JP2000111901A - Substrate for electro-optic device, elctro-optic device and production of elctro-optic device as well as electronic apparatus using electro-optic device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily obtain reflection electrodes having an optimum reflection characteristic with good reproducibility by constituting wiring connected to a switching control circuit and a liquid crystal pixel drive circuit and providing regions exclusive of this wiring with irregularly arranged projecting parts. SOLUTION: Light shielding layers are formed via one insulating film 7 below the reflection electrodes 13 and conductive layers 8 are formed via another insulating film below the light shielding layers. The conductive layers 8 are formed as the wiring, for source and drain electrodes 6a, 6b, etc., in the regions constituting the switching control circuit and the liquid crystal pixel drive circuit. In such a case, the first conductive layers 8a to 8c consisting of first layers of aluminum layers or tantalum layers are formed via first interlayer insulating films 7. The irregularly arranged projecting parts 8c are formed in the regions exclusive of the source electrodes (or drain electrodes) 8a and the drain electrodes (or source electrodes) 8b. Then, the reflection electrodes 13 are also formed of the constitution having the ruggedness along the ruggedness of the conductive layers 8.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a substrate for an electro-optical device constituting a reflection type liquid crystal panel, an electro-optical device formed by using the substrate, and an electronic device using the electro-optical device. Equipment related.

[0002]

2. Description of the Related Art In recent years, a liquid crystal panel has been used as an example of an electro-optical device as an information display device of a portable device such as a portable telephone or a portable information terminal. The content of information to be displayed has been about character display, but a dot matrix type liquid crystal panel has been used to display a large amount of information at a time, and the number of pixels has been gradually increased to increase the duty.

Conventionally, a simple matrix type liquid crystal panel has been used as a display device in the portable equipment as described above. However, in a simple matrix type liquid crystal panel, when performing multiplex driving, a high duty ratio is selected as a row scanning line selection signal. The higher the voltage, the higher the voltage required, which has become a major problem in battery-operated portable devices that demand a small reduction in power consumption.

In order to solve the above-mentioned problem, a liquid crystal panel substrate is used as a semiconductor substrate, a memory circuit is formed for each pixel on the semiconductor substrate, and a static drive type reflection device for performing display control based on data held in the memory circuit. Liquid crystal panels have been proposed.

[0005] Such a reflection type liquid crystal panel which performs display by reflecting light incident from the outside does not require a backlight which is a light source, and therefore has low power consumption, and is noted as being thin and lightweight. ing.

[0006]

A liquid crystal panel and an electronic device using the same are basically used as a display, for example, having a high contrast, a relatively fast response speed, a low driving voltage, and easy gradation display. Although it has the required characteristics in a well-balanced manner, it has disadvantages such as a narrow viewing angle in principle and not suitable for bright display.

In order to obtain a bright display with a wide viewing angle, it is necessary to increase the intensity of light scattered in a direction perpendicular to the display screen with respect to incident light from all angles. For that purpose, it is necessary to create a reflective electrode having optimal reflective characteristics.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems in a reflection type liquid crystal panel and to easily and reproducibly form a reflection electrode having optimum reflection characteristics.
An object of the present invention is to provide a reflection type liquid crystal panel with improved display quality.

[0009]

In order to achieve the above object, a substrate for an electro-optical device according to the present invention has a light-shielding layer formed below a reflective electrode via one insulating film. A conductive layer formed below the other insulating film is formed as a wiring such as a source / drain electrode in a region constituting the switching control circuit and the liquid crystal pixel driving circuit, and a wiring such as a source / drain electrode is formed. In other areas, irregularly arranged convex portions are formed.

According to a first aspect of the present invention, a plurality of column scanning lines and a plurality of row scanning lines orthogonal to the column scanning lines are arranged on the substrate, and each of the plurality of column scanning lines and the row scanning lines intersects with each other. A reflection electrode serving as a pixel electrode is disposed, and each pixel electrode is provided with a switching control circuit and a liquid crystal pixel drive circuit. In the substrate for an electro-optical device, a light-shielding layer is provided below the reflection electrode via one insulating film. And a conductive layer is formed below the light-shielding layer with the other insulating film interposed therebetween. The conductive layer includes a source / drain electrode and the like in a region forming a switching control circuit and a liquid crystal pixel driving circuit. And irregularly arranged convex portions are formed in regions other than the wiring such as the source / drain electrodes. Therefore, by forming the reflective electrode via an insulating film on the conductive layer provided in a convex shape, the reflective electrode also has unevenness along the unevenness of the conductive layer. It can be diffused, and without increasing the process, it is possible to easily create a reflective electrode having optimal reflective characteristics with good reproducibility,
A reflective liquid crystal panel with improved display quality can be provided.

According to a second aspect of the present invention, in the first aspect, the substrate is formed of a semiconductor substrate.
According to a third aspect of the present invention, in the second aspect, the substrate is formed of single crystal silicon.
According to a fourth aspect of the present invention, in the first aspect, the substrate is made of a transparent substrate. According to a fifth aspect of the present invention, in the fourth aspect, the substrate is formed of glass. According to a sixth aspect of the present invention, in the first aspect, the other insulating film includes an SOG film. The invention according to claim 7 is characterized in that, in claim 6, the SOG film is etched back. Therefore, a reflection electrode having good reflection characteristics is formed. According to an eighth aspect of the present invention, the substrate for an electro-optical device according to any one of the first to seventh aspects and a transparent substrate on an incident side are arranged with a gap therebetween, and Provided is an electro-optical device including a liquid crystal sandwiched in a gap with the transparent substrate. According to a ninth aspect of the present invention, there is provided an electronic apparatus using the electro-optical device according to the eighth aspect.

According to a tenth aspect of the present invention, in the method of manufacturing an electro-optical device, a plurality of column scanning lines and a plurality of row scanning lines intersecting the column scanning lines are arranged on the substrate, and the plurality of column scanning lines and the row scanning lines are arranged. A reflection electrode serving as a pixel electrode is disposed at each intersection of the scanning lines.A method for manufacturing an electro-optical device including a switching control circuit and a liquid crystal pixel driving circuit in each pixel electrode, wherein the switching control circuit and the Simultaneously forming irregularly convex portions in a region other than the wiring and the wiring connected to the liquid crystal pixel drive circuit; and forming a light-shielding film on the conductive layer via the other insulating film; Forming the reflective electrode on the light-shielding film via one of the insulating films. Therefore, it is possible to easily and reproducibly form a reflective electrode having optimal reflection characteristics without increasing the number of processes, and to provide an electro-optical device with improved display quality.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. In this embodiment, a liquid crystal panel will be described as an example of the electro-optical device.

(Explanation of Overall Structure of Liquid Crystal Panel and Structure of Reflective Electrode-Side Substrate of the Present Invention) FIG. 1 is a sectional view of a first embodiment of a reflective electrode-side substrate of a reflective liquid crystal panel to which the present invention is applied. Is shown.

As shown in FIG. 1, a substrate for a liquid crystal panel according to the present invention uses a semiconductor substrate as the substrate 1.
The material of the substrate 1 is not limited to the present embodiment. For example, a transparent substrate such as a glass substrate may be used. First, the overall configuration of the reflective liquid crystal panel of the present invention will be outlined.

As shown in FIGS. 9 and 10, the substrate 1
A pixel area 20 is provided at the center of (32), and row scanning lines and column scanning lines are arranged in a matrix in the pixel area. Each pixel is arranged according to the intersection of a row scanning line and a column scanning line, and each pixel is provided with a reflective electrode 13 and a liquid crystal pixel driving circuit 101 as described later. In a peripheral region of the pixel region 20, a row scanning line driving circuit 23 that supplies a row scanning signal to a row scanning line, a column scanning line driving circuit 21 that supplies a column scanning signal to a column scanning line, and a pad region 26 An input data line 22 for taking in input data from is provided. The substrate 1 (31) is bonded and fixed to a counter substrate 35 made of glass having a common electrode 33 formed on an inner surface thereof in a region 36 (a region sandwiched between a solid line and a dashed line) by a seal material 36, The liquid crystal 37 is sealed to form a liquid crystal panel.
Note that a region 25 sandwiched between dotted lines indicates a light-shielding film that shields the periphery of the pixel region.

The sectional structure of the substrate 1 will be described in detail with reference to FIG. In FIG. 1, reference numeral 1 denotes a P-type semiconductor substrate such as single-crystal silicon (or an N-type semiconductor substrate), and 2 denotes an N-type well region formed on the surface of the substrate 1 and having a higher impurity concentration than the substrate. The column scanning line driving circuit 21 and the row scanning line driving circuit 23 shown in the liquid crystal panel plan view of FIG.
It may be formed separately from the well region where the elements constituting the peripheral circuit such as the input data line 22 are formed.

First conductive layers 8a, 8b and 8c made of a first aluminum layer or a tantalum layer were formed via a first interlayer insulating film 7 such as a Phosphorus Silica Grass film. This aluminum or tantalum layer
In this embodiment, 500 nm is deposited by a sputtering method.
The first conductive layer 8a is formed in a source region (or a drain region) 6 through a contact hole formed in the insulating film 7.
a and constitutes a source electrode (or a drain electrode) of the FET. Further, the first conductive layer 8b is electrically connected to the drain region (or source region) 6b of the FET through a contact hole formed in the insulating film 7 to form a drain electrode (or source electrode).
Irregularly arranged projections 8c were formed in regions other than the source electrode (or drain electrode) 8a and the drain electrode (or source electrode) 8b. The diameter of the projection 8c is desirably 0.5 to 10 μm, and may be any size or several sizes in this range. Further, the shape of the projection 8c is not limited to the present embodiment. For example, a polygon such as a regular octagon may be applied.

Above the first conductive layers 8a, 8b, 8c, second interlayer insulating films 9a, 9 made of a silicon oxide film are provided.
b, 9c are formed, and the second interlayer insulating films 9a, 9b, 9c are formed.
Is formed with a contact hole 9d. In the present embodiment, 9a is 600n by TEOS plasma CVD.
m, silicon oxide film, and 9b SOG (Spin On Glas
s) A 320 nm silicon oxide film was formed. In addition,
The thickness of the SOG film is not limited to this embodiment. In order to form an appropriate convex portion in a region other than the wiring such as the source / drain electrodes, the thickness is desirably 100 to 500 nm. A second interlayer insulating film 9 which is an SOG film
After the formation of b, the SOG film and the second interlayer 3 are a field oxide film (so-called LOCOS) for element isolation formed on the surface of the substrate 1. Field oxide film 3 is formed by selective thermal oxidation. An opening is formed in the field oxide film 3, and a gate electrode 5 made of polysilicon or metal silicide is formed in the center of the inside of the opening via a gate oxide film formed by thermal oxidation of the surface of the silicon substrate. Source / drain regions 6a and 6b formed of impurity layers (hereinafter, referred to as doping layers) are formed on the substrate surface on both sides of the gate electrode 5, thereby forming a field effect transistor (hereinafter, referred to as FET). And
Above the source / drain regions 6a and 6b, BP
The SG (Boron insulating film 9a may be etched under non-selective or arbitrary conditions. In this embodiment, the second interlayer insulating films 9b and 9a, which are SOG films, are etched under non-selective conditions. The etching amount at this time is not limited to this embodiment, but is preferably in the range of 100 to 500 nm, and is formed in a region other than the wiring such as the source / drain electrodes. The taper of the convex portion has a gentle curved shape, and it is possible to form a reflective electrode having good reflection characteristics.
Of 500 nm. Further thereon, second conductive layers 10a and 10b made of an aluminum layer or a tantalum layer were formed. In this embodiment, the aluminum layer or the tantalum layer is deposited to a thickness of 500 nm by a sputtering method. The first conductive layer 8b and the second conductive layer 10b are electrically connected via a contact hole 9d.

The second conductive layer 10a formed simultaneously with the second conductive layer 10b is provided with a drain electrode 8b and a reflective electrode so that the incident light does not enter the semiconductor layer side of the substrate and the FET does not leak light. It is possible to shield almost the entire pixel region except for 10b, which is the connection portion 13.

In the present embodiment, the second conductive layer 10b is directly connected to the first conductive layer 8b through the contact hole 9d, but a connection plug made of a refractory metal such as tungsten is used. Connection may be used.

The connection between the second conductive layer 10b, which is formed simultaneously with the second conductive layer 10a, and the reflective electrode 13 is made of a refractory metal such as tungsten in a contact hole opened in the third interlayer insulating film 11. This is performed by burying the connection plug 12 by a CVD method or the like.

After the connection plug 12 is formed, the reflection electrode 1
In No. 3, aluminum formed of a third conductive layer was formed by a low-temperature sputtering method.

By forming the first conductive layer in a convex shape and forming the reflective electrode via the insulating film by the above process, the reflective electrode also has the unevenness along the unevenness of the conductive layer. . For this reason, a reflection type liquid crystal panel that can diffuse light, can easily and with good reproducibility create a reflection electrode having optimal reflection characteristics without increasing the number of processes, and improves display quality. Could be provided.

Referring to FIG. 5, plan views showing first, second, and fourth embodiments of the reflective electrode side substrate of the reflective liquid crystal panel to which the present invention is applied will be described.

9d is a drain electrode (or source electrode)
Reference numeral 12 denotes a contact hole serving as a connection portion between the second conductive layer 8b and the second conductive layer 10b.
This is a connection plug for connecting

FIG. 7 is a plan view showing a configuration example of the first conductive layer of the reflective electrode side substrate of the reflective liquid crystal panel to which the present invention is applied. The first conductive layer 8c has irregularly arranged convex portions formed in regions other than wiring such as source / drain electrodes, and has convex portions formed in regions of wiring such as source / drain electrodes. Not formed. In the present embodiment, a circle is applied to the shape of the projection. The diameter of the hole is 0.5 to 5μ.
m is desirable, and may be any size or several sizes in this range. Further, the shape of the convex portion is not limited to the present embodiment. For example, a polygon such as a regular octagon may be applied.

In the above-described configuration, the source electrode 8a and the drain electrode 8b connected to the switching control circuit and the liquid crystal pixel driving circuit by the conductive layer and the irregular projections 8c are formed in regions other than the source / drain electrodes. At the same time, the second conductive layer 10a is formed on the source / drain electrodes 8a, 8b and the projection 8c via the second interlayer insulating films 9a, 9b, 9c.
10b, and a reflective electrode 13 is formed on the second conductive layer with a third interlayer insulating film 11 interposed therebetween. Therefore, it is possible to easily and reproducibly form a reflective electrode having optimal reflection characteristics without increasing the number of processes, and to provide an electro-optical device with improved display quality.

FIG. 2 is a sectional view of a second embodiment of the reflective electrode side substrate of the reflective liquid crystal panel to which the present invention is applied. .
In the present embodiment, the second conductive layer 10b and the reflective electrode 13 are directly connected without using a connection plug. This embodiment is very effective in simplifying the process.

FIG. 3 is a sectional view of a reflective electrode side substrate of a reflective liquid crystal panel according to a third embodiment of the present invention. In the present embodiment, the drain region (or source region) 6 b and the reflective electrode 13 are electrically connected by the connection plug 12. A high melting point metal such as tungsten was used for the connection plug.

At this time, as shown in FIG. 6, the second conductive layer 10a is formed over the entire pixel region excluding the periphery of the contact hole where the connection plug 12 is formed in each pixel, and further over the entire pixel region. Therefore, a light-shielding layer having a more suitable light-shielding function can be formed.

FIG. 4 is a sectional view of a reflective electrode side substrate of a reflective liquid crystal panel according to a fourth embodiment of the present invention. In FIG. 4, portions denoted by the same reference numerals as those in FIGS. 1, 2 and 3 indicate layers having the same functions as those in these drawings. In the present embodiment, the substrate 1 is a quartz or non-alkali glass substrate, and a monocrystalline, polycrystalline or amorphous silicon film (6
a and 6b), and an insulating film having a two-layer structure of, for example, a silicon dioxide film formed by thermal oxidation and silicon nitride deposited by a CVD method is formed on the silicon film. . The silicon film 6a and 6b regions are doped with N-type impurities (or P-type impurities) to form source / drain regions 6a and 6b of a TFT (Thin Film Transistor). , TFT
Gate electrode 5 is formed of polysilicon or metal silicide. A first interlayer insulating film 7 made of silicon dioxide is formed on gate electrode 5, and a first conductive layer made of a first aluminum layer or a tantalum layer is formed above first interlayer insulating film 7. 8a, 8
b, 8c are formed, and the first conductive layer 8a is
Is electrically connected to a source region (or a drain region) 6a through a contact hole formed in the semiconductor device to form a source electrode (or a drain electrode) of the FET. Also,
The first conductive layer 8b is electrically connected to a drain region (or a source region) 6b of the FET through a contact hole formed in the insulating film 7, and forms a drain electrode (or a source electrode). Source electrode (or drain electrode) 8a and drain electrode (or source electrode) 8b
In other areas, irregularly arranged projections 8c were formed. The diameter of the projection 8c is desirably 0.5 to 10 μm, and may be any size or several sizes in this range. Further, the shape of the projection 8c is not limited to the present embodiment. For example, a polygon such as a regular octagon may be applied.

The second interlayer insulating films 9a, 9 made of a silicon oxide film are provided above the first conductive layers 8a, 8b.
b, 9c are formed, and the second interlayer insulating films 9a, 9b, 9c are formed.
Is formed with a contact hole 9d. Above that, a second layer made of an aluminum layer or a tantalum layer
Of the conductive layers 10a and 10b were formed. The first conductive layer 8b and the second conductive layer 10b are the same as the first conductive layer 8b and the second conductive layer 10b.
The conductive layer 10b is electrically connected through a contact hole 9d. The second conductive layer 10a has a function of blocking light so that incident light does not enter the semiconductor layer side of the substrate and light leaks from the FET. In the present embodiment, the second conductive layer 10b is directly connected to the first conductive layer 8b through the contact hole 9d, but is connected using a connection plug made of a refractory metal such as tungsten. You may. A third interlayer insulating film 11 is formed above the second conductive layer 10b. The connection between the second conductive layer 10b formed simultaneously with the second conductive layer 10a and the reflective electrode 13 is performed by connecting a connection plug 12 made of a refractory metal such as tungsten to a contact hole opened in the third interlayer insulating film 11. Embedded by a CVD method or the like.

After the connection plug 12 is formed, the reflection electrode 1
In No. 3, aluminum formed of a third conductive layer was formed by a low-temperature sputtering method. By the above process, the reflective electrode 13 having a high reflectance of 90% or more was formed.

Although the figure shows a top gate type in which the gate electrode is located above the channel, a bottom gate type in which the gate electrode is formed first and a silicon film to be a channel is disposed above the gate insulating film. It may be.

(Description of Pixels of Liquid Crystal Panel of the Present Invention and Driving Circuit Thereof) FIG. 8 is a block diagram showing an example of pixels of the liquid crystal panel of the present invention and driving circuits thereof. FIG. 9 is a detailed circuit diagram of FIG.

In FIG. 8, the pixel area has a row scanning line 1
10-n (n is a natural number indicating a row of a row scanning line) and a column scanning line 112-m (m is a natural number indicating a column of a column scanning line) are arranged in a matrix, and each pixel is located at an intersection of the scanning lines. Is configured. In the pixel area, a column scanning line 11 is provided.
A column data line 115-d (d is a natural number indicating a column of the column data line) branched from the input data line 114 along 2-m is also arranged. A row scanning line driving circuit 111 is arranged in a peripheral area on the row side of the pixel area, and a column scanning line driving circuit 113 is arranged in a peripheral area on the column side of the pixel area.

The row scanning line driving circuit 111 is controlled by the row scanning line driving circuit control signal 120, and a selection signal is output to the selected row scanning line 110-n. Unselected row scanning lines are set to a non-selection potential. Similarly, the column scanning line driving circuit 11 is controlled by the column scanning line driving circuit control signal 121.
3 is controlled, a selection signal is output to the selected column scanning line 112-m, and an unselected column scanning line is set to a non-selection potential. Which row scanning line and which column scanning line to select is determined by the control signals 120 and 121. That is, the control signals 120 and 121 are address signals that specify the selected pixel.

The switching control circuit 109 arranged near the intersection of the selected row scanning line 110-n and the selected column scanning line 112-m receives the selection signal of both scanning lines and outputs an ON signal. Row scanning line 110-n and column scanning line 11
When at least one of 2-m is not selected, an off signal is output. That is, only the switching control circuit 109 of the pixel located at the intersection of the selected row scanning line and column scanning line outputs an ON signal, and the other switching control circuits output OFF signals. In the present embodiment, the liquid crystal pixel drive circuit 101 is controlled by the ON / OFF signal of the switching control circuit 109.

Next, the configuration and operation of the liquid crystal pixel drive circuit 101 will be described.

The switching circuit 102 is turned on by the ON signal of the switching control circuit 109, and is turned off by the OFF signal. When the switching circuit 102 is turned on, the column data line 1 connected thereto is turned on.
The 15-d data signal is written to the memory circuit 103 via the switching circuit 102. On the other hand, the switching circuit 102 is turned off by the off signal of the switching control circuit 109 and holds the data signal written in the memory circuit 103.

The data signal held in the memory circuit 103 is supplied to a liquid crystal pixel driver 104 arranged for each pixel. The liquid crystal pixel driver 104 supplies the first voltage 116 supplied to the first voltage signal line 118 or the second voltage 117 supplied to the second voltage signal line 119 according to the level of the supplied data signal. One of the liquid crystal pixels 10
5 to the pixel electrode 106. The first voltage 116 is
When the liquid crystal panel performs normally white display, it is a voltage that causes the liquid crystal pixel 105 to be in a black display state, while the second voltage 117 is a voltage that causes the liquid crystal pixel 105 to be in a white display state.

When the data signal held in the memory circuit 103 is at the H level, in the liquid crystal pixel driver 104, the gate connected to the first voltage signal line 118 for displaying the liquid crystal in black in the case of normally white display is turned on. In this state, the first voltage 116 is supplied to the pixel electrode 106, and the liquid crystal pixel 105 enters a black display state due to a potential difference from the reference voltage 122 supplied to the counter electrode 108. Similarly, when the held data signal is at the L level, the gate of the liquid crystal pixel driver 104 connected to the second voltage signal line 119 is turned on, and the second voltage 117 is supplied to the pixel electrode 106, and the liquid crystal is supplied. The pixel 105 enters a white display state.

With the above configuration, the power supply voltage, the first and second
When the voltage signal and the reference voltage can be driven at about the logic voltage, and the screen display does not need to be rewritten, the display state can be held by the data holding function of the memory circuit, so that little current flows.

The liquid crystal pixel 105 has a pixel electrode to which either one of the first voltage 116 and the second voltage 117 output from the liquid crystal pixel driver 104 is selected and supplied according to the held data signal. 106 is provided for each pixel, a potential difference between the two electrodes is applied to a liquid crystal layer 107 interposed between the pixel electrode 106 and the counter electrode 108, and a black display state is set according to a change in alignment of liquid crystal molecules according to the potential difference. (Also called an ON display state) and a white display state (also called an OFF display state). As described above, the liquid crystal panel encloses and sandwiches liquid crystal between a semiconductor substrate and a light-transmitting substrate such as glass, and arranges pixel electrodes in a matrix on the semiconductor substrate. The liquid crystal pixel drive circuit,
A row scanning line, a column scanning line, a data line, a row scanning line driving circuit, a column scanning line driving circuit, and the like are formed. Each pixel has a pixel electrode 1
06 and the opposing electrode 108 formed on the inner surface of the opposing light-transmitting substrate, a voltage is applied to each pixel, and a voltage is supplied to the liquid crystal layer 107 of each pixel interposed therebetween to supply the voltage of the liquid crystal molecules. The orientation is changed for each pixel.

As shown in FIG. 9, in this embodiment, the switching control circuit 109 can be constituted by a logic circuit of a NOR gate circuit 109-1 having a CMOS transistor configuration and an inverter 109-2 having a CMOS transistor configuration. . The NOR gate circuit 109-1 outputs a positive logic ON signal when both inputs have a negative logic selection signal, and outputs a negative logic ON signal by the inverter 109-2. Also, the switching circuit 102
Can be constituted by a transmission gate 102-1 having a CMOS transistor structure. The transmission gate 102-1 has a switching control circuit 10
9 to turn on the column data line 115 and the memory circuit 103, and turn off based on the OFF signal. The memory circuit 103 can have a configuration in which a clocked inverter 103-1 having a CMOS transistor configuration and an inverter 103-2 having a CMOS transistor configuration are connected in a feedback manner. The data signal is supplied to the switching control circuit 10
6 is taken into the memory circuit 103 from the switching circuit 102 by the ON signal of 6, and inverted by the inverter 103-2, and the output is fed back by the clocked inverter 103-1 operated by the OFF signal of the switching control circuit 106 to hold the data signal. I do. LCD pixel driver 1
04 can be constituted by transmission gates 104-1 and 104-2 having two CMOS transistors. When the data signal held in the memory circuit 103 is at the H level, the transmission gate 104-1 connected to the first voltage signal line 118 that causes the liquid crystal to display black in the case of normally white display in the liquid crystal pixel driver 104. It becomes conductive and the pixel electrode 106
The first voltage 116 is supplied to the liquid crystal pixel 105 by a potential difference from the reference voltage 122 supplied to the counter electrode 108.
Becomes a black display state. Similarly, when the held data signal is at the L level, the transmission gate 104-2 connected to the second voltage signal line 119 is turned on, the second voltage 117 is supplied to the pixel electrode 106, and the liquid crystal pixel 105 becomes a white display state.

(Explanation of Structure of Liquid Crystal Panel of the Present Invention) FIG.
Reference numeral 0 denotes a plan view of the entire liquid crystal panel substrate (reflective electrode side substrate) 1 to which the first and second embodiments are applied.

As shown in FIG. 10, in this embodiment, a light-shielding film 25 for preventing light from entering a peripheral circuit provided on the peripheral portion of the substrate is provided. A circuit for driving a pixel is provided around the pixel region 20 in which the pixel electrodes are arranged in a matrix and in the pixel region, and supplies a column scanning line driving circuit 21 and a row scanning line for supplying a column scanning signal to the column scanning line 8a. A row scanning line driving circuit 23 that supplies a row scanning signal to the scanning line 5, an input data line 22 that takes in input data from the outside via a pad area 26, and these circuits serve as switching elements of a switching control circuit 109 and a switching circuit 102. , And a memory circuit 103 and a liquid crystal pixel driver 104. Reference numeral 36 denotes a formation region of a sealant for bonding and fixing the glass substrate to the glass substrate.

In this embodiment, the light shielding film 2
Reference numeral 5 denotes a third conductive layer formed in the same step as the reflective electrode 13 shown in FIG. 1, and is configured to apply a predetermined potential such as an LC common electrode potential. Reference numeral 26 denotes a pad region in which pads or terminals used to supply a power supply voltage are formed.

FIG. 11 shows a sectional structure of a reflection type liquid crystal panel to which the liquid crystal panel substrate 1 is applied. Figures 10 and 1
As shown in FIG. 1, the liquid crystal panel substrate 31 (1) has a substrate 32 made of glass or ceramic on its back surface.
Are bonded by an adhesive. At the same time, a counter electrode (also referred to as a common electrode) 33 made of a transparent conductive film (ITO) to which an LC common electrode potential is applied is provided on the surface side.
A known TN (Twis) is disposed in a gap which is disposed at an appropriate interval on the incident side and has a periphery and is adhered by a seal material 36 formed in the seal material forming area 36 of FIG.
A liquid crystal panel 30 is formed by filling a ted nematic liquid crystal or an SH (super homeotropic) liquid crystal 37 in which liquid crystal molecules are substantially vertically aligned in a state where no voltage is applied. The position where the sealing material is provided is set so that a signal is input from the outside or the pad area 26 is located outside the sealing material 36.

The light shielding film 25 on the peripheral circuit is configured to face the counter electrode 33 with the liquid crystal 37 interposed. When the LC common electrode potential is applied to the light-shielding film 25, the LC common electrode potential is applied to the counter electrode 33, so that no DC voltage is applied to the liquid crystal interposed therebetween. Therefore, in the case of a TN type liquid crystal, the liquid crystal molecules are almost 9
The liquid crystal molecules are kept twisted by 0 °, and in the case of SH type liquid crystal, the liquid crystal molecules are always kept in a vertically aligned state.

In this embodiment, the strength of the liquid crystal panel substrate 31 made of a semiconductor substrate is significantly increased because a substrate made of glass, ceramic, or the like is bonded to the back surface thereof with an adhesive. As a result, if the substrate 32 is bonded to the liquid crystal panel substrate 31 and then bonded to the counter substrate, there is an advantage that the gap of the liquid crystal layer becomes uniform over the entire panel.

(Description of Electronic Apparatus Using Liquid Crystal Panel of the Present Invention) Next, an example of an electronic apparatus using the reflective liquid crystal panel of the present invention as a display device will be described.

FIG. 12A is a perspective view showing a mobile phone. 1000 denotes a mobile phone body, of which 100
Reference numeral 1 denotes a liquid crystal display unit using the reflection type liquid crystal panel of the present invention.

FIG. 12B is a diagram showing a wristwatch-type electronic device. 1100 is a perspective view showing the watch main body. 1
Reference numeral 101 denotes a liquid crystal display unit using the reflection type liquid crystal panel of the present invention. Since this liquid crystal panel has higher definition pixels than a conventional clock display unit, it can also display television images, and can realize a wristwatch type television.

FIG. 12C shows a portable information processing apparatus such as a word processor or a personal computer. 1200 denotes an information processing device, 1202 denotes an input unit such as a keyboard,
Reference numeral 06 denotes a display unit using the reflective liquid crystal panel of the present invention.
Reference numeral 04 denotes an information processing apparatus main body. Since each electronic device is a battery-driven electronic device, the use of a reflective liquid crystal panel without a light source lamp can extend the battery life. Further, since the peripheral circuit can be built in the panel substrate as in the present invention, the number of components can be greatly reduced, and the weight and size can be further reduced.

In the above embodiment, the liquid crystal device has been described as an example. However, the present invention is not limited to this, and the present invention can be applied to an electro-optical device such as electroluminescence.

[0058]

As described above, in the electro-optical device substrate according to the present invention, the light-shielding layer is formed below the reflective electrode via one insulating film, and the other insulating film is formed below the light-shielding layer. A conductive layer is formed through the conductive layer, and the conductive layer is formed as a wiring such as a source / drain electrode in a region constituting the switching control circuit and the liquid crystal pixel driving circuit, and other than the wiring such as the source / drain electrode. In the region, irregularly arranged convex portions are formed. For this reason, by using the substrate for an electro-optical device of the present invention, it is possible to easily and with good reproducibility to create a reflective electrode having optimal reflection characteristics, and to provide a reflective electro-optical device with improved display quality. be able to.

[Brief description of the drawings]

FIG. 1 is a sectional view of a first embodiment of a reflective electrode side substrate of a reflective liquid crystal panel to which the present invention is applied.

FIG. 2 is a sectional view of a reflective electrode side substrate of a reflective liquid crystal panel according to a second embodiment of the present invention.

FIG. 3 is a sectional view of a reflective electrode side substrate of a reflective liquid crystal panel according to a third embodiment of the present invention;

FIG. 4 is a sectional view of a reflective electrode side substrate of a reflective liquid crystal panel according to a fourth embodiment of the present invention;

FIG. 5 is a plan view showing first, second and fourth embodiments of a reflective electrode side substrate of a reflective liquid crystal panel to which the present invention is applied.

FIG. 6 is a plan view illustrating a reflective electrode side substrate of a reflective liquid crystal panel according to a third embodiment of the present invention.

FIG. 7 is a plan view showing a configuration example of a first conductive layer of a reflective electrode side substrate of a reflective liquid crystal panel to which the present invention is applied.

FIG. 8 is a block diagram illustrating an example of a pixel of a liquid crystal panel, a driving circuit thereof, and the like.

FIG. 9 is a detailed circuit diagram of FIG. 8;

FIG. 10 is a plan view showing a layout configuration example of a reflective electrode substrate of the reflective liquid crystal panel of the embodiment.

FIG. 11 is a cross-sectional view illustrating an example of a reflective liquid crystal panel to which the liquid crystal panel substrate of the embodiment is applied.

12A is an external view of a mobile phone using the reflective liquid crystal panel of the embodiment, FIG. 12B is an external view of a wristwatch type television, and FIG.

[Explanation of symbols]

Reference Signs List 1 substrate 2 well region 3 field oxide film 5 gate electrode 6a, 6b source / drain region 7 first interlayer insulating film 8a, 8b first conductive layer (source / drain electrode) 8c first conductive layer (convex portion) 9a , 9b, 9c Second interlayer insulating film 9d Contact hole 10a, 10b Second conductive layer 11 Third interlayer insulating film 12 Connection plug 13 Third conductive layer (reflective electrode) 20 Pixel region 21 Column scanning line drive circuit 22 Input Data line 23 Row scan line drive circuit 25 Light-shielding film (third conductive layer) 26 Pad area 31 Liquid crystal panel substrate 32 Substrate 33 Counter electrode 35 Glass substrate on incident side 36 Seal material 37 Liquid crystal 101 Liquid crystal pixel drive circuit 102 Switching circuit 103 Memory circuit 104 Liquid crystal pixel driver 105 Liquid crystal pixel 106 Pixel electrode 107 Liquid crystal layer 108 Counter electrode Pole 109 Switching control circuit 110 Row scanning line 111 Row scanning line driving circuit 112 Column scanning line 113 Column scanning line driving circuit 114 Input data line 115 Column data line 116 First voltage 117 Second voltage 118 First voltage signal line 119 second voltage signal line 120 control signal for row scanning line driving circuit 121 control signal for column scanning line driving circuit 122 reference voltage 1000 mobile phone 1001 liquid crystal display unit using reflection type liquid crystal panel of the present invention 1100 clock 1101 present invention Liquid crystal display unit using reflective liquid crystal panel 1200 Information processing device 1202 Input unit such as keyboard 1204 Information processing device 1206 Display unit using reflective liquid crystal panel of the present invention

Continued on the front page F-term (reference) 2H090 HA03 HA04 HA06 HB03X HC09 HC12 HD03 HD05 JB04 KA05 LA04 2H091 FA14Y FA34Z FB08 FC02 GA01 GA02 GA07 GA13 HA07 KA03 LA19 2H092 JA24 JA26 JA36 JB56 KA05 KA16 KA19 MA07 MA07 PA12 PA13 QA07 5C094 AA02 AA11 AA12 AA22 AA43 AA46 AA55 BA03 BA43 CA19 DA13 EA06 EA10 EB02 EB05 ED11 ED13 ED15 FA01 GB10

Claims (10)

[Claims] A plurality of column scanning lines and a plurality of row scanning lines intersecting with the column scanning lines are arranged on a substrate, and a reflection electrode serving as a pixel electrode at each intersection of the plurality of column scanning lines and row scanning lines. And an electro-optical device substrate provided with a switching control circuit and a liquid crystal pixel driving circuit for each pixel electrode, wherein a light-shielding layer is disposed below the reflective electrode via one insulating film, A conductive layer is disposed below the layer with the other insulating film interposed therebetween, and the conductive layer is provided to the switching control circuit and the liquid crystal pixel driving circuit in a region forming the switching control circuit and the liquid crystal pixel driving circuit. A substrate for an electro-optical device, comprising a connected wiring, and having irregularly arranged projections in a region other than the wiring. 2. The substrate for an electro-optical device according to claim 1, wherein the substrate comprises a semiconductor substrate. 3. The substrate for an electro-optical device according to claim 2, wherein the substrate is formed of single crystal silicon. 4. The substrate for an electro-optical device according to claim 1, wherein the substrate comprises a transparent substrate. 5. The substrate for an electro-optical device according to claim 4, wherein the substrate is formed of glass. 6. The other insulating film according to claim 1, wherein
A substrate for an electro-optical device, comprising a G film. 7. A substrate for an electro-optical device, wherein the SOG film according to claim 6 is etched back. 8. A substrate for an electro-optical device according to claim 1, and a transparent substrate on an incident side are arranged with a gap, and the substrate for an electro-optical device and the transparent substrate are arranged. The liquid crystal is sandwiched in a gap between the electro-optical device and the electro-optical device. 9. An electronic apparatus using the electro-optical device according to claim 8. 10. A plurality of column scanning lines and a plurality of row scanning lines intersecting the column scanning lines are arranged on a substrate, and a reflection electrode serving as a pixel electrode at each intersection of the plurality of column scanning lines and the row scanning lines. Wherein each pixel electrode is provided with a switching control circuit and a liquid crystal pixel driving circuit, the wiring being connected to the switching control circuit and the liquid crystal pixel driving circuit by a conductive layer, and the wiring Simultaneously forming irregular protrusions simultaneously with the other region; forming a light-shielding film on the conductive layer via the other insulating film; and forming one light-shielding film on the light-shielding film via one insulating film. Forming the reflective electrode.