IT1160057B - Processo per ridurre il tempo di sviluppo di agenti resistivi - Google Patents
Processo per ridurre il tempo di sviluppo di agenti resistiviInfo
- Publication number
- IT1160057B IT1160057B IT29670/78A IT2967078A IT1160057B IT 1160057 B IT1160057 B IT 1160057B IT 29670/78 A IT29670/78 A IT 29670/78A IT 2967078 A IT2967078 A IT 2967078A IT 1160057 B IT1160057 B IT 1160057B
- Authority
- IT
- Italy
- Prior art keywords
- reduce
- development time
- resistive
- agents
- resistive agents
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US85444077A | 1977-11-23 | 1977-11-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7829670A0 IT7829670A0 (it) | 1978-11-10 |
IT1160057B true IT1160057B (it) | 1987-03-04 |
Family
ID=25318701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT29670/78A IT1160057B (it) | 1977-11-23 | 1978-11-10 | Processo per ridurre il tempo di sviluppo di agenti resistivi |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0002105B1 (it) |
JP (1) | JPS5496025A (it) |
AU (1) | AU520640B2 (it) |
BR (1) | BR7807666A (it) |
CA (1) | CA1120763A (it) |
DE (1) | DE2860333D1 (it) |
IT (1) | IT1160057B (it) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5917552A (ja) * | 1982-07-21 | 1984-01-28 | Toray Ind Inc | 画像形成用積層体の処理方法 |
JPS61125019A (ja) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体 |
US4721665A (en) * | 1986-09-29 | 1988-01-26 | Polychrome Corporation | Method for neutralizing acidic novolak resin in a lithographic coating composition |
DE3738603A1 (de) * | 1987-11-13 | 1989-05-24 | Merck Patent Gmbh | Lagerstabile positiv-fotoresist-zusammensetzungen |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1224147B (de) * | 1963-08-23 | 1966-09-01 | Kalle Ag | Verfahren zur Umkehrentwicklung von Diazo-verbindungen enthaltenden Kopierschichten |
DE1447015B2 (de) * | 1963-10-03 | 1973-03-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche schichten zur herstellung von druckformen |
CA774047A (en) * | 1963-12-09 | 1967-12-19 | Shipley Company | Light-sensitive material and process for the development thereof |
JPS5614970B2 (it) * | 1974-02-01 | 1981-04-07 | ||
US3961100A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Method for developing electron beam sensitive resist films |
US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
JPS5156226A (ja) * | 1974-11-11 | 1976-05-17 | Sanei Kagaku Kogyo Kk | Hojitaipukankoseijushino genzozai |
-
1978
- 1978-07-27 CA CA000308258A patent/CA1120763A/en not_active Expired
- 1978-08-11 AU AU38838/78A patent/AU520640B2/en not_active Expired
- 1978-09-14 JP JP11247178A patent/JPS5496025A/ja active Granted
- 1978-10-13 EP EP78300499A patent/EP0002105B1/en not_active Expired
- 1978-10-13 DE DE7878300499T patent/DE2860333D1/de not_active Expired
- 1978-11-10 IT IT29670/78A patent/IT1160057B/it active
- 1978-11-22 BR BR7807666A patent/BR7807666A/pt unknown
Also Published As
Publication number | Publication date |
---|---|
CA1120763A (en) | 1982-03-30 |
DE2860333D1 (en) | 1981-03-12 |
EP0002105A1 (en) | 1979-05-30 |
AU520640B2 (en) | 1982-02-18 |
IT7829670A0 (it) | 1978-11-10 |
JPS5736576B2 (it) | 1982-08-04 |
AU3883878A (en) | 1980-02-14 |
JPS5496025A (en) | 1979-07-30 |
BR7807666A (pt) | 1979-07-31 |
EP0002105B1 (en) | 1981-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19931119 |