IT974361B - Apparecchio di polverizzazione per rivestire oggetti - Google Patents

Apparecchio di polverizzazione per rivestire oggetti

Info

Publication number
IT974361B
IT974361B IT55085/72A IT5508572A IT974361B IT 974361 B IT974361 B IT 974361B IT 55085/72 A IT55085/72 A IT 55085/72A IT 5508572 A IT5508572 A IT 5508572A IT 974361 B IT974361 B IT 974361B
Authority
IT
Italy
Prior art keywords
polverization
coating objects
objects
coating
polverization apparatus
Prior art date
Application number
IT55085/72A
Other languages
English (en)
Original Assignee
Lucas Aerospace Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucas Aerospace Ltd filed Critical Lucas Aerospace Ltd
Application granted granted Critical
Publication of IT974361B publication Critical patent/IT974361B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
IT55085/72A 1971-12-29 1972-12-28 Apparecchio di polverizzazione per rivestire oggetti IT974361B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB6050271A GB1419496A (en) 1971-12-29 1971-12-29 Sputtering apparatus

Publications (1)

Publication Number Publication Date
IT974361B true IT974361B (it) 1974-06-20

Family

ID=10485693

Family Applications (1)

Application Number Title Priority Date Filing Date
IT55085/72A IT974361B (it) 1971-12-29 1972-12-28 Apparecchio di polverizzazione per rivestire oggetti

Country Status (6)

Country Link
US (1) US3827966A (it)
JP (1) JPS4873381A (it)
DE (1) DE2263738A1 (it)
FR (1) FR2170571A5 (it)
GB (1) GB1419496A (it)
IT (1) IT974361B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3981791A (en) * 1975-03-10 1976-09-21 Signetics Corporation Vacuum sputtering apparatus
US3976555A (en) * 1975-03-20 1976-08-24 Coulter Information Systems, Inc. Method and apparatus for supplying background gas in a sputtering chamber
JPS5291650A (en) * 1976-01-29 1977-08-02 Toshiba Corp Continuous gas plasma etching apparatus
US4252595A (en) * 1976-01-29 1981-02-24 Tokyo Shibaura Electric Co., Ltd. Etching apparatus using a plasma
US4141808A (en) * 1978-04-17 1979-02-27 Eastman Kodak Company Manganese carbonyl-sulfonyl chloride photoinitiators for radiation polymerizable unsaturated compounds
US4294678A (en) * 1979-11-28 1981-10-13 Coulter Systems Corporation Apparatus and method for preventing contamination of sputtering targets
EP0162842A1 (en) * 1983-12-01 1985-12-04 Shatterproof Glass Corporation Gas distribution system for sputtering cathodes
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system

Also Published As

Publication number Publication date
US3827966A (en) 1974-08-06
GB1419496A (en) 1975-12-31
JPS4873381A (it) 1973-10-03
FR2170571A5 (it) 1973-09-14
DE2263738A1 (de) 1973-07-12

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