ITUB20153580A1 - Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione - Google Patents
Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazioneInfo
- Publication number
- ITUB20153580A1 ITUB20153580A1 ITUB2015A003580A ITUB20153580A ITUB20153580A1 IT UB20153580 A1 ITUB20153580 A1 IT UB20153580A1 IT UB2015A003580 A ITUB2015A003580 A IT UB2015A003580A IT UB20153580 A ITUB20153580 A IT UB20153580A IT UB20153580 A1 ITUB20153580 A1 IT UB20153580A1
- Authority
- IT
- Italy
- Prior art keywords
- microelettromechanical
- stress
- sensor device
- manufacturing procedure
- reduced sensitivity
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0045—Packages or encapsulation for reducing stress inside of the package structure
- B81B7/0054—Packages or encapsulation for reducing stress inside of the package structure between other parts not provided for in B81B7/0048 - B81B7/0051
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0045—Packages or encapsulation for reducing stress inside of the package structure
- B81B7/0048—Packages or encapsulation for reducing stress inside of the package structure between the MEMS die and the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C3/00—Assembling of devices or systems from individually processed components
- B81C3/001—Bonding of two components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0264—Pressure sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/008—MEMS characterised by an electronic circuit specially adapted for controlling or driving the same
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00325—Processes for packaging MEMS devices for reducing stress inside of the package structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITUB2015A003580A ITUB20153580A1 (it) | 2015-09-11 | 2015-09-11 | Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione |
US15/074,755 US9914639B2 (en) | 2015-09-11 | 2016-03-18 | Microelectromechanical sensor device with reduced stress-sensitivity and corresponding manufacturing process |
EP16161870.7A EP3141521B1 (en) | 2015-09-11 | 2016-03-23 | Microelectromechanical sensor device with reduced stress-sensitivity and corresponding manufacturing process |
CN201620257596.8U CN205820885U (zh) | 2015-09-11 | 2016-03-30 | 微电机系统器件 |
CN201610191890.8A CN106517079B (zh) | 2015-09-11 | 2016-03-30 | 有减少的应力灵敏度的微电机传感器器件和对应制造工艺 |
US15/880,332 US10427933B2 (en) | 2015-09-11 | 2018-01-25 | Microelectromechanical sensor device with reduced stress-sensitivity and corresponding manufacturing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITUB2015A003580A ITUB20153580A1 (it) | 2015-09-11 | 2015-09-11 | Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione |
Publications (1)
Publication Number | Publication Date |
---|---|
ITUB20153580A1 true ITUB20153580A1 (it) | 2017-03-11 |
Family
ID=54601961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITUB2015A003580A ITUB20153580A1 (it) | 2015-09-11 | 2015-09-11 | Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione |
Country Status (4)
Country | Link |
---|---|
US (2) | US9914639B2 (it) |
EP (1) | EP3141521B1 (it) |
CN (2) | CN205820885U (it) |
IT (1) | ITUB20153580A1 (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITUB20153580A1 (it) * | 2015-09-11 | 2017-03-11 | St Microelectronics Srl | Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione |
US10278281B1 (en) * | 2015-10-30 | 2019-04-30 | Garmin International, Inc. | MEMS stress isolation and stabilization system |
US10196259B2 (en) | 2015-12-30 | 2019-02-05 | Mems Drive, Inc. | MEMS actuator structures resistant to shock |
DE102016216870B4 (de) | 2016-09-06 | 2019-07-18 | Robert Bosch Gmbh | Verfahren zum Herstellen eines mikromechanischen Bauteils mit einer freigestellten Drucksensoreinrichtung |
KR102359943B1 (ko) * | 2017-09-13 | 2022-02-07 | 현대자동차 주식회사 | 마이크로폰 장치 |
DE102017220349B3 (de) * | 2017-11-15 | 2018-06-14 | Robert Bosch Gmbh | Mikromechanische Drucksensorvorrichtung und entsprechendes Herstellungsverfahren |
EP3779391A1 (en) * | 2019-08-14 | 2021-02-17 | Sciosense B.V. | Sensor arrangement and method for fabricating a sensor arrangement |
US20220162058A1 (en) * | 2020-11-24 | 2022-05-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wire-bond damper for shock absorption |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040232507A1 (en) * | 2002-05-31 | 2004-11-25 | Eiichi Furukubo | Sensor package |
DE102007010711A1 (de) * | 2007-02-28 | 2008-09-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Schaltanordnung und Verfahren zu deren Herstellung |
US20110298064A1 (en) * | 2009-02-06 | 2011-12-08 | Epcos Ag | Sensor module and method for producing sensor modules |
US20130020718A1 (en) * | 2011-07-22 | 2013-01-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | MEMS Devices and Methods of Forming Same |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4568202B2 (ja) * | 2005-09-29 | 2010-10-27 | Okiセミコンダクタ株式会社 | 半導体装置 |
US8746156B2 (en) * | 2009-12-17 | 2014-06-10 | Richard J. Camarillo | Portable desk apparatus and methods |
FR2954505B1 (fr) | 2009-12-22 | 2012-08-03 | Commissariat Energie Atomique | Structure micromecanique comportant une partie mobile presentant des butees pour des deplacements hors plan de la structure et son procede de realisation |
US9242851B2 (en) * | 2013-08-06 | 2016-01-26 | Freescale Semiconductor, Inc | MEMS device with differential vertical sense electrodes |
US9574959B2 (en) * | 2014-09-02 | 2017-02-21 | Apple Inc. | Various stress free sensor packages using wafer level supporting die and air gap technique |
ITUB20153580A1 (it) * | 2015-09-11 | 2017-03-11 | St Microelectronics Srl | Dispositivo sensore microelettromeccanico con ridotta sensibilita' agli stress e relativo procedimento di fabbricazione |
-
2015
- 2015-09-11 IT ITUB2015A003580A patent/ITUB20153580A1/it unknown
-
2016
- 2016-03-18 US US15/074,755 patent/US9914639B2/en active Active
- 2016-03-23 EP EP16161870.7A patent/EP3141521B1/en active Active
- 2016-03-30 CN CN201620257596.8U patent/CN205820885U/zh active Active
- 2016-03-30 CN CN201610191890.8A patent/CN106517079B/zh active Active
-
2018
- 2018-01-25 US US15/880,332 patent/US10427933B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040232507A1 (en) * | 2002-05-31 | 2004-11-25 | Eiichi Furukubo | Sensor package |
DE102007010711A1 (de) * | 2007-02-28 | 2008-09-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Schaltanordnung und Verfahren zu deren Herstellung |
US20110298064A1 (en) * | 2009-02-06 | 2011-12-08 | Epcos Ag | Sensor module and method for producing sensor modules |
US20130020718A1 (en) * | 2011-07-22 | 2013-01-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | MEMS Devices and Methods of Forming Same |
Also Published As
Publication number | Publication date |
---|---|
US10427933B2 (en) | 2019-10-01 |
US9914639B2 (en) | 2018-03-13 |
CN106517079B (zh) | 2021-05-07 |
US20170073220A1 (en) | 2017-03-16 |
US20180148321A1 (en) | 2018-05-31 |
CN205820885U (zh) | 2016-12-21 |
EP3141521B1 (en) | 2020-07-22 |
CN106517079A (zh) | 2017-03-22 |
EP3141521A1 (en) | 2017-03-15 |
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