次の工程に移送する前に、表
面に付着した処理液を液切りする必要がある。
2. Description of the Related Art Conventionally, various surface treatments using a treatment liquid, such as rust prevention treatment and cleaning treatment of metal products, are generally performed by immersion treatment in which a treatment object is immersed in a treatment liquid, that is, dipping. Have been done. Then, it is necessary to drain the processing liquid adhered to the surface of the processed processing material taken out of the processing liquid before transferring to the next step.

【0003】かかる液切り処理として、浸漬処理を行っ
た液槽の上に処理物を吊り上げたまま所定時間保持し、
重力により処理液を落下させる方法が従来から広く行わ
れていた。しかし、この方法では、液槽上で液切り処理
を行っている間、その液槽を用いて次の処理物の浸漬処
理を行うことが出来ないため、処理の効率が極めて悪か
った。
[0003] As such a liquid draining process, a processing object is held for a predetermined time while being lifted on a liquid tank that has been subjected to an immersion process.
Conventionally, a method of dropping a processing solution by gravity has been widely performed. However, in this method, while the liquid draining process is being performed on the liquid tank, the immersion processing of the next processing object cannot be performed using the liquid tank, so that the processing efficiency is extremely poor.

【0004】そこで、効率化が要求される自動車部品等
の製造工程においては、例えば円筒状のゴムの内周及び
/又は外周に金属製の円筒を備えた防振ゴム製品の防錆
処理を行う際には、処理液を入れた液槽の隣に液切り槽
を別に配置し、液槽での防錆処理等の浸漬処理と、その
後の液切り処理とを平行して行う方法が一般に採用され
ている。
Therefore, in the manufacturing process of automobile parts and the like that require higher efficiency, for example, anti-corrosion treatment of a vibration-proof rubber product having a metal cylinder on the inner and / or outer periphery of a cylindrical rubber is performed. In such a case, a method is generally adopted in which a liquid drainage tank is separately arranged next to the liquid tank containing the processing liquid, and the immersion treatment such as rust prevention treatment in the liquid tank and the subsequent liquid drainage treatment are performed in parallel. Have been.

【0005】例えば、図6に示すように、第1バケット
3を備えると共に防錆液等の処理液2を入れた液槽1
と、第2バケット5を備える液切り槽4とを隣接して設
置し、第1及び第2バケット3、5を回動させる専用の
駆動装置(図示せず)を別々に配置して、浸漬処理と液
切り処理を連続的に平行して行う装置が知られている。
尚、第1及び第2バケット3、5の底部と周囲の壁部に
は、処理液2の流通並びに液切りのための多数の穿孔
(図示せず)が設けてある。
For example, as shown in FIG. 6, a liquid tank 1 having a first bucket 3 and containing a processing liquid 2 such as a rust preventive liquid.
And a draining tank 4 having a second bucket 5 are installed adjacent to each other, and dedicated driving devices (not shown) for rotating the first and second buckets 3 and 5 are separately arranged, and immersion is performed. 2. Description of the Related Art There is known an apparatus that performs a treatment and a liquid removal treatment continuously and in parallel.
The bottoms of the first and second buckets 3 and 5 and surrounding walls are provided with a number of perforations (not shown) for the flow of the processing liquid 2 and the drainage of the liquid.

【0006】[0006]

【発明が解決しようとする課題】上記した図6に図示す
る処理装置においては、液槽1内の第1バケット3に処
理物Aを投入して浸漬処理を行った後、第1バケット3
を回動して処理物Aを液切り槽4内の第2バケット5に
投入する。液切り槽4で処理物Aの液切り処理を行って
いる間、液槽1内に戻した第1バケット3には次の処理
物Aを投入し、平行して浸漬処理を実施する。また、液
切り処理の終わった処理物Aは、第2バケット5を回動
することにより、回収箱6に投入されて回収される。こ
のように処理物の浸漬処理と液切り処理を平行して行う
ため、浸漬と液切りの処理時間が6〜8秒と短く効率的
である。
In the processing apparatus shown in FIG. 6, the processing object A is charged into the first bucket 3 in the liquid tank 1 and immersion processing is performed.
Is turned to put the processing object A into the second bucket 5 in the liquid draining tank 4. While the drainage tank 4 is performing the drainage processing of the processing object A, the next processing object A is charged into the first bucket 3 returned into the liquid tank 1, and the immersion processing is performed in parallel. Further, the processed material A after the liquid draining process is thrown into the collection box 6 by turning the second bucket 5 and collected. As described above, since the immersion treatment and the liquid removal treatment of the processed object are performed in parallel, the immersion and liquid removal treatment time is as short as 6 to 8 seconds, which is efficient.

【0007】しかし、この処理装置では、浸漬のための
液槽1と液切り槽4とを別々に配置し、しかも第1及び
第2バケット3、5を回動させるためそれぞれ専用の駆
動装置を必要とするので、処理装置の設置面積が大きく
なり、設備コストも高くなるという欠点があった。ま
た、第1及び第2バケット3、5の回動により、処理物
Aを液槽1から液切り槽4に、更に回収箱6へと移動さ
せるので、処理液2が周辺に飛散して作業環境を悪化さ
せるうえ、処理物Aが装置外に飛び出したり、装置間に
挟まる等の不都合があった。
However, in this processing apparatus, the liquid tank 1 for immersion and the liquid drain tank 4 are separately arranged, and dedicated driving devices for rotating the first and second buckets 3 and 5 are respectively provided. Because of the necessity, there is a disadvantage that the installation area of the processing apparatus is increased and the equipment cost is increased. Further, since the processing object A is moved from the liquid tank 1 to the liquid draining tank 4 and further to the collection box 6 by the rotation of the first and second buckets 3 and 5, the processing liquid 2 scatters around and works. In addition to deteriorating the environment, there are inconveniences such as the processing object A jumping out of the apparatus and being caught between the apparatuses.

【0008】本発明は、このような従来の事情に鑑み、
浸漬処理と液切り処理の両方を1つの液槽内で同時に平
行して行い、処理の効率を維持しながら、装置の設置面
積や設備コストの低減を図ると共に、処理液の飛散や処
理物の飛び出し等をなくすことを目的とする。
The present invention has been made in view of such a conventional situation,
Both immersion processing and liquid drainage processing are performed simultaneously in one liquid tank in parallel to reduce the installation area and equipment cost of the equipment while maintaining the processing efficiency. The purpose is to eliminate pop-outs and the like.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するた
め、本発明が提供する浸漬と液切りの同時処理方法は、
1つの液槽内で第1底板と該第1底板より高い位置に設
けられた第2底板とを相対的位置を保持したまま同時に
上下方向に往復移動させながら、前記底板が最下降状態
にあるとき、第1底板上の処理物を処理液に浸漬処理す
ると同時に、平行して処理液の液面上にある第2底板上
の処理物を液切り処理することを特徴とするものであ
る。
In order to achieve the above object, the present invention provides a simultaneous immersion and draining method.
While the first bottom plate and the second bottom plate provided at a position higher than the first bottom plate are simultaneously reciprocated up and down in one liquid tank while maintaining the relative position, the bottom plate is in the lowest position. At this time, the processing object on the first bottom plate is immersed in the processing liquid, and at the same time, the processing object on the second bottom plate on the liquid surface of the processing liquid is drained.

【0010】上記の浸漬と液切りの同時処理方法におけ
る好ましい方法は、1つの液槽内で第1底板と該第1底
板より高い位置に設けられた第2底板とを相対的位置を
保持したまま同時に上下方向に往復移動させながら、前
記底板が最下降状態にあるとき、第1底板上の処理物を
処理液に浸漬処理すると同時に、平行して処理液の液面
上にある第2底板上の処理物を液切り処理し、次に底板
が上昇する間に第2底板上の処理物を排出し、引き続き
底板が上昇し更に最下降状態まで下降する間に第1底板
上の処理物を第2底板に移動し、且つ処理物を第1底板
上に供給して、これらの各工程を底板の上下往復移動の
1ストローク当たり1回の割合で処理物を第1底板に供
給しながら連続して行うことを特徴とする。
In a preferred method of the above-described simultaneous immersion and liquid draining method, the relative positions of the first bottom plate and the second bottom plate provided at a position higher than the first bottom plate are maintained in one liquid tank. When the bottom plate is in the lowest position while simultaneously reciprocating in the up and down direction, the processed material on the first bottom plate is immersed in the processing liquid, and at the same time, the second bottom plate on the surface of the processing liquid is immersed. The processed material on the second bottom plate is discharged while the bottom plate is raised, and then the processed material on the first bottom plate is raised while the bottom plate is raised and further lowered to the lowest state. Is moved to the second bottom plate, and the processed material is supplied onto the first bottom plate. Each of these steps is performed while supplying the processed material to the first bottom plate at a rate of one stroke per vertical reciprocating movement of the bottom plate. It is characterized in that it is performed continuously.

【0011】また、本発明の浸漬と液切りの同時処理装
置は、対向する壁部に処理物の投入口と排出口を有する
1つの液槽と、該液槽内の投入口側に投入口側端部が高
くなるように傾斜して上下方向移動可能に設けられた第
1底板と、該液槽内の排出口側に投入口側端部が高くな
るように傾斜して、第1底板よりも高い位置に上下方向
移動可能に設けられた第2底板と、第2底板の投入口側
端部から下方に延長して設けられた邪魔板と、該液槽内
の第1底板と第2底板の間に設置され、投入口側端部が
高くなるように傾斜した頂部を有する中継台と、該第1
底板と第2底板を相対的位置を保持したまま同時に前記
液槽内で上下方向に往復移動させる1つの駆動装置とを
備えることを特徴とする。
In the simultaneous immersion and draining apparatus according to the present invention, there is provided one liquid tank having an inlet and an outlet for a processed material on opposing walls, and an inlet on the inlet side in the liquid tank. A first bottom plate provided so as to be movable up and down so as to be inclined so that the side end is higher; and a first bottom plate which is inclined so that the input end side is higher at a discharge port side in the liquid tank. A second bottom plate movably provided in a higher position than the first bottom plate, a baffle plate extending downward from an end of the second bottom plate on the side of the inlet, a first bottom plate in the liquid tank, and a second bottom plate. A relay stand installed between the two bottom plates, the relay stand having a top portion inclined so that the end on the side of the input port is higher;
One driving device is provided for simultaneously reciprocating the bottom plate and the second bottom plate vertically in the liquid tank while maintaining the relative positions.

【0012】[0012]

【発明の実施の形態】本発明における浸漬と液切りの同
時処理方法では、1つの液槽内に平板状の第1底板と、
第1底板より高い位置に第2底板とを配置し、両者の相
対的位置を保持したまま同時に上下方向に往復移動させ
ながら、第1底板と第2底板の上にそれぞれ処理物を載
せ、低い位置にある第1底板で処理物の浸漬処理を行う
と同時に、第1底板より高い位置にある第2底板では処
理物の液切り処理を平行して行うものである。尚、浸漬
処理とは、処理物を処理液(水であってもよい)に浸漬
することによって行われる全ての処理を意味し、例えば
防錆処理、酸洗処理、メッキ処理、洗浄処理等を含むも
のである。
BEST MODE FOR CARRYING OUT THE INVENTION In the simultaneous treatment method of immersion and liquid drainage according to the present invention, a flat first bottom plate is provided in one liquid tank.
The second bottom plate and the second bottom plate are arranged at a position higher than the first bottom plate, and while the relative positions of the two are kept reciprocating in the vertical direction at the same time, the processing objects are placed on the first bottom plate and the second bottom plate, respectively. The immersion processing of the processing object is performed on the first bottom plate at the position, and the liquid draining processing of the processing object is performed on the second bottom plate at a position higher than the first bottom plate in parallel. In addition, the immersion treatment means all treatments performed by immersing the treated material in a treatment liquid (which may be water), and includes, for example, rust prevention treatment, pickling treatment, plating treatment, cleaning treatment and the like. Including.

【0013】更に具体的には、第1底板及び第2底板
(まとめて単に底板という)は、液槽内を上下方向に直
線的に往復移動する。そして、この上下方向に往復移動
する底板が最下降状態にあるとき、第1底板上の処理物
は処理液中に浸漬され、且つ第2底板は処理液の液面上
に位置するように、各底板の高さと液槽内の処理液の液
面を調整する。この底板の最下降状態において、底板の
移動を所定時間停止することにより、第1底板上の処理
物に浸漬処理を施すと同時に、平行して第2底板上の処
理物については液切り処理を行うことができる。
More specifically, the first bottom plate and the second bottom plate (collectively referred to simply as the bottom plate) linearly reciprocate vertically in the liquid tank. When the bottom plate reciprocating in the up-down direction is in the lowest position, the processed material on the first bottom plate is immersed in the processing liquid, and the second bottom plate is positioned on the liquid surface of the processing liquid. Adjust the height of each bottom plate and the level of the processing liquid in the liquid tank. In the lowest state of the bottom plate, by stopping the movement of the bottom plate for a predetermined time, the immersion process is performed on the processed material on the first bottom plate, and at the same time, the draining process is performed on the processed material on the second bottom plate. It can be carried out.

【0014】浸漬と液切りの同時処理が終了すると、最
下降状態から底板が上昇する間に、第2底板上の液切り
の終了した処理物を液槽の排出口から排出して回収す
る。引き続いて底板は上昇し、最上昇状態に達した後下
降するが、この間に第1底板上にある浸漬処理の終了し
た処理物を空になった第2底板に移動させる。それと同
時に又はその後、空になった第1底板上に次の処理物を
供給する。そして、底板が最下降状態に達したとき、底
板の移動を停止して、前記のごとく浸漬処理と液切り処
理を同時に行うのである。尚、第1底板への次の処理物
の投入は、底板が最下降状態に達したとき、若しくはそ
の後であってもよい。
When the simultaneous processing of the immersion and the draining is completed, while the bottom plate is lifted from the lowest position, the processed material on the second bottom plate after the draining is discharged from the outlet of the liquid tank and collected. Subsequently, the bottom plate rises and descends after reaching the highest state. During this time, the processed material on the first bottom plate after the immersion treatment is moved to the empty second bottom plate. At the same time or thereafter, the next processed material is supplied onto the empty first bottom plate. Then, when the bottom plate reaches the lowermost state, the movement of the bottom plate is stopped, and the immersion process and the liquid removal process are performed simultaneously as described above. It should be noted that the next processing object may be charged into the first bottom plate when the bottom plate reaches the lowest state or after that.

【0015】このように、1つの切り液槽内で浸漬処理
と液切り処理とを同時に平行して行い、且つ底板の上下
方向の往復移動の1ストローク毎に1回の割合で処理物
を第1底板に供給しながら連続処理を実施することがで
きる。従って、極めて高い処理効率が得られると共に、
装置の小型化により設置面積や設備コストの低減を図る
ことができる。更に、第1底板と第2底板は共に液槽内
にあるので、第2底板で液切りされた処理液は液槽内に
落下して液槽外に飛散することがなく、処理物が液槽外
に飛び出すことも防止できる。
As described above, the immersion treatment and the liquid removal treatment are simultaneously performed in one slicing liquid tank at the same time, and the processed material is removed at a rate of once per one stroke of the vertical movement of the bottom plate. Continuous processing can be performed while supplying to one bottom plate. Therefore, extremely high processing efficiency can be obtained,
By reducing the size of the device, the installation area and equipment cost can be reduced. Furthermore, since the first bottom plate and the second bottom plate are both in the liquid tank, the processing liquid drained by the second bottom plate does not fall into the liquid tank and scatter outside the liquid tank, and the processing object is not liable to the liquid. Jumping out of the tank can also be prevented.

【0016】[0016]

【実施例】上記した本発明方法を実施するための好まし
い装置について、図面を参照して説明する。この浸漬と
液切りの同時処理装置は、図1及び図2に示すように、
背の高い(上下方向に長い)四角筒状の液槽10を備
え、液槽10の対向する両側の壁部には処理物Aの投入
口11と排出口12が窓状に開口してあり、その投入口
11と排出口12には処理物Aを滑らせて投入又は排出
するための投入シュート11aと排出シュート12aが
それぞれ設けてある。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred apparatus for carrying out the method of the present invention will be described with reference to the drawings. As shown in FIG. 1 and FIG.
A tall (long in the vertical direction) rectangular tube-shaped liquid tank 10 is provided, and an input port 11 and a discharge port 12 of the processed material A are opened in a window shape on opposite side walls of the liquid tank 10. The input port 11 and the output port 12 are provided with an input chute 11a and a discharge chute 12a for slidingly inputting or discharging the processed material A, respectively.

【0017】この液槽10の内側には、投入口11側に
第1底板13が、及び排出口12側に第2底板14が、
共に投入口側端部が高くなるように傾斜して設けてあ
り、第2底板14は第1底板13よりも高い位置に保持
されている。第2底板14の投入口側端部には、下方に
延長する邪魔板18が固定してある。また、第1底板1
3と第2底板14(及び邪魔板18)の間には、中継台
19が液槽10の底部に固定されて立設され、その頂部
19aは投入口側端部が高くなるように傾斜している。
尚、底板が最上昇状態に達したときでも、邪魔板18は
中継台19の頂部19aより下方に延びる長さとする。
また、中継台19は、その両端部を液槽10の側壁部に
固定してもよい。
Inside the liquid tank 10, a first bottom plate 13 is provided on the side of the inlet 11 and a second bottom plate 14 is provided on the side of the outlet 12.
Both are provided so as to be inclined so that the inlet side end is higher, and the second bottom plate 14 is held at a position higher than the first bottom plate 13. A baffle plate 18 extending downward is fixed to an end of the second bottom plate 14 on the side of the inlet. Also, the first bottom plate 1
Between the third bottom plate 14 and the second bottom plate 14 (and the baffle plate 18), a relay stand 19 is fixed to the bottom of the liquid tank 10 and is erected, and the top 19a is inclined so that the end on the inlet side becomes higher. ing.
Even when the bottom plate reaches the highest position, the baffle plate 18 has a length extending downward from the top 19 a of the relay stand 19.
Further, both ends of the relay stand 19 may be fixed to the side wall of the liquid tank 10.

【0018】また、第1底板13と第2底板14は、図
2に明示されるように、それぞれの投入口側端部と排出
口側端部を除く両側縁部が覆い板15a、15bに接続
して閉鎖され、処理物Aが両側縁部から落下しないよう
になっている。更に、これらの覆い板15a、15bの
上端部は可動板に固定され、液槽10の上部に固定した
上部フレーム10aに設置された駆動装置のエアシリン
ダ17にロッド17aを介して連結されている。
As shown in FIG. 2, the first bottom plate 13 and the second bottom plate 14 have both side edges except for the inlet end and the outlet end on the cover plates 15a and 15b. It is connected and closed, so that the processing object A does not drop from both side edges. Further, upper ends of these cover plates 15a and 15b are fixed to a movable plate, and are connected via a rod 17a to an air cylinder 17 of a driving device installed on an upper frame 10a fixed to an upper portion of the liquid tank 10. .

【0019】尚、第1底板13及び第2底板14を、そ
れぞれの投入口側端部と排出口側端部を除く両側縁部が
共に液槽10の壁面に近接するように設ければ、液槽1
0の壁面との隙間が狭くなり処理物Aが落下することが
なくなるので、必ずしも図示した覆い板15a、15b
を設けなくてもよい。しかし、その場合には、第1底板
13と第2底板14の各隅部に連結棒等を固定し、その
他端を可動板16に固定することにより、駆動装置に連
結する必要がある。
If the first bottom plate 13 and the second bottom plate 14 are provided such that both side edges other than the inlet end and the outlet end are close to the wall surface of the liquid tank 10, Liquid tank 1
0, the processing object A does not drop, and thus the illustrated cover plates 15a, 15b
May not be provided. However, in this case, it is necessary to connect the drive rod by fixing a connecting rod or the like to each corner of the first bottom plate 13 and the second bottom plate 14 and fixing the other end to the movable plate 16.

【0020】このような構造を有する装置では、駆動装
置であるエアシリンダ17により、可動板16に接続さ
れた第1底板13と第2底板14とを相対的な位置を保
持したまま同時に、液槽10内で上下方向に直線的に往
復移動させることができる。また、第1底板13、第2
底板14、中継台19の相互間、及びこれらと液槽10
の壁面との間には、処理物Aを通さない程度の隙間が存
在するので、その隙間を通して処理液2が流通し又は流
れ落ちることができる。尚、液槽10をはじめ、底板1
3、14や邪魔板18、中継台19等は、プラスチック
材料又は金属材料で作製することができる。
In the device having such a structure, the first bottom plate 13 and the second bottom plate 14 connected to the movable plate 16 are simultaneously held by the air cylinder 17 as a driving device while maintaining the relative positions. It can be linearly reciprocated vertically in the tank 10. Also, the first bottom plate 13 and the second
Between the bottom plate 14 and the relay stand 19, and between them and the liquid tank 10
Since there is a gap between the wall and the surface of the processing liquid A, the processing liquid 2 can flow or flow down through the gap. In addition, the bottom plate 1 including the liquid tank 10
3, 14, the baffle plate 18, the relay stand 19 and the like can be made of a plastic material or a metal material.

【0021】次に、上記装置による具体的な処理動作
を、図1及び図3〜図5により説明する。まず、図1に
示すように、上下方向に往復移動する底板13、14が
最下降状態にあるとき、第1底板13上の処理物Aが処
理液2中に浸漬され、且つ第1底板13より高い位置に
ある第2底板14は処理液2の液面上に位置する。この
底板の最下降状態(図1)において、第1底板13上の
処理物Aには浸漬処理が施され、同時に平行して第2底
板14上の処理物Aは液切りされる。
Next, a specific processing operation by the above apparatus will be described with reference to FIG. 1 and FIGS. First, as shown in FIG. 1, when the bottom plates 13, 14 reciprocating in the vertical direction are in the lowest position, the processing object A on the first bottom plate 13 is immersed in the processing liquid 2, and The second bottom plate 14 at a higher position is located above the liquid surface of the processing liquid 2. In the lowermost state of the bottom plate (FIG. 1), the processed material A on the first bottom plate 13 is subjected to immersion processing, and at the same time, the processed material A on the second bottom plate 14 is drained.

【0022】浸漬と液切りの同時処理が終了すると、エ
アシリンダ17の駆動により、底板13、14が最下降
状態から上昇を開始する。底板13、14が上昇して、
図3に示すように、高い位置にある第2底板14が液槽
10の排出口12に達したとき、投入口側端部が高くな
るように傾斜した第2底板14から処理物A(液切り済
み)が自然に滑り落ちて排出口12から排出され、排出
シュート12aを通って回収箱(図示せず)に回収され
る。
When the simultaneous processing of immersion and drainage is completed, the bottom plates 13 and 14 start to rise from the lowest position by driving the air cylinder 17. The bottom plates 13 and 14 rise,
As shown in FIG. 3, when the second bottom plate 14 at a high position reaches the discharge port 12 of the liquid tank 10, the processing object A (liquid) The cut pieces naturally slide down and are discharged from the discharge port 12, and are collected in a collection box (not shown) through the discharge chute 12a.

【0023】更に底板13、14が上昇を続け、図4に
示すように、第1底板13が中継台19の頂部19aに
達したとき、投入口側端部が高くなるように傾斜した第
1底板13から処理物A(浸漬処理済み)が自然に滑り
落ちて、中継台19の頂部19a上に移動する。このと
き、頂部19aも投入口側端部が高くなるように傾斜し
ていると共に、中継台19の排出口側には第2底板14
の投入口側端部に垂下して固定された邪魔板18が位置
しているので、処理物Aは液槽10に落下することな
く、中継台19の頂部19aに載置される。
Further, as shown in FIG. 4, when the first bottom plate 13 reaches the top 19 a of the relay stand 19, the first end plate 13 is inclined so that the end on the input port side becomes higher, as shown in FIG. 4. The processed material A (which has been immersed) naturally slides down from the bottom plate 13 and moves onto the top 19 a of the relay stand 19. At this time, the top portion 19a is also inclined so that the input port side end is higher, and the second bottom plate 14
Since the baffle plate 18 hanging down and fixed to the end portion on the side of the charging port is located, the processed product A is placed on the top portion 19 a of the relay stand 19 without falling into the liquid tank 10.

【0024】尚、上記の説明及び図3と図4では、第2
底板14からの処理物A(液切り済み)の排出が終了し
た後、第1底板13から処理物A(浸漬処理済み)を中
継台19の頂部19aに移す場合について説明したが、
図5に示すように、第1底板13と中継台19の頂部1
9aの高さを調整することにより、第2底板14からの
処理物Aの排出と同時に、第1底板13上の処理物Aを
中継台19の頂部19aに移動させることも可能であ
る。
In the above description and FIGS. 3 and 4, the second
After the discharge of the processed product A (drained) from the bottom plate 14 is completed, the case where the processed product A (dipped) is transferred from the first bottom plate 13 to the top 19a of the relay stand 19 has been described.
As shown in FIG. 5, the first bottom plate 13 and the top 1
By adjusting the height of 9 a, it is possible to move the processed material A on the first bottom plate 13 to the top 19 a of the relay stand 19 simultaneously with the discharge of the processed material A from the second bottom plate 14.

【0025】通常の場合、底板13、14は図4又は図
5の位置を最上昇状態とし、その後は下降を開始する。
そして、底板13、14が下降して、図1に示すよう
に、第2底板14が中継台19の頂部19aに達したと
き、邪魔板18が中継台19の下方に隠れる。その結
果、先に第1底板13から一旦中継台19の頂部19a
に移載されていた処理物A(浸漬処理済み)は、傾斜し
た頂部19aから自然に滑り落ちて空の第2底板上に移
動する。尚、図1は底板13、14の最下降状態を示す
が、中継台19と第2底板14の高さを調整すれば、底
板の下降の途中で処理物Aを第2底板14に移すことも
可能である。
In the normal case, the bottom plates 13 and 14 are set at the highest position in FIG. 4 or FIG. 5, and then start to lower.
Then, when the bottom plates 13 and 14 descend and the second bottom plate 14 reaches the top 19a of the relay stand 19, the baffle plate 18 is hidden below the relay stand 19 as shown in FIG. As a result, the top portion 19a of the relay stand 19 is temporarily moved from the first bottom plate 13 first.
The workpiece A (which has been immersed), which has been immersed, naturally slides down from the inclined top 19a and moves onto the empty second bottom plate. Although FIG. 1 shows the lowest state of the bottom plates 13 and 14, if the heights of the relay stand 19 and the second bottom plate 14 are adjusted, the processing object A is transferred to the second bottom plate 14 during the lowering of the bottom plate. Is also possible.

【0026】また、底板13、14の最下降状態(図
1)において、投入シュート11aに次の処理物Aを供
給し、投入口11から空の第1底板13上に投入する。
この第1底板13への処理物Aの投入は、通常は図1の
ように底板13、14の最下降状態において第2底板1
4への処理物Aの移動と同時に又は相前後して行うが、
他の状態にあるとき行ってもよい。即ち、下降してきた
第1底板13が投入口11に達したとき又はそれ以後で
あれば、空の第1底板13上に次の処理物Aを供給する
ができる。
In the lowest state of the bottom plates 13 and 14 (FIG. 1), the next processed material A is supplied to the charging chute 11a and is charged from the charging port 11 onto the empty first bottom plate 13.
The processing object A is usually introduced into the first bottom plate 13 when the bottom plates 13 and 14 are in the lowest position as shown in FIG.
4, at the same time as or before or after the transfer of the processed material A to
It may be performed when it is in another state. That is, when the first bottom plate 13 that has descended reaches the inlet 11 or after that, the next processed material A can be supplied onto the empty first bottom plate 13.

【0027】そして、底板13、14は、図1の最下降
状態において移動を停止し、前記のごとく所定時間の浸
漬処理と液切り処理を同時に行うのである。このような
動作を連続的に繰り返すことによって、処理物Aを自動
的に効率よく処理することができる。また、処理物Aに
は特に制限はないが、自動車用の防振ゴム製品のように
比較的大きいものは1個ずつ処理することが好ましく、
ある程度小さなものは複数個まとめて処理してもよい。
Then, the bottom plates 13 and 14 stop moving in the lowermost state of FIG. 1, and simultaneously perform the immersion processing and the liquid removal processing for a predetermined time as described above. By continuously repeating such operations, the processing object A can be automatically and efficiently processed. Although there is no particular limitation on the treated product A, it is preferable to treat relatively large products such as anti-vibration rubber products for automobiles one by one,
A plurality of small objects may be collectively processed.

【0028】[0028]

【発明の効果】本発明によれば、処理物を処理液に浸漬
して行う浸漬処理と、その後の液切り処理とを、1つの
液槽内で同時に平行して行うので、効率のよい処理が可
能であって、しかも処理液の液槽外への飛散や処理物の
飛び出し等を完全になくすことができる。また、液槽及
び駆動装置を各1つ備えるだけであるから、装置の設置
面積や設備コストの低減を図ることができると共に、構
造が簡単で故障がなく、信頼性の高い装置を提供するこ
とができる。
According to the present invention, since the immersion treatment in which the treatment object is immersed in the treatment liquid and the subsequent liquid removal treatment are simultaneously performed in one liquid tank, efficient treatment is achieved. In addition, it is possible to completely prevent the processing liquid from scattering out of the liquid tank and the processing object from jumping out. In addition, since only one liquid tank and one driving device are provided, it is possible to reduce the installation area and equipment cost of the device, and to provide a highly reliable device that is simple in structure and free from failure. Can be.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による処理装置の具体例を示す概略の断
面図である。
FIG. 1 is a schematic sectional view showing a specific example of a processing apparatus according to the present invention.

【図2】本発明の図1の装置のI−I線における概略の
断面図である。
FIG. 2 is a schematic sectional view of the device of FIG. 1 of the present invention, taken along line II.

【図3】本発明における処理物の排出工程を示す概略の
断面図である。
FIG. 3 is a schematic cross-sectional view illustrating a process of discharging a processed material according to the present invention.

【図4】本発明における処理物の移動工程を示す概略の
断面図である。
FIG. 4 is a schematic cross-sectional view showing a process of moving a processing object in the present invention.

【図5】本発明における処理物の排出と移動の同時工程
を示す概略の断面図である。
FIG. 5 is a schematic cross-sectional view showing a simultaneous process of discharging and moving a processed object in the present invention.

【図6】従来の処理装置を示す概略の断面図である。FIG. 6 is a schematic sectional view showing a conventional processing apparatus.

【符号の説明】[Explanation of symbols]

A 処理物 1 液槽 2 処理液 3 第1バケット 4 液切り槽 5 第2バケット 6 回収箱 10 液槽 11 投入口 12 排出口 13 第1底板 14 第2底板 15a、15b 覆い板 16 可動板 17 エアシリンダ 18 邪魔板 19 中継台 19a 頂部 A Processed object 1 Liquid tank 2 Processing liquid 3 First bucket 4 Liquid drain tank 5 Second bucket 6 Collection box 10 Liquid tank 11 Input port 12 Discharge port 13 First bottom plate 14 Second bottom plate 15a, 15b Cover plate 16 Movable plate 17 Air cylinder 18 Baffle plate 19 Relay stand 19a Top

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 1つの液槽内で第1底板と該第1底板よ
り高い位置に設けられた第2底板とを相対的位置を保持
したまま同時に上下方向に往復移動させながら、前記底
板が最下降状態にあるとき、第1底板上の処理物を処理
液に浸漬処理すると同時に、平行して処理液の液面上に
ある第2底板上の処理物を液切り処理することを特徴と
する、浸漬と液切りの同時処理方法。
1. A method according to claim 1, wherein the first bottom plate and a second bottom plate provided at a position higher than the first bottom plate are simultaneously reciprocated in a vertical direction while maintaining a relative position in one liquid tank. When in the lowermost state, the processed material on the first bottom plate is immersed in the processing liquid, and at the same time, the processed material on the second bottom plate on the liquid surface of the processing liquid is drained. , A simultaneous treatment method of immersion and drainage.
【請求項2】 1つの液槽内で第1底板と該第1底板よ
り高い位置に設けられた第2底板とを相対的位置を保持
したまま同時に上下方向に往復移動させながら、前記底
板が最下降状態にあるとき、第1底板上の処理物を処理
液に浸漬処理すると同時に、平行して処理液の液面上に
ある第2底板上の処理物を液切り処理し、次に底板が上
昇する間に第2底板上の処理物を排出し、引き続き底板
が上昇し更に最下降状態まで下降する間に第1底板上の
処理物を第2底板に移動し、且つ処理物を第1底板上に
供給して、これらの各工程を底板の上下往復移動の1ス
トローク当たり1回の割合で処理物を第1底板に供給し
ながら連続して行うことを特徴とする、請求項1に記載
の浸漬と液切りの同時処理方法。
2. The method according to claim 1, wherein the first bottom plate and the second bottom plate provided at a position higher than the first bottom plate are simultaneously reciprocated in a vertical direction while maintaining a relative position in one liquid tank. In the lowermost state, the processed material on the first bottom plate is immersed in the processing liquid, and at the same time, the processed material on the second bottom plate on the level of the processing liquid is drained, and then the bottom plate is processed. The workpiece on the second bottom plate is discharged while the bottom plate rises, and the workpiece on the first bottom plate is moved to the second bottom plate while the bottom plate continuously rises and further descends to the lowest state, and the processed product is removed from the second bottom plate. 2. The method according to claim 1, wherein each of the steps is continuously performed while supplying the processed material to the first bottom plate at a rate of once per stroke of the vertical movement of the bottom plate. The simultaneous treatment method of immersion and liquid drainage described in (1).
【請求項3】 対向する壁部に処理物の投入口と排出口
を有する1つの液槽と、該液槽内の投入口側に投入口側
端部が高くなるように傾斜して上下方向移動可能に設け
られた第1底板と、該液槽内の排出口側に投入口側端部
が高くなるように傾斜して、第1底板よりも高い位置に
上下方向移動可能に設けられた第2底板と、第2底板の
投入口側端部から下方に延長して設けられた邪魔板と、
該液槽内の第1底板と第2底板の間に設置され、投入口
側端部が高くなるように傾斜した頂部を有する中継台
と、該第1底板と第2底板を相対的位置を保持したまま
同時に前記液槽内で上下方向に往復移動させる1つの駆
動装置とを備えることを特徴とする浸漬と液切りの同時
処理装置。
3. A liquid tank having an inlet and a discharge port for a processed material on opposing walls, and an inlet port side end in the liquid tank which is inclined so that an end of the inlet port is higher, and is vertically oriented. A first bottom plate movably provided, and a sloping inlet end on the side of the discharge port in the liquid tank, which is inclined so as to be higher, and vertically movably provided at a position higher than the first bottom plate. A second bottom plate, and a baffle plate extending downward from an input port side end of the second bottom plate;
A relay stand, which is installed between the first bottom plate and the second bottom plate in the liquid tank and has a top portion inclined so that the end on the side of the inlet is raised, and a relative position between the first bottom plate and the second bottom plate. A simultaneous driving device for immersion and liquid drainage, comprising one driving device for reciprocating vertically in the liquid tank while holding the same.
【請求項4】 前記第1底板及び第2底板は、それぞれ
の投入口側端部と排出口側端部を除く両側縁部が駆動装
置に連結する覆い板に接続して閉鎖されていることを特
徴とする、請求項3に記載の浸漬と液切りの同時処理装
置。
4. The first bottom plate and the second bottom plate are closed by being connected to a cover plate connected to a driving device at both side edges except for an inlet end and an outlet end. The simultaneous immersion and draining apparatus according to claim 3, characterized in that:
【請求項5】 前記第1底板及び第2底板は、それぞれ
の投入口側端部と排出口側端部を除く両側縁部が液槽の
壁面に近接し、隅部に設けた連結棒により1つの駆動装
置に連結されていることを特徴とする、請求項3に記載
の浸漬と液切りの同時処理装置。
5. The first bottom plate and the second bottom plate have opposite side edges except for an inlet end and an outlet end which are close to the wall surface of the liquid tank, and are provided with connecting rods provided at corners. 4. The simultaneous immersion and draining device according to claim 3, wherein the device is connected to one drive device.
JP10314539A 1998-11-05 1998-11-05 Method and equipment for simultaneous treatment of immersion and liquid draining Pending JP2000144450A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10314539A JP2000144450A (en) 1998-11-05 1998-11-05 Method and equipment for simultaneous treatment of immersion and liquid draining

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10314539A JP2000144450A (en) 1998-11-05 1998-11-05 Method and equipment for simultaneous treatment of immersion and liquid draining

Publications (1)

Publication Number Publication Date
JP2000144450A true JP2000144450A (en) 2000-05-26

Family

ID=18054519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10314539A Pending JP2000144450A (en) 1998-11-05 1998-11-05 Method and equipment for simultaneous treatment of immersion and liquid draining

Country Status (1)

Country Link
JP (1) JP2000144450A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110592574A (en) * 2019-09-17 2019-12-20 天成涂装系统(常州)有限公司 Novel film pretreatment circulating system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110592574A (en) * 2019-09-17 2019-12-20 天成涂装系统(常州)有限公司 Novel film pretreatment circulating system

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