Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
  • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
  • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
  • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
  • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor
  • G03C5/20—Reflex-printing
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
  • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
  • G03C5/56—Processes using photosensitive compositions covered by the groups G03C1/64 - G03C1/72 or agents therefor
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
  • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Architecture (AREA)
• Structural Engineering (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Printing Plates And Materials Therefor (AREA)
• Color Printing (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=26641582

Family Applications (1)

Country Status (7)

Families Citing this family (4)

Family Cites Families (3)

• 0
  • BE BE518003D patent/BE518003A/nl unknown
  • BE BE518004D patent/BE518004A/nl unknown
  • NL NL82809D patent/NL82809C/xx active
  • NL NL80290D patent/NL80290C/xx active
  • IT IT500160D patent/IT500160A/it unknown
  • BE BE529806D patent/BE529806A/xx unknown
• 1953
  • 1953-02-19 GB GB470153A patent/GB740166A/en not_active Expired
  • 1953-02-19 GB GB470053A patent/GB740165A/en not_active Expired
  • 1953-03-25 CH CH322659D patent/CH322659A/en unknown
  • 1953-03-25 CH CH326198D patent/CH326198A/en unknown
  • 1953-03-26 DE DEG11334A patent/DE1024356B/en active Pending
  • 1953-03-26 DE DEG11333A patent/DE1024355B/en active Pending
  • 1953-03-31 FR FR1090398D patent/FR1090398A/en not_active Expired
  • 1953-03-31 FR FR1090397D patent/FR1090397A/en not_active Expired
• 1954
  • 1954-06-28 CH CH342085D patent/CH342085A/en unknown
  • 1954-06-29 DE DEC9580A patent/DE1038917B/en active Pending
  • 1954-06-30 FR FR1153061D patent/FR1153061A/en not_active Expired

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