IT977238B - Procedimento di alimentazione di un bagno di evaporazione - Google Patents

Procedimento di alimentazione di un bagno di evaporazione

Info

Publication number
IT977238B
IT977238B IT48109/73A IT4810973A IT977238B IT 977238 B IT977238 B IT 977238B IT 48109/73 A IT48109/73 A IT 48109/73A IT 4810973 A IT4810973 A IT 4810973A IT 977238 B IT977238 B IT 977238B
Authority
IT
Italy
Prior art keywords
feeding
procedure
evaporation bath
evaporation
bath
Prior art date
Application number
IT48109/73A
Other languages
English (en)
Italian (it)
Original Assignee
Cockerill Ougree Providence Sa
Arbed
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Ougree Providence Sa, Arbed filed Critical Cockerill Ougree Providence Sa
Application granted granted Critical
Publication of IT977238B publication Critical patent/IT977238B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT48109/73A 1972-02-08 1973-02-07 Procedimento di alimentazione di un bagno di evaporazione IT977238B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU64748 1972-02-08

Publications (1)

Publication Number Publication Date
IT977238B true IT977238B (it) 1974-09-10

Family

ID=19726945

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48109/73A IT977238B (it) 1972-02-08 1973-02-07 Procedimento di alimentazione di un bagno di evaporazione

Country Status (10)

Country Link
US (1) US3860444A (el)
JP (1) JPS4984930A (el)
BE (1) BE795116A (el)
CA (1) CA992811A (el)
DE (1) DE2306035A1 (el)
FR (1) FR2171085B1 (el)
GB (1) GB1425095A (el)
IT (1) IT977238B (el)
LU (1) LU64748A1 (el)
NL (1) NL7217377A (el)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4390571A (en) * 1981-06-30 1983-06-28 International Business Machines Corporation Boatless point source evaporation method
AU585531B2 (en) * 1984-09-17 1989-06-22 Mitsubishi Jukogyo Kabushiki Kaisha Method and apparatus for vacuum deposition plating
JPS6179755A (ja) * 1984-09-28 1986-04-23 Nisshin Steel Co Ltd 溶融めつき真空蒸着めつき兼用の連続めつき装置
KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
CH690440A5 (fr) * 1995-12-11 2000-09-15 Charmilles Technologies Procédé et dispositif de fabrication de fils ayant une surface en laiton, pour les besoins de l'électro-érosion à fil.
ES1034476Y (es) * 1996-06-21 1997-06-01 Mecanismos Aux Ind Hembrilla perfeccionada para circuito impreso.
AUPO663597A0 (en) * 1997-05-06 1997-05-29 Unisearch Limited Fabrication of zinc oxide films in non-planar substrates and the use thereof
DE19960465A1 (de) * 1999-12-15 2001-06-21 Alcatel Sa Flachleiter-Bandleitung
BE1017852A3 (fr) 2007-11-19 2009-09-01 Ind Plasma Services & Technologies Ipst Gmbh Procede et installation de galvanisation par evaporation plasma.
EP2270253B1 (en) * 2009-07-03 2012-09-12 Applied Materials, Inc. Bending fixture for homogenous and smooth operation of an evaporation source
CN102485939A (zh) * 2010-12-02 2012-06-06 鸿富锦精密工业（深圳）有限公司 镀膜件及其制备方法
US8920566B2 (en) 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system
CN110153382B (zh) * 2019-06-14 2022-02-08 上海交通大学 在线式合金熔配方法与装置
DE102022105889A1 (de) 2022-03-14 2023-09-14 Thyssenkrupp Steel Europe Ag Verfahren zum Beschichten eines Substrats mit einer Metalllegierungsbeschichtung, die wenigstens zwei Metalle enthält

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2899528A (en) * 1959-08-11 Method and apparatus for supplying
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals
US3467058A (en) * 1965-12-03 1969-09-16 United States Steel Corp Apparatus for vaporizing metal
US3562002A (en) * 1968-04-24 1971-02-09 Air Reduction Method and apparatus for vapor deposition
US3607222A (en) * 1968-11-26 1971-09-21 Air Reduction Method for evaporating alloy

Also Published As

Publication number Publication date
GB1425095A (en) 1976-02-18
DE2306035A1 (de) 1973-08-23
FR2171085A1 (el) 1973-09-21
LU64748A1 (el) 1973-02-19
BE795116A (fr) 1973-05-29
FR2171085B1 (el) 1977-04-08
US3860444A (en) 1975-01-14
CA992811A (en) 1976-07-13
JPS4984930A (el) 1974-08-15
NL7217377A (el) 1973-08-10

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