JP2000021906A - Manufacture of semiconductor chip - Google Patents

Manufacture of semiconductor chip

Info

Publication number
JP2000021906A
JP2000021906A JP10183177A JP18317798A JP2000021906A JP 2000021906 A JP2000021906 A JP 2000021906A JP 10183177 A JP10183177 A JP 10183177A JP 18317798 A JP18317798 A JP 18317798A JP 2000021906 A JP2000021906 A JP 2000021906A
Authority
JP
Japan
Prior art keywords
cutting
semiconductor chip
resin layer
mold resin
semiconductor chips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10183177A
Other languages
Japanese (ja)
Inventor
Hiroshi Nishitake
宏 西竹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10183177A priority Critical patent/JP2000021906A/en
Publication of JP2000021906A publication Critical patent/JP2000021906A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/27Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/27Manufacturing methods
    • H01L2224/274Manufacturing methods by blanket deposition of the material of the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/731Location prior to the connecting process
    • H01L2224/73101Location prior to the connecting process on the same surface
    • H01L2224/73103Bump and layer connectors
    • H01L2224/73104Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PROBLEM TO BE SOLVED: To manufacture the semiconductor chip having the small outer dimensions through a simplified manufacturing process. SOLUTION: A gap 5 is formed between the neighboring semiconductor chips, by performing the first cutting along a scribe line SL for a wafer W stuck to a sheet S. Then, these semiconductor chips are assembled and set in a metal mold for each sheet S. Molding resin is injected, and the forming surface of a bump 4 is covered flatly with molding resin 6. At the same time, the gap 5 is filed. Then, with the mold resin layer 6 filled in the gap 5 as a mark, a second cutting using a dicing wheel DW is performed. The wafer W is again divided into individual semiconductor chips C1. The bump 4 can be used for facedown mounting intactly on the mounting substrate. No assembling whatever using a lead frame and packaging is required.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は製造工程を大幅に簡
略化でき、しかも外形寸法の小さい半導体チップを製造
可能とする方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method capable of greatly simplifying a manufacturing process and manufacturing a semiconductor chip having a small external size.

【0002】[0002]

【従来の技術】デジタルビデオカメラやデジタル携帯電
話、さらにノート型パーソナル・コンピュータ等の携帯
用電子機器の小型化、薄型化、軽量化を進展させるため
には、機器内部の電子部品の表面実装密度をいかに向上
させるかが重要なポイントである。この電子部品のひと
つ、半導体チップの実装に関しては、パッケージの内部
構造の工夫によりその外形寸法をチップ本体の寸法に近
づけたSOP(スモール・アウトライン・パッケージ)
が種々提案されている。
2. Description of the Related Art In order to develop smaller, thinner, and lighter portable electronic devices such as digital video cameras, digital mobile phones, and notebook personal computers, the surface mounting density of electronic components inside the devices must be increased. The key point is how to improve Regarding the mounting of a semiconductor chip, one of these electronic components, an SOP (Small Outline Package) whose external dimensions are close to the dimensions of the chip body by devising the internal structure of the package
Have been proposed.

【0003】かかるSOPの一例として、リード・オン
・チップ(LOC)型の半導体パッケージの製造プロセ
ス例を図7ないし図10を参照しながら説明する。図7
は、集積回路プロセスがすべて終了したウェーハwを合
成樹脂からなるシートs上に貼着し、ダイシング・ホイ
ールdwを用いてスクライブ・ラインslに沿って該ウ
ェーハwを個々の半導体チップcに切断している状態を
示している。図7(a)はウェーハ全体の概略斜視図、
図7(b)はその要部を拡大した模式的断面図である。
ただし、図7(b)は図示の都合上、図7(a)の縮尺
をそのまま反映させたものではない。このことは、以降
の図面についても同様である。
As an example of such an SOP, an example of a manufacturing process of a lead-on-chip (LOC) type semiconductor package will be described with reference to FIGS. FIG.
Pastes a wafer w on which all integrated circuit processes have been completed onto a sheet s made of synthetic resin, and cuts the wafer w into individual semiconductor chips c along a scribe line sl using a dicing wheel dw. It shows the state where it is. FIG. 7A is a schematic perspective view of the entire wafer,
FIG. 7B is a schematic cross-sectional view in which the main part is enlarged.
However, FIG. 7B does not directly reflect the scale of FIG. 7A for convenience of illustration. This is the same for the subsequent drawings.

【0004】個々の半導体チップcは、予めICが作り
込まれた基板11の上面に電極パッド12が配列され、
この上面が電極パッド12を選択的に露出させる保護用
の絶縁膜13で被覆され、この電極パッド12の露出部
にパンプ14が被着されたものである。ウェーハwには
ダイシング・ホイールdwの切り代として隙間15が形
成される。スクライブ・ラインslに沿った切断をすべ
て終了した後、図8に示されるようにシートsを二次元
平面内で延伸して個々の半導体チップcを分離し、該半
導体チップcをシートsから剥離する。
In each semiconductor chip c, electrode pads 12 are arranged on an upper surface of a substrate 11 on which an IC has been formed in advance.
This upper surface is covered with a protective insulating film 13 for selectively exposing the electrode pad 12, and a pump 14 is attached to an exposed portion of the electrode pad 12. A gap 15 is formed in the wafer w as an allowance for the dicing wheel dw. After all the cutting along the scribe line sl is completed, as shown in FIG. 8, the sheet s is stretched in a two-dimensional plane to separate individual semiconductor chips c, and the semiconductor chips c are separated from the sheet s. I do.

【0005】この後は、組立工程に入る。すなわち、た
とえば図9に示されるように半導体チップcの裏面側を
リードフレームのダイパッド17上にペーストを用いて
接着し、バンプ14に外部リード16を接続(ボンディ
ング)する。続いて、モールド装置を用いて上記半導体
チップcを図10に示されるようにモールド樹脂層18
で被覆し、リードフレームの切断および外部リード16
の曲げ加工を行って半導体パッケージを完成させる。こ
の図に示した例は、外部リード16を半導体パッケージ
cの内側方向にJ字形に曲げており、SOJ(smallout
line J-leaded)パッケージとも呼ばれている。
[0005] Thereafter, an assembly process is started. That is, for example, as shown in FIG. 9, the back side of the semiconductor chip c is adhered to the die pad 17 of the lead frame using a paste, and the external leads 16 are connected (bonded) to the bumps 14. Subsequently, the semiconductor chip c is removed using a molding apparatus as shown in FIG.
, And cutting of the lead frame and external leads 16
To complete the semiconductor package. In the example shown in this figure, the external leads 16 are bent in a J-shape inward of the semiconductor package c, and the SOJ (smallout
line J-leaded) Also called a package.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上述の
ようなSOJパッケージの製造プロセスでは組立てに費
やされる材料や工程数が多い。すなわち、材料としては
リードフレームやモールド樹脂が余分に必要である。ま
た、リードフレームの使用に伴って、ボンディング、リ
ードフレーム不要部の切断、曲げ加工等の各工程が付随
的に発生する他、不要部の切断に伴う産業廃棄物も発生
する。また、外部リードを使用し、半導体チップ全体を
モールド樹脂層で封止していることから、完成品のパッ
ケージの外形寸法の縮小にも限界がある。そこで本発明
は、組立てに要する工程数、必要な材料の種類、材料使
用量、産業廃棄物を削減し、かつ完成品の外形寸法の縮
小も可能とする半導体チップの製造方法を提供すること
を目的とする。
However, in the above-described SOJ package manufacturing process, a large number of materials and a large number of steps are used for assembling. That is, as a material, an extra lead frame or molding resin is required. In addition, with the use of the lead frame, various processes such as bonding, cutting of a lead frame unnecessary portion, bending, and the like are additionally generated, and industrial waste accompanying the cutting of the unnecessary portion is also generated. In addition, since external leads are used and the entire semiconductor chip is sealed with a mold resin layer, there is a limit in reducing the external dimensions of a completed package. Therefore, the present invention provides a method of manufacturing a semiconductor chip which reduces the number of steps required for assembly, the type of material required, the amount of material used, industrial waste, and the outer dimensions of a finished product. Aim.

【0007】[0007]

【課題を解決するための手段】本発明者は、上述の目的
を達成するために検討を重ねる課程で、従来のようにウ
ェーハを切断して個々の半導体チップに分離した後に外
部リードを接続して個別に樹脂モールドを行うのではな
く、複数の半導体チップが1カ所にまとめられている状
態で連続したモールド樹脂層を形成し、しかる後に切断
および分割を行うという発想を得た。複数の半導体チッ
プの集合状態を維持するためには、前述のシートに代表
される様な支持部材を用いる。ただし、ウェーハを単に
全面的にモールド樹脂で被覆してしまうとスクライブ・
ラインの位置が不明となるおそれが大きいので、本発明
ではモールド樹脂による全面被覆を行う前にこのスクラ
イブ・ラインに沿って予め1回目の切断を行って隣接す
る半導体チップ間に隙間を形成しておき、この隙間に入
り込んだモールド樹脂層を目印として2回目の切断を行
う。
SUMMARY OF THE INVENTION In order to achieve the above-mentioned object, the present inventor has repeatedly studied and cut a wafer into individual semiconductor chips and connected external leads as in the prior art. Instead of performing individual resin molding, a continuous molding resin layer is formed in a state where a plurality of semiconductor chips are gathered in one place, and then the idea of cutting and dividing is obtained. In order to maintain the aggregate state of a plurality of semiconductor chips, a support member such as the above-mentioned sheet is used. However, if the wafer is simply covered entirely with mold resin, scribe
Since the position of the line is likely to be unknown, in the present invention, a first cut is made in advance along the scribe line to form a gap between adjacent semiconductor chips before performing the entire coating with the mold resin. Then, the second cutting is performed using the mold resin layer that has entered the gap as a mark.

【0008】本発明により、少なくとも外部接続端子の
形成面がモールド樹脂で封止された半導体チップを製造
することができる。この半導体チップの外部接続端子
は、外部リードを接続することなく、このまま実装基板
上への接続に直接的に用いることができる。したがっ
て、リードフレーム、あるいは半導体チップの周囲を取
り囲む様なモールド樹脂層が不要となり、切断時の個々
の半導体チップの寸法がそのまま最終的な半導体チップ
の寸法となる。
According to the present invention, it is possible to manufacture a semiconductor chip in which at least the surface on which the external connection terminals are formed is sealed with a mold resin. The external connection terminals of the semiconductor chip can be directly used for connection to a mounting substrate without connecting external leads. Therefore, a lead frame or a mold resin layer surrounding the periphery of the semiconductor chip becomes unnecessary, and the dimensions of the individual semiconductor chips at the time of cutting become the final dimensions of the semiconductor chip.

【0009】[0009]

【発明の実施の形態】本発明では、集合状態に置かれた
複数の半導体チップの上面に一括してモールド樹脂層を
形成した後に個々の半導体チップを切り分けるので、基
本的には外部接続端子の配列される上面が樹脂モールド
された半導体チップが得られる。しかし、隣接する前記
半導体チップ間の隙間の大きさと、切断の際の切り代と
の大小関係によっては、側壁面の被覆状態を変えること
ができる。すなわち、1回目の切断により生じた切り代
にそのままモールド樹脂を充填し、1回目の切断時と同
じ切り代にて2回目の切断を行った場合には、該切り代
に充填されたモールド樹脂は除去され、上面のみがモー
ルド樹脂で被覆された半導体チップが得られる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS According to the present invention, after a mold resin layer is collectively formed on the upper surfaces of a plurality of semiconductor chips placed in a collective state, individual semiconductor chips are cut out. A semiconductor chip in which the upper surface to be arranged is resin-molded is obtained. However, depending on the size of the gap between the adjacent semiconductor chips and the cutting margin at the time of cutting, the covering state of the side wall surface can be changed. In other words, when the cutting resin produced by the first cutting is filled with the molding resin as it is and the second cutting is performed with the same cutting margin as that at the time of the first cutting, the molding resin filled in the cutting margin is used. Is removed, and a semiconductor chip having only the upper surface covered with the mold resin is obtained.

【0010】一方、上記隙間の大きさが2回目の切断の
際の切り代よりも大きい場合には、上面に加えて側壁面
もモールド樹脂で被覆された半導体チップが得られる。
この場合としては、上記隙間の大きさをプロセス途中で
広げたり、あるいは2回目の切断の際の切り代を1回目
の切断の際の切り代に比べて小さくしたり、あるいはこ
れらの組合せといった様々なケースが考えられる。実用
的なプロセスとしては、支持部材を二次元平面内で延伸
することにより、隣接する前記半導体チップ間の隙間の
大きさを拡大することが挙げられる。この方法であれ
ば、2回目の切断と1回目の切断の際の切り代が等しく
ても、半導体チップの側壁面にモールド樹脂層を残すこ
とができる。
On the other hand, when the size of the gap is larger than the cutting allowance at the time of the second cutting, a semiconductor chip is obtained in which not only the upper surface but also the side wall surface is covered with the mold resin.
In this case, the size of the gap is increased in the middle of the process, or the cutting margin at the time of the second cutting is made smaller than the cutting margin at the time of the first cutting, or a combination thereof. Case is conceivable. A practical process is to extend the size of the gap between adjacent semiconductor chips by extending the support member in a two-dimensional plane. According to this method, the mold resin layer can be left on the side wall surface of the semiconductor chip even if the margins for the second cutting and the first cutting are equal.

【0011】ところで、上記のモールド樹脂層は、半導
体チップの表面に予め形成されている外部接続端子の少
なくとも上面を露出させていることが必要である。モー
ルド樹脂層と外部接続端子とは、いずれが先に形成され
ていても構わない。モールド樹脂層を先に形成する場合
には、外部接続端子の形成予定部位に窓開けを行ってお
く必要があるので、半導体チップ上の電極パッドとモー
ルド樹脂層のパターンとの位置合わせを正確に行う必要
がある。したがって、実用的なプロセスとしては、外部
接続端子を先に形成しておく方か簡単である。
By the way, the above-mentioned mold resin layer needs to expose at least the upper surface of the external connection terminal formed in advance on the surface of the semiconductor chip. Either the mold resin layer or the external connection terminal may be formed first. When forming the mold resin layer first, it is necessary to open a window at the site where the external connection terminal is to be formed, so that the alignment between the electrode pads on the semiconductor chip and the pattern of the mold resin layer must be accurately performed. There is a need to do. Therefore, it is simpler to form the external connection terminals first as a practical process.

【0012】外部接続端子を先に形成しておく場合に
は、これをモールド樹脂層に最終的に埋没させない工夫
が必要である。したがって、外部接続端子を一旦被覆し
てモールド樹脂層を形成するような場合には、たとえば
この外部接続端子に対して選択性が確保できる条件でモ
ールド樹脂層の膜厚を減ずる様なエッチングを行って外
部接続端子を露出させたり、あるいは感光性のモールド
樹脂を使用し、外部接続端子を被覆する部分のみを露光
と現像により選択的に除去する方法が可能である。本発
明ではさらに簡便な方法として、金型を用いたモールド
を提案する。この金型には、外部接続端子の高さに合わ
せたキャビティが形成されており、このキャビティ内に
複数の半導体チップの集合体をそのままをセットし、該
キャビティ内に樹脂を注入して前記モールド樹脂層を形
成する。この方法であれば、モールド樹脂層の上面と同
一平面内に外部接続端子を露出させることができる。
When the external connection terminals are formed first, it is necessary to take measures to prevent the external connection terminals from being finally buried in the mold resin layer. Therefore, in the case where the external connection terminal is once covered to form the mold resin layer, for example, etching is performed so as to reduce the thickness of the mold resin layer under the condition that the selectivity to the external connection terminal can be secured. It is possible to use a photosensitive mold resin to expose the external connection terminals, or to selectively remove only the portions covering the external connection terminals by exposure and development. The present invention proposes a mold using a mold as a simpler method. In this mold, a cavity corresponding to the height of the external connection terminal is formed. An assembly of a plurality of semiconductor chips is set in this cavity as it is, and a resin is injected into the cavity to form the mold. A resin layer is formed. According to this method, the external connection terminals can be exposed in the same plane as the upper surface of the mold resin layer.

【0013】上記外部接続端子は、半導体チップの最終
製品状態においてこのまま実装基板との電気的接点とし
て用いられるものである。かかる外部接続端子の好適な
形態として、バンプが挙げられる。このバンプは、蒸着
やスパッタリング等の方法により成膜された導電膜をパ
ターニングして得られるものであっても、あるいはワイ
ヤボンダを用いて形成されるスタッドバンプであって
も、さらにあるいは転写バンプ法により配列されるもの
であっても構わない。しかし、モールド樹脂層を金型を
用いて形成する場合には、外部接続端子の上面が平らで
あることが好ましく、したがって導電膜のパターニング
により形成されるものが特に好適である。
The external connection terminal is used as an electrical contact with the mounting substrate as it is in the final product state of the semiconductor chip. A preferred form of such an external connection terminal is a bump. This bump may be obtained by patterning a conductive film formed by a method such as vapor deposition or sputtering, or may be a stud bump formed by using a wire bonder, or further by a transfer bump method. They may be arranged. However, when the mold resin layer is formed using a mold, the upper surface of the external connection terminal is preferably flat, and therefore, the one formed by patterning the conductive film is particularly preferable.

【0014】かかる本発明により製造される半導体チッ
プはベアチップに近いものであるから、半導体チップが
パッケージに封入されていない分、チップと実装基板上
の導体パターンとの間の接続経路を単純化かつ短縮する
ことができ、また実装密度が向上できる分、他チップと
の間の距離も短縮することができる。したがって、電子
機器の小型軽量化はもちろん、信号処理の高速化も期待
できるものである。
Since the semiconductor chip manufactured according to the present invention is close to a bare chip, the connection path between the chip and the conductor pattern on the mounting board is simplified and the semiconductor chip is not sealed in a package. The distance between the chip and other chips can be shortened as much as the mounting density can be improved. Therefore, it is expected that the speed of signal processing can be increased as well as the size and weight of the electronic device.

【0015】[0015]

【実施例】以下、本発明の具体的な実施例について説明
する。実施例1 ここでは、1回目の切断により生じた切り代にそのまま
モールド樹脂を充填し、1回目の切断時と同じ切り代に
て2回目の切断を行うプロセスについて、図1ないし図
4を参照しながら説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments of the present invention will be described. Example 1 Here, a process in which a mold resin is directly filled into a cutting margin generated by the first cutting and a second cutting is performed with the same cutting margin as in the first cutting, see FIGS. 1 to 4. I will explain while.

【0016】図1は、集積回路プロセスがすべて終了し
た直径6インチのウェーハWを合成樹脂からなるシート
S上に貼着し、ダイシング・ホイールDWを用いてスク
ライブ・ラインSLに沿った1回目の切断を行うことに
より、該ウェーハWを個々の半導体チップCに分割して
いる状態を示している。図1(a)はウェーハW全体の
概略斜視図、図1(b)はその要部を拡大した模式的断
面図である。ただし、図1(b)は図示の都合上、図1
(a)の縮尺をそのまま反映させたものではない。この
ことは、以降の図面についても同様である。個々の半導
体チップCは、予めICが作り込まれた基板1の上面に
電極パッド2が配列され、この上面が電極パッド2を選
択的に露出させる保護用の絶縁膜3で被覆され、この電
極パッド2の露出部に高さ100μmのパンプ4が被着
されたものである。個々の半導体チップの寸法は、10
mm×10mmとした。ウェーハWにはダイシング・ホ
イールDWの切り代として幅60μm、深さ0.4mm
の隙間5が形成された。
FIG. 1 shows a state in which a wafer W having a diameter of 6 inches on which an integrated circuit process has been completed is pasted on a sheet S made of a synthetic resin, and the first time along a scribe line SL using a dicing wheel DW. This shows a state in which the wafer W is divided into individual semiconductor chips C by cutting. FIG. 1A is a schematic perspective view of the entire wafer W, and FIG. 1B is a schematic cross-sectional view in which main parts are enlarged. However, for convenience of illustration, FIG.
It does not directly reflect the scale of (a). This is the same for the subsequent drawings. In each semiconductor chip C, electrode pads 2 are arranged on an upper surface of a substrate 1 in which an IC is formed in advance, and the upper surface is covered with a protective insulating film 3 for selectively exposing the electrode pads 2. A pump 4 having a height of 100 μm is attached to an exposed portion of the pad 2. The size of each semiconductor chip is 10
mm × 10 mm. The wafer W has a width of 60 μm and a depth of 0.4 mm as a cutting allowance of the dicing wheel DW.
Gap 5 was formed.

【0017】スクライブ・ラインSLに沿った1回目の
切断をすべて終了した後、図2に示されるように、これ
らの半導体チップCをシートSごと金型Dにセットし
た。この金型Dは、バンプ4の上面に平坦に接し、かつ
ウェーハWの直径に等しい内径を有する円形のキャビテ
ィCAを有し、該キャビティCA内にゲートGを通じて
モールド樹脂を注入するようになされたものである。な
お、図2(b)では図示の都合上、ゲートGがキャビテ
ィCAの端部に水平に接続されているが、円形のキャビ
ティCAの中央部に垂直に接続されていても、あるいは
複数のゲートGが互いの樹脂の流動を阻害しないように
適切に配置されていてもよい。この結果、半導体チップ
Cの上面はバンプ4の上面と同じ高さのモールド樹脂層
6で覆われ、また隙間5もモールド樹脂層6で充填され
た。
After all the first cuts along the scribe line SL have been completed, these semiconductor chips C are set together with the sheets S in a mold D as shown in FIG. The mold D has a circular cavity CA that is in flat contact with the upper surface of the bump 4 and has an inner diameter equal to the diameter of the wafer W, and the molding resin is injected into the cavity CA through the gate G. Things. In FIG. 2B, for convenience of illustration, the gate G is horizontally connected to the end of the cavity CA. However, even if the gate G is vertically connected to the center of the circular cavity CA, or a plurality of gates are connected. G may be appropriately arranged so as not to hinder the flow of the resins. As a result, the upper surface of the semiconductor chip C was covered with the mold resin layer 6 having the same height as the upper surface of the bump 4, and the gap 5 was filled with the mold resin layer 6.

【0018】次に、半導体チップCをシートSごと金型
Dから取り出し、図3に示されるように、先のスクライ
ブ・ラインSLに沿って2回目の切断を行った。このと
き、隙間5に充填されたモールド樹脂層6が切断位置の
目印となる。ここで使用したダイシング・ホイールDW
の切り代は1回目の切断時と同じなので、隙間5に充填
されたモールド樹脂層6が過不足なく除去された。この
2回目の切断により、バンプ形成面が平坦にモールド樹
脂層6で被覆された半導体チップC1が得られた。次
に、図4に示されるようにシートSを二次元平面内で延
伸して個々の半導体チップC1を分離し、該半導体チッ
プC1をシートSから剥離した。この半導体チップC1
は、バンプ4側を下向きにしてこのまま実装基板上に実
装することができる。
Next, the semiconductor chip C was taken out of the mold D together with the sheet S, and as shown in FIG. 3, a second cutting was performed along the scribe line SL. At this time, the mold resin layer 6 filled in the gap 5 serves as a mark of the cutting position. Dicing wheel DW used here
Since the cutting margin is the same as that at the time of the first cutting, the mold resin layer 6 filled in the gap 5 was removed without excess or shortage. By the second cutting, a semiconductor chip C1 in which the bump formation surface was flat and covered with the mold resin layer 6 was obtained. Next, as shown in FIG. 4, the sheet S was stretched in a two-dimensional plane to separate individual semiconductor chips C1, and the semiconductor chips C1 were separated from the sheet S. This semiconductor chip C1
Can be mounted on a mounting substrate with the bumps 4 facing downward.

【0019】実施例2 ここでは、1回目の切断により生じた切り代をシートの
延伸により一旦広げてここにモールド樹脂を充填し、1
回目の切断時と同じ切り代にて2回目の切断を行うプロ
セスについて、図5および図6を参照しながら説明す
る。これらの図中で用いる符号は、前掲の図1ないし図
4と一部共通である。
Example 2 In this example, the cutting allowance generated by the first cutting is temporarily expanded by stretching the sheet, and then filled with a mold resin.
A process of performing the second cutting with the same cutting margin as that at the time of the first cutting will be described with reference to FIGS. The reference numerals used in these figures are partially the same as those in FIGS. 1 to 4 described above.

【0020】まず、前掲の図1に示されるように1回目
の切断を行った後、図5に示されるようにシートSを二
次元平面内で延伸し、隣接する半導体チップCの間の隙
間5aを1mmに拡大させた。次に、実施例1と同様に
金型を用いてモールド樹脂層を6aを形成した。ただ
し、ここで用いた金型のキャビティの寸法は、実施例1
で用いたものよりも大きい。この結果、半導体チップC
の上面はバンプ4の上面と同じ高さのモールド樹脂層6
aで覆われ、また拡大された隙間5aもモールド樹脂層
6aで充填された。
First, after the first cutting as shown in FIG. 1 described above, the sheet S is stretched in a two-dimensional plane as shown in FIG. 5a was enlarged to 1 mm. Next, a mold resin layer 6a was formed using a mold in the same manner as in Example 1. However, the dimensions of the mold cavity used here were the same as those in Example 1.
Larger than those used in. As a result, the semiconductor chip C
The upper surface of the mold resin layer 6 has the same height as the upper surface of the bump 4.
The gap 5a covered and enlarged by the a is also filled with the mold resin layer 6a.

【0021】次に、半導体チップCをシートSごと金型
Dから取り出し、図6に示されるように、隙間5aの中
心線に沿って2回目の切断を行った。このとき、隙間5
aに充填されたモールド樹脂層6aが切断位置の目印と
なる。ここで使用したダイシング・ホイールDWの切り
代は1回目の切断時と同じなので、各隙間5aにおいて
充填されたモールド樹脂層6aの中央部のみが除去され
た。この2回目の切断により、バンプ形成面が平坦にモ
ールド樹脂層6aで被覆されると共に、側壁面もモール
ド樹脂層6aで被覆された半導体チップC2が得られ
た。この半導体チンプC2をシートSから剥離する前
に、該シートSをさらに延伸してもよい。本実施例で製
造される半導体チップC2の外形寸法は、側壁面がモー
ルド樹脂層6aで覆われている分、実施例1の半導体チ
ップC1よりも大きくなるが、それでも従来のSOJパ
ッケージよりは大幅に小型化することができた。
Next, the semiconductor chip C was taken out of the mold D together with the sheet S, and a second cutting was performed along the center line of the gap 5a as shown in FIG. At this time, the gap 5
The mold resin layer 6a filled in “a” serves as a mark of the cutting position. Since the cutting margin of the dicing wheel DW used here was the same as that at the time of the first cutting, only the central portion of the mold resin layer 6a filled in each gap 5a was removed. By this second cutting, a semiconductor chip C2 was obtained in which the bump formation surface was covered with the mold resin layer 6a flat and the side wall surface was also covered with the mold resin layer 6a. Before the semiconductor chip C2 is separated from the sheet S, the sheet S may be further stretched. The outer dimensions of the semiconductor chip C2 manufactured in the present embodiment are larger than those of the semiconductor chip C1 of the first embodiment because the side wall surface is covered with the mold resin layer 6a, but still larger than those of the conventional SOJ package. Could be downsized.

【0022】以上、本発明の具体的な実施例を2例挙げ
たが、本発明はこれらの実施例に何ら限定されるもので
はない。たとえば、個々の半導体チップの形状や外形寸
法、該半導体チップを構成する材料膜の膜厚、金型の構
造、キャビティの寸法、隣接する半導体チップ間の隙間
の大きさ等の細部については、適宜選択、変更、組合せ
が可能である。
Although two specific embodiments of the present invention have been described above, the present invention is not limited to these embodiments. For example, the details such as the shape and external dimensions of each semiconductor chip, the thickness of the material film constituting the semiconductor chip, the structure of the mold, the dimensions of the cavity, the size of the gap between adjacent semiconductor chips, etc. Selection, modification and combination are possible.

【0023】[0023]

【発明の効果】以上の説明からも明らかなように、本発
明の半導体チップの製造方法によれば組立てに要する工
程数、必要な材料の種類、材料使用量、産業廃棄物を削
減し、かつ完成品の外形寸法も縮小することができる。
したがって、短い製造時間、少ない製造コスト、優れた
生産性をもって高密度実装に適する半導体チップを製造
することが可能となり、ひいてはこの半導体チップを搭
載した電子機器の小型軽量化、高性能化が図られる。
As is apparent from the above description, according to the method of manufacturing a semiconductor chip of the present invention, the number of steps required for assembly, the type of material required, the amount of material used, the amount of industrial waste is reduced, and The external dimensions of the finished product can also be reduced.
Therefore, it is possible to manufacture a semiconductor chip suitable for high-density mounting with a short manufacturing time, a small manufacturing cost, and excellent productivity, and thereby to reduce the size, weight, and performance of an electronic device equipped with this semiconductor chip. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明を適用したプロセス例において1回目の
切断を行っている状態を示す図であり、(a)はウェー
ハ全体の概略斜視図、(b)はその要部を拡大した模式
的断面図である。
FIGS. 1A and 1B are diagrams showing a state in which a first cutting is performed in a process example to which the present invention is applied, wherein FIG. 1A is a schematic perspective view of the whole wafer, and FIG. It is sectional drawing.

【図2】本発明の第1の実施の形態において、金型を用
いて図1のウェーハの全面にモールド樹脂層を形成した
状態を示す模式的断面図であり、(a)はウェーハ全体
の概略斜視図、(b)はその要部を拡大した模式的断面
図である。
FIG. 2 is a schematic cross-sectional view showing a state in which a mold resin layer is formed on the entire surface of the wafer of FIG. 1 using a mold in the first embodiment of the present invention, and FIG. FIG. 1B is a schematic perspective view, and FIG.

【図3】図2のウェーハに対して2回目の切断を行って
いる状態を示す図であり、(a)はウェーハ全体の概略
斜視図、(b)はその要部を拡大した模式的断面図であ
る。
3A and 3B are diagrams showing a state in which a second cutting is performed on the wafer of FIG. 2, wherein FIG. 3A is a schematic perspective view of the entire wafer, and FIG. FIG.

【図4】図3のシートを延伸して半導体チップを分離し
ている状態を示す図であり、(a)はウェーハ全体の概
略斜視図、(b)はその要部を拡大した模式的断面図で
ある。
4A and 4B are diagrams showing a state in which the semiconductor chip is separated by stretching the sheet of FIG. 3, wherein FIG. 4A is a schematic perspective view of the entire wafer, and FIG. FIG.

【図5】本発明の第2の実施の形態において、1回目の
切断を終えたウェーハを貼着したシートを延伸して半導
体チップを分離している状態を示す図であり、カーはウ
ェーハ全体の概略斜視図、(b)はその要部を拡大した
模式的断面図である。
FIG. 5 is a view showing a state in which a semiconductor chip is separated by stretching a sheet to which a wafer after the first cutting is adhered in the second embodiment of the present invention; FIG. 1B is a schematic cross-sectional view in which main parts are enlarged.

【図6】図5のウェーハの全面にモールド樹脂層を形成
し、2回目の切断を行っている状態を示す図であり、
(a)はウェーハ全体の概略斜視図、(b)はその要部
を拡大した模式的断面図である。
FIG. 6 is a diagram showing a state in which a mold resin layer is formed on the entire surface of the wafer of FIG. 5 and a second cutting is performed;
(A) is a schematic perspective view of the entire wafer, and (b) is a schematic cross-sectional view in which main parts are enlarged.

【図7】従来のプロセス例においてウェーハの切断を行
っている状態を示す図であり、(a)はウェーハ全体の
概略斜視図、(b)はその要部を拡大した模式的断面図
である。
FIGS. 7A and 7B are views showing a state in which a wafer is being cut in a conventional process example, wherein FIG. 7A is a schematic perspective view of the entire wafer, and FIG. 7B is a schematic cross-sectional view in which main parts are enlarged. .

【図8】図7のシートを延伸して半導体チップを分離し
ている状態を示す図であり、(a)はウェーハ全体の概
略斜視図、(b)はその要部を拡大した模式的断面図で
ある。
8A and 8B are diagrams showing a state in which the semiconductor chip is separated by stretching the sheet of FIG. 7, wherein FIG. 8A is a schematic perspective view of the whole wafer, and FIG. FIG.

【図9】分離された図8の半導体チップに外部リードを
接続している状態を示す模式的断面図である。
9 is a schematic cross-sectional view showing a state where external leads are connected to the separated semiconductor chip of FIG. 8;

【図10】モールド樹脂層の形成および外部リードの曲
げ加工を行って半導体パッケージを完成させた状態を示
す模式的断面図である。
FIG. 10 is a schematic sectional view showing a state where a semiconductor package is completed by forming a mold resin layer and bending external leads.

【符号の説明】[Explanation of symbols]

1…基板 2…電極パッド 3…絶縁膜 4…バンプ
5…隙間 6,6a…モールド樹脂層 C,C1,C2
…半導体チップ S…シート DW…ダイシング・ホイ
ール SL…スクライブ・ライン W…ウェーハ D…
金型 CA…キャビティ G…ゲート
DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Electrode pad 3 ... Insulating film 4 ... Bump
5: gap 6, 6a: mold resin layer C, C1, C2
... Semiconductor chip S ... Sheet DW ... Dicing wheel SL ... Scribe line W ... Wafer D ...
Mold CA… Cavity G… Gate

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 集積回路の形成された半導体基板の裏側
に支持部材を貼着し、スクライブ・ラインに沿った1回
目の切断により該半導体基板のみを表側から切断する第
1工程と、 前記1回目の切断により形成された個々の半導体チップ
の集合状態を維持したまま、隣接する該半導体チップ間
の隙間も含めてこれら半導体チップの上面をモールド樹
脂層で被覆する第2工程と、 前記隙間に沿った2回目の切断により前記モールド樹脂
層を切断して再び個々の半導体チップを形成する第3工
程と、 前記個々の半導体チップを前記支持部材から剥離する第
4工程とを有することを特徴とする半導体チップの製造
方法。
A first step of attaching a support member to the back side of a semiconductor substrate on which an integrated circuit is formed, and cutting only the semiconductor substrate from the front side by a first cutting along a scribe line; A second step of covering the upper surfaces of these semiconductor chips with a mold resin layer, including the gaps between adjacent semiconductor chips, while maintaining the aggregate state of the individual semiconductor chips formed by the second cutting; A third step of cutting the mold resin layer by a second cutting along to form individual semiconductor chips again, and a fourth step of peeling the individual semiconductor chips from the support member. Semiconductor chip manufacturing method.
【請求項2】 前記隙間の大きさを、前記1回目の切断
および前記2回目の切断の際の切り代と等しくすること
を特徴とする請求項1記載の半導体チップの製造方法。
2. The method of manufacturing a semiconductor chip according to claim 1, wherein the size of the gap is made equal to a cutting margin at the time of the first cutting and the second cutting.
【請求項3】 前記隙間の大きさを、前記2回目の切断
の際の切り代よりも大とすることを特徴とする請求項1
記載の半導体チップの製造方法。
3. The method according to claim 1, wherein the size of the gap is larger than a cutting margin at the time of the second cutting.
The manufacturing method of the semiconductor chip described in the above.
【請求項4】 前記1回目の切断を行った後に前記支持
部材を二次元平面内で延伸することにより、隣接する半
導体チップ間の前記隙間の大きさを該1回目の切断の際
の切り代よりも大とすることを特徴とする請求項3記載
の半導体チップの製造方法。
4. The size of the gap between adjacent semiconductor chips by extending the support member in a two-dimensional plane after performing the first cutting, so that a margin for the first cutting is provided. 4. The method for manufacturing a semiconductor chip according to claim 3, wherein the value is larger than the value.
【請求項5】 前記第2工程では、前記個々の半導体チ
ップの表面に予め形成されている外部接続端子の上面を
露出させるごとく前記モールド樹脂層を形成することを
特徴とする請求項1記載の半導体チップの製造方法。
5. The method according to claim 1, wherein in the second step, the mold resin layer is formed so as to expose an upper surface of an external connection terminal formed in advance on a surface of each of the semiconductor chips. A method for manufacturing a semiconductor chip.
【請求項6】 前記第2工程では、前記外部接続端子の
高さに合わせた金型のキャビティ内に樹脂を注入して前
記モールド樹脂層を形成することにより、該モールド樹
脂層の上面と同一平面内に該外部接続端子を露出させる
ことを特徴とする請求項5記載の半導体チップの製造方
法。
6. In the second step, the mold resin layer is formed by injecting a resin into a cavity of a mold corresponding to the height of the external connection terminal, so that the mold resin layer has the same upper surface as the mold resin layer. 6. The method according to claim 5, wherein the external connection terminals are exposed in a plane.
【請求項7】 前記外部接続端子がバンプであることを
特徴とする請求項6記載の半導体チップの製造方法。
7. The method according to claim 6, wherein the external connection terminals are bumps.
JP10183177A 1998-06-30 1998-06-30 Manufacture of semiconductor chip Pending JP2000021906A (en)

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JP10183177A JP2000021906A (en) 1998-06-30 1998-06-30 Manufacture of semiconductor chip

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Publication Number Publication Date
JP2000021906A true JP2000021906A (en) 2000-01-21

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002063683A2 (en) 2001-02-09 2002-08-15 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor device and a semiconductor device obtained by means of said method
WO2002097877A1 (en) * 2001-05-28 2002-12-05 Infineon Technologies Ag A method of packaging a semiconductor chip
CN100380653C (en) * 2004-09-30 2008-04-09 株式会社东芝 Semiconductor device and method of manufacturing semiconductor device
JP2010182904A (en) * 2009-02-06 2010-08-19 Fujitsu Ltd Method of manufacturing semiconductor device
EP3381693A1 (en) * 2017-03-30 2018-10-03 Konica Minolta, Inc. Method for producing head chip and method for producing inkjet head

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002063683A2 (en) 2001-02-09 2002-08-15 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor device and a semiconductor device obtained by means of said method
EP1360722A2 (en) * 2001-02-09 2003-11-12 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor device and a semiconductor device obtained by means of said method
EP1360722B1 (en) * 2001-02-09 2016-12-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method of manufacturing a semiconductor device
WO2002097877A1 (en) * 2001-05-28 2002-12-05 Infineon Technologies Ag A method of packaging a semiconductor chip
CN100380653C (en) * 2004-09-30 2008-04-09 株式会社东芝 Semiconductor device and method of manufacturing semiconductor device
JP2010182904A (en) * 2009-02-06 2010-08-19 Fujitsu Ltd Method of manufacturing semiconductor device
EP3381693A1 (en) * 2017-03-30 2018-10-03 Konica Minolta, Inc. Method for producing head chip and method for producing inkjet head

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