JP2000047735A - Active vibration removing device, exposure device, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To lower the sensitivity of the response of a vibration control system to mechanical resonance without deteriorating the response of the vibration control system. SOLUTION: The active vibration removing device equipped with interference elimination control systems 4, 5, 6, and 8 by operation modes which damp the vibration of a vibration removing base, and feedforward means 10 and 11 which apply feedforward signals for canceling a shake of the vibration removing base due to a reaction force accompanying the high-speed positioning or high- speed scanning of a stage to the said control systems according to pieces of position information from position measuring means LA-X, LA-Y, and LA-θ measuring the position of the stage is provided with a filter 7 for lowering the sensitivity to mechanical resonance generated by the application of the feedforward signals in front of a driver 9 which drives electromagnetic actuators LM-Z1, LM-Z2, LM-Z3, LM-X1, LM-Y2, and LM-Y3 applying driving forces to the vibration removing base, or on the supply path of the feedforward signals, the path of a driving signal after distribution, or the supply path of the feedforward signals applied to the said path.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for printing a circuit pattern of a reticle onto a semiconductor wafer, an active vibration isolator used in a liquid crystal substrate manufacturing apparatus or an electron microscope, an exposure apparatus using the same, and an exposure apparatus using the same. Device manufacturing method. More specifically, an active vibration isolator that suppresses external vibrations that propagate to the vibration isolation table and can actively cancel the vibration generated by the precision equipment mounted on the vibration isolation table. The present invention relates to an exposure apparatus provided and a device manufacturing method using the same.

[0002]

2. Description of the Related Art In an exposure apparatus typified by an electron microscope or a stepper using an electron beam, an XY
A stage is mounted. This anti-vibration device has a function of attenuating vibration by vibration absorbing means such as an air spring, a coil spring, and a vibration-proof rubber. However, in the passive vibration isolator having the vibration absorbing means as described above, even if the vibration transmitted from the floor can be attenuated to some extent, the vibration generated by the XY stage mounted on the same device can be effectively reduced. There is a problem that it cannot be attenuated. That is, the reaction force generated by the high-speed movement of the XY stage itself shakes the vibration isolator, and this vibration significantly impairs the positioning and stabilization of the XY stage. In addition, in passive vibration isolators, vibration transmitted from the floor is isolated (vibration isolated).
There is a trade-off between the performance of the XY stage itself and the suppression (vibration suppression) of the vibration generated by the high-speed movement of the XY stage itself. In order to solve these problems, in recent years, active vibration isolators (hereinafter
Active vibration isolators). The active anti-vibration device can eliminate the trade-off between vibration isolation and vibration control within the range of the adjustable mechanism, and above all, obtain performance that cannot be achieved with the passive vibration isolator by applying feed-forward control aggressively. can do.

In the case of an active vibration isolator as well as a passive vibration isolator, when the XY stage mounted on the vibration isolator performs step-and-repeat or step-and-scan, the movement reaction force of the stage is reduced. This causes the anti-vibration table to sway horizontally. Further, since the center of gravity changes due to the movement of the XY stage, the anti-vibration table tilts. After a sufficient time has passed, the swing and the inclination are recovered, but step-and-repeat or step-and-scan are performed at high speed, and the position return operation of the vibration isolation table cannot be completed in time. Such shake and tilt are natural phenomena, but bring disadvantages to the exposure apparatus. This hinders the positioning of the XY stage.

[0004] In view of the obvious cause and effect that the vibration isolation table shakes due to the high-speed movement or high-speed scanning of the stage, the actuator in the active vibration isolation device is driven in advance using the movement information of the stage. A so-called feed-forward technique of canceling the shaking by using the so-called feed-forward technique is introduced. A well-known example is disclosed in
-330874 (anti-vibration apparatus and exposure apparatus)
330875 (anti-vibration device and exposure device).

In the former publication, the amount of vibration of the apparatus main body due to a change in the position of the stage is predicted based on the output of the position measuring means with respect to the stage, and yawing of the main apparatus is particularly suppressed based on the prediction result. The optimum feedforward command value is generated. On the other hand, the latter is a development of the former publication. The aim is to suppress a phenomenon in which the main body structure is vibrated by feedforward input, and as a result, mechanical resonance is excited. In particular,
In order to suppress the occurrence of mechanical resonance, a digital filter is newly inserted in the control loop.

To obtain a more detailed understanding of these publications, FIG. 2 shows an active vibration isolator and XY mounted thereon.
The structure of the stage is shown in FIG. 3 showing the configuration of a decoupling control system for each motion mode applied to the active vibration isolator,
The above prior art will be described with reference to these drawings. First,
In FIG. 2, reference numeral 1 denotes an XY stage mounted on the anti-vibration table 2, and reference numerals 3-1 to 3-2 denote active mounts disposed at the vertices of the substantially triangular anti-vibration table. In each of the active mounts, a position sensor (PO), an acceleration sensor (AC), and a pressure sensor (PR) are used as sensors, and an air spring and a servo valve (SV) for driving the air spring and a linear motor (LM) are used as actuators. Shall be incorporated. However, in this drawing, only an acceleration sensor AC and a linear motor LM are drawn in order to explain a vibration control system using a linear motor (LM).

Next, FIG. 3 shows a configuration of a vibration control system for controlling the movement posture of the vibration isolation table 2 with six degrees of freedom. It should be noted that, unlike the control system described in the above-mentioned publication, the linear motor is not used for position control. An air spring (not shown) plays a role as an actuator for positioning a large-mass anti-vibration table. Servo valve (SV) for controlling the internal pressure of the air spring,
Positioning is performed using a pressure sensor (PR) for using the internal pressure as a monitoring or feedback signal, a position sensor (PO) for positioning, and an acceleration sensor (AC) for damping. Here, acceleration sensors AC-Z1, A as vibration measuring means
C-Z2, AC-Z3, AC-X1, AC-Y2, AC
Using the output of −Y3, linear motors LM-Z1, LM-Z2, LM-Z3, which are representative of the electromagnetic actuator,
Only the configuration of a vibration control system that drives LM-X1, LM-Y2, and LM-Y3 is shown. These linear motors (LM)
Is provided with adjustable damping for each motion mode by the configuration of the motion mode decoupling control system described in detail below, and applies a feedforward signal in such a closed loop. That is, it is used for realizing a vibration control function. Here, the rules of the assigned symbols will be described. AC, LM, PO, SV, PR
The symbols X, Y, and Z following the "-" after the symbol indicate the direction, and the next numbers indicate the site of the active mount. For example, A
C-Y3 means an acceleration sensor that detects the acceleration of the active mount 3-3 in the Y-axis direction.

Referring to FIG. 3, the output of the acceleration sensor is guided to a motion mode extracting means 4 for extracting a motion mode displacement such as translation or rotation of the vibration isolation table 2, and outputs a motion mode acceleration signal (a _x , a _y , a _z , aθ _x , aθ _y , aθ _z ). Next, each motion mode acceleration signal is guided to the integral compensator 5, and its output becomes a speed signal for each motion mode, which is input to the gain compensator 6. After dumping for each motion mode is adjusted here, the motion mode drive signal _{(d x, d y, d} z, dθ x, dθ y, dθ z)
Generate Next, the motion mode drive signal is guided to a filter (FLT) 7 for reducing the sensitivity to mechanical resonance, and its output is input to the motion mode distribution calculating means 8. Here, drive signals (d _z1 , d _z2 , d _z3 , d) for each axis to be generated by the linear motor built in each active mount
_x1 , _dy2 , _dy3 ). These drive signals are output from the linear motors LM-Z1, LM-Z2, LM-Z3, and LM-Z.
X1, LM-Y2, and LM-Y3 are input to the driver 9 that supplies current.

An addition terminal is provided at a stage subsequent to the gain compensator 6. Laser interferometers LA-X, LA-Y, LA-X, LA-X, and XY stage position measuring means mounted on the vibration isolation table 2
The output signal of LA-θ is guided to a feedforward input optimum operation unit 10 that calculates an optimum feedforward input for suppressing the vibration of six degrees of freedom generated in the vibration isolation table in accordance with the output signal. Here, the laser interferometer LA-
X, LA-Y and LA-θ are represented by X axis, Y
Means a laser interferometer that measures the position about the axis and about the Z axis (yaw). Subsequently, the output of the feedforward input optimum operation unit 10 is the feedforward amplifier 1
The signal 1 is applied to the addition terminal at the subsequent stage of the gain compensator 6, that is, to the previous stage of the motion mode distribution calculating means 8. Specifically, a notch filter can be cited as a typical example of the filter (FLT) 7. In this case, since the insertion part of the filter 7 is in front of the motion mode distribution calculating means 8, filtering is performed for each motion mode. However, when considering the mechanism of occurrence of mechanical resonance due to feedforward input, the insertion portion of the filter (FLT) 7 shown in FIG. 3 is inappropriate. This is because, in many cases, the generated mechanical resonance is not a rigid motion mode of the entire vibration isolation table such as translation or rotation, but a local one. For example, a large driving force is generated in the actuator by the feedforward input, but mechanical resonance of the mechanical members in the active mounts 3-1, 3-2, and 3-3 occurs due to the fact that the fastening of the actuator is not rigid. Is almost always done.
In such mechanical resonance, the drive orientation of the actuator differs for each active mount, and the resonance frequency and vibration level also differ for each active mount. These mechanical resonances having different aspects for each of the active mounts are combined as a whole and naturally appear in the output of the motion mode extracting / calculating means 4. However, these mechanical resonances are not translational or rotational motion modes of the vibration isolation table 2. Even if such a signal is filtered by passing through an integration compensator 5 and a gain compensator 6 for each motion mode, and further to a filter (FLT) 7 for each motion mode, the filtering is low for a specific motion mode. Even if the effect of increasing the sensitivity is obtained, not only is there no effect at all for a certain exercise mode, but rather the characteristics are deteriorated. That is, unless filtering is performed in consideration of the mechanism of mechanical co-vibration generated by feedforward input, reduction in sensitivity to mechanical resonance does not function well.

[0010]

As described above, the exposure apparatus has a configuration in which an XY stage for performing excessive acceleration / deceleration is mounted on an active anti-vibration table. Therefore, the main body structure is shaken by the driving reaction force of the stage. At this time, the XY stage mainly swings in the driving direction. However, due to the relationship between the driving force of the XY stage and the center of gravity of the main body structure supported by the active vibration isolator, vibration components other than the driving azimuth actually exist. Further, due to the sequential change of the movement position of the XY stage, the center of gravity of the main body structure also changes to tilt the vibration isolation table. Such a phenomenon is caused by XY
This causes a problem of deteriorating productivity, for example, causing the positioning characteristics of the stage to vary for each moving location.
In order to suppress this phenomenon, a feedforward technique has been introduced, in which information relating to the movement of the stage is obtained, the information is processed, and then the actuator of the active vibration isolator is driven in advance. This is a vibration suppression technology that cancels the vibration by driving the actuator in the active vibration isolator ahead of time based on the information that causes the vibration of the vibration isolation table due to the apparently white cause of the high-speed movement of the XY stage. is there. By introducing the feed forward, the vibration of the anti-vibration table caused by the high-speed movement of the XY stage can be suppressed or reduced. In order to suppress the shaking quickly,
The frequency characteristics of the feedforward input signal need to be rich. However, the excitation of the vibration isolation target by the feedforward input including the high-frequency component easily excites the higher-order resonance of the mechanical system. When this phenomenon occurs, it hinders the positioning of the XY stage. In order to avoid this phenomenon, that is, in order to prevent the mechanical resonance from being excited by the feedforward input, a filter is provided in the feedback loop in the known example. The details of this filter are unknown, but one of the candidates is a notch filter or the like.

However, in such a conventional example, it is considered that the response of the control system to mechanical resonance can be reduced in most cases, but it is inevitable that the response is deteriorated. .

SUMMARY OF THE INVENTION In view of the above-mentioned problems of the prior art, an object of the present invention is to provide an active vibration isolator having a decoupling control system for each motion mode without deteriorating the response of the control system and reducing mechanical resonance. The object is to reduce the response of the control system.

[0013]

In order to achieve this object, according to the present invention, a motion using a feed forward for suppressing the swing of a vibration isolation table caused by a high-speed positioning of a stage or a reaction force by a high-speed scan is provided. In an active anti-vibration device having a mode-dependent decoupling control system, considering the specialty of having a motion mode decoupling control system, an optimal filter for deteriorating the response to the mechanical resonance described above is considered. An insertion site is provided.

That is, according to the present invention, a vibration isolation table supported by at least three active mounts, a stage that is positioned at high speed or moved by high-speed scanning on the vibration isolation table, and incorporated in each of the active mounts, A plurality of electromagnetic actuators for applying a driving force to the anti-vibration table, a plurality of vibration detecting means incorporated in each active mount, and vibrations of the vibration isolating table for each predetermined motion mode from the output of the vibration detecting means. By extracting and compensating, and distributing as a drive signal to each electromagnetic actuator, a motion mode non-interacting control system as a vibration control system that imparts damping to the vibration of the vibration isolation table, According to the position information from the position measuring means for measuring the position of the stage, the stage is positioned at a high speed or a reaction force accompanying a high speed scan is applied. An active vibration isolator that includes a feedforward unit that applies a feedforward signal for canceling the vibration of the vibration isolation table to the motion mode decoupling control system, wherein the active vibration is generated by applying the feedforward signal. The filter for reducing the sensitivity of the mechanical resonance is provided at the previous stage of the driver for driving each electromagnetic actuator or on the supply path of the feedforward signal, or on the path of the drive signal after the distribution or on the feed path. It is provided on a supply path of a forward signal.

As the above-described filter, any one of a notch filter, a band-pass filter, and a low-pass filter can be used.

The exposure apparatus of the present invention is provided with such an active vibration isolator, and prints a circuit pattern of an original onto a substrate on the stage via a projection optical system.

Further, a device manufacturing method of the present invention is characterized in that a device is manufactured by using such an exposure apparatus and performing exposure while removing vibration of the stage by the active vibration removing apparatus.

According to the present invention, the filter for reducing the sensitivity of the mechanical resonance generated by the application of the feedforward signal is arranged at the above-mentioned position.
The sensitivity is reduced in response to local mechanical resonance caused by the feedforward input, and the positioning characteristics and scanning characteristics of the stage are not hindered. Therefore, the productivity of device manufacturing by the exposure apparatus is improved.

[0019]

(Embodiment 1) In a conventional known example, FIG.
As described above, a filter, for example, a notch filter, for suppressing the mechanical resonance of the main unit that occurs when the feedforward is performed is inserted in the front stage of the motion mode distribution calculation means 8. That is, a notch filter for suppressing mechanical resonance generated by feedforward is inserted at a position where a compensation signal for attitude control relating to six degrees of freedom of the rigid body flows. Not only mechanical resonance caused by feedforward but also mechanical resonance can occur even in a closed loop configuration. In such a case, a notch filter may be inserted in the feedback loop. That is, the insertion of the notch filter is a process related to an extremely general control technique.

However, care must be taken when inserting a notch filter into a multi-axis control system such as a motion mode-based decoupling control system. As described above, it should be noted that the occurrence of mechanical resonance most often occurs at a local portion of the main device. That is, the mechanical resonance is a portion where the driving force of the actuator is generated in the active vibration isolation device, and is mostly caused by the low rigidity of the mechanical member. Therefore, in such a case, the aspect of the mechanical resonance differs for each driving force generation site. That is, the mode of mechanical resonance is different for each support leg of the active mount, and the synthesized vibration is mixed into the motion mode signal in the motion mode decoupling control system shown in FIG. is there.

In consideration of the above discussion, in this embodiment, FIG.
Insert a filter (FLT) into the site indicated by. That is, the filter (FLT) 7 is inserted after the motion mode distribution calculation means 8 provided in the motion mode decoupling control system and before the driver 9 that drives the actuators of each axis. In this manner, the sensitivity of the control system to mechanical resonance having different aspects for each axis can be reliably reduced.

Even in the conventional configuration, mechanical resonance can be suppressed in most cases. However, the insertion of the notch filter in the preceding stage of the motion mode distribution calculating means 8, that is, in the portion where the motion mode compensation signal is flowing, is partially required. Although the mechanical resonance is suppressed for the motion mode, it is not effective for the specific motion mode, but may deteriorate the performance. That is, as shown in FIG. 1 of the present embodiment, the filter (FLT) 7 into the decoupling control system for each motion mode is used.
It is necessary to determine the insertion site after fully considering the specialty of the loop configuration for each motion mode and the mechanism of the occurrence of mechanical resonance.

(Embodiment 2) FIG. 4 shows another embodiment of the present invention as a modification of the embodiment of FIG. In the figure, a filter (FL) for lowering the sensitivity to mechanical resonance is used.
T) 7 is inserted after the motion mode distribution calculating means 8 and before the driver 9 as in the case of FIG. The part different from FIG. 1 is the configuration of the feedforward path. In order to suppress the six degrees of freedom swing generated in the vibration isolation table in accordance with the output signals of the laser interferometers LA-X, LA-Y, LA-θ for measuring the position of the XY stage mounted on the vibration isolation table 2. The output of the feed-forward input optimum operation unit 10 for calculating the optimum feed-forward input is input to the feed-forward amplifier 11, and the coordinates for converting this signal from the motion-mode feed-forward signal to the feed-forward signal of each axis. It is led to the conversion unit 12.
The feedforward input of each axis is added after the motion mode distribution calculating means 8 and before the filter 7 for reducing the sensitivity to mechanical resonance.

(Embodiment 3) In each of Embodiments 1 and 2 described above, the filter 7 for reducing the sensitivity of the control system to mechanical resonance is provided in a closed loop called a decoupling control system for each motion mode. Inserted. This is to reduce the mechanical resonance caused by feed forward input by the filter 7 inserted into the closed loop. However, it is also conceivable to eliminate the cause of exciting the mechanical resonance from the beginning. That is, filtering is performed on the feedforward input signal itself so as not to excite mechanical resonance. If a feedforward signal containing no mechanical resonance frequency component is input,
It does not excite the mechanical resonance of the mechanical system.

FIG. 5 illustrates the above idea. Here, a filter 7 is inserted in the feedforward path so that the feedforward signal itself does not include a frequency component that excites mechanical resonance. Here, as the filter 7, a low-pass filter, a band-pass filter, and a notch filter can be used. In the first and second embodiments, the filter 7 for lowering the sensitivity to mechanical resonance is inserted in the closed loop. In this case, at least the stability of the closed loop is not impaired, and the performance as a closed loop system is also deteriorated. In order to suppress the mechanical resonance without any trouble, complicated and delicate parameter adjustment is actually required. On the other hand, as shown in FIG. 5, when the filter 7 is provided in the feedforward path, not only the stability of the decoupling control system for each motion mode, but also its control characteristics are affected by the new insertion of the filter 7. They will not receive it.

<Embodiment of Device Manufacturing Method> Next, an embodiment of a device manufacturing method using the above-described exposure apparatus will be described. FIG. 6 shows a flow of manufacturing micro devices (semiconductor chips such as ICs and LSIs, liquid crystal panels, CCDs, thin-film magnetic heads, micromachines, etc.). In step 1 (circuit design), a device pattern is designed. Step 2 is a process for making a mask on the basis of the designed pattern. On the other hand, in step 3 (wafer manufacture), a wafer is manufactured using a material such as silicon or glass.
Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. The next step 5 (assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer produced in step 4, and includes an assembly process (dicing and bonding).
It includes steps such as a packaging step (chip encapsulation). In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step 7).

FIG. 7 shows the wafer process (step 4).
The detailed flow of is shown. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. In step 15 (resist processing), a resist is applied to the wafer. Step 16 (exposure) uses the above-described exposure apparatus or exposure method to align and print the circuit pattern of the mask on a plurality of shot areas of the wafer.
Step 17 (development) develops the exposed wafer.
In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps,
Multiple circuit patterns are formed on the wafer.

By using the production method of this embodiment, it is possible to produce a large-sized device, which was conventionally difficult to produce, at low cost.

[0029]

The effects of the present invention are as follows. (1) Optimal feedforward is performed according to the movement position of the stage mounted on the anti-vibration table, so that the vibration of the anti-vibration table caused by high-speed positioning of the stage or high-speed scanning is always maintained regardless of the moving position of the stage. Can be suppressed. (2) Since the sensitivity to local mechanical resonance caused by the feedforward input is reduced,
There is an effect that the positioning of the stage or the scanning characteristics is not hindered. (3) Therefore, there is an effect that the productivity of device manufacturing by the exposure apparatus is improved.

[Brief description of the drawings]

FIG. 1 is a block diagram illustrating an active vibration isolation device according to an embodiment of the present invention.

FIG. 2 shows an active vibration isolator and XY mounted thereon.
FIG. 3 is a perspective view showing a structure of a stage.

FIG. 3 is a block diagram illustrating a configuration of a decoupling control system for each motion mode applied to an active vibration isolator according to a conventional example.

FIG. 4 is a block diagram showing an active vibration isolation device according to another embodiment of the present invention.

FIG. 5 is a block diagram showing an active vibration isolation device according to another embodiment of the present invention.

FIG. 6 is a flowchart illustrating a device manufacturing method that can use the exposure apparatus of the present invention.

FIG. 7 is a detailed flowchart of a wafer process in FIG. 6;

[Description of Signs] 1: XY stage, 2: anti-vibration table, 3-1, 3-2, 3-
3: Active mount, 4: Motion mode extraction calculation means, 5:
Integral compensator, 6: gain protector, 7: filter (FL)
T), 8: motion mode distribution calculation means, 9: driver, 1
0: feed forward input optimal operation unit, 11: feed forward amplifier, 12: coordinate conversion unit.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5F046 AA23 CC14 CC16 DA07 5H004 GA09 GB20 HA08 HA12 HB03 HB07 HB09 JA04 JA22 JB08 KA71 KB05 KB30 KB33 LA18 MA12 MA14 MA15

Claims (6)

[Claims] 1. An anti-vibration table supported by at least three active mounts, a stage that is positioned at high speed or moved by high-speed scanning on the anti-vibration table; A plurality of electromagnetic actuators for applying a driving force thereto, a plurality of vibration detecting means incorporated in each active mount, and extracting vibrations for each predetermined motion mode of the vibration isolation table from an output of the vibration detecting means. Compensating and distributing as a drive signal to each electromagnetic actuator to provide a decoupling control system for each motion mode as a vibration control system for imparting damping to the vibration of the anti-vibration table, and a position of the stage In accordance with the position information from the position measuring means for measuring the position, the vibration of the anti-vibration table due to the reaction force accompanying the high-speed positioning of the stage or the high-speed scan is offset. And a feed-forward means for applying a feed-forward signal to the motion-mode decoupling control system to reduce the mechanical resonance caused by the application of the feed-forward signal. An anti-vibration device, wherein a filter is provided in front of a driver for driving each electromagnetic actuator. 2. An anti-vibration table supported by at least three active mounts, a stage to be positioned at high speed or moved by high-speed scan on the anti-vibration table, and the anti-vibration table incorporated in each of the active mounts. A plurality of electromagnetic actuators for applying a driving force to the active mount, a plurality of vibration detecting means incorporated in each active mount, and extracting a vibration for each predetermined motion mode of the vibration isolation table from an output of the vibration detecting means. And a motion-mode decoupling control system as a vibration control system for imparting damping to the vibration of the anti-vibration table by distributing as a drive signal to each electromagnetic actuator; and According to the position information from the position measuring means for measuring the position, the shake of the vibration isolation table due to the reaction force accompanying the high-speed positioning of the stage or the high-speed scan is determined. And a feedforward means for applying a feedforward signal for canceling the motion mode to the decoupling control system for each motion mode, wherein the sensitivity of mechanical resonance generated by the application of the feedforward signal is reduced. An active vibration isolator, wherein a filter is provided in a supply path of the feedforward signal. 3. An anti-vibration table supported by at least three active mounts, a stage for high-speed positioning or high-speed scan movement on the anti-vibration table, and the anti-vibration table incorporated in each of the active mounts. A plurality of electromagnetic actuators for applying a driving force to the active mount, a plurality of vibration detecting means incorporated in each active mount, and extracting a vibration for each predetermined motion mode of the vibration isolation table from an output of the vibration detecting means. And a motion-mode decoupling control system as a vibration control system for imparting damping to the vibration of the anti-vibration table by distributing as a drive signal to each electromagnetic actuator; and According to the position information from the position measuring means for measuring the position, the shake of the vibration isolation table due to the reaction force accompanying the high-speed positioning of the stage or the high-speed scan is determined. And a feedforward means for applying a feedforward signal for canceling the motion mode to the decoupling control system for each motion mode, wherein the sensitivity of mechanical resonance generated by the application of the feedforward signal is reduced. An active anti-vibration device, wherein a filter is provided on a supply path of the drive signal after the distribution or on a supply path of the feedforward signal added to the path. 4. The active vibration isolator according to claim 1, wherein the filter is any one of a notch filter, a band-pass filter, and a low-pass filter. 5. An active vibration isolator according to claim 1, wherein a circuit pattern of an original is printed on a substrate on the stage via a projection optical system. Exposure equipment. 6. A device manufacturing method, wherein a device is manufactured by using the exposure apparatus of claim 5 and performing exposure while performing vibration isolation of the stage by the active vibration isolation apparatus.