JP2000026631A - Plasma surface treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To surface-treat a workpiece in an upright treatment apparatus in which the workpiece is transferred through a vertically extending passage gap path to thereby prevent it from being damaged as a result of contact with the electrode due to its deflection resulting from its own weight during transfer. SOLUTION: There is provided a plasma surface treatment apparatus consisting of a treatment chamber 2 confined by two walls 2a and 2b which are separable from each other horizontally, the walls 2a and 2b being provided with electrodes 5a and 5b opposed to each other through a passage gap path R for a workpiece W so as to form a vertically extending passage gap path R. The atmosphere inside the apparatus is replaced by a plasma exciting gas, and a voltage is impressed between the opposed electrodes 5a and 5b in this atmosphere. The workpiece W is then continuously transferred from the top of the path R to its lower portion and is surface-treated with the plasma generated between the electrodes 5a and 5b during the transfer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma surface used for surface treatment such as surface modification of a sheet-like, film-like, foil-like, band-like or plate-like material by plasma discharge under atmospheric pressure or reduced pressure. The present invention relates to a processing device.

[0002]

2. Description of the Related Art The term "plasma surface treatment" means, for example, activation of the surface of an object to be processed such as a sheet, film, foil, band, plate or the like to improve adhesion, printability or hydrophilicity. Used for surface modification treatment and the like.

Conventionally, as a plasma surface treatment apparatus of this type, as shown in FIGS. 5 and 6, a processing chamber c is formed by upper and lower walls a and b which can be divided into upper and lower parts, and each wall a and b is formed.
The electrodes d and e are disposed opposite to each other with the passage gap R of the object W to be processed, and helium gas or helium gas is mainly supplied from the gas supply port f to the gas discharge port g in the processing chamber c. Atmosphere filled with an inert gas or an active gas between the electrodes d and e in the processing chamber c by displacing the mixed gas as a component, another inert gas for plasma excitation, or an active gas such as oxygen to pass therethrough. In this atmosphere, a voltage is applied between the electrodes d and e facing each other, and the workpiece W is continuously transferred through a passage gap R extending in a horizontal direction. There is known a structure in which the surface of an object to be processed W is modified by plasma generated between the electrodes d and e due to the passage and transfer of W.

[0004]

However, in the case of the above-mentioned conventional structure, the processing chamber c is formed by a two-separated structure consisting of upper and lower walls a and b, and the respective electrodes are vertically arranged opposite to each other, so that a passage gap is formed. It is formed so as to extend in the vertical direction, and the object to be processed passes horizontally between the upper and lower electrodes, so that the inevitable self-weight bending phenomenon during the transfer of the object to be processed leads to the lower electrode. May cause damage due to contact with the equipment, and the upper wall must be separated and lifted using a crane mechanism for maintenance and internal inspection such as cleaning of each electrode and the surroundings of the processing chamber. In addition, the positioning work between the upper and lower walls and the disconnection of the wiring and piping work take a long time, which reduces the workability of maintenance and inspection. So-called Since a mold structure, the overall installation space for installing the apparatus is increased, it has a disadvantage that it is possible to correspondingly reduce the flexibility of the installation.

[0005]

The object of the present invention is to solve such a problem.
According to the first aspect of the present invention, a processing chamber is formed by two walls that can be separated from each other, and electrodes are disposed on each of the walls so as to be opposed to each other with a passage gap for an object to be processed. The atmosphere inside the processing chamber is replaced with a gas for plasma excitation, a voltage is applied between the electrodes facing each other under the atmosphere, and the processing object is continuously passed and transferred to a passage gap path.
In an apparatus for performing a surface treatment of an object to be processed by plasma generated between the electrodes due to the passage and transfer of the object through the passage gap, the two walls that can be separated from each other have a structure that can be horizontally separated. The above-described electrodes are disposed so as to extend in the up-down direction, and are disposed on the respective walls that can be separated in the horizontal direction. A plasma surface treatment apparatus characterized by being arranged and configured.

According to a second aspect of the present invention, one of the two walls is fixedly arranged on the apparatus body and the other wall is provided by a linear bearing structure provided on the apparatus body. The invention is characterized in that the processing chambers are provided so as to be able to guide movement in the horizontal direction facing the body, and the invention according to claim 3 comprises a plurality of the processing chambers arranged side by side in a horizontal direction. Forming the inlet or outlet of the processing object at the upper part of the processing chamber and forming the inlet or outlet of the processing object at the lower part of each processing chamber, and placing the processing object between the upper part of the adjacent processing chamber or It is characterized in that the object to be processed is bridged between the lower portions to form a transfer path in which the object to be processed is transferred by detour at the vertical position.

[0007]

1 to 4 show an embodiment of the present invention. FIGS. 1 to 3 show a first embodiment and FIG. 4 shows a second embodiment.

In the first embodiment shown in FIGS. 1 to 3, reference numeral 1 denotes an apparatus body. In this case, a processing chamber 2 comprising one wall 2a and the other wall 2b is arranged on the apparatus body 1. The one wall 2a is fixedly arranged on the apparatus body 1, and the other wall 2a
b is provided by a linear bearing structure 3 provided on the apparatus body 1 so as to be movable and guided in a horizontal direction facing one wall 2a.

In this case, as the linear bearing structure 3, a guide rail 3a fixed on the apparatus body 1 and the other wall 2
and a bearing portion 3b fixed to the bottom surface of the second wall 2b, and the other wall 2b can be moved and guided to the left and right in the horizontal direction facing the one wall 2a by sliding engagement between the guide rail 3a and the bearing portion 3b. And one wall 2a and the other wall 2
and a hermetic clamp mechanism 4 that can be detachably connected to b.

The processing chamber 2 is hermetically formed by the left and right walls 2a and 2b which can be divided into two parts in the horizontal direction, and each of the walls 2a and 2b is provided with a passage gap R for the object W to be processed. The electrodes 5a and 5b are disposed so as to face each other, thereby forming the passage gap R extending vertically.
5b is formed in a tubular shape, and the electrodes 5a and 5b may be formed in a rod shape. The coolant is passed through the tubular electrodes 5a and 5b, and the gas supply port 6 and the gas discharge port 7 enter the processing chamber 2.
Helium gas, a mixed gas containing helium gas as a main component, or another inert gas for plasma excitation or an active gas such as oxygen is passed therethrough to replace the gas.
An atmosphere filled with an inert gas or an active gas is provided between the electrodes 5a and 5b, and a voltage is applied between the opposing electrodes 5a and 5b by a power source (not shown) under this atmosphere.

In this case, an inlet 8 for the workpiece W is formed in the upper part of the processing chamber 2 and an outlet 9 for the workpiece is formed in the lower part, so that the workpiece W is moved downward from above. It is configured to be continuously transferred through a passage gap R extending vertically in the processing chamber 2. An outlet 9 for the workpiece W is formed in the upper part of the processing chamber 2 and an inlet 8 for the workpiece is formed in the lower part, so that the workpiece W is moved upward and downward in the processing chamber 2. May be configured to be continuously transported through a passage gap R extending to the side.

Since the first embodiment has the above configuration, the workpiece W enters the processing chamber 2 from the inlet 8 at the upper part of the processing chamber 2 and passes through the processing chamber 2 to the processing chamber 2. Helium gas or helium gas from the gas supply port 6 to the gas discharge port 7 in the processing chamber 2. And a gas filled with an inert gas or an active gas between the electrodes 5a and 5b in the processing chamber 2 is replaced by passing an active gas such as an inert gas for plasma excitation or oxygen or the like. In this atmosphere, a voltage is applied between the opposing electrodes 5a and 5b by a power source (not shown), and the workpiece 5 is moved by passing through the gap R to pass through the electrodes 5a and 5b.
The surface modification of the workpiece W is performed by the plasma generated between 5b.

At this time, the two walls 2a and 2b which can be separated from each other are formed in a structure which can be separated in the horizontal direction, and the passing gap path R is disposed extending in the vertical direction and separated in the horizontal direction. Electrodes 5 which are disposed to face each other with possible gaps R extending in the vertical direction of the workpiece W on each of the possible walls 2a and 2b.
Since the workpieces a and 5b are provided, the workpiece W is transported through the passage gap R extending in the vertical direction. The resulting damage to the workpiece W can be suppressed, and the other wall 2b is separated and moved in the horizontal direction during maintenance and internal inspection such as cleaning of the electrodes 5a and 5b and the surroundings of the processing chamber 2. Therefore, the workability of the maintenance and inspection can be improved, and the so-called vertical structure in which the passage gap R of the workpiece W is in a vertical direction, so that the entire installation for installing the apparatus is performed. Space can be reduced, and the flexibility of installation can be increased accordingly.

In this case, the two walls 2a and 2b
Is fixedly disposed on the apparatus body 1 and the other wall 2b is provided by a linear bearing structure 3 provided on the apparatus body 1 so as to be movable and guideable in the horizontal direction facing the one wall body 2a. The electrodes 5a and 5b and the processing chamber 2
For maintenance such as cleaning of the inside of the inside and inspection of the inside, the linear bearing structure 3 eliminates the need for the work of positioning each of the walls 2a and 2b and the work of separating the wiring pipe, and easily moves the other wall 2b. The workability of maintenance and inspection can be further improved.

The second embodiment shown in FIG. 4 shows an alternative structure. In this case, a plurality of the processing chambers 2 are arranged side by side in a horizontal direction on the apparatus body 1, and the processing chambers 2 are disposed above the processing chambers 2. An inlet portion 8 or an outlet portion 9 of the workpiece W is formed, and an inlet portion 8 or an outlet portion 9 of the workpiece W is formed at a lower portion of each of the processing chambers 2. Alternatively, the workpiece W is bridged between the lower portions to form a transfer path in which the workpiece W is transferred by detour at the vertical position.

In the second embodiment, surface treatments having different treatment contents can be sequentially and successively processed in each processing chamber 2, and an object W to be processed in each processing chamber 2 can be processed. The passage gap R is vertical and the workpiece W
Is bridged between the upper part or the lower part of the adjacent processing chamber 2 to form a transfer path for the workpiece W to be detour-transferred at the upper and lower positions. The installation space can be reduced, and the flexibility of installation can be increased accordingly.

It should be noted that the present invention is not limited to the above-described embodiment, but is designed by appropriately changing the processing chamber 2, the electrodes 5a and 5b, and other structures.
The present invention is not limited to the surface modification treatment, and may be applied to other surface treatments using a plasma treatment technique under reduced pressure or atmospheric pressure, such as removal of a resist pattern after etching of the surface of an integrated circuit substrate and surface coating.

[0018]

As described above, according to the first aspect of the present invention, an object to be processed is transported through a passage gap in a gas atmosphere for plasma excitation in a processing chamber. Surface treatment will be performed by the plasma generated in between, and at this time, the two mutually separable walls are formed in a horizontally separable structure, and the passing gap path extends vertically. The electrodes to be disposed are disposed on the respective walls that can be separated in the horizontal direction, and the electrodes that are disposed to face each other with a passage gap extending in the vertical direction of the object to be processed. Is transferred through the passage gap path extending to the workpiece, and therefore, it is possible to suppress damage to the processing object caused by contact with the electrode due to its own weight bending phenomenon at the time of passing transfer, and furthermore, each electrode and the processing chamber Maintenance such as cleaning around the interior and internal points In this case, since the other wall is separated and moved in the horizontal direction, the workability of maintenance and inspection can be enhanced, and the so-called vertical structure in which the passage of the object to be processed is vertical. Thus, the entire installation space for installing the apparatus can be reduced, and the flexibility of installation can be increased accordingly.

Further, according to the present invention, a linear bearing structure in which one of the two walls is fixedly arranged on the apparatus body and the other wall is provided on the apparatus body. Because it is provided so as to be able to move and guide in the horizontal direction facing one wall body, during maintenance and internal inspection such as cleaning of the surroundings of each electrode and the processing chamber, due to the presence of the linear bearing structure,
The other wall can be easily moved, the workability of maintenance and inspection can be further improved, and in the invention according to the third aspect, the surface treatment having different processing contents can be performed in each processing chamber. In, can be processed sequentially and sequentially, and
The transfer passage in which the passage of the processing object in each processing chamber is in the vertical direction, and the processing object is bridged between the upper part or the lower part of the adjacent processing chamber, so that the processing object is detour-transferred at the vertical position. Since it is a path, the so-called vertical arrangement and the vertical turn-back transfer path can reduce the installation space of the entire apparatus, thereby increasing the flexibility of installation.

As described above, the intended purpose can be sufficiently achieved.

[Brief description of the drawings]

FIG. 1 is a front view of a first embodiment of the present invention.

FIG. 2 is a partially enlarged cross-sectional view of the first embodiment of the present invention.

FIG. 3 is an explanatory sectional view of the first embodiment of the present invention.

FIG. 4 is a front view of a second embodiment of the present invention.

FIG. 5 is a front view of a conventional structure.

FIG. 6 is an explanatory sectional view of a conventional structure.

[Explanation of symbols]

 W Workpiece R Passing gap 1 Equipment body 2 Processing chamber 2a Wall 2b Wall 3 Linear bearing structure 5a Electrode 5b Electrode

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Kenichi Kani 7396-10, Kakizaki, Kakizaki-cho, Nakakubiki-jo-gun, Niigata F-term in Unotex Co., Ltd. (reference) 4F073 AA01 BB01 CA01 CA04 CA09 4K029 AA24 AA25 DA01 FA05 GA02

Claims (3)

[Claims] 1. A processing chamber is formed by two walls that can be separated from each other, and electrodes are disposed on each of the walls so as to be opposed to each other with a clearance passage for an object to be processed. The atmosphere is replaced with a gas for plasma excitation, a voltage is applied between the electrodes facing each other under the atmosphere, and the object to be processed is continuously passed through and transferred to the passage gap. In an apparatus for performing a surface treatment of an object to be processed by plasma generated between the electrodes due to the passage transfer of the object,
The two mutually separable walls are formed in a horizontally separable structure, and the passage gap is vertically extended and disposed. A plasma surface treatment apparatus characterized in that electrodes are disposed so as to face each other with a passage gap extending in the vertical direction. 2. One of the two walls is fixedly disposed on the apparatus body and the other wall is moved in a horizontal direction facing the one wall by a linear bearing structure provided on the apparatus body. 2. The method according to claim 1, wherein the guide is provided.
The plasma surface treatment apparatus as described in the above. 3. A plurality of the processing chambers are arranged side by side in a horizontal direction, an inlet portion or an outlet portion of the processing object is formed at an upper portion of each processing chamber, and the processing object is formed at a lower portion of each processing chamber. An inlet portion or an outlet portion is formed, and the object to be processed is bridged between an upper portion or a lower portion of an adjacent processing chamber, so that the object to be processed is formed in a transfer path in which the object to be processed is bypassed at a vertical position. The plasma surface treatment apparatus according to claim 1 or 2, wherein