IT1204345B - Procedimento per omopolimerizzazione anionica di alfa-trifluorometilacrilato - Google Patents

Procedimento per omopolimerizzazione anionica di alfa-trifluorometilacrilato

Info

Publication number
IT1204345B
IT1204345B IT19378/86A IT1937886A IT1204345B IT 1204345 B IT1204345 B IT 1204345B IT 19378/86 A IT19378/86 A IT 19378/86A IT 1937886 A IT1937886 A IT 1937886A IT 1204345 B IT1204345 B IT 1204345B
Authority
IT
Italy
Prior art keywords
trifluoromethylacrylate
alpha
procedure
anionic homopolymerization
homopolymerization
Prior art date
Application number
IT19378/86A
Other languages
English (en)
Other versions
IT8619378A0 (it
Inventor
Narita Tadashi
Hagiwara Tokio
Hamana Hiroshi
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of IT8619378A0 publication Critical patent/IT8619378A0/it
Application granted granted Critical
Publication of IT1204345B publication Critical patent/IT1204345B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10Esters
    • C08F120/22Esters containing halogen
    • C08F120/24Esters containing halogen containing perhaloalkyl radicals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
IT19378/86A 1985-02-20 1986-02-12 Procedimento per omopolimerizzazione anionica di alfa-trifluorometilacrilato IT1204345B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60030623A JPS61190511A (ja) 1985-02-20 1985-02-20 含ふつ素重合体の製造法

Publications (2)

Publication Number Publication Date
IT8619378A0 IT8619378A0 (it) 1986-02-12
IT1204345B true IT1204345B (it) 1989-03-01

Family

ID=12308982

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19378/86A IT1204345B (it) 1985-02-20 1986-02-12 Procedimento per omopolimerizzazione anionica di alfa-trifluorometilacrilato

Country Status (6)

Country Link
US (1) US4613657A (it)
JP (1) JPS61190511A (it)
DE (1) DE3605515A1 (it)
FR (1) FR2577559B1 (it)
GB (1) GB2171708B (it)
IT (1) IT1204345B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61120275A (ja) * 1984-11-16 1986-06-07 Toshiba Corp 日本語ワ−ドプロセツサ
DE3607301A1 (de) * 1986-03-06 1987-09-10 Hoechst Ag Lichtleitfaser mit kern-mantel-struktur
GB2199680A (en) * 1986-11-28 1988-07-13 Sharp Kk Translating apparatus
US4833207A (en) * 1986-12-18 1989-05-23 Kansai Paint Company, Limited Curable compositions
JPH05310837A (ja) * 1992-05-14 1993-11-22 Japan Synthetic Rubber Co Ltd 酸素透過性高分子材料の製造方法
US6884562B1 (en) * 1998-10-27 2005-04-26 E. I. Du Pont De Nemours And Company Photoresists and processes for microlithography
KR100571453B1 (ko) * 1999-12-15 2006-04-17 신에쓰 가가꾸 고교 가부시끼가이샤 고분자 화합물, 화학 증폭 레지스트 재료 및 패턴 형성 방법
KR100592010B1 (ko) * 2000-02-16 2006-06-22 신에쓰 가가꾸 고교 가부시끼가이샤 고분자 화합물, 화학 증폭 레지스트 재료 및 패턴 형성 방법
JP3714870B2 (ja) * 2000-12-28 2005-11-09 セントラル硝子株式会社 透明性含フッ素共重合体
JP3962893B2 (ja) 2001-02-09 2007-08-22 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
US6683202B2 (en) * 2001-02-22 2004-01-27 Tokyo Ohka, Kogyo Co., Ltd. Fluorine-containing monomeric ester compound for base resin in photoresist composition
TWI443461B (zh) 2005-12-09 2014-07-01 Fujifilm Corp 正型光阻組成物、用於正型光阻組成物之樹脂、用於合成該樹脂之化合物及使用該正型光阻組成物之圖案形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2472811A (en) * 1946-04-27 1949-06-14 Eastman Kodak Co Polymers of alpha-fluoromethyl acrylic acid esters
NL298889A (it) * 1962-10-08 1965-08-10
US3285894A (en) * 1963-10-11 1966-11-15 Ceskoslovenska Akademie Ved Polymerization initiators comprising alkali metal alcoholates
US3457247A (en) * 1965-02-12 1969-07-22 Daikin Ind Ltd Fluorocarbon compounds and polymers thereof
US3395174A (en) * 1965-08-13 1968-07-30 Geigy Chem Corp 1, 1-dihydroperfluoroalkyl alpha-trifluoro-methacrylates
US3422081A (en) * 1965-11-15 1969-01-14 Continental Can Co Process for preparing stereoregular acrylamide polymers with an alkali metal alkoxide and polyvalent metal salt catalyst
US4357435A (en) * 1971-04-23 1982-11-02 Rohm And Haas Company Novel polymers of alkyl methacrylates
US4059616A (en) * 1971-04-23 1977-11-22 Rohm And Haas Company Novel methacrylic polymers having allyl functionality

Also Published As

Publication number Publication date
JPH0419247B2 (it) 1992-03-30
GB2171708A (en) 1986-09-03
IT8619378A0 (it) 1986-02-12
JPS61190511A (ja) 1986-08-25
FR2577559A1 (fr) 1986-08-22
GB2171708B (en) 1988-12-29
GB8603637D0 (en) 1986-03-19
US4613657A (en) 1986-09-23
DE3605515A1 (de) 1986-08-21
DE3605515C2 (it) 1988-08-18
FR2577559B1 (fr) 1988-07-01

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