JP1646505S - - Google Patents
Info
- Publication number
- JP1646505S JP1646505S JP2018026741F JP2018026741F JP1646505S JP 1646505 S JP1646505 S JP 1646505S JP 2018026741 F JP2018026741 F JP 2018026741F JP 2018026741 F JP2018026741 F JP 2018026741F JP 1646505 S JP1646505 S JP 1646505S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018026741F JP1646505S (ja) | 2018-12-07 | 2018-12-07 | |
US29/692,040 USD992615S1 (en) | 2018-12-07 | 2019-05-22 | Focus ring |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018026741F JP1646505S (ja) | 2018-12-07 | 2018-12-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1646505S true JP1646505S (ja) | 2019-11-25 |
Family
ID=68610585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018026741F Active JP1646505S (ja) | 2018-12-07 | 2018-12-07 |
Country Status (2)
Country | Link |
---|---|
US (1) | USD992615S1 (ja) |
JP (1) | JP1646505S (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11961723B2 (en) * | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
JP1711120S (ja) * | 2021-10-22 | 2022-03-29 | サセプタカバー | |
USD1042374S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
USD1042373S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
USD1049067S1 (en) * | 2022-04-04 | 2024-10-29 | Applied Materials, Inc. | Ring for an anti-rotation process kit for a substrate processing chamber |
USD1041537S1 (en) * | 2023-05-01 | 2024-09-10 | Jiangmen Kase Optics Co., Ltd | Magnetic filter |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD248766S (en) * | 1976-05-20 | 1978-08-01 | Kabushiki Kaisha Tamron | Barrel for interchangeable lens |
USD698843S1 (en) * | 2011-08-10 | 2014-02-04 | Nikon Corporation | Intermediate adapter for a camera |
USD692475S1 (en) * | 2012-03-21 | 2013-10-29 | Nikon Corporation | Camera mount |
USD729862S1 (en) * | 2012-07-03 | 2015-05-19 | Fujifilm Corporation | Lens for camera |
US9042719B2 (en) * | 2012-11-20 | 2015-05-26 | Ye Xu | Magnetic lens filters and adapter assemblies for a camera |
USD797067S1 (en) * | 2015-04-21 | 2017-09-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1546800S (ja) * | 2015-06-12 | 2016-03-28 | ||
US10174437B2 (en) * | 2015-07-09 | 2019-01-08 | Applied Materials, Inc. | Wafer electroplating chuck assembly |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD799578S1 (en) * | 2016-03-11 | 2017-10-10 | Breakthrough Photography, LLC | Camera lens filter with traction frame |
USD797691S1 (en) * | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
JP1573685S (ja) * | 2016-08-31 | 2017-04-10 | ||
JP1581911S (ja) * | 2016-10-25 | 2017-07-24 | ||
USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
JP7153290B2 (ja) * | 2017-06-01 | 2022-10-14 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | 脆性材料の安全で経済的な蒸発のためのターゲットアセンブリ |
USD898104S1 (en) * | 2017-09-27 | 2020-10-06 | Nikon Corporation | Camera lens |
JP1599291S (ja) * | 2017-09-28 | 2021-03-08 | ||
TWI642967B (zh) * | 2018-03-07 | 2018-12-01 | 大立光電股份有限公司 | 環形光學元件、成像鏡頭模組與電子裝置 |
USD877101S1 (en) * | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD888804S1 (en) * | 2018-05-04 | 2020-06-30 | New Ideas Manufacturing LLC | Step-up ring |
JP1637186S (ja) * | 2018-05-15 | 2019-07-22 | ||
JP1629825S (ja) * | 2018-05-15 | 2019-04-22 | ||
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
JP7546456B2 (ja) * | 2020-11-13 | 2024-09-06 | 東京エレクトロン株式会社 | エッジリングおよび基板処理装置 |
KR102464458B1 (ko) * | 2021-09-06 | 2022-11-09 | (주)원세미콘 | 반도체 플라즈마 에칭 공정 특성을 개선한 포커스 링 |
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2018
- 2018-12-07 JP JP2018026741F patent/JP1646505S/ja active Active
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2019
- 2019-05-22 US US29/692,040 patent/USD992615S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
USD992615S1 (en) | 2023-07-18 |