JP1768309S - 物理蒸着チャンバー用処理シールド - Google Patents

物理蒸着チャンバー用処理シールド

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Publication number
JP1768309S
JP1768309S JP2023022936F JP2023022936F JP1768309S JP 1768309 S JP1768309 S JP 1768309S JP 2023022936 F JP2023022936 F JP 2023022936F JP 2023022936 F JP2023022936 F JP 2023022936F JP 1768309 S JP1768309 S JP 1768309S
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JP
Japan
Prior art keywords
vapor deposition
physical vapor
deposition chambers
processing shield
shield
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Active
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JP2023022936F
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English (en)
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Publication date
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Publication of JP1768309S publication Critical patent/JP1768309S/ja
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JP2023022936F 2023-05-15 2023-11-06 物理蒸着チャンバー用処理シールド Active JP1768309S (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US202329892186 2023-05-15

Publications (1)

Publication Number Publication Date
JP1768309S true JP1768309S (ja) 2024-04-16

Family

ID=90668203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023022936F Active JP1768309S (ja) 2023-05-15 2023-11-06 物理蒸着チャンバー用処理シールド

Country Status (1)

Country Link
JP (1) JP1768309S (ja)

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