IT202200007826A1 - Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition - Google Patents

Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition Download PDF

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Publication number
IT202200007826A1
IT202200007826A1 IT102022000007826A IT202200007826A IT202200007826A1 IT 202200007826 A1 IT202200007826 A1 IT 202200007826A1 IT 102022000007826 A IT102022000007826 A IT 102022000007826A IT 202200007826 A IT202200007826 A IT 202200007826A IT 202200007826 A1 IT202200007826 A1 IT 202200007826A1
Authority
IT
Italy
Prior art keywords
vapor deposition
physical vapor
deposition technique
improved equipment
coating articles
Prior art date
Application number
IT102022000007826A
Other languages
English (en)
Inventor
Antonio Giambavicchio
Original Assignee
Kolzer Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolzer Srl filed Critical Kolzer Srl
Priority to IT102022000007826A priority Critical patent/IT202200007826A1/it
Priority to EP23168758.3A priority patent/EP4265819A1/en
Publication of IT202200007826A1 publication Critical patent/IT202200007826A1/it

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT102022000007826A 2022-04-20 2022-04-20 Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition IT202200007826A1 (it)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IT102022000007826A IT202200007826A1 (it) 2022-04-20 2022-04-20 Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition
EP23168758.3A EP4265819A1 (en) 2022-04-20 2023-04-19 Improved apparatus and method for coating articles by physical vapor deposition technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102022000007826A IT202200007826A1 (it) 2022-04-20 2022-04-20 Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition

Publications (1)

Publication Number Publication Date
IT202200007826A1 true IT202200007826A1 (it) 2023-10-20

Family

ID=82608543

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102022000007826A IT202200007826A1 (it) 2022-04-20 2022-04-20 Apparecchiatura e procedimento di tipo perfezionato per il rivestimento di articoli con tecnica Physical Vapor Deposition

Country Status (2)

Country Link
EP (1) EP4265819A1 (it)
IT (1) IT202200007826A1 (it)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080305277A1 (en) * 2004-12-02 2008-12-11 Fu-Jann Pern Method and apparatus for making diamond-like carbon films
US20090127109A1 (en) * 2007-11-19 2009-05-21 Kojima Press Industry Co., Ltd. Substrate supporting device and sputtering apparatus including the same
US20100213053A1 (en) * 2009-02-26 2010-08-26 Hon Hai Precision Industry Co., Ltd. Sputter-coating apparatus
US9863036B2 (en) * 2014-04-25 2018-01-09 Plasma-Therm Nes Llc Wafer stage for symmetric wafer processing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080305277A1 (en) * 2004-12-02 2008-12-11 Fu-Jann Pern Method and apparatus for making diamond-like carbon films
US20090127109A1 (en) * 2007-11-19 2009-05-21 Kojima Press Industry Co., Ltd. Substrate supporting device and sputtering apparatus including the same
US20100213053A1 (en) * 2009-02-26 2010-08-26 Hon Hai Precision Industry Co., Ltd. Sputter-coating apparatus
US9863036B2 (en) * 2014-04-25 2018-01-09 Plasma-Therm Nes Llc Wafer stage for symmetric wafer processing

Also Published As

Publication number Publication date
EP4265819A1 (en) 2023-10-25

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