IT8348902A0 - Procedomento e soluzione per la placcatura chimica di rame - Google Patents

Procedomento e soluzione per la placcatura chimica di rame

Info

Publication number
IT8348902A0
IT8348902A0 IT8348902A IT4890283A IT8348902A0 IT 8348902 A0 IT8348902 A0 IT 8348902A0 IT 8348902 A IT8348902 A IT 8348902A IT 4890283 A IT4890283 A IT 4890283A IT 8348902 A0 IT8348902 A0 IT 8348902A0
Authority
IT
Italy
Prior art keywords
procedure
solution
copper plating
chemical copper
chemical
Prior art date
Application number
IT8348902A
Other languages
English (en)
Other versions
IT1170454B (it
Inventor
Donald A Arcilesi
Original Assignee
Occidental Chem Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Occidental Chem Co filed Critical Occidental Chem Co
Publication of IT8348902A0 publication Critical patent/IT8348902A0/it
Application granted granted Critical
Publication of IT1170454B publication Critical patent/IT1170454B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
IT48902/83A 1982-09-02 1983-08-31 Procedimento e soluzione per la placcatura chimica di rame IT1170454B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/413,225 US4450191A (en) 1982-09-02 1982-09-02 Ammonium ions used as electroless copper plating rate controller

Publications (2)

Publication Number Publication Date
IT8348902A0 true IT8348902A0 (it) 1983-08-31
IT1170454B IT1170454B (it) 1987-06-03

Family

ID=23636375

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48902/83A IT1170454B (it) 1982-09-02 1983-08-31 Procedimento e soluzione per la placcatura chimica di rame

Country Status (10)

Country Link
US (1) US4450191A (it)
JP (1) JPS5964764A (it)
AU (1) AU565098B2 (it)
BR (1) BR8304782A (it)
CA (1) CA1200952A (it)
DE (1) DE3329958A1 (it)
FR (1) FR2532663A1 (it)
GB (1) GB2126608A (it)
IT (1) IT1170454B (it)
NL (1) NL8303069A (it)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4751106A (en) * 1986-09-25 1988-06-14 Shipley Company Inc. Metal plating process
GB2206128B (en) * 1987-06-23 1991-11-20 Glaverbel Copper mirrors and method of manufacturing same
US5306336A (en) * 1992-11-20 1994-04-26 Monsanto Company Sulfate-free electroless copper plating baths
US5419926A (en) * 1993-11-22 1995-05-30 Lilly London, Inc. Ammonia-free deposition of copper by disproportionation
US5545430A (en) * 1994-12-02 1996-08-13 Motorola, Inc. Method and reduction solution for metallizing a surface
JP2002226974A (ja) * 2000-11-28 2002-08-14 Ebara Corp 無電解Ｎｉ−Ｂめっき液、電子デバイス装置及びその製造方法
US7306662B2 (en) * 2006-05-11 2007-12-11 Lam Research Corporation Plating solution for electroless deposition of copper
US7297190B1 (en) * 2006-06-28 2007-11-20 Lam Research Corporation Plating solutions for electroless deposition of copper
TWI347982B (en) * 2006-07-07 2011-09-01 Rohm & Haas Elect Mat Improved electroless copper compositions
EP3034650B1 (en) * 2014-12-16 2017-06-21 ATOTECH Deutschland GmbH Plating bath compositions for electroless plating of metals and metal alloys

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB892451A (en) * 1957-12-03 1962-03-28 Radio And Allied Ind Ltd Improvements in and relating to the manufacture of printed circuits
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3259559A (en) * 1962-08-22 1966-07-05 Day Company Method for electroless copper plating
US3257215A (en) * 1963-06-18 1966-06-21 Day Company Electroless copper plating
US3377174A (en) * 1963-10-24 1968-04-09 Torigai Eiichi Method and bath for chemically plating copper
DE1300762B (de) * 1965-03-23 1969-08-07 W Kampschulte & Cie Dr Alkalische Loesung und Verfahren zum Abscheiden von Kupfer auf Nichtleitern
US3329512A (en) * 1966-04-04 1967-07-04 Shipley Co Chemical deposition of copper and solutions therefor
US3532518A (en) * 1967-06-28 1970-10-06 Macdermid Inc Colloidal metal activating solutions for use in chemically plating nonconductors,and process of preparing such solutions
US3615736A (en) * 1969-01-06 1971-10-26 Enthone Electroless copper plating bath
US3622370A (en) * 1969-04-07 1971-11-23 Macdermid Inc Method of and solution for accelerating activation of plastic substrates in electroless metal plating system
US3961109A (en) * 1973-08-01 1976-06-01 Photocircuits Division Of Kollmorgen Corporation Sensitizers and process for electroless metal deposition
NL7402422A (nl) * 1974-02-22 1975-08-26 Philips Nv Universele verkoperingsoplossing.
US3962497A (en) * 1975-03-11 1976-06-08 Oxy Metal Industries Corporation Method for treating polymeric substrates prior to plating
DE2659680C2 (de) * 1976-12-30 1985-01-31 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Aktivieren von Oberflächen
US4204013A (en) * 1978-10-20 1980-05-20 Oxy Metal Industries Corporation Method for treating polymeric substrates prior to plating employing accelerating composition containing an alkyl amine
EP0060294B1 (en) * 1980-09-15 1985-12-27 Shipley Company Inc. Electroless alloy plating

Also Published As

Publication number Publication date
US4450191A (en) 1984-05-22
JPS5964764A (ja) 1984-04-12
BR8304782A (pt) 1984-04-10
DE3329958A1 (de) 1984-03-08
FR2532663A1 (fr) 1984-03-09
AU565098B2 (en) 1987-09-03
JPH0317910B2 (it) 1991-03-11
GB2126608A (en) 1984-03-28
GB8323183D0 (en) 1983-09-28
CA1200952A (en) 1986-02-25
IT1170454B (it) 1987-06-03
AU1809483A (en) 1984-03-08
NL8303069A (nl) 1984-04-02

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