JP2000056478A5 - - Google Patents
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- Publication number
- JP2000056478A5 JP2000056478A5 JP1998220864A JP22086498A JP2000056478A5 JP 2000056478 A5 JP2000056478 A5 JP 2000056478A5 JP 1998220864 A JP1998220864 A JP 1998220864A JP 22086498 A JP22086498 A JP 22086498A JP 2000056478 A5 JP2000056478 A5 JP 2000056478A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- side wall
- oxidizing agent
- perbromide
- hypobromite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 2
- JGJLWPGRMCADHB-UHFFFAOYSA-N Hypobromite Chemical compound Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 claims 4
- KHIWWQKSHDUIBK-UHFFFAOYSA-M AC1L4ZKD Chemical compound [O-]I(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-M 0.000 claims 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N Hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M Perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N Perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims 2
- DKSMCEUSSQTGBK-UHFFFAOYSA-M bromite Chemical compound [O-]Br=O DKSMCEUSSQTGBK-UHFFFAOYSA-M 0.000 claims 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tBuOOH Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 claims 2
- DKSMCEUSSQTGBK-UHFFFAOYSA-N Bromous acid Chemical compound OBr=O DKSMCEUSSQTGBK-UHFFFAOYSA-N 0.000 claims 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N Chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 claims 1
- YQHLDYVWEZKEOX-UHFFFAOYSA-N Cumene hydroperoxide Chemical compound OOC(C)(C)C1=CC=CC=C1 YQHLDYVWEZKEOX-UHFFFAOYSA-N 0.000 claims 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N Hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims 1
- GEOVEUCEIQCBKH-UHFFFAOYSA-N Hypoiodous acid Chemical compound IO GEOVEUCEIQCBKH-UHFFFAOYSA-N 0.000 claims 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-N Iodic acid Chemical compound OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 claims 1
- XCRBXWCUXJNEFX-UHFFFAOYSA-N Peroxybenzoic acid Chemical compound OOC(=O)C1=CC=CC=C1 XCRBXWCUXJNEFX-UHFFFAOYSA-N 0.000 claims 1
- XCRBXWCUXJNEFX-UHFFFAOYSA-M benzenecarboperoxoate Chemical compound [O-]OC(=O)C1=CC=CC=C1 XCRBXWCUXJNEFX-UHFFFAOYSA-M 0.000 claims 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-M chlorite Chemical compound [O-]Cl=O QBWCMBCROVPCKQ-UHFFFAOYSA-M 0.000 claims 1
- 229910001919 chlorite Inorganic materials 0.000 claims 1
- 229910052619 chlorite group Inorganic materials 0.000 claims 1
- 229940077239 chlorous acid Drugs 0.000 claims 1
- HDHOHQHZKXFKOS-UHFFFAOYSA-M ethyl benzene hydroperoxide Chemical compound [O-]O.CCC1=CC=CC=C1 HDHOHQHZKXFKOS-UHFFFAOYSA-M 0.000 claims 1
- AAUNBWYUJICUKP-UHFFFAOYSA-N hypoiodite Chemical compound I[O-] AAUNBWYUJICUKP-UHFFFAOYSA-N 0.000 claims 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 claims 1
- 230000001590 oxidative Effects 0.000 claims 1
- CBENFWSGALASAD-UHFFFAOYSA-N ozone Chemical group [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- CZPZWMPYEINMCF-UHFFFAOYSA-N propaneperoxoic acid Chemical compound CCC(=O)OO CZPZWMPYEINMCF-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22086498A JP2000056478A (ja) | 1998-08-04 | 1998-08-04 | サイドウォール除去液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22086498A JP2000056478A (ja) | 1998-08-04 | 1998-08-04 | サイドウォール除去液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000056478A JP2000056478A (ja) | 2000-02-25 |
| JP2000056478A5 true JP2000056478A5 (de) | 2005-10-27 |
Family
ID=16757750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22086498A Pending JP2000056478A (ja) | 1998-08-04 | 1998-08-04 | サイドウォール除去液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000056478A (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6173720B1 (en) * | 1998-12-02 | 2001-01-16 | International Business Machines Corporation | Process for treating a semiconductor substrate |
| AU2003238773A1 (en) * | 2002-06-07 | 2003-12-22 | Mallinckrodt Baker Inc. | Microelectronic cleaning compositions containing oxidizers and organic solvents |
| CN101923294B (zh) | 2004-02-11 | 2013-12-04 | 安万托特性材料股份有限公司 | 含有卤素含氧酸、其盐及其衍生物的微电子清洗组合物 |
| JP4776191B2 (ja) * | 2004-08-25 | 2011-09-21 | 関東化学株式会社 | フォトレジスト残渣及びポリマー残渣除去組成物、並びにそれを用いた残渣除去方法 |
| WO2008114616A1 (ja) | 2007-03-16 | 2008-09-25 | Mitsubishi Gas Chemical Company, Inc. | 洗浄用組成物、半導体素子の製造方法 |
| JP2011520142A (ja) * | 2008-05-01 | 2011-07-14 | アドバンスド テクノロジー マテリアルズ，インコーポレイテッド | 高密度注入レジストの除去のための低ｐＨ混合物 |
-
1998
- 1998-08-04 JP JP22086498A patent/JP2000056478A/ja active Pending
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