JP1438320S - - Google Patents
Info
- Publication number
- JP1438320S JP1438320S JPD2011-21504F JP2011021504F JP1438320S JP 1438320 S JP1438320 S JP 1438320S JP 2011021504 F JP2011021504 F JP 2011021504F JP 1438320 S JP1438320 S JP 1438320S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2011-21504F JP1438320S (forum.php) | 2011-09-20 | 2011-09-20 | |
| US29/416,088 USD694791S1 (en) | 2011-09-20 | 2012-03-19 | Baffle plate for manufacturing semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2011-21504F JP1438320S (forum.php) | 2011-09-20 | 2011-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1438320S true JP1438320S (forum.php) | 2015-04-06 |
Family
ID=49641239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2011-21504F Active JP1438320S (forum.php) | 2011-09-20 | 2011-09-20 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD694791S1 (forum.php) |
| JP (1) | JP1438320S (forum.php) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD735786S1 (en) * | 2013-07-11 | 2015-08-04 | Sievert Ab | Blowtorch |
| USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
| USD826300S1 (en) * | 2016-09-30 | 2018-08-21 | Oerlikon Metco Ag, Wohlen | Rotably mounted thermal plasma burner for thermalspraying |
| USD890443S1 (en) * | 2017-06-27 | 2020-07-14 | Kimberly Ann Virus | Feed bucket lid |
| JP1648519S (forum.php) * | 2018-10-04 | 2019-12-23 | ||
| JP1640255S (forum.php) | 2018-10-25 | 2019-09-02 | ||
| USD937330S1 (en) * | 2019-05-21 | 2021-11-30 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
| USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
| USD1066275S1 (en) * | 2022-04-04 | 2025-03-11 | Applied Materials, Inc. | Baffle for anti-rotation process kit for substrate processing chamber |
| USD1073758S1 (en) * | 2022-10-13 | 2025-05-06 | Lam Research Corporation | Baffle for substrate processing system |
| USD1076837S1 (en) * | 2023-01-19 | 2025-05-27 | Lam Research Corporation | Baffle |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6889468B2 (en) * | 2001-12-28 | 2005-05-10 | 3M Innovative Properties Company | Modular systems and methods for using sample processing devices |
| US7479304B2 (en) * | 2002-02-14 | 2009-01-20 | Applied Materials, Inc. | Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
| KR20030090305A (ko) * | 2002-05-22 | 2003-11-28 | 동경엘렉트론코리아(주) | 플라즈마 발생장치의 가스 배기용 배플 플레이트 |
| US20050150452A1 (en) * | 2004-01-14 | 2005-07-14 | Soovo Sen | Process kit design for deposition chamber |
| US7754474B2 (en) * | 2005-07-05 | 2010-07-13 | 3M Innovative Properties Company | Sample processing device compression systems and methods |
| USD557266S1 (en) * | 2006-05-02 | 2007-12-11 | Sanford, L.P. | Monitor and printer stand |
| USD582949S1 (en) * | 2006-12-15 | 2008-12-16 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
| US20090096349A1 (en) * | 2007-04-26 | 2009-04-16 | Moshtagh Vahid S | Cross flow cvd reactor |
| US8291857B2 (en) * | 2008-07-03 | 2012-10-23 | Applied Materials, Inc. | Apparatuses and methods for atomic layer deposition |
| USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
| USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
| USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
| USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
| US20130125818A1 (en) * | 2011-11-22 | 2013-05-23 | Intermolecular, Inc. | Combinatorial deposition based on a spot apparatus |
-
2011
- 2011-09-20 JP JPD2011-21504F patent/JP1438320S/ja active Active
-
2012
- 2012-03-19 US US29/416,088 patent/USD694791S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD694791S1 (en) | 2013-12-03 |