JP2000087274A - Cleaning method and device for magnetic metallic strip - Google Patents

Cleaning method and device for magnetic metallic strip

Info

Publication number
JP2000087274A
JP2000087274A JP10255197A JP25519798A JP2000087274A JP 2000087274 A JP2000087274 A JP 2000087274A JP 10255197 A JP10255197 A JP 10255197A JP 25519798 A JP25519798 A JP 25519798A JP 2000087274 A JP2000087274 A JP 2000087274A
Authority
JP
Japan
Prior art keywords
magnetic metal
cleaning
metal strip
control
metal band
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10255197A
Other languages
Japanese (ja)
Inventor
Yasuo Tomura
寧男 戸村
Motoki Imamura
元己 今村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP10255197A priority Critical patent/JP2000087274A/en
Publication of JP2000087274A publication Critical patent/JP2000087274A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B45/00Devices for surface or other treatment of work, specially combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
    • B21B45/02Devices for surface or other treatment of work, specially combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills for lubricating, cooling, or cleaning
    • B21B45/0269Cleaning
    • B21B45/0275Cleaning devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Apparatuses For Generation Of Mechanical Vibrations (AREA)

Abstract

PROBLEM TO BE SOLVED: To generate high frequency oscillation on a magnetic metallic strip such as a steel sheet or the like running in a cleaning soln. and to efficiently clean the magnetic metallic strip. SOLUTION: This device is provided with a pair of DC electromagnets 2 respectively faced to surface and back both faces of a steel strip 1 fed from carrying rolls 6 and 7 arranged being away with each other into a tank 5 stored with a cleaning soln. and running in the cleaning soln., a range finder 3 measuring the position of the steel sheet l, a control device 4 executing the feed back control of the attracting force of the electromagnets 2 in such a manner that the deviation between the measured position of the steel sheet 1 obtd. by the range finder and the objective position is made zero and a tension control device for the magnetic metallic strip not shown in fig., and, moreover, the control device is regulated so as to generate resonance of prescribed frequency on the steel sheet 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明は、磁性金属体の洗浄
方法及び装置、特に洗浄液中を走行する磁性金属体の洗
浄に適用して好適な、磁性金属体の洗浄方法及び装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for cleaning a magnetic metal body, and more particularly to a method and an apparatus for cleaning a magnetic metal body suitable for cleaning a magnetic metal body running in a cleaning solution.

【0002】[0002]

【従来の技術】一般に、連続的に走行する帯状の鋼板
(磁性金属体)を洗浄する方法としては、該鋼板を酸又
はアルカリ等の反応性溶液(洗浄液)が入ったタンク内
を通過させ、該溶液に浸漬することにより洗浄する方法
や、更に鋼板が浸漬された反応性溶液に超音波等で高周
波振動を発生させて、スケール層や油膜等を破壊して除
去する方法等が知られている。
2. Description of the Related Art In general, as a method for cleaning a continuously running strip-shaped steel sheet (magnetic metal body), the steel sheet is passed through a tank containing a reactive solution (washing liquid) such as an acid or an alkali. A method of washing by immersion in the solution, a method of generating high-frequency vibrations by ultrasonic waves or the like in a reactive solution further immersed in a steel sheet, and destroying and removing a scale layer and an oil film are known. I have.

【0003】ところが、特にタンク内の酸又はアルカリ
等の反応性溶液に鋼板を浸漬するだけの前者の方法で
は、洗浄効率が悪いために酸等の使用量が多くなる上
に、ライン速度を上げることができないために洗浄効率
が悪いという問題があり、反応性溶液に高周波振動を発
生させる後者の方法でも必ずしも洗浄効率が良くないと
いう問題があった。
However, in the former method, in which the steel sheet is simply immersed in a reactive solution such as an acid or an alkali in a tank, the amount of acid and the like used is increased due to poor cleaning efficiency, and the line speed is increased. However, there is a problem that the cleaning efficiency is poor because of the inability to perform the cleaning, and the latter method of generating high-frequency vibration in the reactive solution has a problem that the cleaning efficiency is not always good.

【0004】そこで、このような問題を解決するため
に、反応性溶液内に浸漬された金属製品(磁性金属体)
に対向して電磁石を配置し、これら電磁石に同一周波数
で且つ位相がπ/2ずれた交流電流を供給することによ
り、該金属製品に直接高周波振動を与えて酸洗等を行う
方法が、特開平5−117884に提案されている。
In order to solve such a problem, a metal product (magnetic metal body) immersed in a reactive solution has been proposed.
In this method, an electromagnet is arranged opposite to a metal product, and an alternating current having the same frequency and a phase shift of π / 2 is supplied to the electromagnet to directly apply high-frequency vibration to the metal product to perform pickling or the like. It has been proposed in Japanese Unexamined Patent Publication No. Hei 5-117883.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、電磁石
に同一周波数で且つ位相がπ/2ずれた交流電流を供給
する前記公報に提案されている方法では、十分な高さの
高周波振動を金属製品に発生させるためには、電源容量
が大きなものが必要であり、電力消費量が多くなるとい
う問題があった。
However, in the method proposed in the above-mentioned publication for supplying an alternating current having the same frequency and a phase shift of π / 2 to the electromagnet, a sufficiently high frequency vibration is applied to the metal product. In order to generate the power, a power supply having a large power supply capacity is required, and there is a problem that power consumption increases.

【0006】本発明は、前記従来の問題点を解決するべ
くなされたもので、洗浄液中を走行する磁性金属帯に十
分な高さの高周波振動を効率良く発生させ、且つ電力消
費量も少なくすることができる磁性金属帯の洗浄方法及
び装置を提供することを課題とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems, and efficiently generates a sufficiently high frequency vibration in a magnetic metal strip running in a cleaning solution and reduces power consumption. An object of the present invention is to provide a method and an apparatus for cleaning a magnetic metal strip which can be performed.

【0007】[0007]

【課題を解決するための手段】本発明は、洗浄液中を走
行する磁性金属帯を振動させて洗浄する磁性金属帯の洗
浄方法において、前記磁性金属帯に直流電磁石により磁
場を付与してその位置をフィードバック制御するにあた
り、磁性金属帯に目標位置に対する共振を発生させ、該
磁性金属帯を高周波振動させることにより、前記課題を
解決したものである。
SUMMARY OF THE INVENTION The present invention relates to a method for cleaning a magnetic metal strip which vibrates and cleans a magnetic metal strip running in a cleaning solution, wherein a magnetic field is applied to the magnetic metal strip by a DC electromagnet to position the magnetic metal strip. In the feedback control of the above, the above-described problem is solved by generating resonance at a target position in the magnetic metal band and causing the magnetic metal band to vibrate at a high frequency.

【0008】本発明は、又、洗浄液中を走行する磁性金
属帯を振動させて洗浄する磁性金属帯の洗浄装置におい
て、前記磁性金属帯の表裏両面にそれぞれ対向する1対
の直流電磁石と、該磁性金属帯の位置を測定する位置測
定手段と、該位置測定手段により得られた磁性金属帯の
実測位置と、磁性金属帯の目標位置との偏差を零とする
ように前記直流電磁石による磁性金属帯の吸引力をフィ
ードバック制御する制御手段を備えていると共に、該制
御手段が、前記磁性金属帯に所定の周波数の共振を発生
させるように調節されるようにしたことにより、同様に
前記課題を解決したものである。
The present invention also provides a magnetic metal band cleaning apparatus for cleaning a magnetic metal band running in a cleaning liquid by vibrating the magnetic metal band, comprising: a pair of DC electromagnets opposed to both front and back surfaces of the magnetic metal band; Position measuring means for measuring the position of the magnetic metal band; and a magnetic metal by the DC electromagnet so that the deviation between the measured position of the magnetic metal band obtained by the position measuring means and the target position of the magnetic metal band is zero. A control means for feedback controlling the suction force of the band is provided, and the control means is adjusted so as to generate resonance of a predetermined frequency in the magnetic metal band. It is a solution.

【0009】本発明者等は、前記課題を解決するべく、
種々検討した結果、鋼板(磁性金属体)の表裏両面にそ
れぞれ対向して直流電磁石を配設し、その電磁石によっ
て該磁性金属体を目標位置にフィードバック制御するこ
とにより、鋼板に発生している振動を非接触で制振させ
る制振装置において、鋼板に掛る張力とバランスするよ
うに、制御ゲインを適当に選ぶことによって、制御量
(ここでは磁性金属体の厚み方向の位置)が目標値の回
りを周期的に変化する、いわゆる共振を発生させること
により、該鋼板に比較的高周波の振動が継続的に発生す
ること、即ち、共振限界があることが明らかとなり、
又、その振動の周波数は20〜100程度で、鋼板の洗
浄を促進するに十分であることを知見した。従って、本
発明において高周波振動は、上記20〜100Hz程度
の周波数の振動を意味する。
The present inventors have set out to solve the above problems.
As a result of various studies, it was found that DC electromagnets were disposed on both sides of a steel plate (magnetic metal body) so as to face each other, and the magnetic metal body was feedback-controlled to a target position by the electromagnet, whereby vibration generated in the steel plate was obtained. In a vibration damping device that controls vibration in a non-contact manner, the control amount (in this case, the position in the thickness direction of the magnetic metal body) can be adjusted around the target value by appropriately selecting the control gain so as to balance with the tension applied to the steel sheet. By periodically changing the so-called resonance, it is evident that relatively high-frequency vibrations are continuously generated in the steel sheet, that is, there is a resonance limit,
In addition, it has been found that the frequency of the vibration is about 20 to 100, which is sufficient to promote the cleaning of the steel sheet. Therefore, in the present invention, high-frequency vibration means vibration at a frequency of about 20 to 100 Hz.

【0010】本発明は、この知見に基づいてなされたも
のであり、例えば洗浄液中を走行する磁性金属帯の表裏
両面に対向して配設した1対の直流電磁石と、該磁性金
属体の位置を検出する位置測定手段とから、該測定手段
からの位置信号に基づいて、該電磁石と磁性金属体の間
の距離を直流電磁石の吸引力により目標値に制御するフ
ィードバック制御系を構成し、該制御系の共振限界で制
御することにより、磁性金属体に高周波振動を与え、該
金属体自体を振動させながら洗浄するようにしたことか
ら、洗浄効率を向上できるようにしたものである。
The present invention has been made based on this finding. For example, a pair of DC electromagnets disposed opposite to the front and back surfaces of a magnetic metal strip running in a cleaning solution, and the position of the magnetic metal body From a position measuring means for detecting the distance between the electromagnet and the magnetic metal body based on a position signal from the measuring means to form a feedback control system for controlling the distance to a target value by the attractive force of the DC electromagnet, By controlling at a resonance limit of the control system, high-frequency vibration is applied to the magnetic metal body, and the metal body itself is cleaned while being vibrated, so that cleaning efficiency can be improved.

【0011】上記フィードバック制御系による制御方法
は、基本的にはPID(比例・積分・微分)制御で十分
であり、その場合の共振限界の制御条件は、例えば比例
ゲインKpを徐々に上げて行き、継続して振動が続く点
をその条件とすることができる。但し、その条件は、後
述するように磁性金属帯の厚みや幅、更にラインの張力
毎に異なるため、予めその条件毎に求めておく必要があ
る。このようにして求まる制御系の共振限界で制御する
ことにより、磁性金属帯に高周波振動を与えることが可
能となる。
In the control method using the feedback control system, PID (proportional / integral / differential) control is basically sufficient. In this case, the control condition of the resonance limit is, for example, by gradually increasing the proportional gain Kp. The point at which the vibration continues is the condition. However, since the conditions differ depending on the thickness and width of the magnetic metal strip and the tension of the line as described later, it is necessary to obtain the conditions in advance for each condition. By controlling at the resonance limit of the control system determined in this way, it becomes possible to apply high-frequency vibration to the magnetic metal band.

【0012】本発明では直流電磁石を使用しているの
で、その電源としては電圧が100V、電流が1〜3A
で十分である。従来の位相がπ/2ずれた交流電流を供
給する方法では電圧が200〜400V、電流が10〜
20A必要である。電力消費量も約1/20に少なくす
ることができる。
Since a DC electromagnet is used in the present invention, the power source is a voltage of 100 V and a current of 1 to 3 A.
Is enough. In the conventional method of supplying an alternating current with a phase shift of π / 2, the voltage is 200 to 400 V and the current is 10 to
20A is required. The power consumption can be reduced to about 1/20.

【0013】従って、効率が高く、且つ電力消費量の少
ない洗浄が可能となる。
Therefore, cleaning with high efficiency and low power consumption can be performed.

【0014】[0014]

【発明の実施の形態】以下、図面を参照して、本発明の
実施の形態について詳細に説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0015】図1は、本発明に係る一実施形態の洗浄装
置の要部構成を示すブロック図である。
FIG. 1 is a block diagram showing a main configuration of a cleaning apparatus according to an embodiment of the present invention.

【0016】本実施形態の洗浄装置は、矢印で示すよう
に、水平方向に走行する鋼板(磁性金属帯)1の表裏両
面それぞれに対向して配設された1対の直流電磁石2
と、走行する上記鋼板1の表面又は裏面までの距離(鋼
板の位置)を測定する距離計(位置測定手段)3と、該
距離計3により実測された距離(実測位置)と目標値
(目標位置)との偏差を零にするように、前記電磁石2
による鋼鈑1に対する吸引力をフィードバック制御する
ための制御指令信号を出力する制御装置(制御手段)4
とを備えている。
As shown by the arrows, the cleaning device of the present embodiment comprises a pair of DC electromagnets 2 disposed opposite to both front and back surfaces of a steel plate (magnetic metal strip) 1 traveling in the horizontal direction.
And a distance meter (position measuring means) 3 for measuring the distance (position of the steel plate) to the front surface or the back surface of the traveling steel plate 1, a distance (measured position) actually measured by the distance meter 3, and a target value (target) Position) so that the deviation from the position
(Control means) 4 for outputting a control command signal for feedback-controlling the attraction force on steel sheet 1 by means of
And

【0017】この洗浄装置は、図2に示すように、酸又
はアルカリ等の反応性溶液からなる洗浄液が貯留されて
いる洗浄タンク5を備えており、上記鋼板1は該タンク
5内に離間して配設されている搬送ロール6、7により
矢印方向に送られることにより、洗浄液中を走行するよ
うになっている。
As shown in FIG. 2, the cleaning apparatus includes a cleaning tank 5 in which a cleaning liquid comprising a reactive solution such as an acid or an alkali is stored. By being transported in the direction of the arrow by the transport rolls 6 and 7 arranged in the vertical direction, it travels in the cleaning liquid.

【0018】又、上記洗浄タンク5の内側には、ロール
6、7で送られる前記鋼板1を挟む上下位置に、それぞ
れ密閉性のケース8が配設され、該ケース8内に前記電
磁石2及び距離計3が収容され、洗浄液に触れないよう
になっている。この図では、便宜上、鋼板1がタンク5
の壁部を貫通しているように示してあるが、実際にはロ
ール6の上流側で液面から洗浄液中に入り、ロール7の
下流側で液面から出るようになっている。
Inside the washing tank 5, airtight cases 8 are disposed at upper and lower positions sandwiching the steel sheet 1 fed by the rolls 6 and 7, respectively. A distance meter 3 is accommodated so as not to touch the cleaning liquid. In this figure, for convenience, the steel plate 1 is
Although it is shown as penetrating through the wall portion, the cleaning liquid actually enters the cleaning liquid upstream of the roll 6 and exits the liquid downstream of the roll 7.

【0019】なお、上記鋼板1は、当該洗浄装置の上流
及び下流に設置された図示しない張力制御手段よりに張
力が制御されている。張力制御手段としては、ブライド
ルロールを用いるのが一般的であり、張力測定ロール等
によって張力を監視しながら制御を行っている。
The tension of the steel plate 1 is controlled by tension control means (not shown) installed upstream and downstream of the cleaning device. Generally, a bridle roll is used as the tension control means, and the control is performed while monitoring the tension with a tension measurement roll or the like.

【0020】図3は、前記洗浄装置の制御ブロック図を
示したものである。この制御ブロック図は、鋼板1の振
動を抑制し、該鋼板1を目標位置に一致させる制振制御
を目的に、本出願人が既に特開平9−184055号公
報において提案している振動制御装置と実質上同一であ
る。
FIG. 3 is a control block diagram of the cleaning apparatus. This control block diagram shows a vibration control device which has been proposed by the present applicant in Japanese Patent Application Laid-Open No. 9-184055 for the purpose of suppressing vibration of the steel plate 1 and controlling the steel plate 1 to a target position. Is substantially the same as

【0021】即ち、本実施形態の洗浄装置では、前記距
離計3による実測値は、予め設定してある目標値と比較
され、その偏差が前記制御装置4に入力されると、それ
が零になるように駆動装置10(前記図1、2では省
略)を介して電磁石2へ駆動力が出力されるようになっ
ている。
That is, in the cleaning device of the present embodiment, the measured value of the distance meter 3 is compared with a preset target value, and when the deviation is input to the control device 4, it is reduced to zero. The driving force is output to the electromagnet 2 via the driving device 10 (omitted in FIGS. 1 and 2).

【0022】上記制御装置4では、比例要素41、積分
要素42とが並列結合されており、その下流側に高周波
位相進み補償要素43が直列結合され、前記電磁石2の
応答遅れを補償するために、位相進み補償を行うように
なっている。上記高周波位相進み補償要素43は、伝達
関数で表わしてあるように、3次の位相進み補償を行う
ようになっている。但し、1次、2次、更に4次以上の
補償を行ってもよい。
In the control device 4, the proportional element 41 and the integrating element 42 are connected in parallel, and a high-frequency phase lead compensating element 43 is connected in series downstream of the proportional element 41 and the integrating element 42 so as to compensate for the response delay of the electromagnet 2. , Phase lead compensation is performed. The high-frequency phase lead compensation element 43 is configured to perform third-order phase lead compensation as represented by a transfer function. However, first-order, second-order, and fourth-order or higher compensation may be performed.

【0023】前記洗浄装置により制振制御をしようとす
る場合、目標値Aと距離計3による鋼板1の変位Bの実
測値Cとの偏差が上記制御装置4内に入力されると、こ
こで駆動制御信号が算出され、その信号が出力として駆
動制御装置10を経て前記電磁石2に入力され、鋼板1
の位置を目標位置に制御するフィードバック制御により
行うことができる。
When a vibration control is to be performed by the cleaning device, a deviation between a target value A and an actually measured value C of the displacement B of the steel plate 1 by the distance meter 3 is input into the control device 4. A drive control signal is calculated, and the signal is input to the electromagnet 2 via the drive control device 10 as an output.
Can be performed by feedback control for controlling the position of the target to the target position.

【0024】本実施形態では、上記フィードバック制御
と同様の制御を行う際、前記図3に示した制御装置4
が、前記鋼板1に所定の周波数、例えば20〜100H
zの周波数で、振幅1〜10mmで振動する共振を発生
させるように調節されている。
In this embodiment, when performing the same control as the feedback control, the control device 4 shown in FIG.
Is applied to the steel plate 1 at a predetermined frequency, for example, 20 to 100H.
At a frequency of z, it is adjusted to generate resonance oscillating with an amplitude of 1 to 10 mm.

【0025】具体的には、前記制振制御のフィードバッ
ク制御系で、鋼板1を目標位置に制御する際に、該鋼板
1の実測位置と目標位置との偏差に乗ずる制御ゲインで
ある、前記図3に示した比例ゲインKpを調節して、前
記共振を発生させるようにしている。
More specifically, when the feedback control system of the vibration suppression control controls the steel sheet 1 to the target position, the control gain is a control gain that multiplies the deviation between the actually measured position of the steel sheet 1 and the target position. The resonance is generated by adjusting the proportional gain Kp shown in FIG.

【0026】図4には、本実施形態の洗浄装置で鋼板1
に共振を発生させる際に、前記制御装置4において調節
する制御ゲインの特徴を、従来の制振制御の場合の制御
ゲインと対比させて概念的に示した。
FIG. 4 shows the cleaning apparatus of this embodiment,
The characteristic of the control gain adjusted by the control device 4 when the resonance is generated is conceptually shown in comparison with the control gain in the case of the conventional vibration suppression control.

【0027】この図4において、実線は張力が大きい場
合に、破線は張力が小さい場合に対応し、又、A、Bは
それぞれの場合の共振発性域を、C、Dは同じく好適範
囲を表わしている。
In FIG. 4, the solid line corresponds to the case where the tension is high, the dashed line corresponds to the case where the tension is low, A and B indicate the resonance generating regions in each case, and C and D indicate the preferable ranges. It represents.

【0028】この図より、前記共振を発生させるために
は、制振制御に適用されるゲイン(図中、制振制御域)
に比べて高い値に制御ゲインを調節することが、制御域
が広く好適であることが分かる。但し、制御ゲインを高
くし過ぎると振動が過大になることから、前記1〜10
mmの振幅にする好適範囲が存在し、例えば制振制御の
場合の約2倍のゲインにすると効果的である。
As can be seen from the graph, in order to generate the resonance, a gain applied to the vibration suppression control (a vibration suppression control area in the figure)
It is understood that adjusting the control gain to a higher value than that of the above is suitable for a wide control range. However, if the control gain is too high, the vibration becomes excessive.
There is a suitable range for making the amplitude of mm, for example, it is effective to make the gain about twice that in the case of vibration suppression control.

【0029】本実施形態では、共振による鋼板1の振動
は、前記搬送ロール6と7の間で発生し、基本的には1
次モードの振動(固有周波数での振動)であることか
ら、その周波数は、鋼板1の寸法、ロール間距離Lが固
定ならば、あまり大きな変化はしないが、該鋼板1に掛
っている張力に関係して変化する。
In the present embodiment, the vibration of the steel sheet 1 due to the resonance occurs between the transport rolls 6 and 7, and
Since this is the next mode of vibration (vibration at the natural frequency), the frequency does not change so much if the dimension of the steel sheet 1 and the distance L between the rolls are fixed, but the frequency does not change much. Change related.

【0030】図5には、寸法が異なる鋼板(図中、鋼帯
寸法1、2)について、周波数と張力の関係を概念的に
示した。
FIG. 5 conceptually shows the relationship between frequency and tension for steel sheets having different dimensions (steel strip dimensions 1 and 2 in the figure).

【0031】この図に示されるように、共振による周波
数は張力に多少依存することから、所定の周波数の共振
を発生させるためには、前記制御ゲインを鋼板1に掛っ
ている張力を考慮して調節する必要がある。
As shown in this figure, since the frequency due to the resonance slightly depends on the tension, in order to generate the resonance at a predetermined frequency, the control gain is set in consideration of the tension applied to the steel plate 1. Need to adjust.

【0032】又、制御ゲインの値によっては張力が低い
と振動が発散する(振幅過大)ことからも、各寸法の鋼
板毎に、張力に応じて制御ゲインの好適範囲が存在す
る。
Further, depending on the value of the control gain, if the tension is low, the vibration diverges (excessive amplitude). Therefore, there is a suitable range of the control gain according to the tension for each steel sheet of each size.

【0033】以上詳述した如く、本実施形態では、本来
鋼板1の表裏両面にそれぞれ磁界を作用させて該鋼板1
の振動を抑止する制振装置を利用し、フィードバック制
御系のゲインを高めに調節して、意図的に共振を発生さ
せることにより、高周波の振動を鋼板1に付与する(強
制的に加振する)と共に、その振動が発散しないように
張力とバランスさせることにより、継続的な振動を発生
させるようにしている。
As described in detail above, in this embodiment, the magnetic field is applied to both the front and back surfaces of the steel
A high frequency vibration is applied to the steel sheet 1 by intentionally generating resonance by using a vibration damping device that suppresses vibration of the steel sheet and adjusting the gain of the feedback control system to a higher value (forced vibration is applied). ) Together with the tension so that the vibration does not diverge, thereby generating continuous vibration.

【0034】その際、洗浄装置と張力制御装置を上位の
制御装置で管理し、適性振動条件(周波数及び振幅)が
得られる張力及び加振条件を設定するようにしてもよ
い。
At this time, the cleaning device and the tension control device may be managed by a higher-level control device, and the tension and the vibration condition for obtaining the appropriate vibration condition (frequency and amplitude) may be set.

【0035】従って、本実施形態によれば、前記距離計
3から入力される距離信号に基づいて、前記直流電磁石
2と鋼板1との間の距離(鋼鈑1の位置)を直流電磁石
2の吸引力により一定(目標位置)に制御するフィード
バック制御系を構成し、該制御系の共振限界で制御する
ことにより、該鋼板1に高周波振動を発生させ、鋼板自
体を振動させて洗浄するようにしたので、効率良く、且
つ少ない電力消費量で洗浄することができるようになっ
た。
Therefore, according to the present embodiment, the distance between the DC electromagnet 2 and the steel plate 1 (the position of the steel plate 1) is determined based on the distance signal input from the distance meter 3. A high-frequency vibration is generated in the steel sheet 1 by controlling a resonance limit of the control system to form a feedback control system for controlling a constant (target position) by the suction force so that the steel sheet itself is vibrated for cleaning. As a result, cleaning can be performed efficiently and with low power consumption.

【0036】以上、本発明について具体的に説明した
が、本発明は、前記実施形態に示したものに限られるも
のでなく、その要旨を逸脱しない範囲で種々変更可能で
ある。
Although the present invention has been described in detail, the present invention is not limited to the above-described embodiment, and can be variously modified without departing from the gist thereof.

【0037】例えば、本発明に適用できる洗浄装置の制
御系の具体的構成は、前記図3の制御ブロック図に示し
たものに限定されない。
For example, the specific configuration of the control system of the cleaning apparatus applicable to the present invention is not limited to that shown in the control block diagram of FIG.

【0038】又、鋼板を例にとったが、磁性金属帯であ
れば、磁場の付与により共振を生じせしめる本発明が適
用可能なことは言うまでもない。
Although a steel plate is taken as an example, it goes without saying that the present invention in which resonance is generated by applying a magnetic field can be applied to a magnetic metal band.

【0039】又、前記実施形態では、洗浄として酸洗又
はアルカリ洗を具体例として示したが、界面活性剤等の
他の洗浄液を使用する洗浄等に適用してもよいことは言
うまでもない。
Further, in the above-described embodiment, pickling or alkali washing has been described as a specific example, but it is needless to say that the present invention may be applied to washing using another washing liquid such as a surfactant.

【0040】[0040]

【発明の効果】以上説明したとおり、本発明によれば、
洗浄液中を走行する磁性金属帯に、従来の約1/20の
消費電力量で十分な高さの高周波振動を効率良く発生さ
せることができ、該磁性金属帯を効率良く洗浄すること
ができる。
As described above, according to the present invention,
A high frequency vibration having a sufficient height can be efficiently generated in the magnetic metal strip running in the cleaning liquid with about 1/20 of the power consumption of the conventional one, and the magnetic metal strip can be efficiently cleaned.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る一実施形態である洗浄装置の要部
を示すブロック図
FIG. 1 is a block diagram showing a main part of a cleaning apparatus according to an embodiment of the present invention.

【図2】上記洗浄装置の概略構成を示す説明図FIG. 2 is an explanatory diagram showing a schematic configuration of the cleaning device.

【図3】上記洗浄装置の制御ブロック図FIG. 3 is a control block diagram of the cleaning device.

【図4】制振制御時のゲインと加振制御時のゲインの関
係を示す線図
FIG. 4 is a diagram showing a relationship between a gain during vibration suppression control and a gain during vibration control.

【図5】加振制御時の張力と周波数の関係を示す線図FIG. 5 is a diagram showing a relationship between tension and frequency during vibration control.

【符号の説明】[Explanation of symbols]

1…鋼板 2…直流電磁石 3…距離計 4…制御装置 5…洗浄タンク 6、7…搬送ロール 8…ケース 10…駆動装置 41…比例要素 42…積分要素 43…位相進み補償要素 A…目標値 B…変位 C…距離実測値 DESCRIPTION OF SYMBOLS 1 ... Steel plate 2 ... DC electromagnet 3 ... Distance meter 4 ... Control device 5 ... Cleaning tank 6, 7 ... Transport roll 8 ... Case 10 ... Drive device 41 ... Proportional element 42 ... Integral element 43 ... Phase advance compensation element A ... Target value B: Displacement C: Actual measured distance

フロントページの続き Fターム(参考) 3B201 AA08 AB16 AB37 AB47 BB02 BB92 BB94 BB95 BC05 CB01 CD42 CD43 4K053 PA02 PA12 QA01 QA04 SA06 TA16 XA09 YA22 YA24 5D107 AA03 BB11 CC09 CD05 CD10 DE01 Continuation of the front page F term (reference) 3B201 AA08 AB16 AB37 AB47 BB02 BB92 BB94 BB95 BC05 CB01 CD42 CD43 4K053 PA02 PA12 QA01 QA04 SA06 TA16 XA09 YA22 YA24 5D107 AA03 BB11 CC09 CD05 CD10 DE01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】洗浄液中を走行する磁性金属帯を振動させ
て洗浄する磁性金属帯の洗浄方法において、 前記磁性金属帯に直流電磁石により磁場を付与してその
位置をフィードバック制御するにあたり、磁性金属帯に
目標位置に対する共振を発生させ、該磁性金属帯を高周
波振動させることを特徴とする磁性金属帯の洗浄方法。
1. A method for cleaning a magnetic metal strip which vibrates and cleans a magnetic metal strip running in a cleaning liquid, wherein a magnetic field is applied to the magnetic metal strip by a DC electromagnet and the position of the magnetic metal strip is feedback-controlled. A method for cleaning a magnetic metal band, comprising: generating a resonance with respect to a target position in the band and causing the magnetic metal band to vibrate at a high frequency.
【請求項2】請求項1において、 前記磁性金属帯を目標位置に制御する際に、該磁性金属
帯の実測位置と目標位置との偏差に乗ずる制御ゲイン
を、該磁性金属帯に掛っている張力に応じて調節し、前
記共振を発生させることを特徴とする磁性金属帯の洗浄
方法。
2. The magnetic metal strip according to claim 1, wherein when controlling the magnetic metal strip to a target position, a control gain that multiplies a deviation between an actual measurement position of the magnetic metal strip and the target position is applied to the magnetic metal strip. A method for cleaning a magnetic metal strip, comprising adjusting the tension according to the tension to generate the resonance.
【請求項3】洗浄液中を走行する磁性金属帯を振動させ
て洗浄する磁性金属帯の洗浄装置において、 前記磁性金属帯の表裏両面にそれぞれ対向する1対の直
流電磁石と、該磁性金属帯の位置を測定する位置測定手
段と、該位置測定手段により得られた磁性金属帯の実測
位置と、磁性金属帯の目標位置との偏差を零とするよう
に前記直流電磁石による磁性金属帯の吸引力をフィード
バック制御する制御手段を備えていると共に、 該制御手段が、前記磁性金属帯に所定の周波数の共振を
発生させるように調節されていることを特徴とする磁性
金属帯の洗浄装置。
3. A magnetic metal band cleaning apparatus for cleaning a magnetic metal band running in a cleaning liquid by vibrating the magnetic metal band, comprising: a pair of DC electromagnets facing both front and back surfaces of the magnetic metal band; Position measuring means for measuring the position, and the attractive force of the magnetic metal band by the DC electromagnet so that the deviation between the actual measured position of the magnetic metal band obtained by the position measuring means and the target position of the magnetic metal band is made zero. And a control means for performing feedback control on the magnetic metal strip, and the control means is adjusted so as to generate resonance of a predetermined frequency in the magnetic metal strip.
【請求項4】請求項3において、 前記制御手段が、前記磁性金属帯を目標位置に制御する
際に、該磁性金属帯の実測位置と目標位置との偏差に乗
ずる制御ゲインを調節して、前記共振を発生させるよう
になっていることを特徴とする磁性金属帯の洗浄装置。
4. The apparatus according to claim 3, wherein the control means adjusts a control gain by which a deviation between an actual measured position of the magnetic metal band and a target position is multiplied when controlling the magnetic metal band to a target position. An apparatus for cleaning a magnetic metal strip, wherein the apparatus generates the resonance.
JP10255197A 1998-09-09 1998-09-09 Cleaning method and device for magnetic metallic strip Pending JP2000087274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10255197A JP2000087274A (en) 1998-09-09 1998-09-09 Cleaning method and device for magnetic metallic strip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10255197A JP2000087274A (en) 1998-09-09 1998-09-09 Cleaning method and device for magnetic metallic strip

Publications (1)

Publication Number Publication Date
JP2000087274A true JP2000087274A (en) 2000-03-28

Family

ID=17275386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10255197A Pending JP2000087274A (en) 1998-09-09 1998-09-09 Cleaning method and device for magnetic metallic strip

Country Status (1)

Country Link
JP (1) JP2000087274A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015028527A1 (en) * 2013-08-29 2015-03-05 Cmi Uvk Gmbh Method of treating a pickling solution for a pickling process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015028527A1 (en) * 2013-08-29 2015-03-05 Cmi Uvk Gmbh Method of treating a pickling solution for a pickling process
KR20160067101A (en) * 2013-08-29 2016-06-13 씨엠아이 유브이케이 게엠베하 Method of treating a pickling solution for a pickling process
CN105793472A (en) * 2013-08-29 2016-07-20 Cmi优威克股份有限公司 Method of treating pickling solution for pickling process
KR101868485B1 (en) * 2013-08-29 2018-06-18 씨엠아이 유브이케이 게엠베하 Method of treating a pickling solution for a pickling process

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