JP2000138496A - Electromagnetic wave shield member, production thereof and indicator - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance visibility by filling the gap between respective lines in each parallel line group on one side of a transparent basic material tightly with a transparent resin layer in the plane direction except the line region of other line groups and composing a conductive layer of a conductive ink thereby providing antireflection and near infrared ray cutting functions. SOLUTION: An electromagnetic wave shield layer region 160 comprises a transparent basic material 110, a conductive layer 121, a light absorbing layer 122 and with a transparent resin layer 130. In the electromagnetic wave shield layer region 160, two parallel line groups of laminate 120 intersect to form a mesh 126 and a mesh of the conductive layer 121 composed of conductive ink serves as an electromagnetic wave shield. The gap between respective lines in each parallel line group of the laminate 120 comprising the conductive layer 121 and the light absorbing layer 122 is filled tightly with the transparent resin layer 130 in the plane direction except the line region of other line groups. The laminate 120 is provided with the light absorbing layer 122 on one side of the transparent basic material 110 of the conductive layer 121. A ground frame part 165 is also formed solidly of the same laminate 120 as that for the line group forming the mesh.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member for shielding electromagnetic waves for a display device used on a front surface of a display panel such as a plasma display for preventing reflection and shielding electromagnetic waves.

[0002]

2. Description of the Related Art Conventionally, electronic devices that generate electromagnetic waves, such as an electronic tube for a display, which are directly used by a person,
It is required to suppress the intensity of electromagnetic wave emission within the standard in consideration of the adverse effect of the electromagnetic wave on the human body. BACKGROUND ART A plasma display panel (hereinafter also referred to as a PDP) has been used in various display devices in recent years because of its small depth and light weight. Because
Since unnecessary electromagnetic waves having a frequency band of 30 MHz to 130 MHz are leaked to the outside, it is particularly required to suppress the electromagnetic waves as much as possible so as not to adversely affect other devices (for example, information processing devices). Further, in a display panel, it is necessary to prevent reflection of external light from the viewpoint of lowering the contrast of an image. In particular, in a video device using a PDP,
Since the display surface is flat, light reflected in a wide range when external light is inserted may enter the eyes at the same time, making it difficult to see the screen, and it is necessary to prevent reflection of external light. Also, since the wavelength of near-infrared light is close to the wavelength range of infrared light used in remote control devices or optical communication devices, etc., when these devices and devices are operated near a PDP that emits near-infrared light, normal operation is possible. Operation may be hindered. Furthermore,
It is also necessary to transmit the light emitted from the PDP at a predetermined transmittance to display an excellent screen.

[0003] In response to these demands, in PDPs, conventionally, as a method for preventing reflection, electromagnetic wave cutting and infrared ray cutting, a film having various functions such as electromagnetic wave cutting and infrared ray cutting is sandwiched between two glass plates. , This is PD
It was put on the front of P and corresponded. However, there is a problem that the overall weight is increased, and none of them is satisfactory in all of electromagnetic wave cutting property, infrared ray cutting property, antireflection property, visible light transmission property, absorption property and the like. Further, in addition to the above functions, a plate used on the front surface of the display panel (also referred to as a front plate) is adapted to cope with dirt, is suitable for mass production in production, and has a low unit price for production. Is required. A plate placed on the front of a display panel such as a PDP is generally called a front panel for a display panel, and is also called an electromagnetic wave shielding member or an electromagnetic wave shielding member because it has an electromagnetic wave shielding.

Under such circumstances, a front panel for a display panel in which a mesh made of a metal thin film is formed on the surface of a transparent glass or plastic substrate has an electromagnetic wave shielding property.
There is an advantage in terms of light transmission, and in recent years, it has come to be used in front of a display panel such as a PDP. However, the PDP does not have a front plate, which has all of the above functions, is light in weight, and has a configuration suitable for mass production in terms of production, that is, an electromagnetic wave shielding member.

[0005]

As described above, the PDP
The front panel of the display panel, etc., has a function of anti-reflection, infrared cut, etc. in addition to the electromagnetic wave cut, is light in weight, suitable for mass production in production, and has a configuration in which the unit price for production is low. That is, an electromagnetic wave shielding member has been required. The present invention seeks to provide an electromagnetic wave shielding member that can withstand such a requirement under such circumstances.

[0006]

According to the present invention, there is provided an electromagnetic wave shielding member according to the present invention, wherein at least one surface of a transparent substrate is formed into one or a plurality of parallel straight lines on one side of a transparent substrate side of a conductive layer. A laminate composed of a conductive layer and a light absorbing layer provided with a light absorbing layer on both surfaces is arranged, at least between the straight lines of each parallel straight line group, except for the straight line region of the other straight line group. , Is buried in the surface direction with a transparent resin layer without gaps,
In addition, the conductive layer is made of a conductive ink. In the above, the transparent substrate is made of a resin film. Further, in the above, the light absorption layer is made of a conductive carbon ink. Further, in the above, one or more parallel straight lines composed of a conductive laminate having a light absorbing layer provided on one or both sides of the transparent substrate side of the conductive layer and the transparent resin layer or the transparent substrate An anti-reflection layer is laminated thereon. Alternatively, in the above, one or a plurality of parallel straight lines composed of a conductive laminate in which a light absorbing layer is provided on one or both surfaces of the conductive layer on the transparent substrate side and a transparent resin layer or a transparent substrate A near-infrared cut layer is laminated thereon, and an anti-reflection layer is further laminated on the near-infrared cut layer.

The display device of the present invention is characterized in that the electromagnetic wave shielding member of the present invention is laminated on the front surface of the display device such that the conductive layer is closer to the device than the light absorbing layer.

According to the method of manufacturing an electromagnetic wave shielding member of the present invention, at least one surface of a transparent substrate is formed into one or a plurality of parallel straight lines, and a light is applied to one or both surfaces of the conductive layer on the transparent substrate side. Laminated body consisting of a conductive layer provided with an absorbing layer and a light absorbing layer, provided, at least, between each straight line of each parallel straight line group, except for the region of the straight line of the other straight line group,
An electromagnetic wave shielding member which is filled with a transparent resin layer in the surface direction without any gap, and in which the conductive layer is made of conductive ink, wherein (a) a concave portion corresponding to the shape of the conductive laminate is formed in order. Using the provided plate, filling the plate with a light-absorbing ink for forming a light-absorbing layer and a conductive ink for forming a conductive layer; and (b) bringing the transparent substrate and the plate into contact with each other and filling at the same time Curing the light absorbing ink forming the light absorbing layer and the conductive ink forming the conductive layer, and (c)
Further, the transparent base material and the plate are brought into close contact with each other, and the transparent base material is peeled off from the plate, whereby the cured light absorbing ink and conductive ink are transferred from the plate side to the transparent base material, and the transparent base material is transferred. Forming a parallel straight line group made of a conductive laminate on the surface of the material; and (d) injecting a resin for forming a transparent resin layer between the conductive laminates with the transparent substrate surface exposed. And a step of performing Further, the method for producing an electromagnetic wave shielding member of the present invention is characterized in that at least one surface of the transparent substrate has a shape of one or more parallel straight lines, and one or both surfaces of the conductive layer on the transparent substrate side have light absorption. A laminate comprising a conductive layer provided with a layer and a light absorbing layer, which is disposed, at least between each straight line of each parallel straight line group, except for the region of the straight line of the other straight line group, the transparent resin layer Using a plate in which the conductive layer is an electromagnetic wave shielding member made of conductive ink, and in order, (A) a concave portion corresponding to the shape of the transparent resin layer is provided, A step of filling the plate with a resin that forms a transparent resin layer; (B) a step of bringing a transparent substrate into contact with the plate and simultaneously curing the resin that forms the filled transparent resin layer; Adhere the transparent substrate to the plate and remove the transparent substrate from the plate. Accordingly, a step of transferring the resin cured to a transparent substrate from the plate side, to form a transparent resin layer on the surface of the transparent substrate,
(D) between the transparent resin layers where the transparent substrate surface is exposed,
A step of injecting a light-absorbing ink forming a light-absorbing layer and a conductive ink forming a conductive layer; and (E) removing the light-absorbing ink or the conductive ink on the transparent resin layer to form a conductive laminate. Forming a parallel straight line group consisting of a body.

[0009]

The electromagnetic wave shielding member of the present invention has a structure suitable for mass production in which the electromagnetic wave shielding layer can be relatively easily manufactured by adopting such a structure. Further, a near-infrared cut layer is provided on the electromagnetic wave shielding layer. By providing the anti-reflection layer, in addition to the electromagnetic wave shield, a function of cutting off near infrared rays and preventing reflection can be provided, and it can be said that the structure is excellent in terms of functions. In particular, when the electromagnetic wave shielding member of the present invention is used by being attached to the front surface of a display device such as a PDP, since the light absorbing layer is provided by being laminated with the conductive layer, the electromagnetic wave shielding member has high visibility. Good things can be made. Many conductive inks have a noble metal as a main component, and often have a glare. Therefore, instead of the conductive laminate having a light absorbing layer provided on one or both surfaces of the conductive layer according to the present invention, an electromagnetic wave shielding member comprising only a conductive layer using a conductive ink containing a noble metal as a main component is used. When attached to the front surface of a PDP, the contrast is reduced due to glare. However, the light absorbing layer in the electromagnetic wave shielding member of the present invention can prevent the conductive ink from lowering the contrast. In addition, the electromagnetic wave shielding member of the present invention can be manufactured individually by simply bonding an electromagnetic wave shielding layer (electromagnetic wave shielding layer), a near-infrared cut layer, and an antireflection layer directly or via an adhesive layer. It can be said that it is an excellent structure in terms of productivity and function. Specifically, at least one surface of a transparent substrate, in the shape of one or more parallel straight lines, a conductive layer provided with a light absorbing layer on one or both surfaces of the transparent substrate side of the conductive layer. The laminated body composed of the light absorbing layer is arranged, and at least the space between each straight line of each parallel straight line group is filled with a transparent resin layer without any gap in the surface direction except for the region of the straight line of the other straight line group. And the conductive layer is made of conductive ink, so that when it is used by attaching it to the front of the PDP, it has a structure with good visibility and an electromagnetic wave shielding layer (electromagnetic wave shielding layer) It has a structure suitable for mass production that can be easily manufactured, and by using a transparent base material as a resin film, it is possible to produce a flexible electromagnetic wave shielding member, which can be reduced in weight and can be used for mass production. It is assumed. More specifically, by laminating a near-infrared cut layer on one or more parallel straight lines composed of a conductive layer and a transparent resin layer or a transparent substrate, and laminating an antireflection layer. Thereby, the function can be further enhanced.

[0010] It is formed on one surface of a transparent substrate,
One or more parallel straight lines composed of a laminate in which a light-absorbing layer is laminated on one or both surfaces of a transparent substrate of a conductive layer are usually formed in a mesh shape, that is, the conductive layer is formed in a mesh shape. It forms and becomes an electromagnetic wave shielding layer. The electromagnetic wave shielding layer composed of a conductive layer, which is usually in a mesh shape, has a sheet resistance of 10
Ω / □ (also referred to as Ω / sqr) or less, more preferably 5
The mesh is easily formed so that the attenuation factor for electromagnetic waves in the frequency range of 20 MHz to 10000 MHz is 20 dB (decibel) or more, preferably Ω / □ or less, most preferably 1 Ω / □ or less. In this case, a plasma display panel (PDP) has a frequency band of 30 MHz to 130 MHz due to plasma discharge.
It is possible to prevent unnecessary leakage of electromagnetic waves such as MHz from the outside, and to prevent adverse effects on other devices (for example, information processing devices).

The near-infrared cut layer is not particularly limited, but may be formed by using a commercially available polyethylene terephthalate (PET) film coated with a near-infrared cut layer. No. 2832 manufactured by Toyobo Co., Ltd. is generally known as a commercially available polyethylene terephthalate (PET) film coated with a near-infrared cut layer. 800nm for infrared cut film
By setting the transmittance for near-infrared light having a wavelength in the range of 1000 nm to 20% or less, the infrared region used in a remote control device or optical communication can be attenuated as much as possible. When operated, normal operation can be prevented.

The antireflection layer (also referred to as an AR layer) is used to prevent reflection of visible light, and its structure is known to be a single layer or a multilayer. And a structure in which low refractive index layers are alternately laminated. The material of the antireflection layer is not particularly limited,
In the production of the electromagnetic wave shielding member of the present invention, any method may be used as long as the effect can be obtained, whether the antireflection layer is produced by a dry method such as sputtering or vapor deposition, or the method of producing the antireflection layer by wet coating. Absent.
Incidentally, as the high refractive index layer, Ti oxide, zirconium or the like is used, and as the low refractive index layer, silicon oxide is generally used. Further, for the antireflection film, 450n
By setting the reflectance with respect to visible light having a range of m to 650 nm to 2% or less, a wavelength in a range of 450 nm to 650 nm can be obtained in a state where a near infrared cut layer and an antireflection layer are laminated on an electromagnetic wave shielding layer. By setting the transmittance to visible light to be 70% or more and the absorptance to 28% or less, it is possible to prevent a decrease in contrast of image quality due to reflection of external light and the like, and to provide good visibility. Thus, the present invention can be applied to a PDP front plate (electromagnetic wave shielding member) and can be applied in a wide range.

The method of manufacturing an electromagnetic wave shielding member according to the present invention has such a configuration, and can respond particularly to mass productivity. In particular, when a resin film is used as a transparent base material that is a base material for forming an electromagnetic wave shielding layer composed of a group of parallel straight lines composed of conductive layers, the embodiment shown in FIGS. It can be manufactured as in the above embodiment, and is suitable for mass production. In the case of the manufacturing method according to claim 9 (also referred to as a second method), a step of removing the conductive ink or the light-absorbing ink is required, and the manufacturing method according to claim 8 (also referred to as the first method). ), But can be made relatively easily.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS First, an embodiment of an electromagnetic wave shielding member of the present invention will be described with reference to the drawings. FIG.
1A is a cross-sectional view of an electromagnetic wave shielding layer region of a first example of the embodiment, FIG. 1B is a plan view seen from the A0 side in FIG. 1, and FIG. 1C is FIG. ) Is an enlarged plan view showing an A1 region which is a part of the electromagnetic wave shielding layer region;
FIG. 2 is a sectional view of an electromagnetic wave shield layer region showing a modification of the first example, FIG. 3 is a sectional view of an electromagnetic wave shield layer region of a second example of the embodiment, and FIG. It is sectional drawing in the electromagnetic-wave shielding layer area | region of the 3rd example. FIG. 1A is a plan view of the electromagnetic wave shielding layer of FIG. 1C viewed from the A2-A3 side, and FIG. 2A and FIG.
(B), FIG. 2 (c), FIG. 3, and FIG.
It is sectional drawing of the part corresponding to (a). 1 to 4,
110 is a transparent substrate (base substrate), 120 is a laminate,
121 is a conductive layer, 122 is a light absorbing layer, 125 is a straight line,
126 is a mesh, 130 is a transparent resin layer, 140 is a near-infrared cut layer, 150 is an antireflection layer, 160 is an electromagnetic wave shield area, and 165 is a grounding frame.

A first example of an embodiment of the electromagnetic wave shielding member will be described with reference to FIG. The electromagnetic wave shield member of the first example has a cross section shown in FIG.
The electromagnetic wave shielding layer region 160 shown in FIG. 1B is composed of a transparent base material 110, a conductive layer 121, a light absorbing layer 122, and a transparent resin layer 130. As shown in FIG. In 160, a mesh 126 is formed by intersecting two parallel straight line groups composed of the laminated body 120, and the mesh of the conductive layer 121 made of conductive ink serves as an electromagnetic wave shielding layer. Then, the conductive layer 12
Between the straight lines of each parallel straight line group of the stacked body 120 including the light absorbing layer 1 and the light absorbing layer 122, except for the region of the straight line of the other straight line group, is filled with the transparent resin layer 130 without any gap in the surface direction.
The laminated body 120 has a structure in which a light absorbing layer 122 is provided on one surface of the conductive layer 121 on the side of the transparent substrate 110. In this example, the grounding frame portion 165 is also formed in a solid frame shape with the laminate 120, which is the same as the straight line group forming the mesh.

As the transparent substrate 110, there are substrates, films and the like of glass, polyacrylic resin and polycarbonate resin, but from the viewpoint of productivity, a resin film is preferable. As the resin film, those having good transparency are preferable from the viewpoint of light transmission, and those having toughness are particularly preferable. Film bases include triacetyl cellulose film, diacetyl cellulose film, acetate butyrate cellulose film, polyether sulfone film, polyacrylic resin film, polyurethane resin film, polyester film, polycarbonate film, polysulfone film, polyether film And a trimethylpentene film, a polyetherketone film, a (meth) acrylonitrile film and the like can be used. In particular, a biaxially stretched polyester is preferably used because it is excellent in transparency and durability. Usually, a thickness of about 50 μm to 1000 μm is suitably used.

As the conductive ink for forming the conductive layer 121, for example, nickel powder, acrylic resin binder,
Alternatively, silver powder or a mixture of silver and copper composite powder, or a mixture of a solvent and gold powder or silver powder can be used. However, the metal powder may be any as long as a predetermined conductivity can be obtained, and the resin binder solvent used in forming the ink can be appropriately selected depending on processability and stability, and is particularly limited to the above. It is not done.

The light-absorbing layer 122 is formed by curing a light-absorbing ink, and the light-absorbing ink serving as the light-absorbing layer is, for example, carbon ink.
Alternatively, a light absorbing ink such as a nickel ink or a dark organic pigment can be used.

As the transparent resin layer 130, an ionizing radiation-curable resin, a thermosetting resin and the like can be mentioned, but an ionizing radiation-curable resin is particularly preferable.

In this embodiment, the grounding frame 165 is made of the conductive laminate 120 and is formed integrally with the straight line 125. However, the grounding frame 165 and the straight line 125 are made of different materials. It may be produced. For example, a conductive paste may be applied after forming the mesh-shaped electromagnetic wave shielding layer, or a metal thin film may be formed by sputtering or the like, and this may be used as the conductive grounding frame portion 165. Laminate 1
The two parallel straight line groups composed of 20 are formed in a mesh shape as shown in FIG. 1C, but the shape is not limited to this. For example, some straight lines may be provided intermittently. Alternatively, on the front and back of the transparent substrate 110, respectively,
A straight line group may be provided, and a mesh may be formed by combining the front and back straight line groups.

(Modification) A first example of the embodiment is shown in FIG.
2A, the conductive laminate 120 is not covered with the transparent resin layer 130 as shown in FIG.
As shown in (a), a structure in which the transparent resin layer 130 is covered also on the conductive laminated body 121 may be used. As another modified example, as shown in FIG. 2B, light absorbing layers 122 may be provided on both surfaces of the conductive layer 121 of the conductive stacked body 120. As still another modification, a conductive laminate 120 in which the boundary between the conductive layer 121 and the light absorbing layer 122 is not linear as shown in FIG. As still another modified example, as shown in FIG. 2D, a conductive layer 121 is provided on the transparent substrate 110 side, and light is applied to a surface of the conductive layer 121 which is not on the transparent substrate 110 side. Absorbing layer 1
The structure provided with 22 is also mentioned.

Next, a second example of the embodiment of the electromagnetic wave shielding member will be described with reference to FIG. In the second example, the near-infrared cut layer 1 is formed on the transparent substrate 110 shown in FIG.
FIG. 3 shows a cross section of the electromagnetic wave shielding layer region. The second example has a near-infrared cut function in addition to an electromagnetic wave shield function. The near-infrared cut layer 140 is not particularly limited,
It may be formed using a commercially available polyethylene terephthalate (PET) film coated with a near infrared cut layer. No. 2832 manufactured by Toyobo Co., Ltd. is generally known as a commercially available polyethylene terephthalate (PET) film coated with a near-infrared cut layer.

(Modification) As a modification of the second example, needless to say, two parallel straight lines composed of the laminate 120 of each modification of the first example and the transparent resin layer 130 shown in FIG. The thing which laminated | stacked the near infrared cut layer on the transparent base material 110 is also mentioned.

Next, a third example of the embodiment of the electromagnetic wave shielding member will be described with reference to FIG. A third example in which a cross section of the electromagnetic wave shielding layer region is shown in FIG. 4 is a second example shown in FIG.
The anti-reflection layer 150
Are laminated. The third example has a near-infrared cut function and an anti-reflection function in addition to an electromagnetic wave shielding function. The antireflection layer (also referred to as AR layer) 150 is for preventing reflection of visible light, and its structure is known to be a single layer or a multi-layer. A structure having a structure in which refractive index layers are alternately stacked is generally used. The material of the antireflection layer 150 is not particularly limited. In the preparation of the electromagnetic wave shielding member of the present invention, any method may be used as long as the effect is obtained, either a method of forming an antireflection layer by a dry method such as sputtering or vapor deposition, or a method of forming an antireflection layer by wet coating. Absent. Incidentally, as the high refractive index layer, Ti oxide, zirconium or the like is used, and as the low refractive index layer, silicon oxide is generally used.

In some cases, the antireflection layer (AR
An antifouling layer may be laminated on the layer 150. The antifouling layer is provided with a water-repellent and oil-repellent coating, and includes a siloxane-based or fluorine-based antifouling coating such as a fluorinated alkylsilyl compound.

(Modification) As a modification of the third example, two parallel straight lines composed of the laminated body 120 of the modification of the first example and the transparent resin layer 130 or the transparent resin shown in FIG. The near-infrared cut layer 14 is sequentially formed on the
0, an antireflection layer 150 may be used.

FIG. 5 shows an example of a mode in which the electromagnetic wave shielding members of the first to third examples of the embodiment and the modifications thereof are used in front of a display device. Although a PDP device is described as a display device, the display device is not limited thereto. The electromagnetic wave shield member is placed in front of the PDP with the antireflection layer side facing the observer. FIG.
Medium, 400 is an electromagnetic wave shielding member, 410 is a PDP (plasma display), 420 is a pedestal, 430 is a housing,
431 is a front part of the housing, 433 is a rear part of the housing, 440 is a mounting bracket, 451 is a mounting boss, and 453 is a screw.

Next, FIG. 6 shows a cross-sectional view of one embodiment of the display device of the present invention, and this will be briefly described. In the example shown in FIG. 6, the third example of the embodiment of the electromagnetic wave shielding member of the present invention shown in FIG. 4 is attached to the surface of a front plate of a PDP device 180 via an adhesive layer 190. is there. By doing so, it is possible to shield electromagnetic waves from the inside of the PDP and to cut off near infrared rays.
The image quality (contrast) can be prevented from lowering due to reflection of external light from the outside.

Next, an embodiment of the method for manufacturing an electromagnetic wave shielding member of the present invention will be described. FIG. 7 is a cross-sectional view illustrating a schematic configuration of an apparatus for performing a process of forming a transparent resin layer in the method of manufacturing the electromagnetic wave shielding member according to the first example of the embodiment, and FIG. FIGS. 9A and 9B are cross-sectional views in each manufacturing process of the first example, and FIG. 9 is a cross-sectional view in each manufacturing process of the second example of the embodiment. FIG.
9, 610 is a transparent substrate, 620 is a resin, 620
A is a transparent resin layer, 630 is a laminate, 631 is a conductive layer (conductive ink), 632 is a light absorbing layer (light absorbing ink), 650 is a roll intaglio, 651 is a concave portion, 653 is a nozzle coating device, 654, 654A are pressing rolls, 655
Is a support roll, 656 is an ionizing radiation irradiation device (ultraviolet irradiation device), 656A is ionizing radiation (ultraviolet light), and 659 is a doctor. In the first example shown in FIG. 8, a transparent resin layer 62 is provided on one surface of a transparent substrate 610 made of a resin film.
OA is formed, and then the laminate 630 is formed. In the second example shown in FIG. 9, the laminate 630 is formed on one surface of a transparent base material 610 made of a resin film, and then the transparent body 630 is formed. This is for forming the resin layer 620A.

Hereinafter, a method of manufacturing the electromagnetic wave shielding member of the first example of the embodiment will be described. A method for forming the transparent resin layer 620A on one surface of the transparent substrate 610 will be briefly described first with reference to FIG. First, a transparent resin layer 620A is formed on one surface of a transparent base material 610 using the apparatus shown in FIG. (FIG. 8A) This processing will be described below with reference to FIG. First, a transparent substrate 610 made of a resin film is sandwiched and supplied between two support rolls 655 on the side where the resin 620 is transferred. Next, a transparent substrate 6 made of a resin film
Reference numeral 10 denotes a roll intaglio 6 on which the electromagnetic wave shielding layer is formed.
50, the sheet is sandwiched between the roll intaglio 650 and the pressing roll 654, and then pulled out while being sandwiched between the pressing roll 654A and the roll intaglio (also referred to as a cylinder intaglio) 650. During this time, the transparent base material 610 is pressed by the pressing roll 654. And the pressing roll 654A are pressed along the surface of the roll intaglio 650. On the other hand, the resin 620 is applied to the concave portion 651 of the roll intaglio 650 by a nozzle coating device 653 so as to fill the concave portion 651, and the resin 620 attached to portions other than the concave portion 651 is removed by a doctor 659, and the concave portion of the roll intaglio 650 is removed. 651 advances to the pressing roll 654 side. That is, in a state where only the concave portion 651 is filled with the resin,
The roll intaglio 650 rotates in the direction of the arrow in the figure. With the rotation of the roll intaglio 650, a transparent substrate 61 made of a resin film is interposed between the pressing roll 654 and the roll intaglio 650.
0, and in the state of being in close contact, further press roll 654A
Then, between the pressing roll 654 and the pressing roll 654A, the resin 620 is cured by irradiating ionizing radiation 656A such as ultraviolet rays from the transparent substrate 610 side. Resin 6
20, the cured resin 620 becomes transparent base material 6
Transfer to the 10 side. Thereafter, the transparent base material 610 passes through the pressing roll 654A, separates from the roll intaglio 650, and transfers the cured resin 620 to the transparent base material 610.
As shown in (a), a transparent resin layer 620A is formed on one surface of a transparent substrate 610.

Next, the transparent resin layer 62 shown in FIG.
The light-absorbing ink forming the light-absorbing layer 632 is injected between the transparent resin layer 620A where the surface of the transparent substrate 610 on one side of the transparent substrate 610 on which 0A is formed is exposed. (FIG. 8B) Thereafter, a conductive ink (paste) 631 for forming a conductive layer is applied. (FIG. 8 (c)) Next, the conductive ink (paste) 631 on the transparent resin layer 620A is removed with a rubber squeegee and dried to form a transparent resin layer 620A on one surface of the transparent substrate 610.
At the same time, a stacked body 630 including the light absorbing layer 632 and the conductive layer 631 is formed. (FIG. 8 (d))

As described above, one or a plurality of parallel straight line groups composed of the laminated body 630 are provided on one surface of the transparent base material 610, and at least a space between each straight line group of each parallel straight line group is different from that of another straight line group. An electromagnetic wave shielding member that is buried in the plane direction with no gap in the transparent resin layer 620A except for a linear region,
The conductive layer 631 can be made of conductive ink. In the step of setting the state shown in FIG. 8A, mass productivity can be improved as shown in FIG. 7, so that the whole production can be adapted to mass production. 8 (c) and 8 (d) can also be performed continuously, if necessary, with the transparent base material 610 in a band shape.

Next, a second example of the embodiment of the method for manufacturing an electromagnetic wave shielding member of the present invention will be described with reference to FIG. In this example, as shown in FIG. 9A, first, a laminate 630 including a light absorbing layer 632 and a conductive layer 631 is formed on a transparent base material 610, and then a transparent resin layer is formed. Is injected into the surface of the transparent base material 610 on the side where the laminate 630 is formed, and is subjected to a drying treatment to form the laminate 630 together with the transparent resin layer 620A on one surface of the transparent base material 610. (FIG. 9 (b)) As shown in FIG. 9 (a), first, as a method of forming a laminate 630 on a transparent base material 610, the apparatus shown in FIG. 651 is filled with a light-absorbing ink and then a conductive ink (paste) 631, and the transparent substrate 610 is formed in the same manner as in the first example.
A laminate 630 can be formed on one side of the substrate. In the case of the second example, as in the first example, the step of bringing the state of FIG.
Since it can be mass-produced, the whole production can be made suitable for mass production.

[0034]

EXAMPLES Further, examples of the electromagnetic wave shielding member of the present invention will be described. (Example 1) In this example, the first example of the embodiment of the present invention shown in FIG. 1 is replaced with the first example of the method for manufacturing an electromagnetic wave shielding member of the present invention shown in FIG. 8 or FIG. It was produced by the method of the example. A description will be given based on FIG. As the transparent substrate 110, PET (polyethylene terephthalate) manufactured by Toyobo Co., Ltd., A4300 (125 μm thick)
m), and as a resin for forming the transparent resin layer 130, an ultraviolet curable resin RC17-
As the conductive ink for forming the conductive layer 121, a conductive paste, Dotite D-500 manufactured by Fujikura Kasei Co., Ltd. is used. As the light absorbing ink for forming the light absorbing layer 122, The Inktec is used. The conductive ink CT-8NS manufactured by Co., Ltd. was used.

(Example 2) Example 2 is different from Example 1 in that Daughteite D-500 is used instead of Daughteite FN-10.
1 is used.

Example 3 Example 3 is different from Example 1 in that Dortite D-500 was used instead of Dortite FE-10.
7 is used. Table 1 shows the surface resistance (Ω / □) of the electromagnetic wave shielding layer corresponding to each example.

[Table 1] The surface resistance (Ω / □) was measured with a surface resistance meter (Hiresta IP) manufactured by Mitsubishi Yuka Corporation, and the total light transmittance was measured with a haze meter manufactured by Toyo Seiki Co., Ltd. The reflectance and the spectral transmittance were measured with a spectrophotometer UV-3100PC manufactured by Shimadzu Corporation.

Example 4 Example 4 corresponds to a modification of the first example of the embodiment of the present invention shown in FIG. 3, and is a laminate of an electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of Example 1. 120 and the transparent resin layer 130, N
o2832 as a near infrared cut layer.

Example 5 Example 5 corresponds to a second example of the embodiment of the present invention shown in FIG. 3, and the transparent base material 11 of the electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of Example 2
No. 2832 manufactured by Toyobo Co., Ltd. was provided as a near-infrared cut layer.

Example 6 Example 6 corresponds to the third example of the embodiment of the present invention shown in FIG. 3, and the transparent base material 11 of the electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of Example 3
No. 2832 manufactured by Toyobo Co., Ltd. was provided as a near-infrared cut layer.

In the fourth, fifth, and sixth embodiments, 800 to
The spectral transmittance in the wavelength region of 1000 nm is 20% each.
It was as follows. The measurement of the spectral transmittance was performed with a spectrophotometer UV-3100PC manufactured by Shimadzu Corporation.

(Embodiment 7) The electromagnetic wave shielding member of the embodiment 7 is formed by magnetron sputtering on the transparent substrate 110 of the electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of the embodiment 1 in order from the transparent substrate side. , SiO ₂ , T
iO ₂ and SiO ₂ were respectively 124 nm and 142 n
m and a thickness of 88 nm.

(Embodiment 8) The electromagnetic wave shielding member of the embodiment 8 is formed by magnetron sputtering on the transparent substrate 110 of the electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of the embodiment 2 in order from the transparent substrate side. , SiO ₂ , T
iO ₂ and SiO ₂ were respectively 124 nm and 142 n
m and a thickness of 88 nm.

(Embodiment 9) The electromagnetic wave shielding member of the embodiment 9 is formed by magnetron sputtering on the transparent substrate 110 of the electromagnetic wave shielding member provided with the electromagnetic wave shielding layer of the embodiment 3 in order from the transparent substrate side. , SiO ₂ , T
iO ₂ and SiO ₂ were respectively 124 nm and 142 n
m and a thickness of 88 nm.

The surface reflectivities of the antireflection layers of Examples 7, 8 and 9 were 1.5% or less, respectively.
The measurement of the spectral reflectance was performed with a spectrophotometer UV-3100PC manufactured by Shimadzu Corporation.

As described above, regarding the electromagnetic wave shielding member of each embodiment, the electromagnetic wave shielding property, the near-infrared cut property,
In terms of antireflection properties, it was judged to be sufficiently practical.

[0046]

As described above, the present invention is an electromagnetic wave shielding member which is used in front of a display device such as a PDP and has a function of preventing reflection and cutting off near-infrared rays and has good visibility. It has become possible to provide an electromagnetic wave shielding member. And, a manufacturing method capable of manufacturing such an electromagnetic wave shielding member with good mass productivity was provided. More specifically, an electromagnetic wave shield layer, an antireflection layer, and a near-infrared cut layer are individually prepared, and a production method with good productivity of laminating these layers is practically possible.

[Brief description of the drawings]

FIG. 1 is a diagram showing a first example of an embodiment of an electromagnetic wave shielding member of the present invention.

FIG. 2 is a cross-sectional view of an electromagnetic wave shield region of a modification of the first example of the embodiment of the electromagnetic wave shield member of the present invention.

FIG. 3 is a sectional view of an electromagnetic wave shielding region of a second example of the embodiment of the electromagnetic wave shielding member of the present invention.

FIG. 4 is a sectional view of an electromagnetic wave shielding region of a third example of the embodiment of the electromagnetic wave shielding member of the present invention.

FIG. 5 is a cross-sectional view showing an example of a usage form of the electromagnetic wave shielding member of the present invention.

FIG. 6 is a sectional view showing an example of an embodiment of a display device of the present invention.

FIG. 7 is a cross-sectional view of an apparatus for explaining a process of a first example of an embodiment of a method for manufacturing an electromagnetic wave shielding member of the present invention.

FIG. 8 is a process sectional view of a first example of an embodiment of a method of manufacturing an electromagnetic wave shielding member of the present invention.

FIG. 9 is a process sectional view of a second example of the embodiment of the method of manufacturing the electromagnetic wave shielding member of the present invention.

[Explanation of symbols]

110 transparent base material (base base material) 120 laminated body 121 conductive layer 122 light absorption layer 125 straight line 126 mesh 130 transparent resin layer 140 near-infrared cut layer 150 anti-reflection layer 160 electromagnetic wave shielding area 165 grounding frame 180 PDP ( Plasma display panel) 190 Adhesive layer 400 Electromagnetic wave shielding member 410 PDP (Plasma display panel) 420 Pedestal 430 Housing 431 Housing front 433 Housing rear 440 Mounting bracket 451 Mounting boss 453 Screw 610 Transparent base material 620 Resin 620A Transparent Resin layer 630 Laminated body 631 Conductive layer (conductive ink) 632 Light absorbing layer (light absorbing ink) 650 Roll intaglio 651 Recess 653 Nozzle coating device 654, 654A Press roll 655 Support roll 656 Ionizing radiation Irradiation equipment (ultraviolet irradiation equipment) 656A Ionizing radiation (ultraviolet light) 659 Doctor

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/00 307 G09F 9/00 318A 309 G02B 1/10 A 318 Z F Term (Reference) 2H042 AA06 AA07 AA09 AA15 AA27 2H048 CA01 CA12 CA19 2K009 AA02 CC03 CC14 DD03 DD04 5E321 AA04 BB23 BB25 BB32 GG05 GH01 5G435 AA00 AA01 AA16 AA17 BB06 GG11 GG33 HH02 HH03 KK07

Claims (9)

[Claims] 1. A conductive layer comprising a transparent substrate and a light absorbing layer provided on one or both sides of the transparent substrate side of the conductive layer in the form of one or more parallel straight lines on at least one surface of the transparent substrate. The laminated body composed of the light absorbing layer is arranged, and at least the space between each straight line of each parallel straight line group is filled with a transparent resin layer without any gap in the surface direction except for the region of the straight line of the other straight line group. An electromagnetic wave shielding member, wherein the conductive layer is made of conductive ink. 2. The electromagnetic wave shielding member according to claim 1, wherein the transparent substrate is made of a resin film. 3. The electromagnetic wave shielding member according to claim 1, wherein the light absorbing layer is made of conductive carbon ink. 4. The transparent resin according to claim 1, wherein one or more groups of parallel straight lines are formed of a conductive laminate having a light absorbing layer provided on one or both surfaces of the conductive layer on the transparent substrate side. An electromagnetic wave shielding member comprising an antireflection layer laminated on a layer or a transparent substrate. 5. The transparent resin according to claim 1, wherein one or more groups of parallel straight lines are formed of a conductive laminate having a light absorbing layer provided on one or both surfaces of the conductive layer on the transparent substrate side. An electromagnetic wave shielding member comprising a near infrared cut layer laminated on a layer or a transparent substrate. 6. The electromagnetic wave shielding member according to claim 5, wherein an antireflection layer is laminated on the near-infrared cut layer. 7. A display device, wherein the electromagnetic wave shielding member according to claim 1 is laminated on the front surface of the display device such that the conductive layer is closer to the device than the light absorbing layer. 8. A conductive layer comprising a transparent substrate and a light absorbing layer provided on one or both sides of the conductive layer on the transparent substrate side in the form of one or more parallel straight lines on at least one surface of the transparent substrate. The laminated body composed of the light absorbing layer is arranged, and at least the space between each straight line of each parallel straight line group is filled with a transparent resin layer without any gap in the surface direction except for the region of the straight line of the other straight line group. An electromagnetic wave shielding member in which the conductive layer is made of a conductive ink, and in order, (a) a plate provided with a concave portion corresponding to the shape of the conductive laminate is used; A filling step of filling a light-absorbing ink for forming a conductive layer and a conductive ink for forming a conductive layer; and (b) contacting a transparent substrate and a plate to form a filled light-absorbing layer at the same time. Curing the conductive ink and the conductive ink forming the conductive layer; and (c) further curing the conductive ink. By bringing the transparent substrate and the plate into close contact with each other and peeling the transparent substrate from the plate, the cured light absorbing ink and conductive ink are transferred from the plate side to the transparent substrate, and the transparent substrate is removed. Forming a group of parallel straight lines made of a conductive laminate on the surface of (d), and (d) injecting a resin forming a transparent resin layer between the conductive laminates with the transparent substrate surface exposed. And a method of manufacturing an electromagnetic wave shielding member. 9. A conductive layer having a light absorption layer provided on at least one surface of a transparent base material in the form of one or more parallel straight lines and on one or both surfaces of the conductive layer on the transparent base material side. The laminated body composed of the light absorbing layer is arranged, and at least the space between each straight line of each parallel straight line group is filled with a transparent resin layer without any gap in the surface direction except for the region of the straight line of the other straight line group. An electromagnetic wave shielding member in which the conductive layer is made of conductive ink, and in which (A) a plate provided with a concave portion corresponding to the shape of the transparent resin layer is used to form a transparent resin layer on the plate. A step of filling the resin, (B) a step of bringing the transparent substrate and the plate into contact with each other, and simultaneously curing the resin that forms the filled transparent resin layer; and (C) a step of filling the transparent substrate and the plate. The transparent base material is peeled off from the plate, and hardened from the plate side to the transparent base material. Transferring the converted resin to form a transparent resin layer on the surface of the transparent substrate; and (D) forming a light absorbing layer between the transparent resin layers where the surface of the transparent substrate is exposed. A step of injecting an absorbent ink or a conductive ink forming a conductive layer, and (E) removing the light-absorbing ink or the conductive ink on the transparent resin layer and forming a parallel straight line group formed of a conductive laminate. Forming the electromagnetic wave shielding member.