IT1290911B1 - Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati. - Google Patents

Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati.

Info

Publication number
IT1290911B1
IT1290911B1 IT97RM000051A ITRM970051A IT1290911B1 IT 1290911 B1 IT1290911 B1 IT 1290911B1 IT 97RM000051 A IT97RM000051 A IT 97RM000051A IT RM970051 A ITRM970051 A IT RM970051A IT 1290911 B1 IT1290911 B1 IT 1290911B1
Authority
IT
Italy
Prior art keywords
deposit
substrates
procedure
power supply
vacuum systems
Prior art date
Application number
IT97RM000051A
Other languages
English (en)
Inventor
Giovanni Gagliardi
Luigi Corvino
Original Assignee
Siv Soc Italiana Vetro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siv Soc Italiana Vetro filed Critical Siv Soc Italiana Vetro
Priority to IT97RM000051A priority Critical patent/IT1290911B1/it
Priority to US08/971,905 priority patent/US6143148A/en
Priority to PCT/IT1997/000297 priority patent/WO1998033949A1/en
Priority to AU51355/98A priority patent/AU5135598A/en
Publication of ITRM970051A1 publication Critical patent/ITRM970051A1/it
Application granted granted Critical
Publication of IT1290911B1 publication Critical patent/IT1290911B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
IT97RM000051A 1997-02-03 1997-02-03 Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati. IT1290911B1 (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT97RM000051A IT1290911B1 (it) 1997-02-03 1997-02-03 Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati.
US08/971,905 US6143148A (en) 1997-02-03 1997-11-17 Device for feeding substrates to vacuum systems for deposit of surface coating on the substrates
PCT/IT1997/000297 WO1998033949A1 (en) 1997-02-03 1997-11-27 Process and device supplying substrates for vacuum coating
AU51355/98A AU5135598A (en) 1997-02-03 1997-11-27 Process and device supplying substrates for vacuum coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT97RM000051A IT1290911B1 (it) 1997-02-03 1997-02-03 Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati.

Publications (2)

Publication Number Publication Date
ITRM970051A1 ITRM970051A1 (it) 1998-08-03
IT1290911B1 true IT1290911B1 (it) 1998-12-14

Family

ID=11404708

Family Applications (1)

Application Number Title Priority Date Filing Date
IT97RM000051A IT1290911B1 (it) 1997-02-03 1997-02-03 Procedimento e dispositivo per l'alimentazione di impianti da vuoto atti al deposito di rivestimenti superficiali su substrati.

Country Status (4)

Country Link
US (1) US6143148A (it)
AU (1) AU5135598A (it)
IT (1) IT1290911B1 (it)
WO (1) WO1998033949A1 (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10205168A1 (de) * 2002-02-07 2003-08-21 Ardenne Anlagentech Gmbh Verfahren zur Zwischenbehandlung von Substraten in einer In-Line-Vakuumbeschichtungsanlage
JP5431901B2 (ja) * 2008-12-26 2014-03-05 キヤノンアネルバ株式会社 インライン真空処理装置、インライン真空処理装置の制御方法、情報記録媒体の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4015558A (en) * 1972-12-04 1977-04-05 Optical Coating Laboratory, Inc. Vapor deposition apparatus
JPH083146B2 (ja) * 1989-10-16 1996-01-17 富士通株式会社 薄膜形成方法
JP2644912B2 (ja) * 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
EP0577766B1 (en) * 1991-04-04 1999-12-29 Seagate Technology, Inc. Apparatus and method for high throughput sputtering
US5215420A (en) * 1991-09-20 1993-06-01 Intevac, Inc. Substrate handling and processing system
JP3115134B2 (ja) * 1992-11-27 2000-12-04 松下電器産業株式会社 薄膜処理装置および薄膜処理方法
DE4341635C2 (de) * 1993-12-07 2002-07-18 Unaxis Deutschland Holding Vakuumbeschichtungsanlage
US5705044A (en) * 1995-08-07 1998-01-06 Akashic Memories Corporation Modular sputtering machine having batch processing and serial thin film sputtering
IL115713A0 (en) * 1995-10-22 1996-01-31 Ipmms Dev & Production Ltd Sputter deposit method and apparatus

Also Published As

Publication number Publication date
ITRM970051A1 (it) 1998-08-03
WO1998033949A1 (en) 1998-08-06
AU5135598A (en) 1998-08-25
US6143148A (en) 2000-11-07

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Legal Events

Date Code Title Description
0001 Granted