JP2000021321A - Partition for plasma display panel and plasma display panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a partition for plasma display panel and a plasma display panel using the same which can improve the adhesion between the partition and a fluorescent layer, while improving quality and yield of products. SOLUTION: In a partition for plasma display panel which comprises a glass frit serving as a base material for fusion of a partition 3 and an aggregate for mainly keeping the shape and strength of the partition 3 as main components, the partition 3 contains 35 to 90 wt.% of Bi base glass in the glass frit component.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a partition for a plasma display panel and a plasma display panel using the same.

[0002]

2. Description of the Related Art A plasma display panel (PDP), which is a gas discharge panel, is provided with a pair of electrodes regularly arranged on two opposing glass substrates, and mainly comprises Ne, He, Xe, etc. therebetween. It has a structure in which a rare gas is sealed. Then, a voltage is applied between these electrodes, and a discharge is generated in minute cells around the electrodes, so that each cell emits light and display is performed.
In order to display information, cells arranged regularly are selectively discharged and emitted. There are two types of PDPs, a direct current type (DC type) in which the electrodes are exposed to the discharge space, and an alternating current type (AC type) in which the electrodes are covered with an insulating layer. And a refresh driving method and a memory driving method.

In a DC PDP and an AC PDP, each cell is formed by holding two glass substrates facing each other by partition walls. Such a partition, in order to obtain a high-luminance light emission by making the display discharge space as large as possible,
It is required to be perpendicular to the glass substrate and to have a small width and a sufficient height. Especially high definition PD
In P, for example, the width is 30 to 5 with respect to the height of 100 μm.
A partition having a high aspect ratio of 0 μm is required.

Conventionally, a partition wall in a PDP has been made of a composition comprising a glass frit, an aggregate, and a colorant, and an organic vehicle obtained by dissolving ethyl cellulose and an acrylic resin which disappear by firing in a solvent such as terpineol or butyl carbitol. A method of printing and drying the paste kneaded by the rolls or the like in a pattern by screen printing until a desired height is obtained, followed by baking; or coating and drying by screen printing, blade coating, die coating or the like to form a solid film. Thereafter, a mask having sand blast resistance is formed in a pattern on the solid film, sand blasting is performed, and the mask is peeled off and fired.

[0005] A phosphor layer is provided on the side surfaces of the partition walls formed on the back plate (one glass substrate) and between the partition walls. Such a phosphor layer is
After formation of the partition walls, a photosensitive phosphor layer coating composition is applied, exposed, and developed to be arranged and formed at predetermined positions.

[0006]

However, in forming such a phosphor layer, it cannot be said that the adhesion between the partition and the phosphor layer is sufficient. In particular, the phosphor near the upper end of the side wall of the partition. Peeling of the layer sometimes occurred. If the adhesion is extremely poor, the phosphor layer itself may fall off during development.

The present invention has been made in view of the above circumstances, and an object of the present invention is to improve the adhesion between a partition and a phosphor layer, thereby improving the quality and yield of a product. An object of the present invention is to provide a panel partition and a plasma display panel using the same.

[0008]

SUMMARY OF THE INVENTION In order to solve such problems, the present invention mainly comprises a glass frit serving as a molten matrix of a partition and an aggregate mainly for maintaining the shape and strength of the partition. , Wherein the partition contains 35 to 90 wt% of Bi-based glass among glass frit components.

The present invention also relates to a plasma display panel having a partition for partitioning a discharge space and a phosphor layer attached to the partition, wherein the partition is made of 35 to 50% of Bi-based glass among glass frit components. It is configured to be contained at a ratio of 90 wt%.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Before describing the composition of the barrier ribs for a plasma display panel according to the present invention, the structure of the whole plasma display panel will be briefly described.

FIG. 1 is a perspective view showing an example of the configuration of an AC type PDP. In this figure, reference numeral 1 denotes a front plate, and reference numeral 2
Is a back plate, 3 is a partition, 4 is a sustain electrode, 5 is a bus electrode, 6 is a dielectric layer, 7 is an MgO layer, 8 is an address electrode, and 9 is a phosphor layer. .

FIG. 1 shows a front panel 1 and a rear panel 2 separated so that the configuration of the PDP can be easily understood. As shown in FIG. 1, an AC type PDP has a front plate 1 and a rear plate 2 made of glass plates which face each other in parallel with each other, and a partition wall 3 erected on the rear plate 2 to separate the front plate 1 and the rear plate 2. Are fixed at regular intervals so as to form a sealed cell.

On the back side of the front plate 1, a composite electrode composed of a sustain electrode 4 as a transparent electrode and a bus electrode 5 as a metal electrode is formed in parallel with each other, and a dielectric layer 6 and MgO layers 7 are sequentially formed.

On the front side (upper side in the drawing) of the back plate 2, address electrodes 8 are formed parallel to each other in the form of stripes so as to be orthogonal to the composite electrode and located between the partition walls 3. A phosphor layer 9 is provided on the bottom surface of the cell on the electrode 8.

FIG. 2 shows a detailed structure of the cross section. According to this figure, an address electrode 8 is provided after a base layer 10 is formed on a glass substrate 2, and a dielectric layer 6 'is further formed. After the lamination, the partition 3 and the phosphor layer 9 are provided.

Such an AC type PDP is of a surface discharge type, in which a predetermined voltage is applied from an AC power source between composite electrodes on the front panel 1 to form an electric field, whereby the front panel 1, the rear panel 2 and the partition wall are formed. The discharge is performed in each cell as a display element defined by the cells 3 and 3.

By causing the phosphor 9 to emit light by ultraviolet rays generated by the discharge, the light transmitted through the front plate 1 can be visually recognized by an observer.

FIG. 3 shows an example of the configuration of a DC type PDP. FIG. 3 (a) is a plan view and FIG.
FIG. 3B is a cross-sectional view taken along line XX in FIG. In the figure, reference numeral 11 denotes a front plate, reference numeral 12 denotes a rear plate, reference numeral 13 denotes a cathode, reference numeral 14 denotes an electrode body, reference numeral 15 denotes a display anode,
Reference numeral 16 denotes a partition wall, reference numeral 17 denotes a discharge cell, reference numeral 18 denotes a terminal portion, reference numeral 19 denotes a resistor, reference numeral 20 denotes an auxiliary electrode, reference numeral 21
Denotes an electrode body, 22 denotes a phosphor layer, and 23 denotes a priming slit.

As shown in FIG. 3, a DC type PDP is
The two glass substrates of the front plate 11 and the rear plate 12 are combined to form a panel, and a first electrode group including a cathode 13 is formed on the front plate 11, and the first electrode group is electrically formed on the rear plate 12. A second electrode group including four connected electrodes and the display anode 15 is formed. The front plate 11 and the back plate 12 are opposed to each other by the partition 16 so that the cathode 13 and the display anode 15 are substantially orthogonal to each other, thereby forming a discharge cell 17. The cathode 13 and the electrode body 14 in the discharge cell 17 form a unit discharge electrode pair.

The display anode 15 includes a linear portion 15a and a protrusion 15b protruding laterally from the linear portion 15a, and a terminal portion 18 extends from the electrode body 14 in parallel with the display anode 15. The projection 15 b of the display anode 15 and the terminal 18 of the electrode body 14 are electrically connected by a resistor 19. Further, an auxiliary anode 20 is provided between the adjacent display anodes 15 in parallel with the display anode 15, and an electrode body 21 is provided on the auxiliary anode 20 at a position intersecting with the cathode 13.

In a DC type PDP, a cathode 13 and a display anode 1 are used.
5, a current flows through the electrode body 14 through the resistor 19, and the cathode 13 in the discharge cell 17.
A discharge is generated between the electrode body 14 and the electrodes 14, and the ultraviolet rays generated by the discharge cause the phosphor layers 22 of, for example, R, G, B and three colors to emit light. This light emission is radiated to the outside through the front panel 11, and a full-color image display is performed. In this case, the auxiliary anode 18 charges the charged particles serving as a pilot light in the discharge cell 17 with the priming slit 23.
Has the role of supplying through. Reference numeral 24 denotes a dielectric layer, which electrically isolates the display anode 15, the terminal portion 18, the resistor 19, and the auxiliary anode 20 from the discharge space, and limits the discharge generation location to only the electrode members 14 and 21.

The partition wall 3 and the partition wall 16 for the PDP in the present invention (hereinafter, the partition wall 3 will be described as a representative).
A method of pattern-printing a partition-forming coating composition in a partition shape by screen printing, or a method of applying a partition-forming coating composition by screen printing, blade coating, die coating, etc., followed by drying to form a solid film. A mask having sandblast resistance is formed in a pattern thereon, sandblasting is performed, the mask is peeled off, and then fired.

The partition walls 3 formed after such firing are:
A glass frit serving as a molten matrix of the partition wall 3;
And an aggregate for maintaining the shape and strength of the partition wall.

In the partition 3 of the present invention, Bi-based glass among glass frit components serving as a molten matrix of the partition 3 is 35%.
To 90 wt%, preferably 50 to 90 wt%, more preferably 65 to 70 wt%. If this value is less than 35% by weight, a disadvantage arises in that a particularly remarkable effect of improving the adhesion between the partition walls and the phosphor layer cannot be expected. On the other hand, when this value exceeds 90 wt%,
There is a disadvantage that the ribs (partitions) have many defects and cannot be used. Here, the Bi-based glass is a glass containing Bi as a main component, and Bi ₂ O ₃ , Bi
A glass containing ₂ O ₃ —ZnO—B ₂ O ₃ or the like as a main component can be exemplified as a preferable glass. One type of Bi-based glass may be used, or a mixture of two or more types may be used. As described above, the glass frit other than the Bi-based glass having the predetermined content range used in the present invention is not particularly limited. However, in general, lead-based glass is used because of a large supply amount and low cost. Used.

Glass frit is a binder (adhesive)
And its glass transition point (T
g) is desirably not lower than the temperature at which the resin used as the paste in the coating composition completely disappears by firing. Further, the softening point of the glass frit must be lower than the temperature at which the glass substrate is deformed. Specifically, Tg
Is appropriately selected from 350 to 500 ° C and the softening point is from 400 to 600 ° C. Furthermore, in order to minimize residual strain and suppress the occurrence of substrate warpage and cracks in the dielectric layer, the coefficient of thermal expansion (α) of the glass frit should be set to the same value as that of the glass substrate, underlayer, and dielectric layer. Need to match. Therefore, specifically, α = 60 to 90 × 10 ⁻⁷ /
Although it is desirable to use about ° C. things, aggregate, because α is changed by adding a colorant, and α at the time of the final partition wall 3 is 60~90 × 10 ^-7 / ℃ about What is necessary is just to select suitably. The average particle size of the glass frit is 0.
It can be in the range of 1 to 10 μm, preferably 1 to 5 μm. The content of the glass frit in the partition wall 3 is 4
0 to 95 wt%, preferably about 60 to 90 wt%.

The aggregate contained in the partition wall 3 of the present invention includes, for example, alumina, silica, zirconia, titanium oxide, magnesia, zircon, mullite, cordierite, silicon carbide, barium titanate, barium zirconate, glass and the like. Those which are stably present at a temperature equal to or lower than the firing temperature of the partition walls are used. The form and particle size of the aggregate may be appropriately selected and used depending on the application.

The aggregate used in the present invention can also have a function as a coloring agent depending on the method of selecting the material. However, in many cases, coloring is actively required. In that case, the partition 3 contains a pigment (colorant).

As the pigment (colorant), a pigment having heat resistance is used. In the case of the present invention, it suffices that the material has heat resistance equal to or higher than the sintering temperature during the substrate manufacturing process. As such a coloring agent, a composite oxide pigment (Cr, Co, Ni, Fe,
Mn, Cu, Sb, As, Bi, Ti, Cd, Al, C
a, a pigment composed of an oxide of two or more metals such as Si, Mg, Ba, etc.), titanium oxide, alumina, zircon, zirconia, silica, magnesia, lead titanate, potassium titanate, cadmium sulfate selenide, red iron oxide (Fe ₂ O ₃ ), cuprous oxide, cadmium mercury red (CdS + HgS), chrome vermillion, silver vermilion, antimony red iodine red, zinc iron red, molybdenum red, lead red, cadmium red, chrome green, zinc green, cobalt green , Chromium oxide, viridian, emerald green ultramarine, navy blue,
Cobalt blue, cerulean blue, copper sulfide, titanium yellow, titanium black, black iron oxide (Fe ₃ O ₄ ),
Examples thereof include yellow iron oxide, cadmium yellow, and yellow, and these may be appropriately selected and used according to the purpose.

In order to form the partition walls 3 as described above, a coating composition (paste) for forming partition walls is prepared. The content of the aggregate, the glass frit, and the like is adjusted such that the solid content composition of the coating composition for forming the partition walls when the partition walls 3 are finally formed by firing is within the above range. After these solids are mixed, an organic vehicle is added, and the mixture is kneaded and dispersed by a three-roll mill, a bead mill, or the like to obtain a paste-like coating composition.

Examples of the organic vehicle resin used here include cellulose derivatives such as ethylcellulose, hydroxypropylcellulose, methylcellulose and nitrocellulose, polyester resins such as polyacrylester and alkyd resin, acrylic acid, methacrylic acid, itaconic acid and maleic acid. Acid, fumaric acid, crotonic acid, vinyl acetic acid, methyl methacrylate, methyl acrylate, ethyl acrylate, ethyl methacrylate, propyl methacrylate, propyl acrylate, n-butyl methacrylate, isobutyl methacrylate, 2-ethylhexyl methacrylate, 2-hexyl acrylate, lauryl methacrylate, Lauryl acrylate, stearyl methacrylate, stearyl acrylate, dodecyl methacrylate, dode Acrylate, hexyl methacrylate, hexyl acrylate, octyl methacrylate, octyl acrylate, cetyl methacrylate, cetyl acrylate, nonyl methacrylate, nonyl acrylate, decyl methacrylate, decyl acrylate, cyclohexyl methacrylate, cyclohexyl acrylate, glycidyl methacrylate, dimethylaminoethyl methacrylate, 2-methoxy Acrylate, 2 (2-ethoxyethoxy) ethyl acrylate,
2-hydroxyethyl methacrylate, diacetone acrylamide, N, N-dimethylaminopropylacrylamide, N, N-diethylacrylamide, isopropylacrylamide, diethylaminoethyl methacrylate, t-butyl methacrylate, N, N-dimethylacrylamide, α-methylstyrene, Homopolymers composed of monomers such as styrene, vinyltoluene and N-vinyl-2-pyrrolidone, and copolymers composed of two or more monomers selected from the above monomers, ethylene-acrylic acid copolymers, ethylene-methacrylic acid copolymers Examples thereof include polymers, polyolefin-based resins such as ethylene-vinyl acetate copolymer, polyvinyl formal, polyvinyl butyral, and the like.

Examples of the solvent include terpenes such as α-, β- and γ-terpineol, ethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers, diethylene glycol monoalkyl ethers, diethylene glycol dialkyl ethers, and ethylene glycol monoalkyl. Ether acetates, ethylene glycol dialkyl ether acetates, diethylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ether acetates, propylene glycol monoalkyl ethers,
Examples include propylene glycol dialkyl ethers, propylene glycol monoalkyl ether acetates, propylene glycol dialkyl ether acetates, alcohols such as methanol, ethanol, isopropanol, 2-ethylhexanol, 1-butoxy-2-propanol, and the like. You may use individually or in mixture of 2 or more types.

Further, a plasticizer, an anti-settling agent, a dispersant and the like can be used as needed.

Next, a brief description will be given of a method of manufacturing a back plate having the partition walls 3 with reference to FIG.

First, the address electrodes 8 are patterned on the glass substrate 2 with the base layer 10 interposed therebetween. Examples of the method for forming the electrode 8 include: (1) a method of combining a thin film forming process such as a sputtering method or a vacuum evaporation method with a photo process;
(2) a method of pattern printing by a screen printing method, and (3) a method of combining a photolithography process with a coating method such as screen printing, blade coating, die coating, roll coating, and reverse coating.
As a photo process, there is a method in which a photoresist is applied and dried, and then patterned by an exposure and development process, or a method in which a photoresist is similarly patterned using a dry film resist. The thickness of the electrode is, for example, about 0.05 to 0.2 μm when Cr is used as an electrode material and the film is formed by a sputtering method. To form an electrode. The electrode material and the patterning method are not necessarily limited to these methods.

After the address electrodes 8 having a predetermined pattern are formed by using any of the above methods, a dielectric layer 6 'is formed, and the partition walls 3 are formed thereon. As a method for forming the partition wall 3, as described above, using the coating composition for forming a partition wall, a method of performing pattern printing on a partition wall shape by screen printing, or after forming a solid film by screen printing, blade coating, die coating, or the like, An example is a method in which a mask having sandblast resistance is formed in a pattern on a solid film, and an unnecessary portion of a partition wall forming material is removed by sandblasting to form a predetermined partition wall shape. Furthermore, a method of coating a paste on a film in advance, laminating the paste on a substrate, and similarly performing a sandblasting process is also exemplified. After forming the partition by any of the above methods, baking is performed to obtain a predetermined partition 3. The height of the partition wall 3 to be formed is about 50 μm to 250 μm. A phosphor layer 9 is formed between the partition walls 3 formed in this way. The phosphor layer 9 is usually formed by a photolithography process. After a photosensitive phosphor layer forming paint is applied and dried, exposure and development are performed to form a gap between the partition walls 3. The phosphor layer 9 is formed. The phosphor layer 9 is adhered to the upper end of the side wall of the partition 3 as shown in the figure.
This is a point where peeling at the contact boundary surface 9a at the upper end of the side surface is particularly problematic. The coating material for forming a phosphor layer contains a fluorescent powder, a polymer, a monomer, a polymerization initiator, a solvent, and various additives.

This manufacturing method can of course be applied to the DC type PDP shown in FIG.

[0037]

The present invention will be described in more detail with reference to specific examples below. In the examples, "parts" refers to parts by weight,
“%” Indicates “% by weight”. [Experimental Example I] (Example 1) Preparation of frit mixture A frit mixture was prepared in the following manner.

Glass frit (Bi-based glass: MB-014, manufactured by Matsunami Glass Industry) 52 parts Glass frit (Pb-based glass: WO-26, manufactured by Degussa Japan Co., Ltd.) 28 parts Aggregate (alumina) : WA # 8000 (manufactured by Fujimi Incorporated, d ₅₀ = 1 μm)) ... 10 parts ・ Pigment (Dipoxide Black # 9510 (manufactured by Dainichi Seika Kogyo)) ... 10 parts These are put in a container made of fluororesin. , 15 with paint conditioner RC-5000 (manufactured by Red Devil Co.)
Mix for a minute to make a frit mixture.

Preparation of Partition Wall Forming Material (Paste) Next, the following additives were added to the above frit mixture in the following manner to prepare a partition wall forming material (paste).

・ The above frit mixture: 80 parts ・ Ethocel STD-100FP (manufactured by Dow Chemical Company): 2 parts ・ Diethylene glycol monobutyl ether acetate (manufactured by Junsei Chemical): 9 parts ・ Screen oil 759 (manufactured by Okuno Chemical Industries): 9 After uniformly mixing these, the mixture was kneaded with a three-roll mill (manufactured by Inoue Seisakusho, C-4 / 3/4 × 10) to produce a paste.

A plate-like substrate using a partition wall forming material (paste)
Preparation of a sample The above-mentioned partition wall forming material (paste) was diluted with a screen oil 759 (manufactured by Okuno Pharmaceutical Co., Ltd.) on a 300 × 450 mm glass substrate, and a shear rate of 15 [1 / sec], 22
The viscosity was adjusted to 600 poise at ℃, and printing and drying were repeated 10 times each by screen printing, and the dry film thickness was 200
A μm solid film was produced. Thereafter, a peak temperature of 575
Firing was performed at a temperature of 20 ° C., a holding time of 20 minutes, and a total firing time of 2 hours to produce a plate-like sample having the same composition as the intended partition wall.
The baked surface of this plate-shaped sample was washed with acetone, and then dried at a temperature of 80 ° C. for 30 minutes.

Production of Phosphor Layer Forming Paste Three kinds of phosphor layer forming pastes G (Gre
en), B (Blue), and R (Red). (Paste G ) ・ Phosphor (NP-200; manufactured by Nichia Corporation) ... 55 parts ・ Hydroxypropylcellulose ... 6 parts ・ Pentaerythritol triacrylate ... 15 parts ・ Irgacure I907 (Ciba Geigy) ... 2 parts ・ 3- Methoxy-3-methyl-1-butanol 50 parts (paste B )-Phosphor (NP-107; manufactured by Nichia Corporation) 55 parts-Hydroxypropyl cellulose 6 parts-Pentaerythritol triacrylate 10 parts-Irga Cure I907 (manufactured by Ciba-Geigy) ... 3 parts-3-methoxy-3-methyl-1-butanol ... 50 parts (paste R )-Phosphor (NP-360; manufactured by Nichia Corporation) ... 55 parts-Hydroxypropyl cellulose ... 6 parts ・ Pentaerythritol triacrylate… 15 parts ・ Irga Yua I907 on the plate-like sample of the adhesion test the partition wall composition (Ciba Geigy) ... 2 parts of 3-methoxy-3-methyl-1-butanol ... 50 parts phosphor layer, each phosphor layer of the formation Each of the pastes G , B , and R was applied, dried, exposed (using a mask having an opening of 40 μm), and developed to form a predetermined phosphor layer pattern. Then, the minimum required exposure amount (minimum required irradiation amount) in a state where the phosphor layer pattern did not peel off during the development for forming the pattern was determined. The smaller the minimum required exposure amount, the better the adhesion, and the criteria for the adhesion were as follows.

A: A phosphor layer pattern can be formed in close contact with a minimum required exposure of 400 mJ or less. A: Minimum required exposure exceeds 400 mJ and 2560 mJ
A phosphor layer pattern can be formed in the following manner. ×: Even if the minimum required exposure dose exceeds 2560 mJ, the phosphor layer pattern does not remain due to development or the fired ribs (partition walls) where the pattern peels off ) State of pattern The state of the rib pattern after firing was confirmed, and ranking was performed according to the following criteria.

A: The defect occurrence rate is low and extremely good. O: The defect occurrence rate is kept within a usable range. Δ: The defect can be repaired, and the defect can be sufficiently used after being repaired. ×: The rib pattern was extremely brittle and could not be used even if modified. (Example 2) In Example 1, the content of Bi-based glass in the glass frit was 70 wt% without changing the total amount of the glass frit. Bi-based and Pb-based 2
The seed glass frit amount was adjusted. Otherwise, an example sample was prepared in the same manner as in the above-described example 1, and a similar adhesion test and a state confirmation of a rib pattern were performed.

(Example 3) In Example 1 described above, the amount of Bi in the glass frit was changed without changing the total amount of the glass frit.
The amounts of the two types of glass frit, Bi-based and Pb-based, were adjusted so that the content of the system glass became 50 wt%. Otherwise, an example sample was prepared in the same manner as in the above-described example 1, and a similar adhesion test and a state confirmation of a rib pattern were performed.

(Example 4) In Example 1 described above, the Bi amount in the glass frit was changed without changing the total amount of the glass frit.
The amounts of the two types of glass frit, Bi-based and Pb-based, were adjusted so that the content of the system glass became 35 wt%. Otherwise, an example sample was prepared in the same manner as in the above-described example 1, and a similar adhesion test and a state confirmation of a rib pattern were performed.

(Embodiment 5) In the first embodiment, the Bi content in the glass frit was changed without changing the total amount of the glass frit.
The amounts of the two types of glass frit, Bi-based and Pb-based, were adjusted so that the content of the system glass became 90 wt%. Otherwise, an example sample was prepared in the same manner as in the above-described example 1, and a similar adhesion test and a state confirmation of a rib pattern were performed.

(Comparative Example 1) In Example 1 described above, the Bi content in the glass frit was changed without changing the total amount of the glass frit.
The amounts of the two types of glass frit, Bi-based and Pb-based, were adjusted such that the content of the system glass became 25 wt%. Otherwise, a comparative sample was prepared in the same manner as in Example 1 described above, and a similar adhesion test and confirmation of the state of the rib pattern were performed.

(Comparative Example 2) In Example 1, the Bi content in the glass frit was changed without changing the total amount of the glass frit.
The amounts of the two types of glass frit, Bi-based and Pb-based, were adjusted so that the content of the system glass became 100 wt%. Otherwise, a comparative sample was prepared in the same manner as in Example 1 described above, and a similar adhesion test and confirmation of the state of the rib pattern were performed.

Table 1 below shows the results of the adhesion test and the state of the rib pattern for each sample.

[0051]

[Table 1] [Experimental example II] Production of panel back plate A panel back plate was actually produced in the following manner, and the effect of the partition wall of the plasma display panel was confirmed.

First, ELD-1155 (manufactured by Okuno Pharmaceutical Co., Ltd.) was printed as a base layer on a 300 × 450 mm glass substrate by screen printing, dried and baked to form a film having a thickness of 10 μm.
After forming an underlayer of m, D-590-HV-MOD (manufactured by ES L Japan) is printed as an address electrode on the underlayer in an electrode pattern by screen printing.
Baking, film thickness 8μm, line width 40μm, pitch 240μm
Electrodes were formed.

Next, PLS-3232 (manufactured by Nippon Electric Glass) was printed as a dielectric layer on the address electrode by screen printing, and dried and fired to form a 12 μm-thick dielectric layer.

Next, the coating composition (paste) for forming the partition wall prepared in Example 1 was applied to a screen oil 7
59 (made by Okuno Pharmaceutical) diluted 15
[1 / sec], viscosity adjusted to 600 poise at 22 ° C,
Printing and drying were each repeated 10 times by screen printing to produce a solid film having a dry film thickness of 200 μm. The substrate on which the solid film is formed is heated to 80 ° C., and a dry film resist (OSBR film B, manufactured by Tokyo Ohka Kogyo Co., Ltd.) is formed on the solid film.
After laminating F-605), exposure was performed through a line pattern mask having a line width of 100 μm and a pitch of 240 μm using a parallel light printer using an ultra-high pressure mercury lamp as a light source. Exposure conditions are intensity 2 when measured at 365 μm.
It was 00 μW / cm ² and the irradiation amount was 80 mJ / cm ² .

Next, using a 0.2% aqueous solution of anhydrous sodium carbonate, spray development was carried out at a liquid temperature of 35 ° C. to produce a sandblast mask, which was dried and then fused alumina A- #
Unnecessary portions were removed by sand blasting using 800 (made by Fujimi Abrasives) as a cutting material.

Next, using a 0.7% aqueous solution of sodium hydroxide, the sandblasting mask was peeled off at a liquid temperature of 30 ° C. and dried.
For 2 minutes, firing was performed for a total firing time of 2 hours to obtain partition walls having a line width of 65 μm and a height of 150 μm.

Each of the above-mentioned paints G, B, and R for forming a phosphor layer is applied thereon, dried, exposed (the condition is the embodiment 1), and developed to form a predetermined phosphor layer pattern. Was. As a result, it was confirmed that the adhesion of the phosphor layer was extremely good. It was confirmed that similarly good results were obtained even when the composition and conditions corresponding to Example 1 were changed to the compositions and conditions of Examples 2 to 4.

[0058]

The effects of the present invention are clear from the above results. That is, the present invention is a partition wall for a plasma display panel containing as a main component a glass frit serving as a molten matrix of the partition wall and an aggregate for mainly maintaining the form and strength of the partition wall, wherein the partition wall is made of glass Since the frit component contains Bi-based glass at a rate of 35 to 90 wt%, the adhesion between the partition walls and the phosphor layer can be improved, and the quality and product quality of the product can be improved. It is possible to improve the stay.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a configuration example of an AC type PDP.

FIG. 2 is a cross-sectional view for explaining a structure of a back plate of FIG. 1;

FIG. 3 shows an example of the configuration of a DC PDP.
FIG. 3A is a plan view, and FIG.
It is sectional drawing in the XX line in (a).

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Front plate 2 ... Back plate 3 ... Partition wall 4 ... Sustain electrode 5 ... Bus electrode 6 ... Dielectric layer 7 ... MgO layer 8 ... Address electrode

Continued on the front page (72) Inventor Naoki Goto 1-1-1 Ichigaya-Kaga-cho, Shinjuku-ku, Tokyo F-term in Dai Nippon Printing Co., Ltd. (reference) 5C040 DD09

Claims (2)

[Claims] 1. A partition for a plasma display panel, comprising as main components a glass frit as a molten matrix of the partition and an aggregate mainly for maintaining the shape and strength of the partition, wherein the partition is a glass frit A partition wall for a plasma display panel, characterized in that Bi-based glass is contained at a ratio of 35 to 90 wt% among the components. 2. A plasma display panel having a partition for partitioning a discharge space and a phosphor layer attached to the partition, wherein the partition contains 35 to 90 wt% of Bi-based glass among glass frit components. A plasma display panel characterized by comprising: