IT978173B - Metodo di fabbricazione di corpi semiconduttori monocristallini e dispositivi semiconduttori in par ticolare rivelatori di radiazioni comprendenti tali corpi semicondut tori - Google Patents
Metodo di fabbricazione di corpi semiconduttori monocristallini e dispositivi semiconduttori in par ticolare rivelatori di radiazioni comprendenti tali corpi semicondut toriInfo
- Publication number
- IT978173B IT978173B IT19231/73A IT1923173A IT978173B IT 978173 B IT978173 B IT 978173B IT 19231/73 A IT19231/73 A IT 19231/73A IT 1923173 A IT1923173 A IT 1923173A IT 978173 B IT978173 B IT 978173B
- Authority
- IT
- Italy
- Prior art keywords
- semiconducting
- bodies
- manufacturing
- radiation detectors
- devices
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7200677A NL7200677A (it) | 1972-01-18 | 1972-01-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT978173B true IT978173B (it) | 1974-09-20 |
Family
ID=19815182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT19231/73A IT978173B (it) | 1972-01-18 | 1973-01-15 | Metodo di fabbricazione di corpi semiconduttori monocristallini e dispositivi semiconduttori in par ticolare rivelatori di radiazioni comprendenti tali corpi semicondut tori |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS504975A (it) |
| BE (1) | BE794122A (it) |
| DE (1) | DE2301148A1 (it) |
| FR (1) | FR2168435B1 (it) |
| GB (1) | GB1414202A (it) |
| IT (1) | IT978173B (it) |
| NL (1) | NL7200677A (it) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2344124A1 (fr) * | 1976-03-12 | 1977-10-07 | Ibm | Procede de fabrication de dispositifs semi-conducteurs |
| JPS61266389A (ja) * | 1985-05-21 | 1986-11-26 | Sumitomo Electric Ind Ltd | 結晶内不純物均一化用二重るつぼ |
| JPH01143224A (ja) * | 1987-11-28 | 1989-06-05 | Toshiba Corp | 半導体基板の表面処理方法 |
| US7535947B2 (en) * | 2006-10-20 | 2009-05-19 | Raytheon Company | Enhanced beam quality from a laser rod using interstitial dopants |
| CN109103088B (zh) * | 2018-08-30 | 2020-09-01 | 成都海威华芯科技有限公司 | 一种欧姆接触金属锗的蒸镀方法及其应用 |
| CN115726025A (zh) * | 2021-08-31 | 2023-03-03 | 隆基绿能科技股份有限公司 | 一种吸料装置和吸料方法 |
| CN114227485B (zh) * | 2021-12-20 | 2022-09-02 | 连云港国伦石英制品有限公司 | 一种大尺寸硅片氧化掺杂用石英器件的成型加工及清洗装置 |
-
0
- BE BE794122D patent/BE794122A/xx unknown
-
1972
- 1972-01-18 NL NL7200677A patent/NL7200677A/xx unknown
-
1973
- 1973-01-11 DE DE2301148A patent/DE2301148A1/de active Pending
- 1973-01-15 IT IT19231/73A patent/IT978173B/it active
- 1973-01-15 GB GB199973A patent/GB1414202A/en not_active Expired
- 1973-01-17 JP JP48007129A patent/JPS504975A/ja active Pending
- 1973-01-17 FR FR7301578A patent/FR2168435B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2301148A1 (de) | 1973-07-26 |
| BE794122A (fr) | 1973-07-16 |
| GB1414202A (en) | 1975-11-19 |
| FR2168435A1 (it) | 1973-08-31 |
| JPS504975A (it) | 1975-01-20 |
| FR2168435B1 (it) | 1976-08-27 |
| NL7200677A (it) | 1973-07-20 |
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