JP1517658S - - Google Patents

Info

Publication number
JP1517658S
JP1517658S JPD2014-10697F JP2014010697F JP1517658S JP 1517658 S JP1517658 S JP 1517658S JP 2014010697 F JP2014010697 F JP 2014010697F JP 1517658 S JP1517658 S JP 1517658S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2014-10697F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2014-10697F priority Critical patent/JP1517658S/ja
Priority to US29/509,022 priority patent/USD767840S1/en
Priority to TW103306671F priority patent/TWD169066S/zh
Application granted granted Critical
Publication of JP1517658S publication Critical patent/JP1517658S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2014-10697F 2014-05-20 2014-05-20 Active JP1517658S (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2014-10697F JP1517658S (zh) 2014-05-20 2014-05-20
US29/509,022 USD767840S1 (en) 2014-05-20 2014-11-13 Polishing pad
TW103306671F TWD169066S (zh) 2014-05-20 2014-11-14 硏磨墊

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2014-10697F JP1517658S (zh) 2014-05-20 2014-05-20

Publications (1)

Publication Number Publication Date
JP1517658S true JP1517658S (zh) 2015-02-16

Family

ID=53484541

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2014-10697F Active JP1517658S (zh) 2014-05-20 2014-05-20

Country Status (3)

Country Link
US (1) USD767840S1 (zh)
JP (1) JP1517658S (zh)
TW (1) TWD169066S (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD809234S1 (en) * 2016-02-05 2018-01-30 3M Innovative Properties Company Nonwoven abrasive with dot surface pattern
USD814727S1 (en) * 2017-02-03 2018-04-03 The Clorox Company Grill brush pad
USD866892S1 (en) * 2017-07-28 2019-11-12 3M Innovative Properties Company Scouring pad
USD850041S1 (en) * 2017-07-31 2019-05-28 3M Innovative Properties Company Scouring pad
USD825125S1 (en) * 2017-08-07 2018-08-07 3M Innovative Properties Company Dusting sleeve with a dot pattern bond
USD1004393S1 (en) * 2021-11-09 2023-11-14 Ehwa Diamond Industrial Co., Ltd. Grinding pad
USD1000928S1 (en) * 2022-06-03 2023-10-10 Beng Youl Cho Polishing pad
USD1004873S1 (en) * 2023-06-01 2023-11-14 Giant Media Network Culture (Shenzhen) Co., Ltd. Mop pad

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1222563A (en) * 1915-02-02 1917-04-10 Charles Schaefer Ground-mat.
US1808834A (en) * 1929-03-06 1931-06-09 Sr Rudolph Busch Cleaning pad
US1993174A (en) * 1933-07-01 1935-03-05 Earnshaw Knitting Company Sanitary wash cloth
US2354435A (en) * 1941-08-20 1944-07-25 Firestone Tire & Rubber Co Plastic fabric
US2886697A (en) * 1954-01-25 1959-05-12 Tyler Co W S Illuminated ceiling
US2809145A (en) * 1955-01-18 1957-10-08 Mcdermott Francis Roland Vibration-absorbing pad and process of manufacture
US3074099A (en) * 1959-02-09 1963-01-22 Gen Foods Corp Scouring and polishing device and method of producing same
US4993099A (en) * 1989-12-27 1991-02-19 Yachiyo Micro Science Company Limited Cleaning and polishing pad
US6453502B1 (en) * 1998-12-22 2002-09-24 Bishop Deforest Universal cleaning and polishing pad
JP3943753B2 (ja) * 1999-04-13 2007-07-11 ユニ・チャーム株式会社 使い捨ての汚れ拭き取り用具の製造方法
USD429545S (en) * 1999-08-31 2000-08-15 Foamex Lp Mop head
US6544373B2 (en) * 2001-07-26 2003-04-08 United Microelectronics Corp. Polishing pad for a chemical mechanical polishing process
USD559064S1 (en) 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD545018S1 (en) * 2005-07-14 2007-06-19 The Procter & Gamble Company Abrasive wipe
US20070077834A1 (en) * 2005-09-30 2007-04-05 Tyco Healthcare Retail Services Ag Absorbent cleaning pad having a durable cleaning surface and method of making same
USD636606S1 (en) * 2008-09-01 2011-04-26 Yao I Fabric Co., Ltd. Mesh-chair cloth
USD627941S1 (en) * 2009-12-17 2010-11-23 Diva International S.R.L. Wipe
US8834984B2 (en) * 2009-12-22 2014-09-16 Tietex International, Ltd Stitch bonded wipe
USD657103S1 (en) * 2011-05-04 2012-04-03 Tietex International Ltd. Cleaning wipe
USD657513S1 (en) * 2011-05-04 2012-04-10 Tietex International, Ltd Cleaning wipe
USD685544S1 (en) * 2012-05-09 2013-07-02 Umf Corporation Cleaning cloth
USD673745S1 (en) * 2012-06-14 2013-01-01 The Procter & Gamble Company Cleaning sheet
US9661973B2 (en) * 2013-03-15 2017-05-30 Rockline Industries, Inc. Cleaning pad with abrasive layer
USD714506S1 (en) * 2013-04-10 2014-09-30 Kikuo Yamada Cleaning sheet
US20150061171A1 (en) * 2013-09-04 2015-03-05 Bio-Medical Carbon Technology Co., Ltd. Method of manufacturing wound dressing
USD742195S1 (en) * 2013-12-16 2015-11-03 3M Innovation Properties Company Sanding article with pattern

Also Published As

Publication number Publication date
TWD169066S (zh) 2015-07-11
USD767840S1 (en) 2016-09-27

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