JP2000131170A - Method of mounting pressure sensor - Google Patents

Method of mounting pressure sensor

Info

Publication number
JP2000131170A
JP2000131170A JP30666298A JP30666298A JP2000131170A JP 2000131170 A JP2000131170 A JP 2000131170A JP 30666298 A JP30666298 A JP 30666298A JP 30666298 A JP30666298 A JP 30666298A JP 2000131170 A JP2000131170 A JP 2000131170A
Authority
JP
Japan
Prior art keywords
diaphragm
pressure sensor
silicon member
response
crystal silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30666298A
Other languages
Japanese (ja)
Inventor
Masayuki Miki
政之 三木
Yoshiyuki Sasada
義幸 笹田
Masanori Kubota
正則 久保田
Atsushi Miyazaki
敦史 宮▲崎▼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Automotive Systems Engineering Co Ltd
Original Assignee
Hitachi Ltd
Hitachi Car Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Car Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP30666298A priority Critical patent/JP2000131170A/en
Publication of JP2000131170A publication Critical patent/JP2000131170A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases

Landscapes

  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the pressure resistance characteristic of a sensor, without being restricted by the parent material strength of glass by directly bonding or adhering a Si member having a diaphragm to a fixing base. SOLUTION: A single-crystal Si member 1 having a diaphragm 1a is formed by the anisotropic or dry etching, etc., of Si and is eutectic-bonded to a fixing base 4 made of Si or metal, etc., which is heat treated at about 400 deg.C, e.g. using an Au-Si alloy solder-made bonding member 5. At this time, about the Si member 1 and the fixing base 4, an Au or Au-Si metal film is metallized on the bonding face of Si or the front face at the bonding face and similarly the bonding face of the base 4 or the front face at the bonding face through plating, deposition, sputtering, etc. As a result, the bond strength is improved, and the pressure resistance characteristic restricted by the parent material of the glass base can be enhanced to improve the reliability.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は自動車のエンジン制
御などに用いられる半導体圧力センサに係わり、特に、
気体やオイル,ガソリンなど液体の圧力を検出する検出
部の実装を非鉛系のはんだによる共晶接合とし、実装構
造の簡単化,外力に対し耐圧特性の向上、かつ、環境汚
染の防止を図るに好適な圧力センサの実装方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor pressure sensor used for controlling an engine of an automobile and the like.
The detection unit that detects the pressure of liquids such as gas, oil, and gasoline is mounted by eutectic bonding using lead-free solder, which simplifies the mounting structure, improves the pressure resistance against external forces, and prevents environmental pollution. More particularly, the present invention relates to a method for mounting a pressure sensor which is suitable for the present invention.

【0002】[0002]

【従来の技術】本発明に係わる従来技術として、ゲージ
抵抗及びダイアフラムを有するシリコン部材は、ガラス
の台座と陽極接合技術により接合され、金属あるいはプ
ラスチック等のベース基板となる固定台座に接着,接合
される。従来技術の概略構造を図2に示す。図におい
て、10は拡散で形成される歪み式ゲージ抵抗11を有
するシリコン部材、12はシリコン部材10を異性エッ
チングプロセスなどで薄板状に形成されたダイアフラ
ム、13はガラス台座、14は圧力導入管15を有する
固定台座、16はガラス台座13と固定台座14を接合
あるいは接着する接合部材である。
2. Description of the Related Art As a prior art related to the present invention, a silicon member having a gauge resistor and a diaphragm is bonded to a glass pedestal by an anodic bonding technique, and is bonded and bonded to a fixed pedestal serving as a base substrate of metal or plastic. You. FIG. 2 shows a schematic structure of the prior art. In the drawing, reference numeral 10 denotes a silicon member having a strain gauge resistor 11 formed by diffusion, 12 denotes a diaphragm formed by thinning the silicon member 10 by an isotropic etching process or the like, 13 denotes a glass pedestal, 14 denotes a pressure introducing pipe 15. Is a joining member for joining or bonding the glass pedestal 13 and the fixed pedestal 14.

【0003】このように、シリコン部材は固定台座の熱
歪みの影響を緩和するため、ガラス台座に陽極接合さ
れ、更に、固定台に有機接着剤あるいは半田などの金属
材料で接合される。
[0003] As described above, the silicon member is anodically bonded to the glass pedestal in order to reduce the influence of thermal distortion of the fixed pedestal, and further bonded to the fixed pedestal with a metal material such as an organic adhesive or solder.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、シリ
コンとガラスとを陽極接合し、固定台座に接合する実装
において、図2の従来技術で示すように圧力導入管を介
して圧力が印加されると、シリコンとガラスの陽極接合
部,ガラスと固定台の接合部には引剥がし方向の力が発
生し、特に、陽極接合部はガラスの母材強度(1kgf/
mm2)以上の圧力が印加されると接合面から破損する。そ
れ故、ガラスの母材強度に制約されずセンサの耐圧特性
を向上させる実装方法が要求される。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method in which silicon and glass are anodically bonded and bonded to a fixed base by applying pressure through a pressure introducing pipe as shown in the prior art of FIG. When this is done, a force in the peeling direction is generated at the anodic joint between silicon and glass and the joint between glass and the fixing base. In particular, the anodic joint has a glass base material strength (1 kgf /
If a pressure of more than mm 2 ) is applied, the joint will be damaged. Therefore, there is a need for a mounting method that improves the pressure resistance of the sensor without being restricted by the strength of the glass base material.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、シリコンとガラスの陽極接合部を無くし、シリコン
部材を半田等の金属により直接固定台座に接合する実装
手段で可能となる。また、固定台座の熱的影響を緩和す
るため、半田等の厚さは極力薄くしなければならない。
In order to achieve the above object, it is possible to eliminate the anodic bonding portion between silicon and glass and to use mounting means for directly bonding a silicon member to a fixed base with metal such as solder. Further, in order to reduce the thermal effect of the fixing pedestal, the thickness of the solder or the like must be reduced as much as possible.

【0006】[0006]

【発明の実施の形態】以下、本発明を図1に示す実施例
により説明する。図において、1はダイアフラム1aを
有する単結晶シリコン部材、2は異方性エッチングプロ
セス等により加工して作られる歪み式ゲージ2a,2b
を有する単結晶シリコン部材、3はシリコン部材1,2
を接合する絶縁層膜、4は圧力導入管4aを有する金属
あるいはセラミック等で作られた固定台座、5はシリコ
ン部材1と固定台座4を接合する接合部材、6は電気信
号を取り出すための電極パッド、7はリードピン8を有
するステムである。なお、後述する同一番号の要素は全
て同じ機能を有するものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to an embodiment shown in FIG. In the figure, 1 is a single crystal silicon member having a diaphragm 1a, 2 is a strain type gauge 2a, 2b made by processing by an anisotropic etching process or the like.
A single-crystal silicon member having
Is a fixed base made of metal or ceramic or the like having a pressure introducing pipe 4a, 5 is a bonding member for bonding the silicon member 1 and the fixed base 4, and 6 is an electrode for extracting an electric signal. The pad 7 is a stem having lead pins 8. Note that elements having the same numbers, which will be described later, all have the same function.

【0007】シリコンの異方性エッチングやドライエッ
チング等の加工プロセスで製作されたダイアフラムを有
するシリコン部材1は、接合部材5、例えば金−シリコ
ン(Au−Si)の合金半田材により、約400℃の熱
処理プロセスで固定台4と共晶接合される。このとき、
シリコン部材1と固定台4には、シリコンの接合面ある
いは接合面側前面に、同様に、固定台4の接合面あるい
は接合側前面には、メッキや蒸着,スパッタなどで表面
が金(Au)あるいは(Au−Si)の金属膜がメタラ
イズされている。なお、シリコン部材1へのAu−Si
のメタライズの代わりに、同材料のプリフォーム形状薄
板を配置し、熱処理することで共晶接合は可能となる。
A silicon member 1 having a diaphragm manufactured by a processing process such as anisotropic etching or dry etching of silicon is bonded to a bonding member 5, for example, a gold-silicon (Au-Si) alloy solder material at about 400 ° C. Is eutectic bonded to the fixing table 4 in the heat treatment process. At this time,
The surface of the silicon member 1 and the fixing table 4 is gold (Au) on the bonding surface or the bonding surface front side of the silicon, and similarly, the bonding surface or the bonding surface of the fixing table 4 is gold (Au) by plating, vapor deposition, sputtering, or the like. Alternatively, a metal film of (Au-Si) is metallized. In addition, Au-Si to the silicon member 1
Eutectic bonding is possible by arranging and heat-treating a preform-shaped thin plate of the same material in place of the metallization.

【0008】また、ゲージを有するシリコン部材2から
電気的信号を取り出すための接続は、電気パッド6とリ
ードピン8の表面に前記同様のメタライズを施し、前記
熱処理時同時にAu−Siの共晶接合で電気的接続を得
ることができる。
The connection for taking out an electric signal from the silicon member 2 having the gauge is performed by metallizing the surface of the electric pad 6 and the lead pin 8 in the same manner as described above, and simultaneously with the eutectic bonding of Au-Si during the heat treatment. An electrical connection can be obtained.

【0009】従って、ガラス台座を使用せずシリコンを
直接固定台に接合することによって、接合強度の向上が
図れると共に、電気的信号の引出しも同時に行えること
で、製造プロセスの簡略化も図れる。
Therefore, by directly bonding silicon to the fixed base without using the glass pedestal, the bonding strength can be improved, and at the same time, electrical signals can be extracted, thereby simplifying the manufacturing process.

【0010】接合部材を変更した他の実施例を図3に示
す。接続部材において、5aは例えば、金−錫(Au−
Sn),錫−銀(Sn−Ag),錫−アンチモン(Sn
−Sb),鉛−錫(Pb−Sn)などの共晶半田を用い
る。一方、シリコン部材や固定台座4には、図中示すメ
タライズを施す必要がある。ここで、5bはシリコン部
材1にスパッタや蒸着などで形成されたアルミニウム−
シリコン/チタン/ニッケル/金(Al−Si/Ti/
Ni/Au)やチタン/白金/金(Ti/Pt/Au)
などのメタライズ層が、また、固定台座4側で5cはニ
ッケルメッキあるいはニッケル−金メッキがメタライズ
されてある。
FIG. 3 shows another embodiment in which the joining members are changed. In the connection member, 5a is, for example, gold-tin (Au-
Sn), tin-silver (Sn-Ag), tin-antimony (Sn
-Sb), eutectic solder such as lead-tin (Pb-Sn) is used. On the other hand, the silicon member and the fixed base 4 need to be metallized as shown in the figure. Here, 5b is aluminum formed on the silicon member 1 by sputtering or vapor deposition.
Silicon / titanium / nickel / gold (Al-Si / Ti /
Ni / Au) and titanium / platinum / gold (Ti / Pt / Au)
And a metallized layer 5c on the side of the fixed pedestal 4 is nickel-plated or nickel-gold plated.

【0011】本実施例によれば、前記Au−Siの接合
材に対し熱処理プロセス温度が約300℃以下で実現で
きる。また、前記実施例同様接合部材5aはプリフォー
ム形状薄板でもよい。そして、電極パッド部の6b,6
cには前記5bと同様のメタライズを施すことによっ
て、電気的接続を得ることができる。
According to this embodiment, the heat treatment process temperature for the Au-Si bonding material can be realized at about 300 ° C. or less. Further, similarly to the above embodiment, the joining member 5a may be a preform-shaped thin plate. Then, the electrode pads 6b, 6
By subjecting c to the same metallization as in 5b, an electrical connection can be obtained.

【0012】電極引出し部の実装方法を変更した他の実
施例を図4に示す。図において、9は接続端子部でセラ
ミックなどの絶縁材、6eはワイヤーボンディング用電
極で表面層がアルミニウムや金により形成される、6d
はシリコン部材2の電極パッドで6e同様表面層がアル
ミニウムや金により形成される。実施例では接続端子部
9の一方にシリコン部材1と同様のメタライズを配する
ことで、シリコン部材1と固定台座4とを接合する工程
で同時に接続端子部9も接合可能となり、結果、電気的
信号の取り出しがワイヤーボンディング方法で可能とな
る。
FIG. 4 shows another embodiment in which the mounting method of the electrode lead portions is changed. In the figure, reference numeral 9 denotes an insulating material such as ceramic, which is a connection terminal portion; 6e, a wire bonding electrode whose surface layer is formed of aluminum or gold;
Is an electrode pad of the silicon member 2, the surface layer of which is formed of aluminum or gold as in 6e. In the embodiment, the metallization similar to that of the silicon member 1 is arranged on one of the connection terminal portions 9, so that the connection terminal portion 9 can be simultaneously bonded in the step of bonding the silicon member 1 and the fixing pedestal 4. Signal extraction can be performed by a wire bonding method.

【0013】[0013]

【発明の効果】本発明によれば、ダイアフラムを有する
シリコン部材を半田で直接固定台座に接合する実装が可
能となり、従来のガラス台の母材強度で制約された耐圧
特性を改善し信頼性を向上させることが可能となる。ま
た、ガラス台を使用する陽極接合プロセスが不要とな
り、製造プロセスの簡単化,時間短縮及びコストの低減
が図れる効果がある。
According to the present invention, it becomes possible to mount a silicon member having a diaphragm directly on a fixed pedestal by soldering, thereby improving the pressure resistance characteristic limited by the base material strength of a conventional glass base and improving reliability. It can be improved. In addition, the anodic bonding process using a glass table is not required, which has the effect of simplifying the manufacturing process, shortening the time, and reducing the cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例である圧力センサを示す側断
面図。
FIG. 1 is a side sectional view showing a pressure sensor according to an embodiment of the present invention.

【図2】センサ実装方法の従来技術を示す側断面図。FIG. 2 is a side sectional view showing a conventional technique of a sensor mounting method.

【図3】本発明の他の実施例を示す圧力センサの側断面
図。
FIG. 3 is a side sectional view of a pressure sensor showing another embodiment of the present invention.

【図4】本発明の他の実施例を示す圧力センサの側断面
図。
FIG. 4 is a side sectional view of a pressure sensor showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1,10…単結晶シリコン部材、1a…ダイアフラム、
2…単結晶シリコン部材、2a,2b…歪み式ゲージ、
3…絶縁層膜、4,14…固定台、4a,15…圧力導
入管、5,16…接合部材、5a,6a…半田部材、5
b,5c,6b,6c…メタライズ層、6…電極パッ
ド、6e…パッド部電極、7…ステム、8…リードピ
ン、8a…ワイヤ、9…接続端子部、11a,11b…
拡散型歪みゲージ、13…ガラス台。
1,10: single-crystal silicon member, 1a: diaphragm,
2 Single crystal silicon member, 2a, 2b Strain gauge,
3 ... insulating layer film, 4, 14 ... fixed base, 4a, 15 ... pressure introduction pipe, 5, 16 ... joining member, 5a, 6a ... solder member, 5
b, 5c, 6b, 6c: metallized layer, 6: electrode pad, 6e: pad electrode, 7: stem, 8: lead pin, 8a: wire, 9: connection terminal, 11a, 11b ...
Diffusion type strain gauge, 13 ... glass stand.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 笹田 義幸 茨城県ひたちなか市大字高場2520番地 株 式会社日立製作所自動車機器事業部内 (72)発明者 久保田 正則 茨城県ひたちなか市高場2477番地 株式会 社日立カーエンジニアリング内 (72)発明者 宮▲崎▼ 敦史 茨城県ひたちなか市大字高場2520番地 株 式会社日立製作所自動車機器事業部内 Fターム(参考) 2F055 AA21 BB20 CC02 DD01 DD05 DD09 EE13 FF43 GG12 4M112 AA01 BA01 CA02 CA15 DA20 EA03 GA01  ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Yoshiyuki Sasada 2520 Ojitakaba, Hitachinaka City, Ibaraki Prefecture Inside the Automotive Equipment Division of Hitachi, Ltd. (72) Inventor Masanori Kubota 2477 Takaba, Hitachinaka City, Ibaraki Prefecture Hitachi Car Engineering (72) Inventor Miya Atsushi Atsushi 2520 Takaba, Hitachinaka-shi, Ibaraki Prefecture F-term (reference) 2F055 AA21 BB20 CC02 DD01 DD05 DD09 EE13 FF43 GG12 4M112 AA01 BA01 CA02 CA15 DA20 EA03 GA01

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、ダイアフラムを有するシリコン部
材1を固定台座に直接接合あるいは接着することを特徴
とする圧力センサの実装方法。
1. A single-crystal silicon member 1 having a diaphragm that is displaced in response to an external force, a single-crystal silicon member 2 in which a resistance value of a gauge portion is changed in response to a displacement of the diaphragm, A method for mounting a pressure sensor, wherein a silicon member 1 having a diaphragm is directly bonded or bonded to a fixed pedestal in a semiconductor pressure sensor including an insulating layer arranged to be bonded and a fixed pedestal for fixing the insulating layers.
【請求項2】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、外力に対する耐圧特性の向上が図
れることを特徴とする請求項1記載の圧力センサの実装
方法。
2. A single-crystal silicon member 1 having a diaphragm which is displaced in response to an external force, a single-crystal silicon member 2 in which a resistance value of a gauge section is changed in response to a displacement of the diaphragm, 2. The method for mounting a pressure sensor according to claim 1, wherein in a semiconductor pressure sensor including an insulating layer arranged so as to be joined and a fixing pedestal for fixing the insulating layer, an improvement in pressure resistance characteristics against an external force can be achieved.
【請求項3】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、ダイアフラムを有するシリコン部
材1を固定台座の接合は、半田による共晶接合であるこ
とを特徴とする請求項1記載の圧力センサの実装方法。
3. A single-crystal silicon member 1 having a diaphragm that is displaced in response to an external force, a single-crystal silicon member 2 in which a resistance value of a gauge portion changes in response to a displacement of the diaphragm, In a semiconductor pressure sensor comprising an insulating layer arranged so as to be joined and a fixing pedestal for fixing them, the joining of the silicon member 1 having the diaphragm to the fixing pedestal is eutectic joining by solder. Item 3. A method for mounting the pressure sensor according to Item 1.
【請求項4】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、接合部材は非鉛系の半田で、単一
材料、あるいは複数の材料を混合して成る合金材である
ことを特徴とする請求項1又は3記載の圧力センサの実
装方法。
4. A single crystal silicon member 1 having a diaphragm that is displaced in response to an external force, a single crystal silicon member 2 in which a resistance value of a gauge section is changed in response to a displacement of the diaphragm, In a semiconductor pressure sensor consisting of an insulating layer arranged to be joined and a fixing pedestal for fixing them, the joining member is a lead-free solder and is made of a single material or an alloy material obtained by mixing a plurality of materials. The method for mounting a pressure sensor according to claim 1, wherein the pressure sensor is provided.
【請求項5】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、固定台座が金属又はセラミックス
系であることを特徴とする請求項1記載の圧力センサの
実装方法。
5. A single crystal silicon member 1 having a diaphragm that is displaced in response to an external force, a single crystal silicon member 2 in which a resistance value of a gauge portion is changed in response to a displacement of the diaphragm, 2. The method for mounting a pressure sensor according to claim 1, wherein in a semiconductor pressure sensor including an insulating layer arranged so as to be joined and a fixed pedestal for fixing the insulating layer, the fixed pedestal is made of a metal or ceramics.
【請求項6】外力に対応して変位するダイアフラムを有
する単結晶シリコン部材1と、前記ダイアフラムの変位
に対応してゲージ部の抵抗値が変化する単結晶シリコン
部材2と、前記2つのシリコンを接合するように配され
た絶縁層と、これらを固定する固定台座からなる半導体
圧力センサにおいて、電気信号の中継端子部材の接合も
同時工程でできることを特徴とする請求項1記載の圧力
センサの実装方法。
6. A single-crystal silicon member 1 having a diaphragm that is displaced in response to an external force, a single-crystal silicon member 2 in which a resistance value of a gauge portion changes in response to a displacement of the diaphragm, The mounting of the pressure sensor according to claim 1, wherein in a semiconductor pressure sensor including an insulating layer arranged so as to be bonded and a fixing pedestal for fixing them, bonding of a relay terminal member for an electric signal can be performed in a simultaneous step. Method.
JP30666298A 1998-10-28 1998-10-28 Method of mounting pressure sensor Pending JP2000131170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30666298A JP2000131170A (en) 1998-10-28 1998-10-28 Method of mounting pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30666298A JP2000131170A (en) 1998-10-28 1998-10-28 Method of mounting pressure sensor

Publications (1)

Publication Number Publication Date
JP2000131170A true JP2000131170A (en) 2000-05-12

Family

ID=17959821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30666298A Pending JP2000131170A (en) 1998-10-28 1998-10-28 Method of mounting pressure sensor

Country Status (1)

Country Link
JP (1) JP2000131170A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009250651A (en) * 2008-04-02 2009-10-29 Denso Corp Pressure sensor
WO2015045779A1 (en) * 2013-09-30 2015-04-02 日立オートモティブシステムズ株式会社 Mechanical quantity measuring device and production method for same
CN109387317A (en) * 2017-08-03 2019-02-26 罗伯特·博世有限公司 For manufacturing the method and pressure sensor apparatus of the pressure sensor apparatus of measurement Fluid pressure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009250651A (en) * 2008-04-02 2009-10-29 Denso Corp Pressure sensor
WO2015045779A1 (en) * 2013-09-30 2015-04-02 日立オートモティブシステムズ株式会社 Mechanical quantity measuring device and production method for same
JPWO2015045779A1 (en) * 2013-09-30 2017-03-09 日立オートモティブシステムズ株式会社 Mechanical quantity measuring apparatus and manufacturing method thereof
CN109387317A (en) * 2017-08-03 2019-02-26 罗伯特·博世有限公司 For manufacturing the method and pressure sensor apparatus of the pressure sensor apparatus of measurement Fluid pressure

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