JP2000001553A - Prepreg for printed wiring board, laminate and their production - Google Patents

Prepreg for printed wiring board, laminate and their production

Info

Publication number
JP2000001553A
JP2000001553A JP17978698A JP17978698A JP2000001553A JP 2000001553 A JP2000001553 A JP 2000001553A JP 17978698 A JP17978698 A JP 17978698A JP 17978698 A JP17978698 A JP 17978698A JP 2000001553 A JP2000001553 A JP 2000001553A
Authority
JP
Japan
Prior art keywords
glass
resin
printed wiring
weight
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17978698A
Other languages
Japanese (ja)
Inventor
Chizuko Sano
千津子 佐野
Shinichi Tamura
進一 田邨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Boseki Co Ltd
Original Assignee
Nitto Boseki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Boseki Co Ltd filed Critical Nitto Boseki Co Ltd
Priority to JP17978698A priority Critical patent/JP2000001553A/en
Publication of JP2000001553A publication Critical patent/JP2000001553A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a prepreg that has excellent ultraviolet shielding properties and does not deteriorate other properties required for a laminate for a printed wiring board such as water resistance, heat resistance, solvent resistance and electrically insulating properties by constituting a matrix resin of a resin containing a partially crystallized glass with a specified crystallinity. SOLUTION: A prepreg for a printed wiring board is obtained by impregnating a matrix resin that contains 60-200 pts.wt., based on 100 pts.wt. of a resin including a curing agent, of a partially crystallized glass with a crystallinity of 5-20 wt.% in a glass base material. In the production of the prepreg for a printed wiring board, 5-40 wt.% of one or more of a calcium carbonate, a dolomite, a talc and a calcium silicate are added to and mixed with E-glass and thereafter calcined at a temperature of 700-1,050 deg.C to obtain a partially crystallized glass with a crystallinity of 5-20 wt.%. The partially crystallized glass is kneaded with a resin to form a matrix resin. The matrix resin is impregnated in a glass base material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、紫外線遮蔽性に優
れたプリント配線板用プリプレグ、積層板及びこれらの
製造方法の改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a prepreg and a laminate for a printed wiring board having an excellent ultraviolet shielding property, and to an improvement of a method for producing the same.

【0002】[0002]

【従来の技術】近年、プリント配線板の製造工程におけ
るソルダーレジスト形成工程は、フォトレジスト法が採
用され、両面同時露光が実施されている。しかし、両面
同時露光の際、照射した紫外線により反対面のレジスト
まで露光される裏映りという問題が発生することが多
い。このため、積層板に対して紫外線遮蔽性が要求され
ている。紫外線遮蔽性を有する積層板については各種提
案がなされているが、これらを主たる添加物によって大
別すると、 有機紫外線吸収剤を添加した樹脂をマトリックス樹脂
とする積層板(特開平5−160532号公報記載)、 酸化チタンなどの無機紫外線吸収剤を添加した樹脂を
マトリックス樹脂とするか、ガラス基材に添加した積層
板(特開平4−104920号公報記載)、 クレーや炭酸カルシウムなどの無機充填剤を配合した
樹脂をマトリックス樹脂とする積層板(特開昭54−3
2769号公報記載)、 前記〜の添加物を併用した樹脂をマトリックス樹
脂とする積層板(特開平9−19976号公報記載)等
がある。
2. Description of the Related Art In recent years, in a solder resist forming step in a manufacturing process of a printed wiring board, a photoresist method has been adopted, and simultaneous exposure on both sides has been performed. However, during double-sided simultaneous exposure, there often occurs a problem of show-through in which the resist on the opposite side is exposed by the irradiated ultraviolet rays. For this reason, the laminated plate is required to have an ultraviolet shielding property. Various proposals have been made for laminates having ultraviolet shielding properties. These are roughly classified according to their main additives, and laminated laminates using a resin to which an organic ultraviolet absorber is added as a matrix resin (Japanese Unexamined Patent Publication No. Hei 5-160532). A matrix resin made of a resin to which an inorganic ultraviolet absorber such as titanium oxide is added, or a laminated plate (described in JP-A-4-104920) added to a glass substrate, and an inorganic filler such as clay or calcium carbonate. (Japanese Patent Laid-Open No. Sho 54-3)
No. 2769) and a laminate (described in JP-A-9-19776) using a resin in which the above additives are used in combination as a matrix resin.

【0003】[0003]

【発明が解決しようとする課題】しかし、上記従来技術
による積層板は紫外線遮蔽性は向上するものの、プリン
ト配線板用積層板に要求されている他の特性である耐水
性、耐熱性、耐溶剤性、電気絶縁性等の特性を低下させ
る場合がある。例えば、では、加熱による耐熱性の低
下および耐溶剤性の低下を引き起こすことがあり、又有
機紫外線吸収剤が光で劣化し紫外線遮蔽性のばらつきを
生じることがある。では、高感度のソルダーレジスト
を用いた場合鮮明な解像ができないことがある。で
は、ガラス基材への樹脂の含浸性が低下し、耐熱性、電
気絶縁性を劣化させることがある。では、〜の添
加物を併用しているが、これは上記従来技術の単なる組
み合わせにすぎず、上記欠点を十分に解決するものでは
ない。
However, although the laminated board according to the prior art described above has improved ultraviolet shielding properties, it has other properties required for printed wiring board laminates such as water resistance, heat resistance and solvent resistance. In some cases, the properties such as properties and electrical insulation properties may be reduced. For example, in some cases, heating may cause a decrease in heat resistance and a decrease in solvent resistance, and the organic ultraviolet absorbent may be degraded by light to cause variations in ultraviolet shielding properties. In such a case, a clear resolution may not be obtained when a high-sensitivity solder resist is used. In such a case, the impregnating property of the resin into the glass substrate is reduced, and the heat resistance and the electrical insulation may be deteriorated. However, this is merely a combination of the above-mentioned prior arts, and does not sufficiently solve the above-mentioned disadvantages.

【0004】本発明は、紫外線遮蔽性に優れ且つ耐水
性、耐熱性、耐溶剤性、電気絶縁性等のプリント配線板
用積層板に要求される他の特性を低下させることのない
プリント配線板用プリプレグ、積層板及びこれらの製造
方法を得ることを目的とする。
The present invention provides a printed wiring board which is excellent in ultraviolet shielding properties and does not deteriorate other characteristics required for a printed wiring board laminate, such as water resistance, heat resistance, solvent resistance, and electrical insulation. It is an object of the present invention to obtain a prepreg for use, a laminate, and a method for producing these.

【0005】[0005]

【課題を解決するための手段】本発明は前記目的を達成
するために、請求項1の発明にあっては、結晶化度5〜
20重量%の部分結晶化ガラスを含む樹脂をマトリック
ス樹脂としたプリント配線板用積層板により解決した。
請求項2の発明にあっては、硬化剤を含む樹脂100重
量部に対し結晶化度5〜20重量%の部分結晶化ガラス
を60〜200重量部含んだマトリックス樹脂をガラス
基材に含浸させたプリント配線板用プリプレグにより解
決した。請求項3の発明にあっては、Eガラスに炭酸カ
ルシウム、ドロマイト、タルク及び珪酸カルシウムのい
ずれか1種又は2種以上を5〜40重量%添加混合した
後、700〜1050℃で焼成することにより結晶化度
5〜20重量%の部分結晶化ガラスを得て、該部分結晶
化ガラスを樹脂に混練してマトリックス樹脂とし、該マ
トリックス樹脂をガラス基材に含浸させるプリント配線
板用プリプレグの製造方法により解決した。請求項4の
発明にあっては、請求項3に記載のプリント配線板用プ
リプレグの製造方法により得られたプリプレグを少なく
とも1枚用い、常法により積層し成形するプリント配線
板用積層板の製造方法により解決した。
According to the present invention, in order to achieve the above object, according to the first aspect of the present invention, the degree of crystallinity is 5 to 5.
The problem was solved by a laminate for printed wiring boards using a resin containing 20% by weight of partially crystallized glass as a matrix resin.
According to the second aspect of the present invention, the glass substrate is impregnated with a matrix resin containing 60 to 200 parts by weight of partially crystallized glass having a crystallinity of 5 to 20% by weight based on 100 parts by weight of the resin containing the hardener. The problem was solved by the prepreg for printed wiring boards. In the invention according to claim 3, after adding and mixing any one or more of calcium carbonate, dolomite, talc and calcium silicate to E glass in an amount of 5 to 40% by weight, the mixture is fired at 700 to 1050 ° C. To obtain a partially crystallized glass having a degree of crystallinity of 5 to 20% by weight, kneading the partially crystallized glass with a resin to form a matrix resin, and impregnating the glass substrate with the matrix resin to produce a prepreg for a printed wiring board. Solved by the method. According to a fourth aspect of the present invention, there is provided a method for manufacturing a laminate for a printed wiring board, wherein at least one prepreg obtained by the method for manufacturing a prepreg for a printed wiring board according to the third aspect is laminated and formed by a conventional method. Solved by the method.

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

【0006】本発明に用いるEガラスは、アルミナホウ
珪酸塩ガラスに属する無アルカリガラスで、主な組成は
例えばSiO2 ;52〜56重量%、Al2 3 ;12
〜16重量%、CaO;16〜25重量%、MgO;0
〜6重量%、B2 3 ;5〜10重量%、R2 O(Rは
NaおよびK);0〜3重量%である。Eガラスの形態
としては、ガラスバルク、ガラスパウダー、ガラス繊維
等で特に限定することなく用いることができる。本発明
に用いる樹脂には、フェノール樹脂、エポキシ樹脂、不
飽和ポリエステル樹脂、ポリイミド樹脂、ポリフェニレ
ンオキサイド樹脂、ポリフェニレンエーテル樹脂、フッ
素樹脂などの熱硬化性樹脂が利用可能であるが、所望す
るプリント配線板用プリプレグ及び積層板に要求される
特性により適宜選択される。
The E glass used in the present invention is an alkali-free glass belonging to alumina borosilicate glass, and its main composition is, for example, SiO 2 ; 52 to 56% by weight, Al 2 O 3 ;
-16% by weight, CaO; 16-25% by weight, MgO: 0
66% by weight, B 2 O 3 ; 5-10% by weight, R 2 O (R is Na and K); 0-3% by weight. As the form of E glass, glass bulk, glass powder, glass fiber and the like can be used without particular limitation. As the resin used in the present invention, a thermosetting resin such as a phenol resin, an epoxy resin, an unsaturated polyester resin, a polyimide resin, a polyphenylene oxide resin, a polyphenylene ether resin, and a fluororesin can be used. Is appropriately selected according to the characteristics required for the prepreg and the laminate.

【0007】本発明に用いる部分結晶化ガラスを得るた
めには、先ずEガラスに、炭酸カルシウム、ドロマイ
ト、タルク及び珪酸カルシウムのいずれか1種又は2種
以上(以下これらを結晶化促進剤と略称する)を添加す
るが、予めEガラス及び結晶化促進剤を平均粒径200
μm以下に粉砕しておくことが望ましい。結晶化を促進
する為、結晶化促進剤の添加量はEガラスに対し、5〜
40重量%とする。添加量が5重量%未満の場合は、結
晶核の数が少なく結晶化が進まず、添加量が40重量%
を超える場合は、添加混合した結晶化促進剤が結晶化に
寄与しない未反応部分が残ることがあり、部分結晶化ガ
ラスと樹脂との接着力が低下し、耐水性および耐熱性が
劣化する。
In order to obtain the partially crystallized glass used in the present invention, first, one or more of calcium carbonate, dolomite, talc and calcium silicate (hereinafter, these are abbreviated as crystallization accelerators) are added to E glass. Is added, but E glass and a crystallization accelerator are previously added to an average particle diameter of 200.
It is desirable to pulverize to a size of μm or less. In order to promote crystallization, the amount of the crystallization accelerator added is 5 to E glass.
40% by weight. When the addition amount is less than 5% by weight, the number of crystal nuclei is small and crystallization does not proceed, and the addition amount is 40% by weight.
If it exceeds 3, unreacted portions where the added and mixed crystallization accelerator does not contribute to crystallization may remain, the adhesive strength between the partially crystallized glass and the resin is reduced, and the water resistance and heat resistance are deteriorated.

【0008】次に、部分結晶化ガラスを得るために、E
ガラスに結晶化促進剤を添加混合した後、700〜10
50℃、好ましくは900〜1000℃で焼成をする。
焼成温度が700℃未満ではEガラスの結晶化が進ま
ず、1050℃を超える温度ではEガラスの結晶化した
部分がガラス化してしまうことがある。部分結晶化ガラ
スを得るための焼成の時間は、30〜120分をとるの
が好ましい。30分未満ではEガラスに添加した結晶化
促進剤が結晶化に寄与しない未反応部分が残ることがあ
り、120分を超える時間はロスとなり製造効率が悪
い。このようにして得られたEガラスの結晶化度は結晶
化促進剤の添加量、焼成温度及び焼成時間の組み合わせ
により制御され5〜20重量%の部分結晶化ガラスとさ
れる。結晶化度は高いほど紫外線遮蔽性は高いが、5%
未満では得られたプリント配線板用積層板の紫外線遮蔽
効果が発揮されず、結晶化度20%を超える部分結晶化
ガラスは製造が困難な場合がある。
Next, in order to obtain a partially crystallized glass, E
After adding and mixing a crystallization accelerator to glass, 700 to 10
The firing is performed at 50 ° C, preferably 900 to 1000 ° C.
If the firing temperature is lower than 700 ° C., crystallization of E glass does not proceed, and if it exceeds 1050 ° C., the crystallized portion of E glass may be vitrified. The firing time for obtaining the partially crystallized glass is preferably 30 to 120 minutes. If the time is less than 30 minutes, an unreacted portion in which the crystallization accelerator added to the E glass does not contribute to crystallization may remain, and if the time exceeds 120 minutes, a loss occurs and the production efficiency is poor. The crystallinity of the E glass thus obtained is controlled by a combination of the amount of the crystallization accelerator added, the firing temperature and the firing time, to obtain a partially crystallized glass of 5 to 20% by weight. The higher the crystallinity, the higher the UV-shielding properties, but 5%
If it is less than 30, the obtained laminated board for a printed wiring board will not exhibit an ultraviolet shielding effect, and it may be difficult to produce partially crystallized glass having a crystallinity of more than 20%.

【0009】更に、得られた部分結晶化ガラスを樹脂に
混練して均一に分散させマトリックス樹脂とするが、部
分結晶化ガラスを予め平均粒径20μm以下に粉砕して
おくことが望ましい。又部分結晶化ガラスと樹脂の接着
力を強固にさせる為、部分結晶化ガラスを樹脂に混練す
るに際し、予め部分結晶化ガラスをγ−(2−アミノエ
チル)アミノプロピルトリメトキシシラン、γ−(2−
アミノエチル)アミノプロピルメチルジメトキシシラ
ン、γ−メタクリロキシプロピルトリメトキシシラン、
N−β−(N−ビニルベンジルアミノエチル)−γ−ア
ミノプロピルメチルジメトキシシラン塩酸塩、γ−グリ
シドキシプロピルトリメトキシシラン、γ−メルカプト
プロピルトリメトキシシラン、メチルトリメトキシシラ
ン、メチルトリエトキシシラン、ビニルトリアセトキシ
シラン、γ−クロロプロピルトリメトキシシラン、ヘキ
サメチルジシラザン、γ−アニリノプロピルトリメトキ
シシラン、ビニルトリメトキシシラン、オクタデシルジ
メチル(3−トリメトキシシリル)プロピルアンモニウ
ムクロライド、γ−クロロプロピルメチルジメトキシシ
ラン、γ−メルカプトプロピルメチルジメトキシシラ
ン、メチルトリクロロシラン、メチルトリクロロシラ
ン、ジメチルジクロロシラン、トリメチルクロロシラン
等の公知のシランカップリング剤で表面処理し、ガラス
フィラーとするのが好ましい。本発明においてはシラン
カップリング剤の種類は、特に限定されない。部分結晶
化ガラスを樹脂に混練しマトリックス樹脂とする際、硬
化剤を含む樹脂ワニス100重量部に対し、ガラスフィ
ラーは60〜200重量部であることが好ましい。60
重量部未満では紫外線遮蔽性の効果が出ず、200重量
部を超えるとマトリックス樹脂の粘度が上昇し、ガラス
基材への樹脂の含浸性が低下する。
Further, the obtained partially crystallized glass is kneaded with a resin and uniformly dispersed to obtain a matrix resin. It is desirable that the partially crystallized glass is previously ground to an average particle size of 20 μm or less. Further, in order to strengthen the adhesive force between the partially crystallized glass and the resin, the partially crystallized glass is kneaded with the resin before kneading the partially crystallized glass with γ- (2-aminoethyl) aminopropyltrimethoxysilane, γ- ( 2-
Aminoethyl) aminopropylmethyldimethoxysilane, γ-methacryloxypropyltrimethoxysilane,
N-β- (N-vinylbenzylaminoethyl) -γ-aminopropylmethyldimethoxysilane hydrochloride, γ-glycidoxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane , Vinyltriacetoxysilane, γ-chloropropyltrimethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, octadecyldimethyl (3-trimethoxysilyl) propylammonium chloride, γ-chloropropyl Known silane coupling agents such as methyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrichlorosilane, methyltrichlorosilane, dimethyldichlorosilane, and trimethylchlorosilane It is preferable to perform a surface treatment with a brushing agent to obtain a glass filler. In the present invention, the type of the silane coupling agent is not particularly limited. When the partially crystallized glass is kneaded with the resin to form a matrix resin, the glass filler is preferably 60 to 200 parts by weight based on 100 parts by weight of the resin varnish containing a curing agent. 60
If the amount is less than 100 parts by weight, the effect of shielding ultraviolet rays is not obtained. If the amount is more than 200 parts by weight, the viscosity of the matrix resin increases, and the impregnation of the glass substrate with the resin decreases.

【0010】最後に、部分結晶化ガラスが分散され樹脂
ワニスをガラス基材に含浸乾燥させてプリント配線板用
プリプレグが得られる。さらに、得られたプリプレグを
少なくとも1枚用いて積層し加圧成形等の常法により成
形加工を行なって所望のプリント配線板用積層板が得ら
れる。ここで、プリプレグの使用枚数の限定はない。ガ
ラス基材としては、少なくともガラス繊維を含む織布、
不織布及び紙のいずれか1種又は2種以上が用られる。
Finally, the partially crystallized glass is dispersed and a resin varnish is impregnated into a glass substrate and dried to obtain a prepreg for a printed wiring board. Further, at least one of the obtained prepregs is laminated and molded by a conventional method such as pressure molding to obtain a desired laminate for a printed wiring board. Here, there is no limitation on the number of prepregs to be used. As a glass substrate, a woven fabric containing at least glass fiber,
One or more of nonwoven fabric and paper are used.

【0011】[0011]

【実施例】Eガラス組成 SiO2 ;55重量%、Al2 3 ;14重量%、Ca
O;22重量%、B2 3 ;7重量%、Na2 O及びK
2 O;0.5重量%の組成を主成分とするEガラスバル
クを用いた。ガラス基材として、厚み0.18mm、単
位重量209g/m2 のガラス織布を用い、シランカッ
プリング剤としてN−β−(N−ビニルベンジルアミノ
エチル)−γ−アミノプロピルメチルジメトキシシラン
塩酸塩(東レ・ダウコーニングシリコン社製SZ603
2)で浸漬して作成した。 樹脂ワニスの調製 臭化エポキシ樹脂(旭チバ社製アラルダイトN80)を
100重量部、フェノールノボラック型エポキシ樹脂
(油化シェルエポキシ社製エピコート154)を12重
量部、2−エチル−4−メチルイミダゾールを0.2重
量部、2−メトキシエタノールを20重量部調製し、エ
ポキシ樹脂ワニスを得た。
EXAMPLES Glass composition SiO 2 : 55% by weight, Al 2 O 3 : 14% by weight, Ca
O; 22% by weight, B 2 O 3 ; 7% by weight, Na 2 O and K
2 O: E glass bulk having a composition of 0.5% by weight as a main component was used. A glass woven fabric having a thickness of 0.18 mm and a unit weight of 209 g / m 2 is used as a glass substrate, and N-β- (N-vinylbenzylaminoethyl) -γ-aminopropylmethyldimethoxysilane hydrochloride is used as a silane coupling agent. (Toray Dow Corning Silicon SZ603
It was prepared by dipping in 2). Preparation of Resin Varnish 100 parts by weight of a brominated epoxy resin (Araldite N80 manufactured by Asahi Ciba), 12 parts by weight of a phenol novolak type epoxy resin (Epicoat 154 manufactured by Yuka Shell Epoxy), and 2-ethyl-4-methylimidazole were used. 0.2 parts by weight and 20 parts by weight of 2-methoxyethanol were prepared to obtain an epoxy resin varnish.

【0012】[実施例1]Eガラスバルクを平均粒径2
00μm以下に粉砕後、炭酸カルシウムをEガラスに対
し15重量%添加混合した。これを950℃で60分間
焼成し、Eガラスを一部結晶化させた。冷却後、一部結
晶化したEガラスを平均粒径20μmに粉砕し、シラン
カップリング剤としてN−β−(N−ビニルベンジルア
ミノエチル)−γ−アミノプロピルメチルジメトキシシ
ラン塩酸塩(東レ・ダウコーニングシリコン社製SZ6
032)で表面処理し、ガラスフィラーを得た。得られ
た該ガラスフィラー120重量部を、前記記載のエポ
キシ樹脂ワニスに混練し、エポキシ樹脂組成物を得た
後、該エポキシ樹脂組成物をガラス織布に樹脂組成物が
43重量%になるように含浸乾燥させてプリプレグを得
た。得られたプリプレグ8枚を厚み18μmの銅箔で挟
み、170℃、90分、3MPaの条件でプレス成形
し、厚さ1.6mmの銅張積層板を作成した。作成した
銅張積層板の銅箔をエッチング除去し実施例1とした。 [実施例2]炭酸カルシウムをEガラスに対し20重量
%添加混合した他は、実施例1と同様の方法で実施例2
を作成した。 [実施例3]炭酸カルシウムをEガラスに対し30重量
%添加混合した他は、実施例1と同様の方法で実施例3
を作成した。 [実施例4]Eガラスのバルクを平均粒径200μm以
下に粉砕後、ドロマイトをEガラスに対し30重量%添
加混合した。以下、実施例1と同様の方法で実施例4を
作成した。
Example 1 E glass bulk was prepared with an average particle size of 2
After pulverizing to a size of not more than 00 μm, 15% by weight of calcium carbonate was added to E glass and mixed. This was baked at 950 ° C. for 60 minutes to partially crystallize E glass. After cooling, the partially crystallized E glass was pulverized to an average particle size of 20 μm, and N-β- (N-vinylbenzylaminoethyl) -γ-aminopropylmethyldimethoxysilane hydrochloride (Toray Dow) was used as a silane coupling agent. Corning Silicon SZ6
032) to obtain a glass filler. After 120 parts by weight of the obtained glass filler is kneaded with the epoxy resin varnish described above to obtain an epoxy resin composition, the epoxy resin composition is added to a glass woven fabric so that the resin composition becomes 43% by weight. To obtain a prepreg. The obtained eight prepregs were sandwiched between copper foils having a thickness of 18 μm and press-molded at 170 ° C. for 90 minutes under a condition of 3 MPa to prepare a copper-clad laminate having a thickness of 1.6 mm. The copper foil of the produced copper-clad laminate was removed by etching to obtain Example 1. Example 2 Example 2 was carried out in the same manner as in Example 1 except that 20% by weight of calcium carbonate was added to and mixed with E glass.
It was created. Example 3 Example 3 was performed in the same manner as in Example 1, except that 30% by weight of calcium carbonate was added to and mixed with E glass.
It was created. Example 4 The bulk of E glass was pulverized to an average particle size of 200 μm or less, and then dolomite was added to E glass at 30% by weight and mixed. Hereinafter, Example 4 was created in the same manner as in Example 1.

【0013】[比較例1]前記記載の樹脂ワニスをガ
ラス織布に樹脂組成物が43重量%になるように含浸乾
燥させてプリプレグを得た。以下、実施例1と同様の条
件でプレス成形し、厚さ1.6mmの銅張積層板を作成
し、該銅張積層板の銅箔をエッチング除去し比較例1と
した。 [比較例2]Eガラスバルクを平均粒径200μm以下
に粉砕し、炭酸カルシウムをEガラスに対して20重量
%添加混合し、該混合物を平均粒径20μm以下に粉砕
し、実施例1と同じシランカップリング剤で表面処理
し、該表面処理したEガラスと炭酸カルシウムの混合物
をガラスフィラーとし、以下実施例1と同様の方法によ
り比較例2を作成した。
Comparative Example 1 A prepreg was obtained by impregnating and drying a resin varnish described above in a glass woven fabric so that the resin composition was 43% by weight. Thereafter, press molding was performed under the same conditions as in Example 1 to prepare a 1.6 mm-thick copper-clad laminate, and the copper foil of the copper-clad laminate was removed by etching to obtain Comparative Example 1. [Comparative Example 2] E glass bulk was pulverized to an average particle diameter of 200 µm or less, and calcium carbonate was added to and mixed with 20% by weight of E glass, and the mixture was pulverized to an average particle diameter of 20 µm or less. A surface treatment was carried out with a silane coupling agent, and a mixture of E-glass and calcium carbonate subjected to the surface treatment was used as a glass filler, and Comparative Example 2 was prepared in the same manner as in Example 1 below.

【0014】上記各実施例及び比較例について、部分結
晶化ガラスの結晶化度、紫外線遮蔽性及び耐水性を以下
の方法で測定した。 結晶化度の測定;X線回析法により測定した。 紫外線遮蔽性の測定;分光光度計(日立製作所製22
0−A型)を用いて波長350nm及び420nmにお
ける透過率を測定し、紫外線遮蔽性の尺度とした。 耐水性の測定;先ず常態における絶縁抵抗を測定し、
各例をプレッシャークッカーに入れ121℃、2気圧の
条件下で吸湿処理した後の絶縁抵抗を測定し、耐水性の
尺度とした。絶縁性はJIS C6481の測定法に準
拠した。 各例の測定結果を表1に示す。
With respect to each of the above Examples and Comparative Examples, the crystallinity, ultraviolet shielding property and water resistance of the partially crystallized glass were measured by the following methods. Measurement of crystallinity; measured by X-ray diffraction method. Measurement of ultraviolet shielding properties; spectrophotometer (Hitachi Ltd. 22
(0-A type) was used to measure the transmittance at wavelengths of 350 nm and 420 nm, which was used as a measure of ultraviolet shielding properties. Measurement of water resistance; First, the insulation resistance under normal conditions was measured,
Each example was placed in a pressure cooker and subjected to a moisture absorption treatment under the conditions of 121 ° C. and 2 atm. The insulation conformed to the measurement method of JIS C6481. Table 1 shows the measurement results of each example.

【0015】[0015]

【表1】 [Table 1]

【0016】上記各実施例及び比較例より明らかなよう
に、本発明の実施例は部分結晶化ガラスを含まない比較
例1に比較して、紫外線透過率が大幅に小さく、絶縁抵
抗すなわち耐水性の低下はほぼ同等である。一方、Eガ
ラスと炭酸カルシウムの混合物を含むエポキシ樹脂をマ
トリックス樹脂とする比較例2に比較して、紫外線透過
率はほぼ同等であるが、絶縁抵抗すなわち耐水性の低下
が少ない。これは、部分結晶化ガラスの結晶成分はウオ
ラストナイト、アノーサイトなどであり、ウオラストナ
イト、アノーサイトとも耐水性・耐熱性・耐溶剤性・電
気絶縁性にはまったく問題なく、該部分結晶化ガラスを
ガラスフィラーとして、マトリックス樹脂と混練し樹脂
組成物を得、該樹脂組成物をマトリックス樹脂として常
法により積層板を成形するので、得られた積層板は紫外
線遮蔽性を有し、かつ耐水性・耐熱性・耐溶剤性・電気
絶縁性の保持に有効に作用するものと思われる。又、付
加的構成としてEガラスを焼成する際に、コバルトや鉄
等の遷移金属を部分結晶化ガラスに対し0.1〜2.0
重量%添加するとか、部分結晶化ガラスを樹脂に混練す
る際に有機紫外線吸収剤及び/又は酸化チタンを添加す
る等により得られるプリント配線板用プリプレグ、積層
板及びこれらの製造方法も本発明の範囲に包含される。
As is clear from the above Examples and Comparative Examples, the Example of the present invention has a significantly smaller ultraviolet transmittance than Comparative Example 1 containing no partially crystallized glass, and has an insulation resistance, ie, water resistance. The decline is almost the same. On the other hand, as compared with Comparative Example 2 in which an epoxy resin containing a mixture of E glass and calcium carbonate is used as the matrix resin, the ultraviolet transmittance is almost the same, but the insulation resistance, that is, the decrease in water resistance is small. This is because the crystalline components of partially crystallized glass are wollastonite, anorthite, etc., and both wollastonite and anorthite have no problem in water resistance, heat resistance, solvent resistance, and electrical insulation. As the glass filler is used as a glass filler, a resin composition is obtained by kneading with a matrix resin, and the resin composition is used as a matrix resin to mold a laminate by a conventional method, so that the obtained laminate has an ultraviolet shielding property, and It is thought to be effective in maintaining water resistance, heat resistance, solvent resistance, and electrical insulation. Further, when firing E glass as an additional configuration, a transition metal such as cobalt or iron is added to the partially crystallized glass in an amount of 0.1 to 2.0.
The present invention also relates to a prepreg for a printed wiring board, a laminated board, and a method for producing these, which are obtained by adding an organic ultraviolet absorber and / or titanium oxide when kneading a partially crystallized glass with a resin, or by kneading the partially crystallized glass with a resin. Included in the scope.

【0017】[0017]

【発明の効果】本発明は、部分結晶化ガラスをガラスフ
ィラーとした樹脂をマトリックス樹脂としたから、得ら
れたプリプレグ及び積層板は紫外線遮蔽性に優れ、且つ
耐水性、耐熱性、耐溶剤性、電気絶縁性の低下が少な
い、従来技術にない優れたプリント配線板用プリプレ
グ、積層板及びこれらの製造方法である。
According to the present invention, since the matrix resin is a resin in which partially crystallized glass is used as a glass filler, the obtained prepregs and laminates have excellent ultraviolet shielding properties, and are resistant to water, heat, and solvents. An excellent prepreg for a printed wiring board, a laminated board, and a method for producing the same, which are not present in the prior art and have little decrease in electrical insulation.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F072 AA06 AB09 AE01 AF04 AG03 AG17 AH21 AL13 4F100 AA08A AA08H AB03 AB17 AB33 AC10A AC10H AE09A AE09H AG00A AG00B AG00H AK01A AK01B AK53 BA01 BA02 CA02A DG01A DG11A DH01A EJ482 EJ82A EJ822 GB43 JA11A JA11B JA11H JB07 JG04 JJ03 JN30 YY00A YY00B YY00H  ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) 4F072 AA06 AB09 AE01 AF04 AG03 AG17 AH21 AL13 4F100 AA08A AA08H AB03 AB17 AB33 AC10A AC10H AE09A AE09H AG00A AG00B AG00H AK01A AK01B AK53 BA01 BA02 CA02A EJ01 EA01 JB07 JG04 JJ03 JN30 YY00A YY00B YY00H

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 結晶化度5〜20重量%の部分結晶化ガ
ラスを含む樹脂をマトリックス樹脂としたことを特徴と
するプリント配線板用積層板。
1. A laminate for a printed wiring board, wherein a resin containing partially crystallized glass having a crystallinity of 5 to 20% by weight is used as a matrix resin.
【請求項2】 硬化剤を含む樹脂100重量部に対し結
晶化度5〜20重量%の部分結晶化ガラスを60〜20
0重量部含んだマトリックス樹脂をガラス基材に含浸さ
せたことを特徴とするプリント配線板用プリプレグ。
2. A partially crystallized glass having a degree of crystallinity of 5 to 20% by weight based on 100 parts by weight of a resin containing a curing agent.
A prepreg for a printed wiring board, wherein a glass substrate is impregnated with a matrix resin containing 0 parts by weight.
【請求項3】 Eガラスに炭酸カルシウム、ドロマイ
ト、タルク及び珪酸カルシウムのいずれか1種又は2種
以上を5〜40重量%添加混合した後、700〜105
0℃で焼成することにより結晶化度5〜20重量%の部
分結晶化ガラスを得て、該部分結晶化ガラスを樹脂に混
練してマトリックス樹脂とし、該マトリックス樹脂をガ
ラス基材に含浸させることを特徴とするプリント配線板
用プリプレグの製造方法。
3. E-glass is mixed with one or more of calcium carbonate, dolomite, talc and calcium silicate in an amount of 5 to 40% by weight, and then mixed.
A partially crystallized glass having a crystallinity of 5 to 20% by weight is obtained by firing at 0 ° C., and the partially crystallized glass is kneaded with a resin to form a matrix resin, and the matrix resin is impregnated into a glass substrate. A method for producing a prepreg for a printed wiring board.
【請求項4】 請求項3に記載のプリント配線板用プリ
プレグの製造方法により得られたプリプレグを少なくと
も1枚用い、常法により積層し成形することを特徴とす
るプリント配線板用積層板の製造方法。
4. A method for producing a laminate for a printed wiring board, wherein at least one prepreg obtained by the method for producing a prepreg for a printed wiring board according to claim 3 is laminated and molded by an ordinary method. Method.
JP17978698A 1998-06-12 1998-06-12 Prepreg for printed wiring board, laminate and their production Pending JP2000001553A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17978698A JP2000001553A (en) 1998-06-12 1998-06-12 Prepreg for printed wiring board, laminate and their production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17978698A JP2000001553A (en) 1998-06-12 1998-06-12 Prepreg for printed wiring board, laminate and their production

Publications (1)

Publication Number Publication Date
JP2000001553A true JP2000001553A (en) 2000-01-07

Family

ID=16071878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17978698A Pending JP2000001553A (en) 1998-06-12 1998-06-12 Prepreg for printed wiring board, laminate and their production

Country Status (1)

Country Link
JP (1) JP2000001553A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008222986A (en) * 2007-03-16 2008-09-25 Asahi Kasei Electronics Co Ltd Prepreg and its preparation
JP2013007061A (en) * 2012-10-10 2013-01-10 Asahi Kasei E-Materials Corp Prepreg and method of producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008222986A (en) * 2007-03-16 2008-09-25 Asahi Kasei Electronics Co Ltd Prepreg and its preparation
JP2013007061A (en) * 2012-10-10 2013-01-10 Asahi Kasei E-Materials Corp Prepreg and method of producing the same

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