IT8422297A0 - Dispositivo a effetto di campo a congelamento dei portatori di carica. - Google Patents
Dispositivo a effetto di campo a congelamento dei portatori di carica.Info
- Publication number
- IT8422297A0 IT8422297A0 IT8422297A IT2229784A IT8422297A0 IT 8422297 A0 IT8422297 A0 IT 8422297A0 IT 8422297 A IT8422297 A IT 8422297A IT 2229784 A IT2229784 A IT 2229784A IT 8422297 A0 IT8422297 A0 IT 8422297A0
- Authority
- IT
- Italy
- Prior art keywords
- field effect
- effect device
- charge carrier
- freezing field
- carrier freezing
- Prior art date
Links
- 230000005669 field effect Effects 0.000 title 1
- 230000008014 freezing Effects 0.000 title 1
- 238000007710 freezing Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66992—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by the variation of applied heat
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7838—Field effect transistors with field effect produced by an insulated gate without inversion channel, e.g. buried channel lateral MISFETs, normally-on lateral MISFETs, depletion-mode lateral MISFETs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52248783A | 1983-08-12 | 1983-08-12 | |
US06/550,506 US4472727A (en) | 1983-08-12 | 1983-11-10 | Carrier freezeout field-effect device |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8422297A0 true IT8422297A0 (it) | 1984-08-10 |
IT1176606B IT1176606B (it) | 1987-08-18 |
Family
ID=27060828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT22297/84A IT1176606B (it) | 1983-08-12 | 1984-08-10 | Dispositivo a effetto di campo a congelamento dei portatori di carica |
Country Status (9)
Country | Link |
---|---|
US (1) | US4472727A (it) |
JP (1) | JPH069206B2 (it) |
CA (1) | CA1201536A (it) |
DE (1) | DE3429577A1 (it) |
FR (1) | FR2550662B1 (it) |
GB (1) | GB2144913B (it) |
IT (1) | IT1176606B (it) |
NL (1) | NL188435C (it) |
SE (1) | SE458245B (it) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5126830A (en) * | 1989-10-31 | 1992-06-30 | General Electric Company | Cryogenic semiconductor power devices |
US5612615A (en) * | 1992-08-21 | 1997-03-18 | American Superconductor Corporation | Cryogenic electronics power supply |
US5347168A (en) * | 1992-08-21 | 1994-09-13 | American Superconductor Corporation | Cryogenic electronics power supply and power sink |
WO1994015364A1 (en) * | 1992-12-29 | 1994-07-07 | Honeywell Inc. | Depletable semiconductor on insulator low threshold complementary transistors |
DE10061529A1 (de) * | 2000-12-11 | 2002-06-27 | Infineon Technologies Ag | Feldeffekt gesteuertes Halbleiterbauelement und Verfahren |
CN103940885B (zh) * | 2014-03-18 | 2017-11-28 | 复旦大学 | 离子敏感场效应晶体管及其制备工艺 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6407158A (it) * | 1963-06-24 | 1964-12-28 | ||
US3512012A (en) * | 1965-11-16 | 1970-05-12 | United Aircraft Corp | Field effect transistor circuit |
US3500137A (en) * | 1967-12-22 | 1970-03-10 | Texas Instruments Inc | Cryogenic semiconductor devices |
US3502908A (en) * | 1968-09-23 | 1970-03-24 | Shell Oil Co | Transistor inverter circuit |
US3644803A (en) * | 1969-03-18 | 1972-02-22 | Us Air Force | Electrical connections to low temperatures |
DE2619663C3 (de) * | 1976-05-04 | 1982-07-22 | Siemens AG, 1000 Berlin und 8000 München | Feldeffekttransistor, Verfahren zu seinem Betrieb und Verwendung als schneller Schalter sowie in einer integrierten Schaltung |
US4129880A (en) * | 1977-07-01 | 1978-12-12 | International Business Machines Incorporated | Channel depletion boundary modulation magnetic field sensor |
US4274105A (en) * | 1978-12-29 | 1981-06-16 | International Business Machines Corporation | MOSFET Substrate sensitivity control |
JPS5720485A (en) * | 1980-07-11 | 1982-02-02 | Mitsubishi Electric Corp | Cryogenic refrigerating plant |
JPS5863168A (ja) * | 1981-10-12 | 1983-04-14 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果型半導体装置 |
-
1983
- 1983-11-10 US US06/550,506 patent/US4472727A/en not_active Expired - Lifetime
-
1984
- 1984-07-17 CA CA000459081A patent/CA1201536A/en not_active Expired
- 1984-08-01 SE SE8403943A patent/SE458245B/sv not_active IP Right Cessation
- 1984-08-06 FR FR8412402A patent/FR2550662B1/fr not_active Expired
- 1984-08-08 GB GB08420184A patent/GB2144913B/en not_active Expired
- 1984-08-10 IT IT22297/84A patent/IT1176606B/it active
- 1984-08-10 JP JP59166620A patent/JPH069206B2/ja not_active Expired - Lifetime
- 1984-08-10 DE DE19843429577 patent/DE3429577A1/de not_active Withdrawn
- 1984-08-10 NL NLAANVRAGE8402474,A patent/NL188435C/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2144913A (en) | 1985-03-13 |
IT1176606B (it) | 1987-08-18 |
SE8403943L (sv) | 1985-02-13 |
CA1201536A (en) | 1986-03-04 |
NL188435C (nl) | 1992-06-16 |
GB2144913B (en) | 1987-03-25 |
JPS6055667A (ja) | 1985-03-30 |
DE3429577A1 (de) | 1985-02-28 |
GB8420184D0 (en) | 1984-09-12 |
NL188435B (nl) | 1992-01-16 |
SE458245B (sv) | 1989-03-06 |
US4472727A (en) | 1984-09-18 |
NL8402474A (nl) | 1985-03-01 |
JPH069206B2 (ja) | 1994-02-02 |
SE8403943D0 (sv) | 1984-08-01 |
FR2550662B1 (fr) | 1988-12-23 |
FR2550662A1 (fr) | 1985-02-15 |
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