JP2000038575A - Aqueous slurry polishing liquid - Google Patents

Aqueous slurry polishing liquid

Info

Publication number
JP2000038575A
JP2000038575A JP20970598A JP20970598A JP2000038575A JP 2000038575 A JP2000038575 A JP 2000038575A JP 20970598 A JP20970598 A JP 20970598A JP 20970598 A JP20970598 A JP 20970598A JP 2000038575 A JP2000038575 A JP 2000038575A
Authority
JP
Japan
Prior art keywords
polishing liquid
starch syrup
aqueous slurry
abrasive grains
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP20970598A
Other languages
Japanese (ja)
Inventor
Teruyuki Nakano
輝幸 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ishii Hyoki Co Ltd
Original Assignee
Ishii Hyoki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ishii Hyoki Co Ltd filed Critical Ishii Hyoki Co Ltd
Priority to JP20970598A priority Critical patent/JP2000038575A/en
Publication of JP2000038575A publication Critical patent/JP2000038575A/en
Withdrawn legal-status Critical Current

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  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an aq. slurry polishing liquid which is free of dirt, a bad odor, and a bad influence on human bodies and can easily be washed away even when attached to wire, etc., by dispersing free abrasive grains in an aq, slurry contg. a starch syrup and a dispersant. SOLUTION: This aq. slurry polishing liquid is prepd. by dispersing free abrasive grains in 1l of an aq. slurry contg. 100-300 g of a starch syrup. 100-500 cc of a dispersant, and optionally a rust preventive contg. a low-pH surfactant. A reducing starch syrup, hardly undergoing thermal change in properties and excellent in heat resistance, is pref. as the starch syrup, examples being a highly saccharified reducing starch syrup, a lowly saccharified reducing starch syrup, and a reducing maltose starch syrup. The dispersant is cellulose microfibers having a thickness of 0.1-0.01 μm and prepd. by applying a strong mechanical shearing force to highly purified plant fibers with an ultrahigh-pressure homogenizer, The aq. slurry polishing liquid is used for wire cutting with a wire saw, and the dispersion stability of the abrasive grains and the attachability thereof give good results.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は水性スラリー研磨液
に関し、例えばワイヤーソー等の加工装置において使用
され、水性スラリー液に遊離砥粒を分散させた水性スラ
リー研磨液に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aqueous slurry polishing liquid, and more particularly to an aqueous slurry polishing liquid used in a processing apparatus such as a wire saw, wherein free abrasive grains are dispersed in the aqueous slurry liquid.

【0002】[0002]

【従来の技術】一般に、半導体用シリコン、セラミック
や石英(水晶)等の硬脆材料からなるインゴット等のワ
ークを一度に多数枚に切断する加工装置としてワイヤー
ソーがある。このワイヤーソーは、所定のテンションに
張設された多数本のワイヤーをワークに押し付け、それ
らワイヤーを往復運転させながら、砥粒の研磨作用によ
りワークを切断するものである。
2. Description of the Related Art In general, there is a wire saw as a processing apparatus for cutting a workpiece such as an ingot made of a hard and brittle material such as silicon for semiconductors, ceramics and quartz (quartz) into many pieces at a time. This wire saw presses a large number of wires stretched to a predetermined tension against a work, and cuts the work by the abrasive action of abrasive grains while reciprocating the wires.

【0003】このワイヤーソーによる切断加工時に使用
される砥粒はワイヤーに固着される場合(固定砥粒方
式)もあるが、油又は水に分散させて油性又は水性スラ
リー研磨液として使用する場合(遊離砥粒方式)が多
い。この遊離砥粒方式では、通常、流動性を調整しやす
い点から、油性スラリー研磨液が多用されている。ま
た、砥粒を水に分散させた水性スラリー研磨液の場合
は、粘度を高め、砥粒の分散保持性を高めるために多量
のグリセリンを含有させている。
[0003] The abrasive grains used in the cutting process using the wire saw are sometimes fixed to the wire (fixed abrasive method), but they are dispersed in oil or water and used as an oily or aqueous slurry polishing liquid ( Loose abrasive method). In this loose abrasive method, an oil-based slurry polishing liquid is generally used in general because it is easy to adjust the fluidity. Further, in the case of an aqueous slurry polishing liquid in which abrasive grains are dispersed in water, a large amount of glycerin is contained in order to increase the viscosity and enhance the dispersion retention of the abrasive grains.

【0004】[0004]

【発明が解決しようとする課題】ところで、油に砥粒を
分散させた油性スラリー研磨液の場合、使用済み液は産
業廃棄物として処理する必要があって一般排水に排水で
きず、また、切断加工中に飛散したスラリー研磨液によ
る切断装置の汚れやオイルミストによる悪臭が激しく、
更に、スラリー研磨液が直接に皮膚に付着するとかゆみ
等の症状が起こり、人体へ悪影響を及ぼすという問題が
あった。
However, in the case of an oily slurry polishing liquid in which abrasive grains are dispersed in oil, the used liquid must be treated as industrial waste and cannot be drained into general wastewater. The cutting device becomes dirty due to the slurry polishing liquid scattered during processing and the odor due to oil mist is intense.
Furthermore, when the slurry polishing liquid directly adheres to the skin, it causes a problem such as itching, which has a problem of adversely affecting the human body.

【0005】一方、水に砥粒を分散させた水性スラリー
研磨液の場合、前述した切断装置の汚れ、悪臭や人体へ
の悪影響などがなく、ワイヤー等に付着しても簡単に洗
い落とすことができて砥粒のリサイクル化も容易である
が、通常、多量のグリセリンを併用するためにその取り
扱いに充分な注意が必要であり、油性スラリー研磨液の
場合と同様、使用済み液を産業廃棄物として処理する必
要があり、一般排水に排水することができないという問
題があった。
On the other hand, in the case of an aqueous slurry polishing liquid in which abrasive grains are dispersed in water, there is no dirt, odor or adverse effect on the human body of the cutting device described above, and even if it adheres to a wire or the like, it can be easily washed off. Although it is easy to recycle the abrasive grains, it is usually necessary to take sufficient care in handling a large amount of glycerin in combination with the use of glycerin. There was a problem that it was necessary to treat and it was not possible to drain to general wastewater.

【0006】そこで、本発明は前述した問題点に鑑みて
提案されたもので、その目的とするところは、一般排水
に排水することができるように有害物質を含有しない素
材をベースにした水性スラリー研磨液を提供することに
ある。
Accordingly, the present invention has been proposed in view of the aforementioned problems, and an object of the present invention is to provide an aqueous slurry based on a material containing no harmful substances so that it can be drained to general wastewater. It is to provide a polishing liquid.

【0007】[0007]

【課題を解決するための手段】前述した目的を達成する
ための技術的手段として、本発明は、食用にも使用でき
る水あめとセルロース繊維の分散剤とを含有する水性ス
ラリー液に遊離砥粒を分散させたことを特徴とする。具
体的に、水あめとして還元水あめが好適であり、また、
分散剤として微小繊維状セルロースが好適である。尚、
本発明の水性スラリー研磨液は、ワイヤーソーによるワ
ーク切断加工に使用することが可能である。
As a technical means for achieving the above-mentioned object, the present invention relates to a method in which free abrasive grains are added to an aqueous slurry liquid containing edible syrup and a dispersant for cellulose fibers. It is characterized by being dispersed. Specifically, reduced starch syrup is suitable as the starch syrup,
Microfibrous cellulose is suitable as a dispersant. still,
The aqueous slurry polishing liquid of the present invention can be used for work cutting by a wire saw.

【0008】本発明では、水あめと分散剤とを含有する
水性スラリー液を使用したことにより、汚れ、悪臭や人
体への悪影響などがなく、ワイヤー等に付着しても簡単
に洗い落とすことができて砥粒のリサイクル化も容易
で、有害物質を含有しないことから一般排水に排水する
ことができる。
In the present invention, since the aqueous slurry containing the syrup and the dispersant is used, there is no dirt, bad smell or adverse effect on the human body, and even if it adheres to a wire or the like, it can be easily washed off. Abrasives can be easily recycled and can be drained into general wastewater because they do not contain harmful substances.

【0009】例えばワイヤーソーに適用する場合の必要
な条件としては、水性スラリー液中に分散させる砥粒の
濃度が一定となるように砥粒の分散安定性が高いこと
や、ワイヤーへの砥粒の付着性が良好であることがあ
る。
For example, when applied to a wire saw, the necessary conditions include that the dispersion stability of the abrasive grains is high so that the concentration of the abrasive grains dispersed in the aqueous slurry liquid is constant, May have good adhesion.

【0010】これらの条件を満足するものとして、本発
明の水性スラリー液では、水あめが水性スラリー液の増
粘効果及びワイヤーへの砥粒の付着性を良くする効果を
発揮し、分散剤として微小繊維状セルロースを使用する
ことにより、前述の水あめとの相乗効果によって砥粒の
分散安定性を高める効果を発揮する。
[0010] Assuming that these conditions are satisfied, in the aqueous slurry liquid of the present invention, syrup exhibits an effect of increasing the viscosity of the aqueous slurry liquid and an effect of improving the adhesion of the abrasive grains to the wire. By using fibrous cellulose, the effect of enhancing the dispersion stability of the abrasive grains is exhibited by a synergistic effect with the aforementioned syrup.

【0011】尚、本発明では、水性スラリー液1リット
ル中に、水あめを100〜300g、分散剤を100〜
500ccの割合で配合することが、前述した水性スラ
リー液の増粘効果、ワイヤーへの砥粒の付着性を良くす
る効果、及び砥粒の分散安定性を高める効果を十分に発
揮できる点で好ましい。
In the present invention, 100 g of starch syrup and 100 g of dispersant are contained in 1 liter of aqueous slurry liquid.
It is preferable to mix at a ratio of 500 cc because the effect of increasing the viscosity of the aqueous slurry liquid, the effect of improving the adhesion of the abrasive grains to the wire, and the effect of increasing the dispersion stability of the abrasive grains can be sufficiently exhibited. .

【0012】[0012]

【発明の実施の形態】本発明に係る水性スラリー研磨液
の実施形態を以下に詳述する。以下の実施形態では、遊
離砥粒方式による加工装置、例えばワイヤーソーに適用
した場合について説明するが、本発明はこれに限定され
ることなく、例えばラッピング装置やポリシング装置な
どの他の加工装置にも適用可能である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the aqueous slurry polishing liquid according to the present invention will be described in detail below. In the following embodiments, a processing apparatus using a loose abrasive method, for example, a case where the present invention is applied to a wire saw will be described.However, the present invention is not limited to this, and may be applied to other processing apparatuses such as a lapping apparatus and a polishing apparatus. Is also applicable.

【0013】この実施形態の水性スラリー研磨液は、水
性スラリー液に遊離砥粒を分散させたものであって、水
あめと分散剤と必要に応じて防錆剤とを、例えばイオン
交換水などの水溶性溶媒に分散させた水性スラリー液を
使用する。このように水あめと分散剤とを含有する水性
スラリー液を使用したことにより、汚れ、悪臭や人体へ
の悪影響などがなく、ワイヤー等に付着しても簡単に洗
い落とすことができて砥粒のリサイクル化も容易で、有
害物質を含有しないことから一般排水に排水することが
できる。
The aqueous slurry polishing liquid of this embodiment is obtained by dispersing free abrasive grains in an aqueous slurry liquid, and comprises a syrup, a dispersant and, if necessary, a rust inhibitor, for example, ion-exchanged water or the like. An aqueous slurry liquid dispersed in a water-soluble solvent is used. The use of the aqueous slurry containing the starch syrup and the dispersant as described above eliminates dirt, odors and adverse effects on the human body. It can be easily converted to general wastewater because it does not contain harmful substances.

【0014】例えばワイヤーソーによるワーク切断加工
において、本発明の水性スラリー研磨液を使用した場
合、水性スラリー液中に分散させる砥粒の濃度が一定と
なるように砥粒の分散安定性が高いことや、ワイヤーへ
の砥粒の付着性が良好である条件が必要となる。これら
の条件に対して、本発明の水性スラリー液に配合された
水あめは、水性スラリー液の増粘効果及びワイヤーへの
砥粒の付着性を良くする効果を発揮し、分散剤との相乗
効果により砥粒の分散安定性を高める効果を発揮し、か
つ、ワーク切断時の潤滑作用を呈する。
For example, when the aqueous slurry polishing liquid of the present invention is used in a workpiece cutting process using a wire saw, the dispersion stability of the abrasive particles is high so that the concentration of the abrasive particles dispersed in the aqueous slurry liquid is constant. Also, a condition is required in which the adhesion of the abrasive grains to the wire is good. Under these conditions, the syrup blended in the aqueous slurry liquid of the present invention exhibits a thickening effect of the aqueous slurry liquid and an effect of improving the adhesion of the abrasive grains to the wire, and has a synergistic effect with the dispersant. Thereby, the effect of enhancing the dispersion stability of the abrasive grains is exhibited, and a lubricating effect at the time of cutting the work is exhibited.

【0015】尚、水あめには多くの種類があり、前述の
効果が得られる限りにおいて、種々のものを使用するこ
とができるが、熱による性質変化が少なく耐熱性に優れ
ている点から還元水あめを使用することが望ましい。例
えば、澱粉の分解によって得られる還元水あめとして、
高糖化還元水あめ、低糖化還元水あめ、還元麦芽糖水あ
め等があり、特に低糖化還元水あめが好適である。
There are many types of starch syrup, and various types can be used as long as the above-mentioned effects can be obtained. However, the reduced starch syrup has a small property change due to heat and is excellent in heat resistance. It is desirable to use For example, as reduced starch syrup obtained by decomposition of starch,
There are a high-saccharified reduced starch syrup, a low-saccharified reduced starch syrup, a reduced maltose starch syrup, and the like. Particularly, a low-saccharified reduced starch syrup is suitable.

【0016】また、分散剤としては、微小繊維状セルロ
ースが好適である。この微小繊維状セルロースは高度に
精製した純植物繊維を原料とし、これに超高圧ホモジナ
イザー処理による強力な機械的剪断力を加えて微小繊維
状にしたものであり、原料の繊維はこの処理によって数
万本に引き裂かれ、繊維の太さは0.1〜0.01μm
まで微小化されている。この微小化により繊維の表面積
が飛躍的に増大するため、セルロース本来の特性である
親水性が著しく強まると共に、微小繊維間の絡み合いが
生じ、水性スラリー液の分散剤として使用した場合に優
れた増粘安定性、分散安定性を示す。
As the dispersant, microfibrous cellulose is preferable. This microfibrous cellulose is made from highly purified pure plant fiber as a raw material, and is subjected to a strong mechanical shearing force by an ultra-high pressure homogenizer to form a microfibrillated fiber. It is torn into ten thousand pieces and the thickness of the fiber is 0.1-0.01μm
It has been miniaturized. Due to the miniaturization, the surface area of the fiber is dramatically increased, so that the hydrophilicity, which is the inherent characteristic of cellulose, is remarkably enhanced, and entanglement between the microfibers is caused. Shows viscosity stability and dispersion stability.

【0017】例えば、水にセルロース繊維固形分1.2
7%を含有させたものを分散剤として使用することによ
り、その微小繊維状セルロースの絡み合いによる網目構
造でもって砥粒が保持され、優れた分散安定性が得られ
る。尚、微小繊維状セルロースがワーク切断時にワイヤ
ーとワークとの間で緩衝材となり、ワークでのクラック
発生も防止する。
For example, a cellulose fiber solid content of 1.2 in water
By using the one containing 7% as a dispersant, the abrasive grains are retained in a network structure by entanglement of the microfibrous cellulose, and excellent dispersion stability is obtained. Note that the microfibrous cellulose serves as a buffer between the wire and the work when the work is cut, thereby preventing cracks in the work.

【0018】更に、防錆剤としては、水に低pHの界面
活性剤を含有させたものが好適である。
Further, as the rust preventive, those containing a low pH surfactant in water are preferred.

【0019】尚、本発明では、水性スラリー液1リット
ル中に、水あめを100〜300g、分散剤を100〜
500ccの割合で配合することが、前述した水性スラ
リー液の増粘効果、ワイヤーへの砥粒の付着性を良くす
る効果、及び砥粒の分散安定性を高める効果を十分に発
揮できる点で好ましい。
In the present invention, 100 g of starch syrup and 100 g of dispersant are added to 1 liter of the aqueous slurry liquid.
It is preferable to mix at a ratio of 500 cc because the effect of increasing the viscosity of the aqueous slurry liquid, the effect of improving the adhesion of the abrasive grains to the wire, and the effect of increasing the dispersion stability of the abrasive grains can be sufficiently exhibited. .

【0020】この配合比において、水あめが100gよ
り少ないと、水性スラリー液の増粘効果や、ワイヤーへ
の砥粒の良好な付着性が得られず、逆に、水あめが30
0gより多いと、粘度が高くなり過ぎ、流動性が悪くな
る。また、分散剤が100ccより少ないと、砥粒を水
性スラリー液に十分に分散させることができず、逆に、
分散剤が500ccより多いと、水あめと同様に粘度が
高くなり過ぎ、流動性が悪くなる。
If the syrup is less than 100 g, the thickening effect of the aqueous slurry liquid and the good adhesion of the abrasive grains to the wire cannot be obtained.
If it is more than 0 g, the viscosity becomes too high and the fluidity becomes poor. On the other hand, if the dispersant is less than 100 cc, the abrasive grains cannot be sufficiently dispersed in the aqueous slurry liquid.
If the amount of the dispersant is more than 500 cc, the viscosity becomes too high as in the case of starch syrup, and the fluidity becomes poor.

【0021】[0021]

【実施例】本出願人は、本発明に係る水性スラリー研磨
液の切断能力を確認するため、図1(a)(b)に示す
実験装置を用いてワークの切削量を測定し、従来品の油
性スラリー研磨液と本発明品の水性スラリー研磨液との
切断能力を比較した。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In order to confirm the cutting ability of the aqueous slurry polishing liquid according to the present invention, the applicant measured the cutting amount of a work using an experimental apparatus shown in FIGS. The cutting abilities of the oily slurry polishing liquid of Example 1 and the aqueous slurry polishing liquid of the present invention were compared.

【0022】尚、図1(a)(b)に示す実験装置は、
ACサーボモータ1によりボールネジ2を介してワーク
3を直線的に往復移動させる。この往復移動するワーク
3に対してウェイト4により所定のテンションで張設さ
れたワイヤー5を押し付けることによってワーク3を切
削する。この切削時、ワーク3と共に往復移動する供給
ノズル6からスラリー研磨液を供給する。
The experimental apparatus shown in FIGS. 1 (a) and 1 (b)
The work 3 is linearly reciprocated by the AC servomotor 1 via the ball screw 2. The work 3 is cut by pressing the wire 5 stretched with a predetermined tension by the weight 4 against the reciprocating work 3. During this cutting, a slurry polishing liquid is supplied from a supply nozzle 6 which reciprocates together with the work 3.

【0023】このワイヤーによる切削速度を140mm
/s、往復回数を100回として定量ポンプにて一定量
のスラリー研磨液を供給ノズルから供給しながらワーク
をワイヤーにより切削する。尚、ワークとしてはシリコ
ンを材質としたものを使用し、そのワークの切削量を3
回測定した。
The cutting speed of this wire is 140 mm
The workpiece is cut with a wire while a fixed amount of slurry polishing liquid is supplied from a supply nozzle by a constant-rate pump with the number of reciprocations set to 100 times / s. The work is made of silicon and the cut amount of the work is 3
Measured times.

【0024】従来品である油性スラリー研磨液は、油性
スラリー液140mlに砥粒(GC#800)180g
を分散させたものを使用した。その結果は、以下の通り
である。
A conventional oily slurry polishing liquid is composed of 180 g of abrasive grains (GC # 800) in 140 ml of the oily slurry liquid.
Was used. The results are as follows.

【0025】 (切削前) (切削後) (切削量) 1回目 16.9283g − 16.9054g = 0.0229g 2回目 16.9054g − 16.8913g = 0.0141g 3回目 16.8913g − 16.8608g = 0.0305g (平均切削量 0.0229g ) 本発明品である水性スラリー研磨液は、前述の水性スラ
リー液180mlに砥粒(GC#800)180gを分
散させたものを使用した。その結果は、以下の通りであ
る。
(Before cutting) (After cutting) (Cutting amount) First time 16.9283g-16.9054g = 0.0229g Second time 16.9054g-16.8913g = 0.0141g Third time 16.8913g-16.8608g = 0.0305g (Average cutting amount 0.0229g) g) As the aqueous slurry polishing liquid of the present invention, an aqueous slurry liquid in which 180 g of abrasive grains (GC # 800) were dispersed in 180 ml of the above-described aqueous slurry liquid was used. The results are as follows.

【0026】 (切削前) (切削後) (切削量) 1回目 16.9374g − 16.8983g = 0.0391g 2回目 16.8983g − 16.8775g = 0.0208g 3回目 16.8775g − 16.8543g = 0.0232g (平均切削量 0.0277g ) 以上の比較結果からも明らかなように、従来品の油性ス
ラリー研磨液による切断能力との比較においても、本発
明品の水性スラリー研磨液による切断能力が十分あるこ
とが判明した。
(Before cutting) (After cutting) (Cutting amount) First time 16.9374g-16.8983g = 0.0391g Second time 16.8983g-16.8775g = 0.0208g Third time 16.8775g-16.8543g = 0.0232g (Average cutting amount 0.0277 g) As is clear from the above comparison results, it was also found that the product of the present invention has sufficient cutting ability with the aqueous slurry polishing liquid in comparison with the cutting ability with the oily slurry polishing liquid of the conventional product.

【0027】また、切削後のワイヤーをマイクロスコー
プで観察した結果、ワイヤー洗浄前と洗浄後の状態を比
較すると、図2に示すようにワイヤー洗浄前において
は、従来品の油性スラリー研磨液〔同図(a)参照〕よ
りも本発明品の水性スラリー研磨液〔同図(c)参照〕
の方が、ワイヤーに付着している砥粒の量が多く、ワイ
ヤーへの砥粒の付着性がよいことが明らかである。一
方、ワイヤー洗浄後においては、従来品の油性スラリー
研磨液〔同図(b)参照〕よりも本発明品の水性スラリ
ー研磨液〔同図(d)参照〕の方が、砥粒が簡単に洗い
落とされてその付着量が少なく十分に除去されているこ
とが明らかである。
Further, as a result of observing the wire after cutting with a microscope and comparing the state before and after the wire cleaning, as shown in FIG. Aqueous slurry polishing liquid of the product of the present invention [see FIG.
It is clear that the larger the amount of the abrasive particles attached to the wire, the better the adhesion of the abrasive particles to the wire. On the other hand, after the wire cleaning, the abrasive grains of the aqueous slurry polishing liquid of the present invention (see FIG. (D)) are easier to form than the conventional oil-based slurry polishing liquid (see FIG. (B)). It is clear that it has been washed away and its adhesion amount is small and sufficiently removed.

【0028】更に、本発明品の水性スラリー研磨液につ
いて、使用後のスラリー液を回収機にかけてその成分を
分析して得られた結果を下表に示す。
Further, the results obtained by analyzing the components of the aqueous slurry polishing liquid of the product of the present invention by subjecting the used slurry liquid to a recovery machine and analyzing the components are shown in the following table.

【0029】[0029]

【表1】 [Table 1]

【0030】上表において、原液自体の成分含有量(左
欄数値)は排水基準値(右欄数値)を上回っている(S
S及び全燐を除く)が、水などの有害性のない適当な溶
媒で希釈することにより、排水基準値をクリアすること
ができて一般排水への排水が可能となる。上表の例で
は、667倍以上の希釈率で希釈すれば、一般排水への
排水が可能である。
In the above table, the component content of the stock solution itself (values in the left column) exceeds the reference value for drainage (values in the right column) (S
By diluting (excluding S and total phosphorus) with a suitable non-hazardous solvent such as water, the wastewater standard value can be cleared and drainage to general wastewater becomes possible. In the example of the above table, draining to general wastewater is possible if the dilution is performed at a dilution ratio of 667 times or more.

【0031】[0031]

【発明の効果】本発明の水性スラリー液では、水あめが
水性スラリー液の増粘効果及びワイヤーへの砥粒の付着
性を良くする効果を発揮することから、従来の油性スラ
リー液と同等もしくはそれ以上の加工能力を維持でき
る。また、水あめという食用素材をベースとしているた
め、人体への悪影響などがなく、水で希釈すれば一般排
水への排水が可能である。更に、水により簡単に洗浄で
きるために砥粒のリサイクルが容易に実現できる。
According to the aqueous slurry liquid of the present invention, since the syrup exhibits the effect of thickening the aqueous slurry liquid and the effect of improving the adhesion of the abrasive grains to the wire, it is equal to or more than the conventional oil-based slurry liquid. The above processing ability can be maintained. In addition, since it is based on edible material such as water syrup, there is no adverse effect on the human body, and if diluted with water, it can be drained to general waste water. Further, the abrasive grains can be easily recycled because they can be easily washed with water.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の実施例において使用した実験
装置を示す概略構成図 (b)は(a)の実験装置のA部拡大図
FIG. 1A is a schematic configuration diagram showing an experimental device used in an embodiment of the present invention. FIG. 1B is an enlarged view of a part A of the experimental device in FIG.

【図2】(a)は従来品の油性スラリー研磨液によるワ
イヤーの表面状態(洗浄前)を示す拡大図 (b)は従来品の油性スラリー研磨液によるワイヤーの
表面状態(洗浄後)を示す拡大図 (c)は本発明品の水性スラリー研磨液によるワイヤー
の表面状態(洗浄前)を示す拡大図 (d)は本発明品の水性スラリー研磨液によるワイヤー
の表面状態(洗浄後)を示す拡大図
FIG. 2A is an enlarged view showing a surface state of a wire with a conventional oily slurry polishing liquid (before cleaning), and FIG. 2B is a view showing a surface state of the wire with a conventional oily slurry polishing liquid (after cleaning). The enlarged view (c) shows the surface state of the wire of the present invention with the aqueous slurry polishing liquid (before washing), and the enlarged view (d) shows the surface state of the wire of the present invention with the aqueous slurry polishing liquid (after washing). Enlarged view

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 水あめと分散剤とを含有する水性スラリ
ー液に遊離砥粒を分散させたことを特徴とする水性スラ
リー研磨液。
An aqueous slurry polishing liquid characterized by dispersing free abrasive grains in an aqueous slurry liquid containing a syrup and a dispersant.
【請求項2】 前記水あめは、還元水あめであることを
特徴とする請求項1記載の水性スラリー研磨液。
2. The aqueous slurry polishing liquid according to claim 1, wherein the syrup is a reduced syrup.
【請求項3】 前記分散剤は、繊維状セルロースである
ことを特徴とする請求項1記載の水性スラリー研磨液。
3. The aqueous slurry polishing liquid according to claim 1, wherein the dispersant is fibrous cellulose.
【請求項4】 ワイヤーソーによるワーク切断加工に使
用されることを特徴とする請求項1、2又は3記載の水
性スラリー研磨液。
4. The aqueous slurry polishing liquid according to claim 1, which is used for cutting a workpiece with a wire saw.
JP20970598A 1998-07-24 1998-07-24 Aqueous slurry polishing liquid Withdrawn JP2000038575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20970598A JP2000038575A (en) 1998-07-24 1998-07-24 Aqueous slurry polishing liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20970598A JP2000038575A (en) 1998-07-24 1998-07-24 Aqueous slurry polishing liquid

Publications (1)

Publication Number Publication Date
JP2000038575A true JP2000038575A (en) 2000-02-08

Family

ID=16577283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20970598A Withdrawn JP2000038575A (en) 1998-07-24 1998-07-24 Aqueous slurry polishing liquid

Country Status (1)

Country Link
JP (1) JP2000038575A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6568996B2 (en) * 2000-10-02 2003-05-27 Mitsubishi Denki Kabushiki Kaisha Polishing agent for processing semiconductor, dispersant used therefor and process for preparing semiconductor device using above polishing agent for processing semiconductor
KR100467872B1 (en) * 1999-05-03 2005-01-24 프랙스에어 에스.티. 테크놀로지, 인코포레이티드 Polishing slurry
WO2016111165A1 (en) * 2015-01-07 2016-07-14 御国色素株式会社 Thickener-containing abrasive-grain slurry and process for producing same
CN107142083A (en) * 2017-06-16 2017-09-08 宿迁德特材料科技有限公司 A kind of cellulose nano-fibrous base lapping liquid and preparation method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100467872B1 (en) * 1999-05-03 2005-01-24 프랙스에어 에스.티. 테크놀로지, 인코포레이티드 Polishing slurry
US6568996B2 (en) * 2000-10-02 2003-05-27 Mitsubishi Denki Kabushiki Kaisha Polishing agent for processing semiconductor, dispersant used therefor and process for preparing semiconductor device using above polishing agent for processing semiconductor
WO2016111165A1 (en) * 2015-01-07 2016-07-14 御国色素株式会社 Thickener-containing abrasive-grain slurry and process for producing same
JPWO2016111165A1 (en) * 2015-01-07 2017-11-09 御国色素株式会社 Thickener-containing abrasive slurry and method for producing the same
CN107142083A (en) * 2017-06-16 2017-09-08 宿迁德特材料科技有限公司 A kind of cellulose nano-fibrous base lapping liquid and preparation method thereof

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