JP1659287S - - Google Patents

Info

Publication number
JP1659287S
JP1659287S JPD2019-23330F JP2019023330F JP1659287S JP 1659287 S JP1659287 S JP 1659287S JP 2019023330 F JP2019023330 F JP 2019023330F JP 1659287 S JP1659287 S JP 1659287S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2019-23330F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2019-23330F priority Critical patent/JP1659287S/ja
Priority to US29/731,604 priority patent/USD954986S1/en
Priority to TW109302067F priority patent/TWD210379S/zh
Application granted granted Critical
Publication of JP1659287S publication Critical patent/JP1659287S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2019-23330F 2019-10-18 2019-10-18 Active JP1659287S (show.php)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2019-23330F JP1659287S (show.php) 2019-10-18 2019-10-18
US29/731,604 USD954986S1 (en) 2019-10-18 2020-04-16 Electrode cover for a plasma processing device
TW109302067F TWD210379S (zh) 2019-10-18 2020-04-16 電漿處理裝置用保護環

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2019-23330F JP1659287S (show.php) 2019-10-18 2019-10-18

Publications (1)

Publication Number Publication Date
JP1659287S true JP1659287S (show.php) 2020-05-11

Family

ID=70483560

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2019-23330F Active JP1659287S (show.php) 2019-10-18 2019-10-18

Country Status (3)

Country Link
US (1) USD954986S1 (show.php)
JP (1) JP1659287S (show.php)
TW (1) TWD210379S (show.php)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
JP1746769S (ja) * 2023-01-31 2023-06-20 複合シール材
USD1061905S1 (en) * 2023-05-17 2025-02-11 Shenzhen Fengyu Trading Co., Ltd. Protective cover for biosensor

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
US4579354A (en) * 1984-12-05 1986-04-01 Vassallo Research And Development Corporation Gasket
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
JP1546800S (show.php) * 2015-06-12 2016-03-28
JP1545407S (show.php) * 2015-06-16 2016-03-14
JP1545406S (show.php) * 2015-06-16 2016-03-14
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD830434S1 (en) * 2015-12-28 2018-10-09 Ntn Corporation Inner ring for tapered roller bearing
JP1584906S (show.php) * 2017-01-31 2017-08-28
JP1584241S (show.php) * 2017-01-31 2017-08-21
JP1598984S (show.php) * 2017-07-31 2018-03-05
JP1598996S (show.php) * 2017-08-31 2018-03-05
JP1598997S (show.php) * 2017-08-31 2018-03-05
JP1598998S (show.php) * 2017-08-31 2018-03-05
JP1605832S (show.php) * 2017-11-06 2018-06-04
JP1640255S (show.php) * 2018-10-25 2019-09-02
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD917026S1 (en) * 2019-09-12 2021-04-20 S & B Technical Products, Inc. Pipe sealing gasket

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus

Also Published As

Publication number Publication date
TWD210379S (zh) 2021-03-11
USD954986S1 (en) 2022-06-14

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