IT1048044B - Dispositivo di deflessione di fasci di elettroni in particolare per apparecchi di evaporazione sotto vuoto - Google Patents

Dispositivo di deflessione di fasci di elettroni in particolare per apparecchi di evaporazione sotto vuoto

Info

Publication number
IT1048044B
IT1048044B IT5201075A IT5201075A IT1048044B IT 1048044 B IT1048044 B IT 1048044B IT 5201075 A IT5201075 A IT 5201075A IT 5201075 A IT5201075 A IT 5201075A IT 1048044 B IT1048044 B IT 1048044B
Authority
IT
Italy
Prior art keywords
vacuum evaporation
deflection device
evaporation equipment
electronic bands
bands
Prior art date
Application number
IT5201075A
Other languages
English (en)
Italian (it)
Original Assignee
Bandstahlkombinat Matern Veb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bandstahlkombinat Matern Veb filed Critical Bandstahlkombinat Matern Veb
Application granted granted Critical
Publication of IT1048044B publication Critical patent/IT1048044B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
IT5201075A 1974-12-24 1975-10-30 Dispositivo di deflessione di fasci di elettroni in particolare per apparecchi di evaporazione sotto vuoto IT1048044B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD18340974A DD120729A1 (enrdf_load_stackoverflow) 1974-12-24 1974-12-24

Publications (1)

Publication Number Publication Date
IT1048044B true IT1048044B (it) 1980-11-20

Family

ID=5498701

Family Applications (1)

Application Number Title Priority Date Filing Date
IT5201075A IT1048044B (it) 1974-12-24 1975-10-30 Dispositivo di deflessione di fasci di elettroni in particolare per apparecchi di evaporazione sotto vuoto

Country Status (7)

Country Link
JP (1) JPS5187180A (enrdf_load_stackoverflow)
BE (1) BE837062A (enrdf_load_stackoverflow)
DD (1) DD120729A1 (enrdf_load_stackoverflow)
DE (1) DE2546902A1 (enrdf_load_stackoverflow)
IT (1) IT1048044B (enrdf_load_stackoverflow)
LU (1) LU74084A1 (enrdf_load_stackoverflow)
SU (1) SU636709A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS624862A (ja) * 1985-06-29 1987-01-10 Anelva Corp 真空蒸着用電子銃

Also Published As

Publication number Publication date
DE2546902A1 (de) 1976-07-08
SU636709A1 (ru) 1978-12-05
BE837062A (fr) 1976-04-16
DD120729A1 (enrdf_load_stackoverflow) 1976-06-20
LU74084A1 (enrdf_load_stackoverflow) 1976-07-20
JPS5187180A (en) 1976-07-30

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