JP2000133564A5 - - Google Patents

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Publication number
JP2000133564A5
JP2000133564A5 JP1998300524A JP30052498A JP2000133564A5 JP 2000133564 A5 JP2000133564 A5 JP 2000133564A5 JP 1998300524 A JP1998300524 A JP 1998300524A JP 30052498 A JP30052498 A JP 30052498A JP 2000133564 A5 JP2000133564 A5 JP 2000133564A5
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JP
Japan
Prior art keywords
photosensitive substrate
pattern
exposure apparatus
exposure
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1998300524A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000133564A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10300524A priority Critical patent/JP2000133564A/ja
Priority claimed from JP10300524A external-priority patent/JP2000133564A/ja
Publication of JP2000133564A publication Critical patent/JP2000133564A/ja
Publication of JP2000133564A5 publication Critical patent/JP2000133564A5/ja
Withdrawn legal-status Critical Current

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JP10300524A 1998-10-22 1998-10-22 露光装置 Withdrawn JP2000133564A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10300524A JP2000133564A (ja) 1998-10-22 1998-10-22 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10300524A JP2000133564A (ja) 1998-10-22 1998-10-22 露光装置

Publications (2)

Publication Number Publication Date
JP2000133564A JP2000133564A (ja) 2000-05-12
JP2000133564A5 true JP2000133564A5 (cg-RX-API-DMAC10.html) 2005-10-27

Family

ID=17885865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10300524A Withdrawn JP2000133564A (ja) 1998-10-22 1998-10-22 露光装置

Country Status (1)

Country Link
JP (1) JP2000133564A (cg-RX-API-DMAC10.html)

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