IT1394053B1 - REACTOR FOR DEPOSITION OF LAYERS ON SUBSTRATES - Google Patents
REACTOR FOR DEPOSITION OF LAYERS ON SUBSTRATESInfo
- Publication number
- IT1394053B1 IT1394053B1 ITMI2009A000753A ITMI20090753A IT1394053B1 IT 1394053 B1 IT1394053 B1 IT 1394053B1 IT MI2009A000753 A ITMI2009A000753 A IT MI2009A000753A IT MI20090753 A ITMI20090753 A IT MI20090753A IT 1394053 B1 IT1394053 B1 IT 1394053B1
- Authority
- IT
- Italy
- Prior art keywords
- reactor
- substrates
- deposition
- layers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Saccharide Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI2009A000753A IT1394053B1 (en) | 2009-05-04 | 2009-05-04 | REACTOR FOR DEPOSITION OF LAYERS ON SUBSTRATES |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI2009A000753A IT1394053B1 (en) | 2009-05-04 | 2009-05-04 | REACTOR FOR DEPOSITION OF LAYERS ON SUBSTRATES |
Publications (2)
Publication Number | Publication Date |
---|---|
ITMI20090753A1 ITMI20090753A1 (en) | 2010-11-05 |
IT1394053B1 true IT1394053B1 (en) | 2012-05-25 |
Family
ID=41716471
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITMI2009A000753A IT1394053B1 (en) | 2009-05-04 | 2009-05-04 | REACTOR FOR DEPOSITION OF LAYERS ON SUBSTRATES |
Country Status (1)
Country | Link |
---|---|
IT (1) | IT1394053B1 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58185499A (en) * | 1982-04-21 | 1983-10-29 | Clarion Co Ltd | Device for growing thin film in vapor phase |
US5493987A (en) * | 1994-05-16 | 1996-02-27 | Ag Associates, Inc. | Chemical vapor deposition reactor and method |
US5885356A (en) * | 1994-11-30 | 1999-03-23 | Applied Materials, Inc. | Method of reducing residue accumulation in CVD chamber using ceramic lining |
JP3702068B2 (en) * | 1997-04-09 | 2005-10-05 | 東京エレクトロン株式会社 | Substrate processing equipment |
US20040020599A1 (en) * | 2000-12-27 | 2004-02-05 | Sumi Tanaka | Treating device |
DE10301949A1 (en) * | 2003-01-20 | 2004-07-29 | Siced Electronics Development Gmbh & Co. Kg | CVD reactor for producing a silicon carbide single crystalline layer comprises a reaction chamber, a susceptor arranged in the reaction chamber, and a gas inlet with a diffuser and a homogenizing unit |
KR100558922B1 (en) * | 2004-12-16 | 2006-03-10 | (주)퓨전에이드 | Apparatus and method for thin film deposition |
-
2009
- 2009-05-04 IT ITMI2009A000753A patent/IT1394053B1/en active
Also Published As
Publication number | Publication date |
---|---|
ITMI20090753A1 (en) | 2010-11-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK2371923T3 (en) | deposition inhibitor | |
GB0805328D0 (en) | Deposition of an amorphous layer | |
BR112012006813A2 (en) | coated substrate | |
EP2507826A4 (en) | Method for improving performance of a substrate carrier | |
EP2449579A4 (en) | Methods of forming oxide layers on substrates | |
EP2617807A4 (en) | Culture substrate | |
GB201208994D0 (en) | Spalling for a semiconductor substrate | |
PL2714608T3 (en) | Transparent glass substrate having a coating of consecutive layers | |
EP2643099A4 (en) | Deposition of a silver layer on a nonconducting substrate | |
EP2681045A4 (en) | Protective internal coatings for porous substrates | |
FR2972446B1 (en) | SUBSTRATE FOR PHOTOVOLTAIC CELL | |
GB0904803D0 (en) | Coated substrate | |
SMT201500156B (en) | Compounds of dihydropyrolonaphtoneone as jak inhibitors | |
HK1168392A1 (en) | Process for production of semiconductor light-emitting element substrate | |
EP2794280A4 (en) | Coated media substrate | |
DK2516435T3 (en) | Inhibitors of AKT activity | |
EP2245216A4 (en) | Indium electroplating baths for thin layer deposition | |
EP2704856A4 (en) | Methods and systems for nanoparticle-only layer by layer surface modification of substrate membrane | |
BRPI1006546A2 (en) | method of coating a metallic substrate | |
IT1402060B1 (en) | MANUFACTURED FOR SURFACE COATING | |
GB0916510D0 (en) | Deposition of materials | |
EP2426238A4 (en) | METHOD FOR FABRICATING SiC SUBSTRATE | |
FI20115966A (en) | A method for improving the life of a silicon substrate | |
IT1403828B1 (en) | PROCEDURE FOR THE PRINTING OF A SUBSTRATE | |
FR2972724B1 (en) | SUBSTRATE FOR PHOTOVOLTAIC CELL |