JP2000133917A - Packaging of circuit member - Google Patents

Packaging of circuit member

Info

Publication number
JP2000133917A
JP2000133917A JP10302927A JP30292798A JP2000133917A JP 2000133917 A JP2000133917 A JP 2000133917A JP 10302927 A JP10302927 A JP 10302927A JP 30292798 A JP30292798 A JP 30292798A JP 2000133917 A JP2000133917 A JP 2000133917A
Authority
JP
Japan
Prior art keywords
substrate
adhesive
electrodes
mounting
circuit member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10302927A
Other languages
Japanese (ja)
Other versions
JP4032532B2 (en
Inventor
Kazuhiro Isaka
和博 井坂
Itsuo Watanabe
伊津夫 渡辺
Kenzo Takemura
賢三 竹村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30292798A priority Critical patent/JP4032532B2/en
Publication of JP2000133917A publication Critical patent/JP2000133917A/en
Application granted granted Critical
Publication of JP4032532B2 publication Critical patent/JP4032532B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Wire Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of packaging a electronic component, which uses an anisotropic conductive adhesive only by the self weight of the electronic component without particularly pressuring the adhesive. SOLUTION: Ni grains with the surfaces covered with an Sn-In alloy (a melting point of 117 deg.C) are dispersed in a phenolic curing system thermosetting adhesive having a melting viscosity of 1000 cps at a temperature of 117 deg.C to obtain an anisotropic conductive bonding agent. The anisotropic conductive adhesive is applied on electrodes on a glass epoxy mounting substrate. Electrodes of a QFP package (124 pins) and a BGA package (225 pins) are aligned with the substrate electrodes and the QEP and BGA packages are mounted on the substrate. Subsequently, ultrasonic vibrations of a frequency of 65 Hz are applied to the substrate for 20 msec and after an adhesive 6 between all the electrodes of the packages and conductive grains 5 and between the conductive grains 5 and the substrate electrodes 2 is eliminated, the substrate is put in a heating furnace of a temperature of 130 deg.C for one minute. After the substrate is taken out from the heating furnace, the substrate is heated and cured in a heating furnace of a temperature of 200 deg.C for two hours.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えばフリップチ
ップ実装方式により半導体チップを基板と接着剤で接着
固定すると共に両者の電極同士を電気的に接続する回路
部材の実装方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for mounting a circuit member for bonding a semiconductor chip to a substrate with an adhesive and electrically connecting both electrodes by, for example, a flip chip mounting method.

【0002】[0002]

【従来の技術】半導体実装分野では、低コスト化・高精
度化に対応した新しい実装形態としてICチップを直接
プリント基板やフレキシブル配線板に搭載するフリップ
チップ実装が注目されている。フリップチップ実装方式
としては、チップの端子にはんだバンプを設け、はんだ
接続を行う方式や導電性接着剤を介して電気的接続を行
う方式が知られている。これらの方式では、接続するチ
ップと基板の熱膨張係数差に基づくストレスが、各種環
境下に曝した場合、接続界面で発生し接続信頼性が低下
するという問題がある。このため、接続界面のストレス
を緩和する目的で一般にエポキシ樹脂系のアンダフィル
材をチップ/基板の間隙に注入する方式が検討されてい
る。しかし、このアンダフィルの注入工程は、プロセス
を煩雑化し、生産性、コストの面で不利になるという問
題がある。このような問題を解決すべく最近では、異方
導電性と封止機能を有する異方導電性接着剤を用いたフ
リップチップ実装が、プロセス簡易性という観点から注
目されている。
2. Description of the Related Art In the field of semiconductor mounting, flip chip mounting, in which an IC chip is directly mounted on a printed circuit board or a flexible wiring board, has been attracting attention as a new mounting mode corresponding to cost reduction and high precision. As a flip-chip mounting method, a method of providing a solder bump on a terminal of a chip and performing solder connection or a method of performing electrical connection via a conductive adhesive is known. In these methods, there is a problem in that when exposed to various environments, stress based on the difference in thermal expansion coefficient between the chip to be connected and the substrate is generated at the connection interface and connection reliability is reduced. For this reason, a method of injecting an epoxy resin-based underfill material into a gap between a chip and a substrate is generally studied for the purpose of reducing stress at a connection interface. However, there is a problem that the underfill injection step complicates the process and is disadvantageous in terms of productivity and cost. In order to solve such a problem, flip-chip mounting using an anisotropic conductive adhesive having anisotropic conductivity and a sealing function has recently attracted attention from the viewpoint of process simplicity.

【0003】[0003]

【発明が解決しようとする課題】異方導電性接着剤によ
る実装は熱と圧力を必要とするため、基板裏側への実装
ができないことや他の電子部品実装への配慮から、基板
への電子部品の実装工程の最初に行わなければならない
などの制限があり、熱圧着後、他の電子部品とともにリ
フロ工程を経るという非効率な実装工程をとっていた。
本発明は、他の電子部品と同時に実装して、一括して加
熱処理で熱硬化するとともに回路部材同士の電極の電気
的導通を得る回路部材の実装方法を提供するものであ
る。
Since mounting with an anisotropic conductive adhesive requires heat and pressure, it cannot be mounted on the back side of the substrate and other electronic components must be mounted. There are restrictions such as the fact that it must be performed at the beginning of the component mounting process, and an inefficient mounting process has been adopted in which, after thermocompression bonding, a reflow process is performed together with other electronic components.
The present invention provides a method for mounting a circuit member, which is mounted simultaneously with another electronic component, is collectively thermally cured by a heat treatment, and obtains electrical conduction between electrodes of the circuit member.

【0004】[0004]

【課題を解決するための手段】本発明の回路部材の実装
方法は、回路部材を、前記回路部材の端子(a)に対応
した端子(b)が設けられた実装基板に前記端子(a)
(b)を対向しマトリックス樹脂と金属粒子を含む接着
剤を介し搭載し、加熱により前記端子(a)(b)を電
気的に接続する回路部材の実装方法であって、前記実装
基板に超音波振動を与え、前記マトリックス樹脂両面に
金属粒子を露出させる工程を備えることを特徴とする。
金属粒子が易溶融性金属表面を持つ金属粒子であること
が好ましい。超音波振動は、周波数25〜100KH
z、振動時間10〜50秒の条件が好ましい。
According to the method of mounting a circuit member of the present invention, the circuit member is mounted on a mounting board provided with a terminal (b) corresponding to the terminal (a) of the circuit member.
(B) is a method of mounting a circuit member which is opposed to and mounted with an adhesive containing a matrix resin and metal particles, and which electrically connects the terminals (a) and (b) by heating. A step of applying sonic vibration to expose metal particles on both surfaces of the matrix resin.
Preferably, the metal particles are metal particles having a readily fusible metal surface. Ultrasonic vibration, frequency 25 ~ 100KH
z, a condition of a vibration time of 10 to 50 seconds is preferable.

【0005】[0005]

【発明の実施の形態】金属粒子としては、Au、Ag、
Ni、Cu、はんだ等の金属粒子やカーボン等が使用で
きる。またプラスチックに前記した導通層を被覆等によ
り形成し最外層を貴金属類プラスチックを核とした場合
や熱溶融金属粒子の場合、加熱加圧により変形性を有す
るので接続時に電極との接触面積が増加し信頼性が向上
するので好ましい。また易溶融性金属表面を持つ金属粒
子である、Sn,Bi,In,Ag,Sb,Cu,Z
n,Ni,Au,Mg,Ga及びAlの群から選択され
た1種の金属または2種以上の金属を組み合わせてでき
る合金材であり、導電性微粒子の融点が250℃以下が
好ましく、さらに好ましくは100℃以上190℃以下
である。金属粒子表面層が易溶融性金属であっても良
い。
BEST MODE FOR CARRYING OUT THE INVENTION As metal particles, Au, Ag,
Metal particles such as Ni, Cu, and solder, and carbon can be used. In the case where the above-mentioned conductive layer is formed on a plastic by coating or the like and the outermost layer is made of a noble metal plastic as a nucleus or in the case of hot-melt metal particles, the contact area with the electrode increases at the time of connection because it has deformability by heating and pressing. This is preferable because the reliability is improved. In addition, Sn, Bi, In, Ag, Sb, Cu, Z, which are metal particles having a fusible metal surface.
n, Ni, Au, Mg, Ga and an alloy material made of a combination of two or more metals selected from the group consisting of Ga and Al, and the melting point of the conductive fine particles is preferably 250 ° C. or less, more preferably Is 100 ° C. or more and 190 ° C. or less. The metal particle surface layer may be a fusible metal.

【0006】本発明に用いられる接着剤は、UV硬化
系、加熱によって遊離ラジカルを発生する硬化剤系もし
くは熱硬化系エポキシ樹脂またはこれらの混合系であ
り、UV硬化系の光開始剤としては、ベンゾインエチル
エーテル、イソプロピルベンゾインエーテル等のベンゾ
インエーテル、ベンジル、ヒドロキシシクロヘキシルフ
ェニルケトン等のベンジルケタール、ベンゾフェノン、
アセトフェノン等のケトン類及びその誘導体、チオキサ
ントン類、ビスイミダゾール類等があり、これらの光開
始剤に必要に応じてアミン類、イオウ化合物、リン化合
物等の増感剤を任意の比で添加しても良い。
The adhesive used in the present invention is a UV curing system, a curing agent system that generates free radicals upon heating, a thermosetting epoxy resin, or a mixture thereof. Benzoin ethyl ether, benzoin ether such as isopropyl benzoin ether, benzyl, benzyl ketal such as hydroxycyclohexyl phenyl ketone, benzophenone,
There are ketones such as acetophenone and derivatives thereof, thioxanthones, bisimidazoles, and the like.If necessary, sensitizers such as amines, sulfur compounds, and phosphorus compounds may be added to these photoinitiators at any ratio. Is also good.

【0007】加熱により遊離ラジカルを発生する硬化剤
としては、過酸化化合物、アゾ系化合物などの加熱によ
り分解して遊離ラジカルを発生するものであり、目的と
する接続温度、接続時間、ポットライフ等により適宜選
定される。配合量は0.05〜10重量%程度であり
0.1〜5重量%がより好ましい。具体的には、ジアシ
ルパーオキサイド、パーオキシジカーボネート、パーオ
キシエステル、パーオキシケタール、ジアルキルパーオ
キサイド、ハイドロパーオキサイド、シリルパーオキサ
イドなどから選定できる。また、回路部材の接続端子の
腐食を抑えるために、硬化剤中に含有される塩素イオン
や有機酸は5000ppm以下であることが好ましく、
さらに、加熱分解後に発生する有機酸が少ないものがよ
り好ましい。具体的には、パーオキシエステル、ジアル
キルパーオキサイド、ハイドロパーオキサイド、シリル
パーオキサイドから選定され、高反応性が得られるパー
オキシエステルから選定されることがより好ましい。こ
れらは、適宜混合して用いることができる。また、これ
らの硬化剤をポリウレタン系、ポリエステル系の高分子
物質等で被覆してマイクロカプセル化したものは、可使
時間が延長されるために好ましい。
The curing agent which generates free radicals upon heating is one which decomposes upon heating of a peroxide compound, an azo compound or the like to generate free radicals, and has a desired connection temperature, connection time, pot life and the like. Is selected as appropriate. The compounding amount is about 0.05 to 10% by weight, and more preferably 0.1 to 5% by weight. Specifically, it can be selected from diacyl peroxide, peroxydicarbonate, peroxyester, peroxyketal, dialkyl peroxide, hydroperoxide, silyl peroxide and the like. Further, in order to suppress the corrosion of the connection terminal of the circuit member, the chlorine ion and the organic acid contained in the curing agent are preferably 5000 ppm or less,
Further, those having less organic acid generated after thermal decomposition are more preferable. Specifically, it is selected from peroxyesters, dialkyl peroxides, hydroperoxides, and silyl peroxides, and is more preferably selected from peroxyesters having high reactivity. These can be used by mixing as appropriate. A microcapsule obtained by coating these curing agents with a polyurethane-based or polyester-based polymer substance or the like is preferable because the pot life is extended.

【0008】本発明で用いるラジカル重合性物質として
は、ラジカルにより重合する官能基を有する物質であ
り、アクリレート、メタクリレート、マレイミド化合物
等が挙げられる。ラジカル重合性物質はモノマー、オリ
ゴマーいずれの状態で用いることが可能であり、モノマ
ーとオリゴマーを併用することも可能である。
The radically polymerizable substance used in the present invention is a substance having a functional group which is polymerized by a radical, such as acrylate, methacrylate, and maleimide compound. The radical polymerizable substance can be used in any state of a monomer and an oligomer, and the monomer and the oligomer can be used in combination.

【0009】本発明で用いるエポキシ樹脂としては、エ
ピクロルヒドリンとビスフェノールAやF、AD等から
誘導されるビスフェノール型エポキシ樹脂、エピクロル
ヒドリンとフェノールノボラックやクレゾールノボラッ
クから誘導されるエポキシノボラック樹脂やナフタレン
環を含んだ骨格を有するナフタレン系エポキシ樹脂、グ
リシジルアミン、グリシジルエーテル、ビフェニル、脂
環式等の1分子内に2個以上のグリシジル基を有する各
種のエポキシ化合物等を単独にあるいは2種以上を混合
して用いることが可能である。これらのエポキシ樹脂
は、不純物イオン(Na+、Cl−等)や、加水分解性
塩素等を300ppm以下に低減した高純度品を用いる
ことがエレクトロンマイグレーション防止のために好ま
しい。エポキシ樹脂は熱膨張係数の低下及びガラス転移
温度の向上として、3官能以上の多官能エポキシ樹脂及
び/又はナフタレン系エポキシ樹脂が好ましい。3官能
以上の多官能エポキシ樹脂としては、フェノールノボラ
ック型エポキシ樹脂、クレゾールノボラック型エポキシ
樹脂、トリスヒドロキシフェニルメタン型エポキシ樹
脂、テトラフェニロールエタン型エポキシ樹脂、ジシク
ロペンタジエンフェノール型エポキシ樹脂等がある。ま
た、ナフタレン系エポキシ樹脂は、1分子中に少なくと
も1個以上のナフタレン環を含んだ骨格を有しており、
ナフトール系、ナフタレンジオール系等がある。
The epoxy resin used in the present invention includes a bisphenol type epoxy resin derived from epichlorohydrin and bisphenol A, F, AD, etc., an epoxy novolak resin derived from epichlorohydrin and phenol novolak or cresol novolak, and a naphthalene ring. Naphthalene epoxy resin having a skeleton, glycidylamine, glycidyl ether, biphenyl, various epoxy compounds having two or more glycidyl groups in one molecule such as alicyclic, etc. are used alone or as a mixture of two or more. It is possible. It is preferable to use a high-purity epoxy resin in which impurity ions (Na +, Cl −, etc.), hydrolyzable chlorine and the like are reduced to 300 ppm or less for preventing electron migration. The epoxy resin is preferably a trifunctional or higher-functional polyfunctional epoxy resin and / or a naphthalene-based epoxy resin in order to reduce the coefficient of thermal expansion and improve the glass transition temperature. Examples of the trifunctional or higher polyfunctional epoxy resin include a phenol novolak type epoxy resin, a cresol novolak type epoxy resin, a trishydroxyphenylmethane type epoxy resin, a tetraphenylolethane type epoxy resin, and a dicyclopentadiene phenol type epoxy resin. Further, the naphthalene epoxy resin has a skeleton containing at least one naphthalene ring in one molecule,
There are naphthol type, naphthalene diol type and the like.

【0010】また接着剤中にアクリルゴムなどのゴム成
分を必要量添加しても良く、アクリルゴムとしては、ア
クリル酸、アクリル酸エステル、メタクリル酸エステル
またはアクリロニトリルのうち少なくともひとつをモノ
マー成分とした重合体または共重合体があげられ、中で
もグリシジルエーテル基を含有するグリシジルアクリレ
ートやグリシジルメタクリレートを含む共重合体系アク
リルゴムが好適に用いられる。また、接着剤にはフィル
ム形成性をより容易にするためにフェノキシ樹脂などの
熱可塑性樹脂を配合することもできる。特に、フェノキ
シ樹脂は、エポキシ樹脂と構造が類似しているため、エ
ポキシ樹脂との相溶性、接着性に優れるなどの特徴を有
するので好ましい。
A necessary amount of a rubber component such as acrylic rubber may be added to the adhesive. As the acrylic rubber, a polymer containing at least one of acrylic acid, acrylic ester, methacrylic ester or acrylonitrile as a monomer component is used. Copolymers or copolymers can be mentioned, and among them, copolymer acrylic rubber containing glycidyl acrylate or glycidyl methacrylate containing a glycidyl ether group is preferably used. In addition, a thermoplastic resin such as a phenoxy resin can be blended with the adhesive in order to make the film formability easier. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin, and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesiveness.

【0011】また、エポキシ樹脂の硬化剤としては、イ
ミダゾール系、ヒドラジド系、三フッ化ホウ素−アミン
錯体、芳香族スルホニウム塩、アミンイミド、ポリアミ
ンの塩、ジシアンジアミド等の潜在性硬化剤が速硬化性
の観点から有効であり、その他に酸無水物系硬化剤もイ
オン性不純物が少ないことから有効である。本発明の言
うところのリフロ処理は、赤外線、エア、ベーパーフェ
ーズ(VPS)、窒素などの全体加熱方式およびYAG
レーザ、半導体レーザ、キセノンランプ、ハロゲンラン
プ、パルスヒータ、ホットエアなどの部分加熱方式のこ
とである。
As the curing agent for the epoxy resin, a latent curing agent such as an imidazole-based compound, a hydrazide-based compound, a boron trifluoride-amine complex, an aromatic sulfonium salt, an amine imide, a polyamine salt, or dicyandiamide is used. From the viewpoint, it is effective, and an acid anhydride-based curing agent is also effective because it has less ionic impurities. The reflow treatment according to the present invention is performed by the whole heating method such as infrared ray, air, vapor phase (VPS), nitrogen, etc.
It is a partial heating method such as laser, semiconductor laser, xenon lamp, halogen lamp, pulse heater, hot air and the like.

【0012】本発明の金属粒子の配列技術としては、例
えば特開平6―163550号公報や特開平6―310
515号公報に記載されたものなどがあり、特開平6―
163550号公報記載の技術では、両面で径の異なる
多数の貫通孔を有し、径の大きい穴を有する面側にはん
だボールを装着可能なガラス治具上に閉空間を形成し
て、はんだボールを圧縮空気により閉空間に送り込ん
で、ガラス治具の径の小さい穴から吸引することによ
り、はんだボールをガラス治具の径の大きい貫通孔に吸
引して、配列させている。また、特開平6―31051
5号公報に記載の技術では、はんだボールを一定数整列
に搭載できるプレート上にはんだボールをスクリューフ
ィーダ等により供給して、真空ポンプとバイブレータに
より振動を与えて、配列させている。また、搭載ヘッド
に所望の間隔に吸着孔を設け、搭載ヘッドを上下動させ
て導電性ボールを真空吸着して配置すべきシート上に搭
載ヘッドを移動した後、吸着を解放して配列させる方法
やメッシュを用いる方法がある。これらの技術を用いて
も良い。また接着フィルムを支持層と接着層の多層構成
にしても良く、その場合には、接着剤層塗工→乾燥→支
持層塗工→硬化→接着剤層塗工→乾燥の工程をとれば良
い。導電性微粒子の散布については、静電気力を利用す
ると余剰な粒子を回収することが出来、効率的な散布が
可能となる。
The technique for arranging metal particles of the present invention includes, for example, JP-A-6-163550 and JP-A-6-310.
No. 515, for example, are disclosed in
In the technique described in Japanese Patent No. 163550, a closed space is formed on a glass jig having a large number of through-holes having different diameters on both sides, and a solder ball can be mounted on a surface having a large-diameter hole. Is sent to the closed space by compressed air, and is sucked from the small-diameter hole of the glass jig, so that the solder balls are sucked and arranged in the large-diameter through-hole of the glass jig. Also, Japanese Patent Application Laid-Open No. Hei 6-31051
In the technique described in Japanese Patent Application Laid-Open No. 5 (1999) -1995, solder balls are supplied by a screw feeder or the like on a plate on which solder balls can be mounted in a fixed number, and are vibrated and arranged by a vacuum pump and a vibrator. Also, a method in which suction holes are provided at desired intervals in the mounting head, and the mounting head is moved up and down to vacuum-adsorb the conductive balls and move the mounting head onto a sheet to be arranged, and then release and arrange the suction. And a method using a mesh. These techniques may be used. Further, the adhesive film may have a multilayer structure of a support layer and an adhesive layer, in which case, the steps of adhesive layer coating → drying → support layer coating → curing → adhesive layer coating → drying may be performed. . Regarding the spraying of the conductive fine particles, if the electrostatic force is used, surplus particles can be collected, and efficient spraying can be performed.

【0013】また本発明においてフィルム状に成形した
場合、導電性微粒子の表面がフィルムの表裏の表面から
露出していることが望ましく、フィルムの表面に粘着力
が付与されていることが望ましい。また導電性微粒子に
ついては、粒径は基板の電極の最小の間隔よりも小さい
ことが必要であるため、必要に応じて所定の形状に変形
させても良い。また、接着剤に分散される導電粒子量
は、接着剤樹脂組成物100体積部に対して0.1〜3
0体積部であり、好ましくは0.2〜15体積部であ
る。
In the present invention, when formed into a film, the surface of the conductive fine particles is desirably exposed from the front and back surfaces of the film, and it is desirable that the surface of the film has an adhesive force. In addition, since the conductive fine particles need to have a particle size smaller than the minimum distance between the electrodes of the substrate, the conductive fine particles may be deformed into a predetermined shape as needed. The amount of the conductive particles dispersed in the adhesive is 0.1 to 3 with respect to 100 parts by volume of the adhesive resin composition.
0 parts by volume, preferably 0.2 to 15 parts by volume.

【0014】また本発明に用いられる回路部材接続用接
着剤は、フィルム状接着剤ではなく、液状の接着剤を回
路板の電極上にスクリーン印刷して用いても良い。回路
部材としては、半導体パッケージ(QFP、BGA、C
SP、SOP、TCP等)、コンデンサ、抵抗体、コイ
ル等のチップ部品、コネクタ等が用いられる。回路部材
には端子が多数設けられており、回路部材はその端子に
対応した多数の端子が設けられた実装基板に端子どうし
を対向して接着剤を介し搭載され、端子どうしを電気的
に接続して実装される。チップ部品を実装する基板とし
て、半導体チップ端子に対応する電極(接続端子)が形
成された有機質絶縁基板が使用される。
The adhesive for connecting circuit members used in the present invention may be a screen-printed liquid adhesive instead of a film-like adhesive on the electrodes of the circuit board. As a circuit member, a semiconductor package (QFP, BGA, C
SP, SOP, TCP, etc.), chip components such as capacitors, resistors, and coils, connectors, and the like are used. The circuit member is provided with a large number of terminals, and the circuit member is mounted on a mounting board provided with a large number of terminals corresponding to the terminals via an adhesive with the terminals facing each other, and the terminals are electrically connected. Implemented. As a substrate on which chip components are mounted, an organic insulating substrate on which electrodes (connection terminals) corresponding to semiconductor chip terminals are formed is used.

【0015】有機質絶縁基板としては、ポリイミド樹
脂、ポリエステル樹脂等の合成樹脂フィルム、又はガラ
スクロス、ガラス不織布等のガラス基材にポリイミド樹
脂、エポキシ樹脂、フェノ−ル樹脂等の樹脂を含浸し硬
化させた積層板が使用される。回路部材端子と接続する
電極、この電極が形成された表面絶縁層及び所定数層の
絶縁層と前記各絶縁層を介して配置される所定数層の配
線層と所定の前記電極・配線層間を電気的に接続する導
体化された穴を有する多層配線板が使用できる。このよ
うな多層配線板として、ガラスクロスを用いた絶縁層に
より構成された基材もしくは1層以上の導体回路を有す
る配線基板上に絶縁層と導体回路層とを交互に形成し
た、ビルドアップ多層基板が好ましい。
As the organic insulating substrate, a synthetic resin film such as a polyimide resin or a polyester resin, or a glass substrate such as a glass cloth or a glass nonwoven fabric is impregnated with a resin such as a polyimide resin, an epoxy resin, or a phenol resin, and cured. Laminated boards are used. An electrode connected to a circuit member terminal, a surface insulating layer on which the electrode is formed, a predetermined number of insulating layers, a predetermined number of wiring layers arranged via the respective insulating layers, and a predetermined number of the electrode / wiring layers. A multilayer wiring board having electrically conductive holes for electrical connection can be used. As such a multilayer wiring board, a build-up multilayer in which insulating layers and conductive circuit layers are alternately formed on a substrate composed of insulating layers using glass cloth or a wiring board having one or more conductive circuits. Substrates are preferred.

【0016】表面絶縁層は、樹脂フィルムを用いること
ができ、この樹脂フィルムはエポキシ樹脂、ポリイミド
樹脂、ポリアミドイミド樹脂、変成ポリフェニレンエー
テル樹脂、フェノキシ樹脂、アミドエポキシ樹脂、フェ
ノール樹脂やこれらの混合物、共重合物等のフィルム
が、またポリサルフォン、ポリエーテルサルフォン、ポ
リエーテルエーテルケトン、全芳香族液晶ポリエステ
ル、フッ素系樹脂などの耐熱性熱可塑性エンジニヤリン
グプラスチックのフィルムが使用できる。樹脂フィルム
中に有機もしくは無機のフィラーを含むものが使用でき
る。ガラス基材で補強された樹脂よりなる絶縁層として
は、ガラスクロス、ガラス不織布等のガラス基材にエポ
キシ樹脂、フェノ−ル樹脂等の樹脂を含浸し硬化させた
プリプレグが使用できる。
As the surface insulating layer, a resin film can be used. This resin film is made of an epoxy resin, a polyimide resin, a polyamideimide resin, a modified polyphenylene ether resin, a phenoxy resin, an amide epoxy resin, a phenol resin or a mixture thereof. Films of polymers and the like, and films of heat-resistant thermoplastic engineering plastics such as polysulfone, polyethersulfone, polyetheretherketone, wholly aromatic liquid crystal polyester, and fluororesin can be used. A resin film containing an organic or inorganic filler can be used. As the insulating layer made of a resin reinforced with a glass base material, a prepreg obtained by impregnating a glass base material such as a glass cloth or a nonwoven fabric with a resin such as an epoxy resin or a phenol resin and curing the resin can be used.

【0017】半導体チップや基板の電極パッド上には、
めっきで形成されるバンプや金ワイヤの先端をトーチ等
により溶融させ、金ボールを形成し、このボールを電極
パッド上に圧着した後、ワイヤを切断して得られるワイ
ヤバンプなどの突起電極を設け、接続端子として用いる
ことができる。
On an electrode pad of a semiconductor chip or a substrate,
The tip of the bump or gold wire formed by plating is melted with a torch or the like to form a gold ball, and after this ball is pressed on an electrode pad, a protruding electrode such as a wire bump obtained by cutting the wire is provided. It can be used as a connection terminal.

【0018】図1は、本発明の実装方法を用いてQFP
パッケージを実装基板に実装した断面図であり、図2は
本発明の実装方法を用いてCSPパッケージを実装基板
に実装した断面図である。1は実装基板、2は基板上の
電極、3はQFPパッケージ、4はリード端子、5はN
i粒子、6はSn−Bi合金、7は接着剤、8は半導体
素子、9は封止剤、10はインターポーザ、11ははん
だボールを示す。
FIG. 1 shows a QFP using the mounting method of the present invention.
FIG. 2 is a cross-sectional view in which the package is mounted on a mounting board, and FIG. 2 is a cross-sectional view in which the CSP package is mounted on the mounting board using the mounting method of the present invention. 1 is a mounting board, 2 is an electrode on the board, 3 is a QFP package, 4 is a lead terminal, 5 is N
i particles, 6 an Sn—Bi alloy, 7 an adhesive, 8 a semiconductor element, 9 a sealant, 10 an interposer, and 11 solder balls.

【0019】[0019]

【実施例】Sn−In合金(融点117℃)を表面に被
覆したNi粒子(粒径10μmφ、8vol%)を11
7℃における溶融粘度が1000cpsであるフェノー
ル硬化系の熱硬化性接着剤中に分散して異方性導電接着
剤を得た。ガラス−エポキシ実装基板の電極上に異方導
電性接着剤を塗布した。次にQFPパッケージ(124
ピン)及びBGAパッケージ(225ピン)の電極と基
板電極を位置合わせし、搭載した。続いて基板に周波数
65Hzの超音波振動を20msec加え、各パッケー
ジのすべての電極と導電粒子、導電粒子と基板電極の間
にある接着剤を排除した後、130℃の加熱炉の中に1
分間入れた。加熱炉から取り出した後、導通検査を行
い、NG品については、リペア後再度搭載することと
し、OK品については200℃の加熱炉中で2時間加熱
硬化した。加熱硬化後の実装サンプルはヒートサイクル
試験(−55℃〜125℃)、高温高湿試験(85℃/
85%RH)ともに良好な結果を得た。
EXAMPLE 11 Ni particles (particle diameter 10 μmφ, 8 vol%) coated on the surface with a Sn—In alloy (melting point 117 ° C.)
It was dispersed in a phenol-cured thermosetting adhesive having a melt viscosity at 7 ° C. of 1000 cps to obtain an anisotropic conductive adhesive. An anisotropic conductive adhesive was applied on the electrodes of the glass-epoxy mounting substrate. Next, the QFP package (124
Pins) and the electrodes of the BGA package (225 pins) and the substrate electrodes were aligned and mounted. Subsequently, ultrasonic vibration at a frequency of 65 Hz was applied to the substrate for 20 msec to remove all the electrodes and conductive particles of each package, and the adhesive between the conductive particles and the substrate electrodes, and then placed in a 130 ° C. heating furnace.
Put for minutes. After being taken out of the heating furnace, a continuity test was performed. For the NG product, it was decided to mount it again after repairing, and for the OK product, it was heated and cured in a heating furnace at 200 ° C. for 2 hours. The mounted sample after heat curing is subjected to a heat cycle test (-55 ° C to 125 ° C) and a high temperature and high humidity test (85 ° C /
85% RH).

【0020】[0020]

【発明の効果】本発明の実装方法によれば、特別に加圧
することなく電子部品の自重だけで異方性導電接着剤を
用いた電子部品の実装を実現することが出来、他の電子
部品の実装と一括して加熱処理で熱硬化するとともに回
路部材同士の電極の電気的導通を得ることが出来、実装
工程を簡略化できるとともに、大幅なコスト低減を図る
ことが可能となる。また、必要に応じて電気的接続工程
と機械的接続工程の間に検査工程とリペア工程を設ける
ことが可能となる。
According to the mounting method of the present invention, mounting of an electronic component using an anisotropic conductive adhesive can be realized only by the weight of the electronic component without applying special pressure, and other electronic components can be realized. In addition, heat curing can be performed at the same time as the mounting, and electrical conduction between the electrodes of the circuit members can be obtained, so that the mounting process can be simplified and the cost can be significantly reduced. In addition, it is possible to provide an inspection step and a repair step between the electrical connection step and the mechanical connection step as needed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】異方導電性接着剤を用いてQFPパッケージを
実装基板に搭載した後、超音波振動をかけて実装した断
面図である。
FIG. 1 is a cross-sectional view in which a QFP package is mounted on a mounting board using an anisotropic conductive adhesive, and then mounted by applying ultrasonic vibration.

【符号の説明】[Explanation of symbols]

1 回路基板 2 基板上の電極 3 QFPパッケージ 4 リード端子 5 導電性粒子 6 接着剤 DESCRIPTION OF SYMBOLS 1 Circuit board 2 Electrode on board 3 QFP package 4 Lead terminal 5 Conductive particle 6 Adhesive

───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹村 賢三 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 Fターム(参考) 5E319 AA03 AB01 BB04 BB07 BB08 BB09 BB10 BB16 BB20 CC61 GG15 5F044 KK01 LL09 QQ01  ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Kenzo Takemura 48 Wadai, Tsukuba, Ibaraki Prefecture F-term in Tsukuba Development Laboratory, Hitachi Chemical Co., Ltd. 5E319 AA03 AB01 BB04 BB07 BB08 BB09 BB10 BB16 BB20 CC61 GG15 5F044 KK01 LL09 QQ01

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】回路部材を、前記回路部材の端子(a)に
対応した端子(b)が設けられた実装基板に前記端子
(a)(b)を対向しマトリックス樹脂と金属粒子を含
む接着剤を介し搭載し、加熱により前記端子(a)
(b)を電気的に接続する回路部材の実装方法であっ
て、 前記実装基板に超音波振動を与え、前記マトリックス樹
脂両面に金属粒子を露出させる工程を備えることを特徴
とする回路部材の実装方法。
1. A bonding method comprising bonding a circuit member to a mounting substrate provided with terminals (b) corresponding to the terminals (a) of the circuit member, the terminals (a) and (b) being opposed to each other and including a matrix resin and metal particles. And the terminal (a)
A method for mounting a circuit member for electrically connecting (b), comprising a step of applying ultrasonic vibration to the mounting substrate to expose metal particles on both surfaces of the matrix resin. Method.
【請求項2】金属粒子が易溶融性金属表面を持つ金属粒
子である請求項1記載の回路部材の実装方法。
2. The method for mounting a circuit member according to claim 1, wherein the metal particles are metal particles having an easily fusible metal surface.
【請求項3】超音波振動が、周波数25〜100KH
z、振動時間10〜50秒である請求項1又は2記載の
回路部材の実装方法。
3. The ultrasonic vibration has a frequency of 25 to 100 KH.
3. The method for mounting a circuit member according to claim 1, wherein z is a vibration time of 10 to 50 seconds.
JP30292798A 1998-10-23 1998-10-23 Circuit member mounting method Expired - Fee Related JP4032532B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30292798A JP4032532B2 (en) 1998-10-23 1998-10-23 Circuit member mounting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30292798A JP4032532B2 (en) 1998-10-23 1998-10-23 Circuit member mounting method

Publications (2)

Publication Number Publication Date
JP2000133917A true JP2000133917A (en) 2000-05-12
JP4032532B2 JP4032532B2 (en) 2008-01-16

Family

ID=17914815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30292798A Expired - Fee Related JP4032532B2 (en) 1998-10-23 1998-10-23 Circuit member mounting method

Country Status (1)

Country Link
JP (1) JP4032532B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308027A (en) * 2000-04-25 2001-11-02 Sharp Corp Method for manufacturing semiconductor device
JP2006199833A (en) * 2005-01-20 2006-08-03 Sekisui Chem Co Ltd Anisotropic conductive adhesive

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780050A (en) * 1995-07-20 1998-07-14 Theratech, Inc. Drug delivery compositions for improved stability of steroids

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308027A (en) * 2000-04-25 2001-11-02 Sharp Corp Method for manufacturing semiconductor device
JP2006199833A (en) * 2005-01-20 2006-08-03 Sekisui Chem Co Ltd Anisotropic conductive adhesive

Also Published As

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JP4032532B2 (en) 2008-01-16

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