IT948212B - Dispositivo di resistenza elettrica e procedimento per produrlo - Google Patents
Dispositivo di resistenza elettrica e procedimento per produrloInfo
- Publication number
- IT948212B IT948212B IT47724/72A IT4772472A IT948212B IT 948212 B IT948212 B IT 948212B IT 47724/72 A IT47724/72 A IT 47724/72A IT 4772472 A IT4772472 A IT 4772472A IT 948212 B IT948212 B IT 948212B
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- producing
- electrical resistance
- resistance device
- electrical
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/04—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient
- H01C7/041—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient formed as one or more layers or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
- Y10T428/24868—Translucent outer layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material
- Y10T428/24909—Free metal or mineral containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11189771A | 1971-02-02 | 1971-02-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
IT948212B true IT948212B (it) | 1973-05-30 |
Family
ID=22341025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT47724/72A IT948212B (it) | 1971-02-02 | 1972-01-14 | Dispositivo di resistenza elettrica e procedimento per produrlo |
Country Status (6)
Country | Link |
---|---|
US (1) | US4088799A (it) |
JP (1) | JPS5136877B1 (it) |
FR (1) | FR2124361B1 (it) |
GB (1) | GB1346517A (it) |
IL (1) | IL38468A (it) |
IT (1) | IT948212B (it) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4188417A (en) * | 1977-05-04 | 1980-02-12 | Balzers Patent-und Beteiligungs-Aktiegesellschaft | Method of applying a dielectric layer to a substrate and a mask-forming coating for the application of a dielectric layer |
US4173660A (en) * | 1977-07-27 | 1979-11-06 | The United States Of America As Represented By The United States Department Of Energy | Method of preparing a thermoluminescent phosphor |
US4196228A (en) * | 1978-06-10 | 1980-04-01 | Monolithic Memories, Inc. | Fabrication of high resistivity semiconductor resistors by ion implanatation |
JPS5839376B2 (ja) * | 1978-10-30 | 1983-08-30 | 富士通株式会社 | イオン注入法 |
US4286250A (en) | 1979-05-04 | 1981-08-25 | New England Instrument Company | Laser formed resistor elements |
DE3041957A1 (de) * | 1979-11-08 | 1981-09-03 | British Aerospace, Weybridge, Surrey | Thermische abschirmung, insbesondere fuer raumfahrzeuge |
US4532149A (en) * | 1981-10-21 | 1985-07-30 | The United States Of America As Represented By The United States Department Of Energy | Method for producing hard-surfaced tools and machine components |
GB8310298D0 (en) * | 1983-04-15 | 1983-05-18 | Atomic Energy Authority Uk | Modification of surface properties of ceramics |
US4489104A (en) * | 1983-06-03 | 1984-12-18 | Industrial Technology Research Institute | Polycrystalline silicon resistor having limited lateral diffusion |
US4560583A (en) * | 1984-06-29 | 1985-12-24 | International Business Machines Corporation | Resistor design system |
US4800170A (en) * | 1987-10-02 | 1989-01-24 | General Motors Corporation | Process for forming in a silicon oxide layer a portion with vertical side walls |
US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
US4915746A (en) * | 1988-08-15 | 1990-04-10 | Welsch Gerhard E | Method of forming high temperature barriers in structural metals to make such metals creep resistant at high homologous temperatures |
JP2764591B2 (ja) * | 1988-12-16 | 1998-06-11 | 株式会社小松製作所 | 薄膜el素子とその製造方法 |
JP2934456B2 (ja) * | 1989-07-14 | 1999-08-16 | 株式会社日立製作所 | 表面処理方法及びその装置 |
US5164266A (en) * | 1989-10-24 | 1992-11-17 | Isuzu Ceramics Research Institute Co., Ltd. | Slidable ceramic member and method of manufacturing same |
US5183795A (en) * | 1989-12-13 | 1993-02-02 | Intel Corporation | Fully planar metalization process |
US5060110A (en) * | 1990-08-29 | 1991-10-22 | Motorola, Inc. | High frequency MOSCAP |
FR2695117B1 (fr) * | 1992-08-28 | 1994-12-02 | Saint Gobain Vitrage Int | Procédé de traitement de couches minces à propriétés de conduction électrique et/ou de réflexion dans l'infra-rouge. |
US5437729A (en) * | 1993-04-08 | 1995-08-01 | Martin Marietta Energy Systems, Inc. | Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy |
US6484585B1 (en) | 1995-02-28 | 2002-11-26 | Rosemount Inc. | Pressure sensor for a pressure transmitter |
US5637802A (en) * | 1995-02-28 | 1997-06-10 | Rosemount Inc. | Capacitive pressure sensor for a pressure transmitted where electric field emanates substantially from back sides of plates |
US5665899A (en) * | 1996-02-23 | 1997-09-09 | Rosemount Inc. | Pressure sensor diagnostics in a process transmitter |
US6017829A (en) * | 1997-04-01 | 2000-01-25 | Micron Technology, Inc. | Implanted conductor and methods of making |
US5808205A (en) * | 1997-04-01 | 1998-09-15 | Rosemount Inc. | Eccentric capacitive pressure sensor |
US6451674B1 (en) * | 1998-02-18 | 2002-09-17 | Matsushita Electronics Corporation | Method for introducing impurity into a semiconductor substrate without negative charge buildup phenomenon |
US6403454B1 (en) * | 1999-10-29 | 2002-06-11 | Agere Systems Guardian Corp. | Silicon semiconductor devices with δ-doped layers |
CN1151367C (zh) | 2000-01-06 | 2004-05-26 | 罗斯蒙德公司 | 微机电系统(mems)用的电互联的晶粒生长 |
US6505516B1 (en) | 2000-01-06 | 2003-01-14 | Rosemount Inc. | Capacitive pressure sensing with moving dielectric |
US6520020B1 (en) | 2000-01-06 | 2003-02-18 | Rosemount Inc. | Method and apparatus for a direct bonded isolated pressure sensor |
US6561038B2 (en) | 2000-01-06 | 2003-05-13 | Rosemount Inc. | Sensor with fluid isolation barrier |
US6508129B1 (en) | 2000-01-06 | 2003-01-21 | Rosemount Inc. | Pressure sensor capsule with improved isolation |
IL143442A0 (en) * | 2001-05-30 | 2002-04-21 | Target Technology Ct | Ceramic heat-generating element and method for manufacturing thereof |
US6848316B2 (en) * | 2002-05-08 | 2005-02-01 | Rosemount Inc. | Pressure sensor assembly |
US6944008B2 (en) * | 2002-12-18 | 2005-09-13 | Lucent Technologies Inc. | Charge dissipation in electrostatically driven devices |
US20070184194A1 (en) * | 2006-02-08 | 2007-08-09 | Varian Semiconductor Equipment Associates | Technique for depositing metallic films using ion implantation surface modification for catalysis of electroless deposition |
KR102281607B1 (ko) * | 2012-11-14 | 2021-07-26 | 지티에이티 코포레이션 | 초슬림 사파이어 덮개판을 포함하는 휴대용 전자장치 |
US9377912B2 (en) * | 2012-12-11 | 2016-06-28 | Gtat Corporation | Mobile electronic device comprising a modified sapphire |
US9407746B2 (en) * | 2012-12-27 | 2016-08-02 | Gtat Corporation | Mobile electronic device comprising a sapphire cover plate having a low level of inclusions |
US9092187B2 (en) | 2013-01-08 | 2015-07-28 | Apple Inc. | Ion implant indicia for cover glass or display component |
US9623628B2 (en) | 2013-01-10 | 2017-04-18 | Apple Inc. | Sapphire component with residual compressive stress |
EP2789004A1 (en) | 2013-02-12 | 2014-10-15 | Apple Inc. | Multi-step ion implantation |
US9416442B2 (en) | 2013-03-02 | 2016-08-16 | Apple Inc. | Sapphire property modification through ion implantation |
US10280504B2 (en) | 2015-09-25 | 2019-05-07 | Apple Inc. | Ion-implanted, anti-reflective layer formed within sapphire material |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2950996A (en) * | 1957-12-05 | 1960-08-30 | Beckman Instruments Inc | Electrical resistance material and method of making same |
US3390012A (en) * | 1964-05-14 | 1968-06-25 | Texas Instruments Inc | Method of making dielectric bodies having conducting portions |
US3481776A (en) * | 1966-07-18 | 1969-12-02 | Sprague Electric Co | Ion implantation to form conductive contact |
US3562022A (en) * | 1967-12-26 | 1971-02-09 | Hughes Aircraft Co | Method of doping semiconductor bodies by indirection implantation |
US3523042A (en) * | 1967-12-26 | 1970-08-04 | Hughes Aircraft Co | Method of making bipolar transistor devices |
US3600797A (en) * | 1967-12-26 | 1971-08-24 | Hughes Aircraft Co | Method of making ohmic contacts to semiconductor bodies by indirect ion implantation |
US3718502A (en) * | 1969-10-15 | 1973-02-27 | J Gibbons | Enhancement of diffusion of atoms into a heated substrate by bombardment |
-
1971
- 1971-12-27 IL IL38468A patent/IL38468A/xx unknown
-
1972
- 1972-01-06 GB GB63072A patent/GB1346517A/en not_active Expired
- 1972-01-14 IT IT47724/72A patent/IT948212B/it active
- 1972-02-01 FR FR7203359A patent/FR2124361B1/fr not_active Expired
- 1972-02-02 JP JP47011445A patent/JPS5136877B1/ja active Pending
-
1974
- 1974-02-01 US US05/438,898 patent/US4088799A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2124361B1 (it) | 1976-01-16 |
IL38468A (en) | 1974-11-29 |
DE2202585A1 (de) | 1972-08-10 |
IL38468A0 (en) | 1972-02-29 |
GB1346517A (en) | 1974-02-13 |
DE2202585B2 (de) | 1976-12-30 |
US4088799A (en) | 1978-05-09 |
FR2124361A1 (it) | 1972-09-22 |
JPS5136877B1 (it) | 1976-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IT948212B (it) | Dispositivo di resistenza elettrica e procedimento per produrlo | |
AR194850A1 (es) | Un dispositivo conectador electrico | |
SE389582B (sv) | Elektrisk kontaktanordning | |
AT311480B (de) | Elektrisches Hochspannungsgerät | |
IT966369B (it) | Dispositivo di riscaldamento elettrico e metodo per realizzarlo | |
AT300143B (de) | Elektrisches Widerstandserhitzungskabel | |
SE388749B (sv) | Elektrisk kontaktanordning | |
SE384952B (sv) | Elektrisk anslutningsanordning | |
AT325196B (de) | Gerät zur elektrodiagnose | |
IT968737B (it) | Dispositivo elettrico di connessione | |
CH528067A (de) | Freiluftbeständige Isoliereinrichtung | |
CH532848A (de) | Elektrische Verbindungsvorrichtung | |
SE414665B (sv) | Elektrisk uppvermningsapparat | |
IT984607B (it) | Procedimento e dispositivo di raffreddamento | |
IT968105B (it) | Procedimento e dispositivo di fabbricazione di cablaggi piatti e cablaggio piatto ottenuto | |
IT951291B (it) | Procedimento e dispositivo per misura di resistenza elettrica | |
SE385259B (sv) | Elektriskt motstandsvermeelement | |
IT968718B (it) | Apparecchio per tagliare ed inserire conduttori | |
SE383579B (sv) | Elektriskt reglerdon | |
IT955729B (it) | Conduttori elettrici | |
IT966480B (it) | Dispositivo semiconduttore e procedimento per produrlo | |
IT997293B (it) | Procedimento e dispositivo per produrre wafers | |
IT972525B (it) | Isolamento elettrico | |
IT949098B (it) | Dispositivo semicondottore | |
IT996752B (it) | Procedimento e dispositivo per la fabbricazione di conduttori elettri ci |