JP2000086257A - Production of quartz glass fly eye lens - Google Patents

Production of quartz glass fly eye lens

Info

Publication number
JP2000086257A
JP2000086257A JP10252553A JP25255398A JP2000086257A JP 2000086257 A JP2000086257 A JP 2000086257A JP 10252553 A JP10252553 A JP 10252553A JP 25255398 A JP25255398 A JP 25255398A JP 2000086257 A JP2000086257 A JP 2000086257A
Authority
JP
Japan
Prior art keywords
quartz glass
eye lens
hydrogen
transmittance
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10252553A
Other languages
Japanese (ja)
Other versions
JP2000086257A5 (en
Inventor
Mitsumasa Negishi
光正 根岸
Kazuo Kitazawa
和雄 北沢
Hiroaki Iguchi
裕章 井口
Jun Takano
潤 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10252553A priority Critical patent/JP2000086257A/en
Publication of JP2000086257A publication Critical patent/JP2000086257A/en
Publication of JP2000086257A5 publication Critical patent/JP2000086257A5/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/082Construction of plunger or mould for making solid articles, e.g. lenses having profiled, patterned or microstructured surfaces
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/0071Compositions for glass with special properties for laserable glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/0085Compositions for glass with special properties for UV-transmitting glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/40Product characteristics
    • C03B2215/41Profiled surfaces
    • C03B2215/414Arrays of products, e.g. lenses
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/20Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/50After-treatment
    • C03C2203/52Heat-treatment
    • C03C2203/54Heat-treatment in a dopant containing atmosphere

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

PROBLEM TO BE SOLVED: To ensure necessary transmittance to KrF excimer laser and ArF excimer laser by cooling a quartz glass fly eye lens hotformed at the softening temperature to room temperature, heating the lens to a specified temperature and holding it in an atmosphere of hydrogen having a specified pressure for a specified time. SOLUTION: A quartz glass fly eye lens hot-formed at the softening temperature is cooled to room temperature, heated to 300-800 deg.C and held in an atmosphere of hydrogen having >=9.8×104 Pa pressure for >=24 hr. The solubility of hydrogen molecules at the temp. and pressure is 1×1018-3×1018 molecules/cm3 and hydrogen molecules are sufficiently diffused by holding this state for <=24 hr. Since the lens is heated to a high temperature of 1,350 deg.C the number of hydrogen molecules decrease to 5×1016 and the transmittance lowers to the level of 80%. It is necessary to ensure >=95% transmittance. The number of hydrogen molecules in the quartz glass reduced to 1/100-1/200 in the hot forming process can be returned to 1×1018 molecules/cm3 as the value before the hot forming and the lowering of the transmittance due to a change in physical properties is suppressed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は石英ガラスフライア
イレンズの製造方法に関する。
[0001] The present invention relates to a method of manufacturing a quartz glass fly-eye lens.

【0002】[0002]

【従来技術】近年、半導体露光装置では分解能アップの
ため、使用する波長がi線(365nm)からKrFエ
キシマレーザー(248nm)やArFエキシマレーザ
ー(193nm)へと短くなっている。波長がi線まで
は、光学ガラスが使用できるが、KrFエキシマレーザ
ーやArFエキシマレーザーになると、光の透過率の問
題から光学材料は石英ガラスになる。この装置では光源
からの照度不均一な光を照度均一な光に変換させるため
の、石英フライアイレンズが用いられる。
2. Description of the Related Art In recent years, the wavelength used in semiconductor exposure apparatuses has been shortened from i-ray (365 nm) to KrF excimer laser (248 nm) or ArF excimer laser (193 nm) in order to increase resolution. Optical glass can be used up to the wavelength of the i-line, but in the case of KrF excimer laser or ArF excimer laser, the optical material is quartz glass due to the problem of light transmittance. In this apparatus, a quartz fly-eye lens is used for converting light having non-uniform illuminance from a light source into light having uniform illuminance.

【0003】従来、この種の石英フライアイレンズの製
造方法は、図6に示すような角形棒状素子31を研削・
研磨加工により製作し、この一個一個の素子を接着して
束ねることにより複数の光学機能面を有するフライアイ
レンズ32を製造していた。これは、石英ガラスの軟化
温度が1300℃以上であり、800℃以下の光学ガラ
スと比較して、成形温度域が極端に高くなるため、光学
ガラスで行われているような加熱成形により製造するこ
とが難しかったためである。
Conventionally, this type of manufacturing method of a quartz fly-eye lens has been performed by grinding a rectangular rod-shaped element 31 as shown in FIG.
The fly-eye lens 32 having a plurality of optically functional surfaces has been manufactured by polishing and then bonding and bundling the individual elements. This is because the softening temperature of quartz glass is 1300 ° C. or higher, and the forming temperature range is extremely higher than that of optical glass of 800 ° C. or lower. Because it was difficult.

【0004】[0004]

【発明が解決しようとする課題】このような石英ガラス
フライアイレンズに要求される物性は、KrFエキシマ
レーザーやArFエキシマレーザーに対して透過率が9
5%以上確保されていることである。一般に石英ガラス
にKrFエキシマレーザーやArFエキシマレーザーを
照射すると、石英ガラスの透過率は石英ガラス内部の物
性変化により急激に低下し、80%程度となる。この急
激な透過率の低下を避けるため、石英ガラス内部に物性
変化を抑える働きのある水素分子を一定量以上確保して
いる。その値は、一般に1×1018個以上である。この
水素分子を確保している石英ガラスを1300℃以上の
温度まで加熱し加圧成形すると、ガラス内部の水素分子
の数は、高温に加熱されることにより1/100〜1/
200となり、KrFエキシマレーザーやArFエキシ
マレーザーに対して透過率を確保できなくなるという問
題があった。
The physical properties required of such a quartz glass fly-eye lens are that the transmittance to a KrF excimer laser or an ArF excimer laser is 9%.
5% or more is secured. Generally, when a quartz glass is irradiated with a KrF excimer laser or an ArF excimer laser, the transmittance of the quartz glass rapidly decreases due to a change in physical properties inside the quartz glass, and becomes about 80%. In order to avoid such a sharp decrease in transmittance, a certain amount or more of hydrogen molecules having a function of suppressing a change in physical properties are secured inside the quartz glass. Its value is generally 1 × 10 18 or more. When the quartz glass retaining the hydrogen molecules is heated to a temperature of 1300 ° C. or higher and pressed, the number of hydrogen molecules in the glass becomes 1/100 to 1 /
As a result, the transmittance was not able to be secured for a KrF excimer laser or an ArF excimer laser.

【0005】本発明の目的は、KrFエキシマレーザー
やArFエキシマレーザーに対して必要な透過率を確保
し、物性的に安定な石英ガラスフライアイレンズを加熱
成形によって製造する方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a quartz glass fly-eye lens which has a required transmittance for a KrF excimer laser or an ArF excimer laser and which is physically stable by heat molding. .

【0006】[0006]

【課題を解決するための手段】そこで、本発明者らは鋭
意研究した結果、軟化温度で加熱成形した石英ガラスフ
ライアイレンズを室温まで冷却した後、温度を300〜
800℃に加熱し、圧力が9.8×104Pa以上の水
素雰囲気中で24時間以上保持する方法で製造すること
にした。この温度と圧力下での水素分子の溶解度は1〜
3×1018個/cm3であり、24時間以上この状態を
保持することにより水素分子を十分拡散させることがで
きる。
The inventors of the present invention have conducted intensive studies, and as a result, after cooling a quartz glass fly-eye lens heated and formed at a softening temperature to room temperature, the temperature was reduced to 300 to 300.degree.
It was manufactured by a method of heating to 800 ° C. and maintaining the pressure in a hydrogen atmosphere of 9.8 × 10 4 Pa or more for 24 hours or more. The solubility of hydrogen molecules at this temperature and pressure is 1 to
The density is 3 × 10 18 / cm 3 , and by maintaining this state for 24 hours or more, hydrogen molecules can be sufficiently diffused.

【0007】温度を300℃以上にするのはそれ以下の
温度だと水素分子の溶解度が低く拡散係数が非現実的な
ものになるからであり、温度を800℃以下にするのは
それ以上の温度だと水素分子以外の不純物(例えば、カ
ーボン)の拡散が生じ透過率を劣化させてしまうからで
ある。また、水素雰囲気の圧力を9.8×104Pa以
上にするのはそれ以下の圧力では前述の溶解度が確保で
きないからである。また24時間以上保持するのはそれ
以下の時間だと水素分子が充分に拡散されないからであ
る。
The reason why the temperature is set to 300 ° C. or higher is that if the temperature is lower than 300 ° C., the solubility of hydrogen molecules is low and the diffusion coefficient becomes unrealistic. This is because if the temperature is higher, impurities other than hydrogen molecules (for example, carbon) are diffused and the transmittance is deteriorated. The reason why the pressure of the hydrogen atmosphere is set to 9.8 × 10 4 Pa or higher is that the above-mentioned solubility cannot be secured at a pressure lower than 9.8 × 10 4 Pa. In addition, the reason why the hydrogen molecule is held for 24 hours or more is that if the time is shorter than that, the hydrogen molecules are not sufficiently diffused.

【0008】このようにすることによって、加熱成形過
程で1/100〜1/200に減少した石英ガラス内部
の水素分子の量を、加熱成形前のレベルまで戻すことが
でき、物性変化にともなう透過率の低下を抑えることが
できた。
[0008] By doing so, the amount of hydrogen molecules inside the quartz glass, which has been reduced to 1/100 to 1/200 in the heat forming process, can be returned to the level before the heat forming, and the permeation due to the change in physical properties can be achieved. The reduction in the rate was able to be suppressed.

【0009】[0009]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

【0010】[0010]

【実施例】図1から図5を用いて本発明の実施の形態に
ついて説明する。まず図1のような角型30mm×30
mmで厚さが20mmに両面研磨した石英ガラス材料1
を準備する。この石英ガラス材料1の透過率は95%、
水素分子量は1×1018個で、初期値としてはKrFエ
キシマレーザーやArFエキシマレーザーに対して十分
な物性値を持っている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. First, a square 30mm × 30 as shown in FIG.
Quartz glass material 1 polished on both sides to a thickness of 20 mm and a thickness of 20 mm
Prepare The transmittance of the quartz glass material 1 is 95%,
The hydrogen molecular weight is 1 × 10 18 , and as an initial value, it has sufficient physical property values with respect to a KrF excimer laser or an ArF excimer laser.

【0011】この石英ガラス材料1を、図5に示すよう
に6mm×6mmに25分割し、それぞれがR8mmに
凹面研磨仕上げされた複数の仕上げ面23を持つセラミ
ックス製上型21及び下型22の中間に配置する。石英
ガラス材料1、上型21、下型22を成形装置(図示せ
ず)にセットし、軟化温度である1350℃で加熱成形
し、冷却後、室温で取り出し、図2に示す石英ガラスフ
ライアイレンズ2を作る。
The quartz glass material 1 is divided into 25 sections of 6 mm × 6 mm as shown in FIG. 5, and each of the upper and lower ceramic molds 21 and 22 having a plurality of finished surfaces 23 each of which is concavely polished to R8 mm. Place in the middle. The quartz glass material 1, the upper mold 21 and the lower mold 22 are set in a molding apparatus (not shown), and are molded by heating at a softening temperature of 1350 ° C., and after cooling, are taken out at room temperature. Make lens 2.

【0012】この石英フライアイレンズ2は、1350
℃の高温で加熱されたため、水素分子の量が5×1016
個になっていて、透過率は80%台となり、KrFエキ
シマレーザーやArFエキシマレーザーの照射には耐え
られないものになっている。加熱成形され水素分子の量
が、初期の1/100〜1/200になっている石英フ
ライアイレンズを図3に示すような真空・ガス雰囲気炉
の中に入れ、まず雰囲気炉内部をバルブ16を開き真空
引きする。真空度が1.33Pa以下になったら、バル
ブ16を閉じ、バルブ18を開き水素ガスを導入し置換
する。水素ガスの圧力は、9.8×104Pa以上であ
る。圧力が確認できた後、図4に示すような加熱スケジ
ュールで、熱処理する。1時間で300℃まで上昇さ
せ、その後24時間以上保持し、冷却する。冷却後室温
になった時点で、水素ガスをバルブ17から安全に排気
し、大気を導入後、石英ガラスフライアイレンズを取り
出す。以上の水素雰囲気中での処理工程を経過した石英
ガラスフライアイレンズの物性値を再度測定すると、透
過率は95%で水素分子量も1×1018個に戻ってお
り、KrFエキシマレーザーやArFエキシマレーザー
に対して十分な物性値となった。
The quartz fly-eye lens 2 has 1350
Because of heating at a high temperature of 5 ° C., the amount of hydrogen molecules was 5 × 10 16
It has a transmittance of the order of 80% and cannot withstand irradiation by a KrF excimer laser or an ArF excimer laser. A quartz fly-eye lens formed by heating and having an initial amount of hydrogen molecules of 1/100 to 1/200 is placed in a vacuum / gas atmosphere furnace as shown in FIG. Open and evacuate. When the degree of vacuum becomes 1.33 Pa or less, the valve 16 is closed, the valve 18 is opened, and hydrogen gas is introduced and replaced. The pressure of the hydrogen gas is 9.8 × 10 4 Pa or more. After confirming the pressure, heat treatment is performed according to a heating schedule as shown in FIG. The temperature is raised to 300 ° C. in one hour, and then maintained for at least 24 hours and cooled. At room temperature after cooling, hydrogen gas is safely exhausted from the valve 17, air is introduced, and the quartz glass fly-eye lens is taken out. When the physical properties of the quartz glass fly-eye lens after the treatment process in the above hydrogen atmosphere were measured again, the transmittance was 95% and the hydrogen molecular weight was returned to 1 × 10 18 , and the KrF excimer laser and the ArF excimer were used. Sufficient properties were obtained for the laser.

【0013】[0013]

【発明の効果】以上のように本発明によれば、まず、石
英ガラスは加熱成形するとKrFエキシマレーザーやA
rFエキシマレーザー用としては物性面で使用できない
レベルになっていたが、加熱成形後に水素雰囲気中で処
理することで、物性上の問題が解決でき、加熱成形によ
る石英ガラスフライアイレンズの製造方法が確立でき
た。このため図5のような複数の仕上げ面を有する上下
の型は、非常に高精度に加工できるので、この上下型を
使用して転写した一個一個の素子の機能面も非常に高精
度に製造でき、図6のような従来の方法で製造したフラ
イアイレンズと比較して極めて高精度な素子を安定して
供給することができた。また、加熱成形による製造方法
は、従来の加工方法に比較して、製造工数を短くできコ
スト低減も達成できた。
As described above, according to the present invention, first, when quartz glass is heated and formed, a KrF excimer laser or A
Although it was at a level where physical properties could not be used for rF excimer laser, problems in physical properties could be solved by treating in a hydrogen atmosphere after heat molding, and a method of manufacturing a quartz glass fly-eye lens by heat molding was developed. It was established. For this reason, the upper and lower molds having a plurality of finishing surfaces as shown in FIG. 5 can be machined with very high precision, and the functional surfaces of the individual elements transferred using the upper and lower molds are also manufactured with very high precision. As a result, it was possible to stably supply elements with extremely high precision as compared with the fly-eye lens manufactured by the conventional method as shown in FIG. In addition, the manufacturing method by heat molding can shorten the number of manufacturing steps and achieve cost reduction as compared with the conventional processing method.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施の形態による製造方法の素材図FIG. 1 is a material diagram of a manufacturing method according to an embodiment.

【図2】実施の形態により製造した石英ガラスフライア
イレンズ
FIG. 2 is a quartz glass fly-eye lens manufactured according to the embodiment.

【図3】実施の形態に使用した熱処理装置図FIG. 3 is a diagram of a heat treatment apparatus used in the embodiment.

【図4】実施の形態の加熱スケジュール図FIG. 4 is a heating schedule diagram of the embodiment.

【図5】実施の形態の成形構造図、FIG. 5 is a diagram showing a molding structure according to the embodiment;

【図6】従来方法の貼り合わせによって作製される素子
FIG. 6 is a diagram of an element manufactured by bonding according to a conventional method.

【主要部分の符号の説明】[Explanation of Signs of Main Parts]

1・・・・石英ガラス材料 2・・・・加熱成形により製造した石英ガラスフライア
イレンズ 11・・・真空・ガス雰囲気炉チャンバー 12・・・ヒーター 13・・・断熱板 14・・・載せ台 15・・・ロータリーポンプ 16・・・バルブ 17・・・バルブ 18・・・バルブ 19・・・水素供給設備 20・・・石英ガラスフライアイレンズ 21・・・上型 22・・・下型 23・・・仕上げ面 31・・・従来方法で製造した1個のレンズ 32・・・従来方法で製造したフライアイレンズ
DESCRIPTION OF SYMBOLS 1 ... Quartz glass material 2 ... Quartz glass fly-eye lens manufactured by heat molding 11 ... Vacuum / gas atmosphere furnace chamber 12 ... Heater 13 ... Heat insulation plate 14 ... Placement table 15 ... Rotary pump 16 ... Valve 17 ... Valve 18 ... Valve 19 ... Hydrogen supply equipment 20 ... Quartz glass fly-eye lens 21 ... Upper mold 22 ... Lower mold 23 ... Finished surface 31 ... One lens manufactured by conventional method 32 ... Fly-eye lens manufactured by conventional method

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高野 潤 東京都千代田区丸の内3丁目2番3号 株 式会社ニコン内 Fターム(参考) 4G014 AH00  ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Jun Takano 3-2-3 Marunouchi, Chiyoda-ku, Tokyo F-term in Nikon Corporation (reference) 4G014 AH00

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】軟化温度で加熱成形した石英ガラスフライ
アイレンズを室温まで冷却した後、温度を300〜80
0℃に加熱し、圧力が9.8×104Pa以上の水素雰
囲気中で24時間以上保持することを特徴とする石英ガ
ラスフライアイレンズの製造方法。
After cooling a quartz glass fly-eye lens heated and formed at a softening temperature to room temperature, the temperature is raised to 300-80.
A method for producing a quartz glass fly-eye lens, characterized in that the quartz glass fly-eye lens is heated to 0 ° C. and kept in a hydrogen atmosphere at a pressure of 9.8 × 10 4 Pa or more for 24 hours or more.
JP10252553A 1998-09-07 1998-09-07 Production of quartz glass fly eye lens Pending JP2000086257A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10252553A JP2000086257A (en) 1998-09-07 1998-09-07 Production of quartz glass fly eye lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10252553A JP2000086257A (en) 1998-09-07 1998-09-07 Production of quartz glass fly eye lens

Publications (2)

Publication Number Publication Date
JP2000086257A true JP2000086257A (en) 2000-03-28
JP2000086257A5 JP2000086257A5 (en) 2005-10-27

Family

ID=17238980

Family Applications (1)

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JP10252553A Pending JP2000086257A (en) 1998-09-07 1998-09-07 Production of quartz glass fly eye lens

Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117805948A (en) * 2024-03-01 2024-04-02 河南百合特种光学研究院有限公司 High-temperature sintering method of quartz fly-eye lens

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117805948A (en) * 2024-03-01 2024-04-02 河南百合特种光学研究院有限公司 High-temperature sintering method of quartz fly-eye lens
CN117805948B (en) * 2024-03-01 2024-05-17 河南百合特种光学研究院有限公司 High-temperature sintering method of quartz fly-eye lens

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