JP2000094564A - Base with highly functional coat formed and method for forming the base - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the wear resistance, corrosion resistance and sliding characteristic of a base with a cleaning action by forming a coat having the cleaning action due to a photocatalytic reaction on one main face of a base material and forming a hard coat on the main face of the other side. SOLUTION: On the main face A of one of the sides of a matrix, a coat having a cleaning performance due to a photocatalytic reaction which contains either one of a titanium oxide, a cadmium sulfide, a zinc sulfide, niobium and a ferric oxide is formed. A hard carbon coat is formed on the main face B of the other side and the carbon is gradiently functionalized in the coat so that it is reduced toward the surface side of the coat from the base material side. In addition, an intermediate layer is formed between the coat formed on the main face A of one of the sides of the base material and the base material, or between the hard carbon coat formed on the main face B of the other side of the base material and the base material. The intermediate layer is Si, Ti, Zr, Ge, Ru, Mo, W or a mixture thereof, or an oxide, a nitride or a carbide thereof, or a hard carbon-coat.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate requiring cleaning action and high hardness, such as a shaver blade (inner blade and outer blade), an air conditioner, an air purifier, and various products having the function of air cleaning. The present invention relates to a high-functional film-forming base comprising a sliding member of various products having a function of cleaning (antibacterial), and a method of forming the base.

[0002]

2. Description of the Related Art In recent years, for example, in an electric shaver, a technique of surface modification of a blade has been adopted, and a ZrN or high-hardness film is formed on a base material surface of a shaver outer blade. Improvements have been made in order to improve the quality, and the technology is disclosed in JP-A-7-62561 (Int6: C23).
C 26/00).

On the other hand, the electric shaver is a product to be considered in terms of hygiene since the outer blade directly touches the skin of a human face. From such a viewpoint, an antibacterial material has recently attracted attention.
No. 0 (Int6: C23C 14/08).

[0004]

However, at present, a substrate having both high hardness and cleaning properties, particularly a shaver equipped with a blade, has not been developed so far.

Accordingly, an object of the present invention is to provide a substrate which is excellent in abrasion resistance, corrosion resistance and sliding properties and has a cleaning action.

[0006]

The high-functional film-forming substrate of the present invention comprises a base material having a film having a cleaning action by a photocatalytic reaction formed on one main surface and a hard film formed on the other main surface. It is characterized by being.

[0007] The hard coating is a hard carbon coating.

[0008] It is characterized in that a coating in which carbon is mixed with a material having a cleaning action by a photocatalytic reaction is formed on one main surface of a base material, and a hard carbon coating is formed on the other main surface.

[0009] The carbon is characterized in that it functions as a gradient in the coating.

[0010] The carbon is reduced from the base material side toward the coating surface side.

[0011] A coating containing any one of titanium oxide, cadmium sulfide, zinc sulfide, niobium, and ferric oxide having a cleaning action by a photocatalytic reaction is formed on one main surface of the base material. And

An intermediate layer is formed between the coating formed on one main surface of the base material and the base material or between the hard carbon coating formed on the other main surface of the base material and the base material. Is formed.

The intermediate layer is Si, Ti, Zr, Ge, Ru, Mo, W, or a mixture thereof, or an oxide, nitride, or carbide of a simple substance or a mixture thereof, or a hard carbon coating. It is characterized by the following.

[0014] At least one kind of atoms among the coating atoms formed on the intermediate layer is mixed into the intermediate layer,
The atoms are functionally graded in the intermediate layer.

At least one kind of atoms among the coating atoms formed on the intermediate layer is mixed into the intermediate layer,
The number of atoms increases from the intermediate layer side to the coating side.

The base material is characterized by being a Ni, Al, Fe, stainless steel alloy or a ceramic containing the elements Ti, Zr, Al, Si, Cr, Hf, Ge.

The base is an outer blade of an electric shaver.

[0018] The hard coating is a ceramic coating.

The ceramic film is a compound of a metal or a semiconductor material and at least one element of nitrogen, oxygen and carbon.

[0020] At least one element of nitrogen, oxygen and carbon contained in the ceramic coating is functionally graded.

The ceramic film is formed by irradiating a metal or a semiconductor material with molecules, atoms, ions or radicals of a gas containing at least one of nitrogen, oxygen and carbon. .

The ceramic coating is made of Zr, Ti, Al, Cr, H
f, a compound of Si, Ge, Fe, B, Mg, Ta, W and at least one element of nitrogen, oxygen and carbon.

Further, according to the method of forming a high-functional film-forming substrate of the present invention, a film having a cleaning action by a photocatalytic reaction is formed on one main surface of a base material, and a ceramic film is formed on the other main surface. The ceramic film is formed by irradiating a metal or a semiconductor material with molecules, atoms, ions, or radicals of a gas containing at least one of nitrogen, oxygen, and carbon.

The first ceramic film is formed by irradiating a metal or semiconductor material and molecules, atoms, ions or radicals of a gas containing at least one of nitrogen, oxygen and carbon to form a first film layer. And a second step of forming a second coating layer by supplying a metal or a semiconductor material and molecules or atoms of a gas containing at least one of nitrogen, oxygen, and carbon following the first step. It is characterized by consisting of.

The ceramic film is a compound of a metal or a semiconductor material and at least one element of nitrogen, oxygen and carbon.

[0026] At least one element of nitrogen, oxygen and carbon contained in the ceramic coating is functionally graded.

[0027]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS.

The hard carbon film in the embodiment of the present invention may be any of a diamond film, a mixed film of a diamond structure and an amorphous carbon structure, or an amorphous carbon film.

The intermediate layer is made of Si, Ti, Zr, Ge,
Ru, Mo, W or their oxides, their nitrides, or their carbides are applicable.

FIG. 1 is a schematic sectional view showing an example of an ECR plasma CVD apparatus capable of forming a hard carbon film in the present invention.

Referring to FIG. 1, inside a vacuum chamber 8, a plasma generating chamber 4 and a reaction chamber in which a substrate holder 9 is installed are provided. One end of the waveguide 2 is attached to the plasma generation chamber 4, and the other end of the waveguide 2 is
Microwave supply means 1 is provided.

The microwave generated by the microwave supply means 1 is guided to the plasma generation chamber 4 through the waveguide 2 and the microwave introduction window 3. The plasma generation chamber 4 is provided with a discharge gas introduction pipe 5 for introducing a discharge gas such as an argon (Ar) gas into the plasma generation chamber 4.
A plasma magnetic field generator 6 is provided around the plasma generation chamber 4.

In the reaction chamber in the vacuum chamber 8, a drum-shaped holder 9 is installed so as to be rotatable around a rotation axis perpendicular to the plane of FIG. Motor is connected.

On the outer peripheral surface of the holder 9, a plurality of (24 in this embodiment) shaver blade bases are mounted at equal intervals. The holder 9 is connected to a high frequency power supply (not shown).

Around the holder 9, a metal cylindrical shield cover (not shown) is provided at a distance of about 5 mm from the holder 9. The shield cover is connected to a ground electrode, and when the coating is formed, the shield cover is connected between the vacuum chamber 8 and the holder 9 other than the coating formation location by a high frequency (RF) voltage applied to the holder 9. It is provided in order to prevent the occurrence of an inter-discharge.

An opening is formed in the shield cover. Through this opening, the plasma drawn from the plasma generation chamber 4 is radiated to the base mounted on the holder 9. A reaction gas introduction pipe 10 is provided in the vacuum chamber 8. The tip of the reaction gas introduction pipe 10 is located diagonally above the opening of the shield cover. <Example 1> Fig. 2 shows the structure of an example of the substrate of the present invention. Fig. 2 (a) shows a structure in which titanium oxide is formed on one main surface (A) of a base material. This is an example of a substrate in which a hard carbon coating is formed after forming an Si intermediate layer on another main surface (B) opposite to the surface.

A hard carbon coating as shown in FIG. 2A is formed on a shaver outer blade (Ni electroformed) by using the above-described coating forming apparatus, and the hard carbon coating is formed on the outer surface of the shaver outer blade. An example in which titanium oxide is formed on the main surface on the side will be specifically described below.

First, an embodiment in which an intermediate layer is formed on the back surface of the outer shaver blade, and then a hard carbon film is formed will be described.

First, the inside of the vacuum chamber 8 is set to 10 ^-5 to 10
The air is exhausted to ^-7 Torr, and the holder 9 is rotated at a speed of about 10 rpm.

The intermediate layer is formed by placing a Si target on the target 7, applying high frequency power between the holder 9 and the target 7, and sputtering the target 7 by collision of ions in the plasma.
m.

Next, while supplying Ar gas at 5.7 × 10 ⁻⁴ Torr from the discharge gas introducing pipe 5 and supplying microwaves of 2.45 GHz and 100 W from the microwave supply means 1, the plasma generation chamber was supplied. The Ar plasma formed in 4 is radiated to the surface of the outer shaver blade.

[0042] At the same time, CH ₄ from the reaction gas tubes 10
While supplying the gas at 1.3 × 10 ⁻³ Torr, RF power of 13.56 MHz is applied to the holder 9 from a high frequency power supply.

By the above steps, the shaver outer blade is
A hard carbon film having a thickness of 210 nm was formed.

Further, the shaver outer blade was set upside down on the holder 9 and titanium oxide was formed on the outer shaver blade by magnetron sputtering. At this time, the target 7 was changed from Si to Ti, and 1.0 × 10 ⁻³ Torr of oxygen was introduced into the chamber to form titanium oxide.

The titanium oxide has a hardness of 1,000.
Vickers was found to be a film having excellent protection properties. Further, it was also found that the film was transparent, and various color tones could be changed by changing the film thickness and utilizing light interference.

By the way, it has been found that titanium oxide has a cleaning (antibacterial) action by photocatalysis. Titanium oxide has a band gap of 3.2 e.
V, and is excited by ultraviolet light having a wavelength of 380 nm or less, and an electron-hole pair is generated inside. The reaction between the adsorbed substance and the electrons and the reaction due to the holes occur on the surface of the titanium oxide, and the titanium oxide is excellent in a so-called photocatalytic reaction in which the adsorbed substance is decomposed by the strong oxidizing power of the holes.

Therefore, the substrate on which titanium oxide is formed is already a substrate having a cleaning (antibacterial) action. For example, in an application such as a shaver, it is considered that the photocatalytic effect and the cleaning effect play a large role.

The formation of the titanium oxide is described below.
In the above embodiment, the oxygen partial pressure was set to 1.0 × 10 ⁻³ Torr.
However, when the partial pressure is increased, the structure of the titanium oxide becomes sparser, the surface area can be increased, and the reactivity can be increased.

As for the material of the intermediate layer, the same effect as that of Si can be obtained by replacing the target material from Si with Ti, Zr, Ge, Ru, Mo or W.

Further, by introducing a gas containing nitrogen, oxygen and carbon, it is possible to convert them into nitrides, oxides and carbides.

One object of the present invention is to provide a substrate having excellent sliding characteristics with respect to the substrate having such a cleaning (antibacterial) action.

Therefore, the hardness of the back surface of the substrate on which the hard carbon film was formed was measured, and as a result, the hardness of the back surface of the substrate was about 3,000 Vickers, which was lower than that of the substrate having no hard carbon film formed. It was found that about six times higher hardness was realized.

Further, an indentation test using a Vickers indenter
(1 kg), no peeling was observed, and it was confirmed that the adhesiveness was excellent.

Further, a sliding test using alumina balls was performed on a substrate having a hard carbon film formed thereon and a substrate having no hard carbon film formed thereon. No scratches etc. are seen on the surface even at the time of sliding, but wear marks are seen on the uncoated substrate, and the wear resistance is clearly improved by forming a hard carbon coating. I understood.

Further, instead of the above-mentioned shaver outer blade, S
A hard carbon-based film having a thickness of 250 nm was formed using an i-substrate, and an abrasion test using alumina balls (load: 200
g) was performed, and the wear characteristics were evaluated based on the wear depth. FIG. 3 shows the results.

At this time, a hard carbon coating was formed by changing the substrate bias voltage applied to the substrate from 0 to -150 V.

When no bias voltage was applied, the underlying Si was exposed due to the abrasion of the hard carbon film.
When a bias voltage is applied, the wear depth is several tens of nm.
The following shows that the wear characteristics have been dramatically improved.

As described above, according to the present invention, it is found that a substrate having antibacterial properties on the surface and excellent abrasion resistance on the backside can be realized.

In addition, even if a film containing any of cadmium sulfide, zinc sulfide, niobium, and ferric oxide other than titanium oxide having a cleaning (antibacterial) action is formed, the same effect as titanium oxide is obtained. It is thought to play. <Example 2> Next, FIG. 2 shows an example of forming a base in which carbon is added to titanium oxide so that the surface has higher hardness.
(B). FIG. 2 (b) shows that a titanium oxide to which carbon atoms are added is formed on one main surface (A) of a base material, and a Si intermediate layer is formed on another main surface (B) opposite to the one main surface. After forming
It is an example of a substrate on which a hard carbon coating is formed.

At this time, by reducing the flow rate of, for example, methane gas (CH ₄ ) during the process, a substrate having a functionally graded structure in which the carbon in the titanium oxide is reduced from the base material side toward the coating surface side is produced. It is possible to do.

The formation of the hard carbon film on the back surface of the base material is the same as in the first embodiment. With respect to the surface of the base material, the shaver outer blade was placed on the holder with the front and back reversed, and 5.7 × 10 ⁻⁴ T Ar gas was supplied from the discharge gas introduction pipe 5.
While supplying at orr, the microwave supply means 1 supplies a microwave of 2.45 GHz and 100 W to radiate the Ar plasma formed in the plasma generation chamber 4 to the surface of the outer shaver blade.

At the same time, CH _{4 is} supplied from the reaction gas pipe 10.
1.3 × 10 ⁻³ Torr of gas and 1.0 × 10 ^{−3 of} oxygen
13.56 MHZ from high frequency power supply while supplying Torr
z RF power is applied to the holder 9. At the same time, Ti is sputtered by magnetron sputtering to supply Ti onto the substrate.

Through the above steps, a carbon-containing titanium oxide film was formed on the outer surface of the shaver. At this time, as the process proceeds, the supplied CH ₄ gas is reduced, and from the base material side toward the coating surface side,
It is possible to form a so-called gradient-functionalized coating having a reduced carbon concentration. <Example 3> In Example 3, the formation of carbon-containing titanium oxide and a hard carbon film on a shaver outer blade having an opening for introducing a beard as a substrate will be described with reference to FIG. FIG. 4 shows an example of attaching a shaver outer blade to a base holder.

The shaver outer blade 20 has an opening 21 for introducing a beard. Using this opening, the hard carbon film is first formed on the surface 23 opposite to the titanium oxide forming surface 22. At this time, the base holder 24 and the shaver outer blade 20 are floated in advance, and the titanium oxide Carbon is also wrapped around the formation surface.

Thereafter, when titanium oxide is formed at a substrate bias voltage of −100 V by magnetron sputtering,
The ion of i has kinetic energy, and a layer in which carbon is mixed with titanium oxide is formed.

As a result, since the outermost surface is made of only titanium oxide, the cleaning (antibacterial) action is not lost, and the inclusion of carbon makes it possible to form a film having a higher hardness than a film made of titanium oxide alone. In this respect, it is also possible to produce a substrate having excellent protection characteristics.

It has been confirmed that the hard carbon film on the opposite side of the substrate has the same characteristics as described above.

When an opening exists in such a base material, not only the surface of the titanium oxide but also the back surface of the base material (the surface opposite to the surface on which the titanium oxide is formed) is passed through the opening.
Therefore, since the light is incident on the titanium oxide, the photocatalytic effect and the cleaning effect are further enhanced.

Further, the formation of a hard carbon film or the formation of a titanium oxide film on the inner blade can be performed in the same manner as described above.
Further, it has been confirmed that an opening portion is provided in the inner blade, and the same effect exists. Fourth Embodiment In a fourth embodiment, a method for forming a zirconium nitride (ZrN) film on a surface opposite to the surface on which titanium oxide is formed in the first and second embodiments will be described with reference to the drawings.

FIG. 5 shows a vacuum chamber and an ion implantation apparatus for forming a zirconium nitride film. Reference numeral 11 denotes a vacuum chamber evacuated to 10 ^-5 to 10 ^-7 Torr, and 1
Reference numeral 2 denotes a holder which is arranged in the vacuum chamber 11 and is rotatable at a speed of 10 to 20 rpm in the direction of the arrow in FIG. 5, 13 is a shaver outer blade, 14 is an electron beam for evaporating zirconium (Zr) atoms, Shaver outer blade 1
An evaporation source radiating toward 3, 15 is a shaver outer blade 13.
Is an assist ion gun that can either emit nitrogen ions (N ions) in the direction of, or supply nitrogen gas (N ₂ ).

Next, the shaver outer blade 1
A method for forming a ZrN film on the surface of No. 3 will be described.

First, the inside of the vacuum chamber 11 is set to 10 ⁻⁵ to 10
^After exhausting to ^-7 Torr, N ₂ gas is supplied to the assist ion gun 15 to extract N ions and irradiate them to the surface of the outer shaver blade 13. At this time, the acceleration voltage of N ions was set to 700 eV, and the ion current density was set to 0.38 mA / cm ² .

On the other hand, the evaporation source 14
Is driven to evaporate Zr atoms and radiate them to the surface of the shaver outer blade 13. At this time, the evaporation rate of Zr was set to 650 ° / min. In terms of the film formation rate on the shaver outer blade 13.

The above process is performed for about 30 seconds to about 1 minute, and the surface of the shaver outer blade 13 is coated with a Zr film having a thickness of 250-500 °.
A first coating layer of N was formed.

Next, the irradiation of N ions is stopped, and N ₂ gas not ionized by the ion gun 15 is removed from the chamber 11.
ZrN atoms were emitted from the evaporation source 14 toward the surface of the first coating layer on the shaver outer blade 13 in this N ₂ atmosphere. At this time, the evaporation rate of Zr was set to 650 ° / min. In terms of the deposition rate on the surface of the first coating layer.

The above process is performed for about 4 minutes to 4 minutes and 30 seconds, and the thickness of the first coating layer of ZrN is set to 2650 ° to 290 °.
A second coating layer of ZrN having 0 ° was formed. As a result of the above steps, the thickness of the
A 400 ° ZrN coating will be formed.

The hardness of the ZrN film was 1600 Vickers, and the indentation test (1 k
g) shows no peeling, and it is confirmed that the adhesiveness is excellent. A sliding test was performed in the same manner as the hard carbon coating. It was confirmed that there was no change in the state of the surface even after 3,000 slides under a load of 10 g, and the life was greatly improved.

In this embodiment, the method for forming a film is described from two steps. However, the formation of ZrN is not necessarily limited to this method. It has been confirmed that even by the method of irradiating with no pressure, no peeling was observed in the indentation test (1 kg) using a Vickers indenter, and the adhesion was excellent. <Example 5> Zr deposition and N ion irradiation were simultaneously performed to
When forming the rN coating, the deposition rate of Zr was set to 650 ° / min. in terms of the deposition rate on the outer shaver blade 13, and the acceleration voltage of N ions was set to 700 eV. However, the ion current density was initially 0.6 mA / cm ^2, and was constant at 0.38 mA / cm ² for 2 minutes, and a ZrN film of about 3150 ° was formed by a total of 5 minutes of the process.

The nitrogen content of the ZrN film thus formed was measured by SIMS. As a result, it was found that the nitrogen content decreased from the base material toward the surface of the ZrN film, and then became constant.

As a result of performing an adhesion test and a sliding test, it was found that this film was excellent.

Further, it has been confirmed by experiments that the same high hardness ZrN film can be formed not only by using ions but also by using N radicals.

Further, in this embodiment, the ZrN film was described. However, in addition to Zr, ceramics, Ti, Hf, Cr, Fe, B, Al, Si, Ge, Mg, Ta, It has been confirmed that a nitride, oxide, or carbide of W also exerts the same effect as that of the ZrN film.

Also, in this case, when an opening is present in the base material, light can be incident from both sides similarly to the case of the carbon-based film, and the photocatalytic effect and the cleaning effect can be enhanced.

The present embodiment can be applied not only to the outer blade but also to the inner blade as long as it is a shaver. Further, sliding members such as a compressor, a printing mask, a squeegee, a thin-film magnetic head, and the like can be used. The present invention can be applied to batteries and semiconductor devices.

[0085]

As is apparent from the above description, according to the present invention, it is possible to provide a substrate which is excellent in abrasion resistance, corrosion resistance and sliding characteristics and has a cleaning action.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing an example of an ECR plasma CVD apparatus capable of forming a hard carbon film.

FIG. 2 (a) shows a hard carbon film after titanium oxide is formed on one main surface of a base material and a Si intermediate layer is formed on another main surface (opposite the one main surface). FIG. 2B shows a substrate on which titanium oxide to which carbon atoms are added is formed on one main surface of a base material and Si is formed on another main surface (opposite the one main surface). 1 shows a substrate on which a hard carbon coating is formed after forming an intermediate layer.

FIG. 3 shows a wear test using alumina balls (load: 20
0g) and evaluated the wear characteristics by the wear depth.

FIG. 4 is a schematic cross-sectional view showing an example in which a shaver outer blade having an opening in a base material is attached to a base holder.

FIG. 5 shows a vacuum chamber and an ion implantation apparatus for forming a zirconium nitride film.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Microwave supply means 2 ... Waveguide 3 ... Microwave introduction window 4 ... Plasma generation chamber 5 ... Discharge gas introduction pipe 6 ... Plasma magnetic field generator 7 ... Target 8 ... Vacuum chamber 9 ... Holder 10 ... Reaction gas introduction pipe Reference Signs List 20 Shaver outer blade 21 Opening 22 Titanium oxide forming surface 23 Opposite surface to titanium oxide forming surface 24 Base holder

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) C23C 16/26 C23C 16/26 Z F16C 33/12 F16C 33/12 Z 33/16 33/16 33/24 33/24 A // C23C 16/517 C23C 16/50 H (72) Inventor Keiichi Kuramoto 2-5-5 Keihanhondori, Moriguchi-shi, Osaka Sanyo Electric Co., Ltd. (72) Inventor Hisaki Tarui Osaka 2-5-5 Keihanhondori, Moriguchi City Sanyo Electric Co., Ltd.

Claims (21)

[Claims] 1. A highly functional film-forming substrate, wherein a coating having a cleaning action by a photocatalytic reaction is formed on one main surface of a base material, and a hard coating is formed on the other main surface. 2. The highly functional film-forming substrate according to claim 1, wherein said hard film is a hard carbon film. 3. A film in which carbon is mixed with a material having a cleaning action by a photocatalytic reaction is formed on one main surface of the base material,
A highly functional film-forming substrate, wherein a hard carbon film is formed on the other main surface. 4. The high-functional film-forming substrate according to claim 3, wherein the carbon has a gradient function in the film. 5. The high-functional film-forming substrate according to claim 4, wherein said carbon decreases from said base material side toward said film surface side. 6. A film containing any one of titanium oxide, cadmium sulfide, zinc sulfide, niobium, and ferric oxide having a cleaning action by a photocatalytic reaction is formed on one main surface of the base material. The high-functional film-forming substrate according to any one of claims 4 and 5, characterized in that: 7. Between the coating formed on one main surface of the base material and the base material, or between the hard carbon coating formed on the other main surface of the base material and the base material. The high-functional film-forming substrate according to any one of claims 2 to 4, wherein an intermediate layer is formed. 8. The intermediate layer is made of Si, Ti, Zr, Ge, Ru, Mo, W, or a mixture thereof, or an oxide, nitride, or carbide of a simple substance or a mixture thereof, or a hard carbon coating. The highly functional film-forming substrate according to claim 7, wherein: 9. The method according to claim 1, wherein at least one kind of atoms among the coating atoms formed on the intermediate layer is mixed in the intermediate layer, and the atoms are functionally graded in the intermediate layer. The high-functional film-forming substrate according to any one of claims 7 and 8. 10. At least one kind of atoms among film atoms formed on the intermediate layer is mixed into the intermediate layer, and the number of atoms increases from the intermediate layer side toward the film side. The high-functional film-forming substrate according to claim 9, wherein: 11. The method according to claim 2, wherein the base material is Ni, Al, Fe, a stainless steel alloy, or a ceramic containing the elements of Ti, Zr, Al, Si, Cr, Hf, and Ge. The high-functional film-forming substrate according to any one of claims 4 to 10. 12. The high-functional film-forming substrate according to claim 1, wherein said substrate is an outer blade of an electric shaver. 13. The substrate according to claim 1, wherein the hard coating is a ceramic coating. 14. The ceramic film according to claim 13, wherein the ceramic film is a compound of a metal or a semiconductor material and at least one element of nitrogen, oxygen and carbon.
The highly functional film-forming substrate according to the above. 15. The high-functional film-forming substrate according to claim 14, wherein at least one element of nitrogen, oxygen, and carbon contained in the ceramic film has a gradient function. 16. The ceramic film is formed by irradiating a metal or a semiconductor material and molecules, atoms, ions or radicals of a gas containing at least one of nitrogen, oxygen and carbon. The high-functional film-forming substrate according to any one of claims 14 and 15. 17. The method according to claim 17, wherein the ceramic coating is made of Zr, Ti, Al, C
17. A compound according to claim 13, wherein the compound is a compound of r, Hf, Si, Ge, Fe, B, Mg, Ta, W and at least one element of nitrogen, oxygen and carbon. A high-functional film-forming substrate according to the above item. 18. A coating having a cleaning effect by a photocatalytic reaction is formed on one main surface of a base material, and a ceramic coating is formed on the other main surface. , At least one of carbon
A method for forming a highly functional film-forming substrate, which is formed by irradiating molecules, atoms, ions or radicals of a gas containing a kind. 19. The first coating layer is formed by irradiating the ceramic coating with a metal or semiconductor material and molecules, atoms, ions or radicals of a gas containing at least one of nitrogen, oxygen and carbon. A second step of forming a second coating layer by supplying a metal or semiconductor material and molecules or atoms of a gas containing at least one of nitrogen, oxygen and carbon to the first step and the first step; 19. The method for forming a high-functional-film-forming substrate according to claim 18, comprising the steps of: 20. The ceramic film according to claim 1, wherein the ceramic film is a compound of a metal or a semiconductor material and at least one element of nitrogen, oxygen and carbon.
20. The method for forming a highly functional film-forming substrate according to any one of items 8 and 19. 21. The method according to claim 18, wherein at least one element of nitrogen, oxygen, and carbon contained in the ceramic film has a function of gradient.